公开(公告)号：US08120781B2

公开(公告)日：2012-02-21

申请号：US12509083

申请日：2009-07-24

Applicant: Jan Liesener ,  Mark Davidson ,  Peter J De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

Inventor： Jan Liesener ,  Mark Davidson ,  Peter J De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

IPC: G01B11/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: In certain aspects, interferometry methods are disclosed that include providing one or more interferometry signals for a test object, wherein the interferometry signals correspond to a sequence of optical path difference (OPD) values which are not all equally spaced from one another because of noise, providing information about the unequal spacing of the sequence of OPD values, decomposing each of the interferometry signals into a contribution from a plurality of basis functions each corresponding to a different frequency and sampled at the unequally spaced OPD values, and using information about the contribution from each of the multiple basis functions to each of the interferometry signals to determine information about the test object.

Abstract translation: 在某些方面，公开了干涉测量方法，其包括为测试对象提供一个或多个干涉测量信号，其中所述干涉测量信号对应于由于噪声而不是彼此均等间隔的光程差（OPD）值序列， 提供关于OPD值序列的不等间距的信息，将每个干涉测量信号分解成来自多个基本函数的贡献，每个基本函数对应于不同的频率，并以不等间隔的OPD值进行采样，并且使用关于来自 每个干涉测量信号的多个基本函数中的每一个确定关于测试对象的信息。

公开(公告)号：US07924435B2

公开(公告)日：2011-04-12

申请号：US11963693

申请日：2007-12-21

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/8422 ,  G01N21/9501 ,  G01N2021/9513

Abstract: An apparatus is disclosed which includes an interferometry system configured to operate in a first mode to produce a first set of multiple interferometry signals corresponding to different illumination angles of a test object by test light and in a second mode produce a second set of multiple interferometry signals corresponding to different surface locations of a test object. An electronic processor coupled to the interferometry system is configured to receive the first set of interferometry signals and programmed to compare information derivable from the first set of multiple interferometry signals to information corresponding to multiple models of the test object to determine information related to one or features of the test object, and output the information. In some embodiments, the features include an under-resolved feature.

Abstract translation: 公开了一种装置，其包括被配置为以第一模式操作以产生对应于测试光的测试对象的不同照明角度的第一组多个干涉测量信号的干涉测量系统，并且在第二模式中产生第二组多个干涉测量信号 对应于测试对象的不同表面位置。 耦合到干涉测量系统的电子处理器被配置为接收第一组干涉测量信号，并被编程以将可从第一组多个干涉测量信号导出的信息与对应于测试对象的多个模型的信息进行比较，以确定与一个或多个特征相关的信息 的测试对象，并输出信息。 在一些实施例中，特征包括欠分辨特征。

公开(公告)号：US07636168B2

公开(公告)日：2009-12-22

申请号：US11546119

申请日：2006-10-11

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/02044 ,  G01B9/02022 ,  G01B9/02037 ,  G01B9/02072 ,  G01B9/0209 ,  G01B2290/70

Abstract: In general, in one aspect, the disclosure features a method that includes directing measurement light to reflect from a measurement surface and combining the reflected measurement light with reference light, where the measurement light and reference light are derived from a common source, and there is a non-zero optical path length difference between the measurement light and reference light that is greater than a coherence length of the measurement light. The method further includes spectrally dispersing the combined light onto a multi-element detector to detect a spatially-varying intensity pattern, determining spatial information about the measurement surface based on the spatially-varying intensity pattern, and outputting the spatial information.

Abstract translation: 通常，在一个方面，本发明的特征在于一种方法，其包括引导测量光从测量表面反射并将反射的测量光与参考光组合，其中测量光和参考光源自公共源，并且存在 测量光和参考光之间的非零光程长度差大于测量光的相干长度。 该方法还包括将组合的光谱分散到多元素检测器上以检测空间变化的强度图案，基于空间变化的强度图案确定关于测量表面的空间信息，并输出空间信息。

公开(公告)号：US20080174784A1

公开(公告)日：2008-07-24

申请号：US11963693

申请日：2007-12-21

Applicant: Xavier Colonna De Lega ,  Peter de Groot

Inventor： Xavier Colonna De Lega ,  Peter de Groot

IPC: G01B9/02 ,  G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/8422 ,  G01N21/9501 ,  G01N2021/9513

Abstract: An apparatus is disclosed which includes an interferometry system configured to operate in a first mode to produce a first set of multiple interferometry signals corresponding to different illumination angles of a test object by test light and in a second mode produce a second set of multiple interferometry signals corresponding to different surface locations of a test object. An electronic processor coupled to the interferometry system is configured to receive the first set of interferometry signals and programmed to compare information derivable from the first set of multiple interferometry signals to information corresponding to multiple models of the test object to determine information related to one or features of the test object, and output the information. In some embodiments, the features include an under-resolved feature.

Abstract translation: 公开了一种装置，其包括被配置为以第一模式操作以产生对应于测试光的测试对象的不同照明角度的第一组多个干涉测量信号的干涉测量系统，并且在第二模式中产生第二组多个干涉测量信号 对应于测试对象的不同表面位置。 耦合到干涉测量系统的电子处理器被配置为接收第一组干涉测量信号，并被编程以将可从第一组多个干涉测量信号导出的信息与对应于测试对象的多个模型的信息进行比较，以确定与一个或多个特征相关的信息 的测试对象，并输出信息。 在一些实施例中，特征包括欠分辨特征。

公开(公告)号：US07126698B2

公开(公告)日：2006-10-24

申请号：US11329304

申请日：2006-01-10

Applicant: Peter J De Groot ,  Xavier Colonna De Lega

Inventor： Peter J De Groot ,  Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G01N21/9515 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/2441 ,  G01B11/306 ,  G01B2290/25

Abstract: Conical surfaces (and other complex surface shapes) can be interferometrically characterized using a locally spherical measurement wavefront (e.g., spherical and aspherical wavefronts). In particular, complex surface shapes are measured relative to a measurement point datum. This is achieved by varying the radius of curvature of a virtual surface corresponding to a theoretical test surface that would reflect a measurement wavefront to produce a constant optical path length difference (e.g., zero OPD) between the measurement and reference wavefronts.

公开(公告)号：US07046371B2

公开(公告)日：2006-05-16

申请号：US10464163

申请日：2003-06-17

Applicant: Xavier Colonna De Lega ,  Peter J. De Groot

Inventor： Xavier Colonna De Lega ,  Peter J. De Groot

IPC: G01B9/02

CPC classification number: G01B9/02038 ,  G01B9/02065 ,  G01B9/0209 ,  G01B2290/70

Abstract: In certain aspects, the invention features an interferometry system that utilizes coupled cavities (e.g., at least one remote cavity and a main cavity) and an extended light source. The remote cavity and the main cavity can have similar optical properties (e.g., similar numerical apertures (NA's)), allowing them to introduce offsetting, and therefore compensating, non-zero optical path differences (OPD's) between the measurement and reference beams without degrading interference fringe contrast due to source spatial coherence. In other words, for each non-zero OPD in the main cavity there exists a configuration of the remote cavity such that the total OPD between test and reference chief rays, and between test and reference marginal rays is substantially zero.

Abstract translation: 在某些方面，本发明的特征在于使用耦合空腔（例如，至少一个远程腔和主腔）和扩展光源的干涉测量系统。 远程腔体和主腔体可以具有相似的光学特性（例如，类似的数值孔径（NA）），允许它们在测量和参考光束之间引入补偿，从而补偿非零光程差（OPD）而不降解 干涉条纹对比由于源空间相干性。 换句话说，对于主腔中的每个非零OPD，存在远程腔的配置，使得测试和参考主射线之间以及测试和参考边缘射线之间的总OPD基本为零。

公开(公告)号：US07030996B2

公开(公告)日：2006-04-18

申请号：US10806496

申请日：2004-03-22

Applicant: Peter J De Groot ,  Xavier Colonna De Lega

Inventor： Peter J De Groot ,  Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G01N21/9515 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/2441 ,  G01B11/306 ,  G01B2290/25

Abstract: Conical surfaces (and other complex surface shapes) can be interferometrically characterized using a locally spherical measurement wavefront (e.g., spherical and aspherical wavefronts). In particular, complex surface shapes are measured relative to a measurement point datum. This is achieved by varying the radius of curvature of a virtual surface corresponding to a theoretical test surface that would reflect a measurement wavefront to produce a constant optical path length difference (e.g., zero OPD) between the measurement and reference wavefronts.

公开(公告)号：US07012700B2

公开(公告)日：2006-03-14

申请号：US10464723

申请日：2003-06-17

Applicant: Peter J. De Groot ,  Xavier Colonna De Lega ,  Senthil Balasubramaniam

Inventor： Peter J. De Groot ,  Xavier Colonna De Lega ,  Senthil Balasubramaniam

IPC: G01B9/02

CPC classification number: G01B11/2441 ,  G01B9/02039 ,  G01B9/02063 ,  G01B9/0209

Abstract: In certain aspects, the invention features scanning interferometry systems and methods that can scan an optical measurement surface over distances greater than a depth of focus of imaging optics in the interferometry system, while keeping an optical measurement surface in focus (i.e., maintaining an image of the optical measurement surface coincident with the detector). The optical measurement surface refers to a theoretical test surface in the path of test light in the interferometer that would reflect the test light to produce an optical path length difference (OPD) between it and reference light that is equal to a constant across a detector.

Abstract translation: 在某些方面，本发明的特征在于扫描干涉测量系统和方法，其可以在保持光学测量表面聚焦的同时在干涉测量系统中扫描光学测量表面的距离大于成像光学元件的焦深， 光学测量表面与检测器重合）。 光学测量表面是指干涉仪中的测试光路径中的理论测试表面，其将反射测试光以产生其与参考光之间的光程长度差（OPD），该参考光等于检测器上的常数。

公开(公告)号：US06822745B2

公开(公告)日：2004-11-23

申请号：US09769859

申请日：2001-01-25

Applicant: Peter De Groot ,  Xavier Colonna De Lega ,  David Grigg ,  James Biegen

Inventor： Peter De Groot ,  Xavier Colonna De Lega ,  David Grigg ,  James Biegen

IPC: G01B902

CPC classification number: G01B11/245 ,  G01B9/02021 ,  G01B9/02024 ,  G01B9/02027 ,  G01B9/02072 ,  G01B9/02078 ,  G01B9/0209 ,  G01B11/2441

Abstract: The invention features a method for determining a geometric property of a test object, the method including: interferometrically profiling a first surface of the test object in a first coordinate system; interferometrically profiling a second surface of the test object in a second coordinate system different from the first coordinate system; providing a relationship between the first and second coordinate system; and calculating the geometric property based on the interferometrically profiled surfaces and the relationship between the first and second coordinate system. In some embodiments, the relationship may be determined by using calibrated gage blocks or by using a displacement measuring interferometer. Corresponding system are also described.

Abstract translation: 本发明的特征在于一种用于确定测试对象的几何特性的方法，该方法包括：在第一坐标系中对测试对象的第一表面进行干涉测量; 在不同于第一坐标系的第二坐标系中对测试对象的第二表面进行干涉测量; 提供第一和第二坐标系之间的关系; 并基于干涉测量曲面计算几何特性以及第一和第二坐标系之间的关系。 在一些实施例中，可以通过使用校准的计量块或通过使用位移测量干涉仪来确定该关系。 还描述了相应的系统。

公开(公告)号：US06597460B2

公开(公告)日：2003-07-22

申请号：US09769891

申请日：2001-01-25

Applicant: Peter De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck ,  James W. Kramer

Inventor： Peter De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck ,  James W. Kramer

IPC: G01B902

CPC classification number: G01B11/30 ,  G01B9/02058 ,  G01B9/02078 ,  G01B9/02083 ,  G01B9/0209

Abstract: The invention features a surface profiling method including: collecting interferometric data related to a surface profile of a measurement object; and calculating the surface profile based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object. The invention also features a surface profiling system including: an interferometry system which during operation provides interferometric data related to a surface profile of a measurement object; and an electronic processor coupled the interferometry system, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and at least one parameter indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.

Abstract translation: 本发明的特征在于一种表面分析方法，包括：收集与测量对象的表面轮廓相关的干涉测量数据; 以及基于所收集的干涉测量数据和指示测量对象的成型表面的反射相位变化（PCOR）中的色散的至少一个值来计算表面轮廓。 本发明还具有表面分布系统，其包括：干涉测量系统，其在操作期间提供与测量对象的表面轮廓相关的干涉测量数据; 以及耦合所述干涉测量系统的电子处理器，其中在操作期间，所述电子处理器基于所述干涉测量数据和指示所述测量对象的成型表面的反射相位变化（PCOR）上的色散的至少一个参数来计算所述表面轮廓。