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公开(公告)号:US11817324B2
公开(公告)日:2023-11-14
申请号:US17371673
申请日:2021-07-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ching-Yi Lin , Yu-Hao Chen , Fong-Yuan Chang , Po-Hsiang Huang , Jyh Chwen Frank Lee , Shuo-Mao Chen
IPC: H01L21/48 , H01L23/498 , H01L23/367 , H01L23/00
CPC classification number: H01L21/4882 , H01L21/486 , H01L21/4857 , H01L23/367 , H01L23/49816 , H01L23/49822 , H01L23/49838 , H01L24/16 , H01L24/19 , H01L24/24 , H01L24/32 , H01L24/73 , H01L24/83 , H01L2224/16227 , H01L2224/24226 , H01L2224/32225 , H01L2224/73209 , H01L2224/73253 , H01L2224/73267
Abstract: A method includes forming a package, which includes forming a plurality of redistribution lines over a carrier, and forming a thermal dissipation block over the carrier. The plurality of redistribution lines and the thermal dissipation block are formed by common processes. The thermal dissipation block has a first metal density, and the plurality of redistribution lines have a second metal density smaller than the first metal density. The method further includes forming a metal post over the carrier, placing a device die directly over the thermal dissipation block, and encapsulating the device die and the metal post in an encapsulant. The package is then de-bonded from the carrier.
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公开(公告)号:US20230352463A1
公开(公告)日:2023-11-02
申请号:US18346319
申请日:2023-07-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Shuo-Mao Chen , Feng-Cheng Hsu
IPC: H01L25/16 , H01L23/00 , H01L23/31 , H01L23/538 , H01L21/48 , H01L21/56 , H01L25/00 , H01L25/065
CPC classification number: H01L25/16 , H01L24/16 , H01L23/3128 , H01L23/5381 , H01L23/5384 , H01L21/4853 , H01L21/486 , H01L21/565 , H01L25/50 , H01L25/0657 , H01L2924/19105 , H01L2225/06513 , H01L2225/06586 , H01L2224/16227 , H01L2924/1431 , H01L2924/1434
Abstract: A method includes bonding a first package component and a second package component to an interposer. The first package component includes a core device die, and the second package component includes a memory die. An Independent Passive Device (IPD) die is bonded directly to the interposer. The IPD die is electrically connected to the first package component through a first conductive path in the interposer. A package substrate is bonded to the interposer die. The package substrate is on an opposing side of the interposer than the first package component and the second package component.
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公开(公告)号:US20230335477A1
公开(公告)日:2023-10-19
申请号:US18340387
申请日:2023-06-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chia-Kuei Hsu , Ming-Chih Yew , Po-Yao Lin , Shuo-Mao Chen , Feng-Cheng Hsu , Shin-Puu Jeng
IPC: H01L23/498 , H01L21/48 , H01L21/56 , H01L23/00 , H01L25/065 , H01L25/18
CPC classification number: H01L23/49822 , H01L21/4857 , H01L21/563 , H01L23/49838 , H01L24/81 , H01L25/0655 , H01L25/18 , H01L2224/81815
Abstract: A method includes forming a redistribution structure, which formation process includes forming a plurality of dielectric layers over a carrier, forming a plurality of redistribution lines extending into the plurality of dielectric layers, and forming a reinforcing patch over the carrier. The method further includes bonding a package component to the redistribution structure, with the package component having a peripheral region overlapping a portion of the reinforcing patch. And de-bonding the redistribution structure and the first package component from the carrier.
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公开(公告)号:US11508710B2
公开(公告)日:2022-11-22
申请号:US16884046
申请日:2020-05-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Po-Yao Lin , Cheng-Yi Hong , Feng-Cheng Hsu , Shuo-Mao Chen , Shin-Puu Jeng , Shu-Shen Yeh , Kuang-Chun Lee
IPC: H01L25/18 , H01L23/538 , H01L21/48 , H01L21/56 , H01L23/24 , H01L25/00 , H01L23/31 , H01L21/683 , H01L23/00 , H01L23/373
Abstract: A method of forming a semiconductor device package includes the following steps. A redistribution structure is formed on a carrier. A plurality of second semiconductor devices are disposed on the redistribution structure. At least one warpage adjusting component is disposed on at least one of the second semiconductor devices. A first semiconductor device is disposed on the redistribution structure. An encapsulating material is formed on the redistribution structure to encapsulate the first semiconductor device, the second semiconductor devices and the warpage adjusting component. The carrier is removed to reveal a bottom surface of the redistribution structure. A plurality of electrical terminals are formed on the bottom surface of the redistribution structure.
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公开(公告)号:US20220189919A1
公开(公告)日:2022-06-16
申请号:US17688448
申请日:2022-03-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Po-Yao Chuang , Shuo-Mao Chen
IPC: H01L25/065 , H01L21/56 , H01L23/31 , H01L23/538 , H01L25/00
Abstract: An embodiment is a structure including a first semiconductor device and a second semiconductor device, a first set of conductive connectors mechanically and electrically bonding the first semiconductor device and the second semiconductor device, a first underfill between the first and second semiconductor devices and surrounding the first set of conductive connectors, a first encapsulant on at least sidewalls of the first and second semiconductor devices and the first underfill, and a second set of conductive connectors electrically coupled to the first semiconductor device, the second set of conductive connectors being on an opposite side of the first semiconductor device as the first set of conductive connectors.
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公开(公告)号:US11270953B2
公开(公告)日:2022-03-08
申请号:US16284630
申请日:2019-02-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Po-Yao Chuang , Po-Hao Tsai , Shin-Puu Jeng , Shuo-Mao Chen , Ming-Chih Yew
IPC: H01L23/552 , H01L23/538 , H01L25/065 , H01L23/31 , H01L21/48 , H01L25/00 , H01L21/56 , H05K1/02 , H01L23/498 , H01L25/16 , H01L23/00
Abstract: Structures and formation methods of a chip package are provided. The method includes forming multiple conductive structures over a carrier substrate. The method also includes disposing a semiconductor die over the carrier substrate such that the conductive structures surround the semiconductor die. The method further includes forming a protective layer to surround the conductive structures and the semiconductor die. In addition, the method includes disposing a shielding element over the semiconductor die and the conductive structures. The shielding element is electrically connected to the conductive structures.
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公开(公告)号:US11264300B2
公开(公告)日:2022-03-01
申请号:US16182750
申请日:2018-11-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Po-Yao Lin , Feng-Cheng Hsu , Shuo-Mao Chen , Chin-Hua Wang
IPC: H01L23/367 , H01L25/18 , H01L21/56 , H01L21/48 , H01L25/00
Abstract: A package structure and method for forming the same are provided. The package structure includes a semiconductor die formed over a first side of an interconnect structure, and the semiconductor die has a first height. The package structure also includes a first stacked die package structure formed over the first side of the interconnect structure, and the first stacked die package structure has a second height. The second height is greater than the first height. The package structure includes a lid structure formed over the semiconductor die and the first stacked die package structure. The lid includes a main portion and a protruding portion extending from the main portion, and the protruding portion is directly over the semiconductor die.
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公开(公告)号:US11189596B2
公开(公告)日:2021-11-30
申请号:US16928003
申请日:2020-07-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shuo-Mao Chen , Feng-Cheng Hsu , Han-Hsiang Huang , Hsien-Wen Liu , Shin-Puu Jeng , Hsiao-Wen Lee
IPC: H01L25/065 , H01L25/16 , H01L23/538 , H01L25/00 , H01L21/56 , H01L21/683 , H01L23/31
Abstract: Multi-chip wafer level packages and methods of forming the same are provided. A multi-chip wafer level package includes a first tier and a second tier. The first tier includes a first redistribution layer structure and at least one chip over the first redistribution layer structure. The second tier includes a second redistribution layer structure and at least two other chips over the second redistribution layer structure. The first tier is bonded to the second tier with the at least one chip being in physical contact with the second redistribution layer structure. The total number of connectors of the at least two other chips is greater than the total number of connectors of the at least one chip.
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公开(公告)号:US11004818B2
公开(公告)日:2021-05-11
申请号:US16915052
申请日:2020-06-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shuo-Mao Chen , Der-Chyang Yeh , Li-Hsien Huang
IPC: H01L23/00 , H01L23/31 , H01L23/522 , H01L23/525 , H01L21/56 , H01L23/538 , H01L21/768
Abstract: An embodiment is a device comprising a substrate, a metal pad over the substrate, and a passivation layer comprising a portion over the metal pad. The device further comprises a metal pillar over and electrically coupled to the metal pad, and a passive device comprising a first portion at a same level as the metal pillar, wherein the first portion of the passive device is formed of a same material as the metal pillar.
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公开(公告)号:US20200343220A1
公开(公告)日:2020-10-29
申请号:US16928003
申请日:2020-07-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shuo-Mao Chen , Feng-Cheng Hsu , Han-Hsiang Huang , Hsien-Wen Liu , Shin-Puu Jeng , Hsiao-Wen Lee
IPC: H01L25/065 , H01L25/16 , H01L23/538 , H01L25/00 , H01L21/56 , H01L21/683
Abstract: Multi-chip wafer level packages and methods of forming the same are provided. A multi-chip wafer level package includes a first tier and a second tier. The first tier includes a first redistribution layer structure and at least one chip over the first redistribution layer structure. The second tier includes a second redistribution layer structure and at least two other chips over the second redistribution layer structure. The first tier is bonded to the second tier with the at least one chip being in physical contact with the second redistribution layer structure. The total number of connectors of the at least two other chips is greater than the total number of connectors of the at least one chip.
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