摘要:
A radiation-curable resin composition for optical parts comprising (A) 5% to 70% by weight of a urethane (meth)acrylate which is a reaction product of (a) a (meth)acrylate having a hydroxyl group, (b) a polyisocyanate having an aromatic ring, (c) a polyol, and (d) an alcohol having 1 to 4 carbon atoms without a polymerizable unsaturated group, and which has (meth)acryloyl groups in an amount of 40% to 85% by mole of its molecular ends on average of the reaction product; and (B) 10% to 80% by weight of a compound, other than the component (A), having an ethylenically unsaturated group is provided. A cured product of the composition exhibits a high refractive index, excellent property of adhesion to various plastic substrates, appropriate hardness, and little sign of yellowing.
摘要:
A backlight apparatus of a sidelight type includes a light guide plate having an incident face on a lateral face and a light source unit having a plurality of substrates. The plurality of the substrates are respectively disposed on the incident face side of the light guide plate such that each of substrate faces of the substrates is parallel with a light exit face of the light guide plate, and the substrates are adjacent to one another in a thickness direction of the light guide plate. A plurality of light emitting devices that emit light along the substrate faces are mounted in columns on each of the substrate faces of the plurality of the substrates such that emitting directions of the light emitting devices are directed to the incident face.
摘要:
The invention relates to a photocurable resin composition comprising: (A) 20-65 wt % of a cationically polymerizable component, (B) 0.1-10 wt % of a cationic-polymerization initiator, (C) 5-45 wt % of a component having a structure shown by the following formula (1), wherein R′, R2, and R3 individually represent organic groups, provided that at least two of R1, R2, and R3 have a polymerizable carbon-carbon double bond, (D) 0.1-10 wt % of a radical-polymerization initiator, and (E) 0-20 wt % of a component having at least one radically polymerizable group in the molecule; The invention also relates to a method of making three dimensional articles and the use of the articles.
摘要:
The invention relates to a photocurable resin composition comprising: (A) (A1) a (meth)acrylate having a structure shown by the formula (1) or (2), or (A2) an epoxy compound having a structure shown by the formula (1) or (2); (B) a (meth)acrylate having three or more functional groups other than (A1); (C) a radical photoinitiator; (D) a compound having three or more cyclic ether linkages in the molecule other than (A2) and (E) a cationic photoinitiator; the invention also relates to optical parts made from the resins of the invention and use of the resin in other applications.
摘要:
To provide a UV-curable resin composition useful for forming optical parts such as optical lenses. A radiation-curable resin composition for optical parts, comprising (A) 5-70 wt % of urethane (meth)acrylate, (B) 0.1-70 wt % of benzyl (meth)acrylate, and (C) 10-70 wt % of an ethylenically unsaturated group-containing compound other than the components (A) and (B).
摘要:
A surface illuminant device includes a surface illuminant having a light distribution characteristic with no directivity relative to specific directions, and a prism sheet having a plurality of prisms each having a predetermined apical angle. The prism sheet is placed on the light emission side of the surface illuminant. One side of the prism sheet on which a plurality of prisms are placed is opposite to the light emission side of the surface illuminant. Accordingly, light can be emitted in a plurality of specific directions in concentrative manner to enhance luminance in that plurality of directions. Further, the surface illuminant device includes an optical sheet which condenses the incident light. In the luminance distribution (light distribution characteristic) thus obtained, the luminance gently decreases in the vicinity of the directions in which light is emitted in concentrative manner.
摘要:
A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.
摘要:
A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.
摘要:
The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.
摘要:
In a surface-area light source device, a light entrance side surface of a light guide plate of a surface-area light source device has a staircase shape having steps in the vertical direction, and light emission diodes are provided at each step. The structure enables the distance between a light emission diode provided at one step and light emission diodes provided at an adjacent step to be maintained greater even if the thickness of the light guide plate is reduced so as to decrease intervals of the light emission diodes in the direction of the thickness of the light guide plate. As a consequence, the amount of transmission and reception of heat produced by the light emission diodes is reduced to prevent an increase in the temperature of the diodes. This allows a reduction in the thickness of the light guide plate with the brightness of light emitted from the light guide plate maintained, enabling the surface-area light source device to be thinned. As a result, a large number of light emitting diodes are provided, so that the brightness of the surface light source device is increased.