公开(公告)号：US20050173028A1

公开(公告)日：2005-08-11

申请号：US10508945

申请日：2003-03-26

申请人： Sumie Suda ,  Nobuhiko Ibaraki ,  Nao Yoshihara ,  Shigetsugu Yoshida ,  Koji Harada

发明人： Sumie Suda ,  Nobuhiko Ibaraki ,  Nao Yoshihara ,  Shigetsugu Yoshida ,  Koji Harada

IPC分类号： C21D8/06 ,  C21D9/52 ,  C22C38/02 ,  C22C38/04 ,  C22C38/18 ,  C22C38/34 ,  C22C38/44

CPC分类号： C22C38/34 ,  C21D8/06 ,  C21D9/52 ,  C22C38/02 ,  C22C38/04 ,  Y10S148/908 ,  Y10T29/479

摘要： Disclosed is a hard-drawn spring which exhibits fatigue strength and sag resistance equal or superior to springs produced using an oil-tempered wire. The hard-drawn spring is produced using a steel wire containing 0.5 to 0.7 mass % of C, 1.0 to 1.95 mass % of Si, 0.5 to 1.5 mass % of Mn and 0.5 to 1.5 mass % of Cr, with the balance being Fe and inevitable impurities. In the steel wire, the number of carbides having circle-equivalent diameters of 0.1 μm or more is 5 particles/100 μm2 or less.

摘要翻译： 公开了一种硬拉伸弹簧，其表现出等于或优于使用油回火线产生的弹簧的疲劳强度和下垂阻力。 硬拉伸弹簧使用含有C：0.5〜0.7质量％，Si：1.0〜1.95质量％，Mn：0.5〜1.5质量％，Cr：0.5〜1.5质量％的钢线，余量为Fe， 不可避免的杂质。 在钢丝中，圆当量直径为0.1μm以上的碳化物的数量为5个/100μm以下。

公开(公告)号：US06921554B2

公开(公告)日：2005-07-26

申请号：US10164696

申请日：2002-06-10

申请人： Koji Harada ,  Ryoichi Uemura

发明人： Koji Harada ,  Ryoichi Uemura

IPC分类号： C23C16/44 ,  C23C16/455 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67253 ,  C23C16/45523 ,  C23C16/45557 ,  H01L21/67248

摘要： Process gas supply/stop operations are intermittently performed. As the hydrophobic process progresses, the temperature of a gas contract portion of a wafer lowers. While the hydrophobic process stops, the temperature of the gas contact portion of the wafer rises to the original temperature. Thereafter, the hydrophobic process resumes. Thus, while the temperature of the gas contact portion of wafer is suppressed from largely lowering, the hydrophobic process can be performed. Thus, non-uniformity of the hydrophobic process on the front surface of the wafer is reduced.

摘要翻译： 间歇地执行过程气体供应/停止操作。 随着疏水过程的进行，晶片的气体收缩部分的温度降低。 当疏水过程停止时，晶片的气体接触部分的温度升高到原始温度。 此后，疏水过程恢复。 因此，当抑制晶片的气体接触部分的温度大大降低时，可以进行疏水处理。 因此，晶片前表面上的疏水过程的不均匀性降低。

公开(公告)号：US20050103899A1

公开(公告)日：2005-05-19

申请号：US11016749

申请日：2004-12-21

申请人： Masayuki Kobayashi ,  Koji Harada ,  Toru Ishikawa

发明人： Masayuki Kobayashi ,  Koji Harada ,  Toru Ishikawa

IPC分类号： F02M61/04 ,  F02M51/06 ,  F02M61/16 ,  F02M61/18 ,  F02M63/00 ,  F02M69/04 ,  F02M61/00

CPC分类号： F02M61/188 ,  F02M51/0671 ,  F02M61/162 ,  F02M61/168 ,  F02M61/18 ,  F02M69/045 ,  F02M2200/505

摘要： It is an object of the present invention is to provide a fuel injection valve and its apparatus, and an internal combustion engine, a method for manufacturing the fuel injection valve and its nozzle body, and a method for manufacturing the same capable of securing highly accurate and stabilized fuel spraying characteristics. The fuel injection valve comprises a nozzle body, an injection hole provided in the nozzle body, a valve body for opening and closing a fuel passage from the injection hole relative to the nozzle body, and a drive means for driving the valve body, wherein formed is a protrusion having an opening in communication with the downstream side of the injection hole of the nozzle body and which part of the side and an extreme end are opened. The invention resides in a nozzle body and manufacturing it by plastic processing, and an internal combustion engine using the same.

公开(公告)号：US06686571B2

公开(公告)日：2004-02-03

申请号：US10237781

申请日：2002-09-10

申请人： Jun Ookura ,  Koji Harada

发明人： Jun Ookura ,  Koji Harada

IPC分类号： H05B102

CPC分类号： H01L21/67248 ,  G05B11/42 ,  G05D23/1917 ,  H01L21/67109

摘要： A substrate cooling unit comprises a cooling plate on which the substrate is placed, a cooling temperature adjusting element which adjusts the cooling plate to a predetermined temperature, a temperature controller which controls a temperature of the cooling temperature adjusting element according to a transfer function, a temperature sensor attached to the cooling plate, and a control parameter changing section which changes at least any one setting of a proportional operation coefficient, integral time or derivative time among control parameters in the transfer function based on a temperature of the cooling plate detected by the temperature sensor after the substrate that is an object to be cooled is placed on the cooling plate.

摘要翻译： 基板冷却单元包括其上放置基板的冷却板，将冷却板调节到预定温度的冷却温度调节元件，根据传递函数来控制冷却温度调节元件的温度的温度控制器， 温度传感器，其安装在冷却板上，以及控制参数变更部，其基于由所述冷却板检测出的所述冷却板的温度，在所述传递函数中的控制参数中的至少任一个比例运算系数，积分时间或微分时间的设定中进行变更 将作为被冷却对象的基板后的温度传感器放置在冷却板上。

公开(公告)号：US06465055B2

公开(公告)日：2002-10-15

申请号：US09742536

申请日：2000-12-22

申请人： Koji Harada

发明人： Koji Harada

IPC分类号： B05D306

CPC分类号： H01L21/67115 ,  H01L21/67028

摘要： In this impurity eliminating apparatus, a mounting stand on which a wafer is mounted and a casing which confronts the mounting stand are provided in a container. A lower face of the casing consists of quartz glass. Inside the casing, an irradiating body for irradiating ultraviolet rays toward the wafer on the mounting stand is provided. The casing is full of inactive gas atmosphere supplied from an inactive gas supply pipe. The atmosphere above the wafer is exhausted from one side by an exhauster. Following the treatment by the impurity eliminating apparatus with the above structure, coating treatment with a treatment solution for forming a SOG film is performed. Thus, organic substances on the surface of the wafer is eliminated to form the SOG film.

摘要翻译： 在该杂质消除装置中，在容器中设置有安装有晶片的安装台和面对安装台的壳体。 外壳的下表面由石英玻璃组成。 在壳体内设置用于向安装台上的晶片照射紫外线的照射体。 外壳充满从惰性气体供应管供应的惰性气体气氛。 晶片上方的气氛通过排气器从一侧排出。 在用具有上述结构的杂质消除装置处理之后，进行用于形成SOG膜的处理溶液的涂覆处理。 因此，消除晶片表面上的有机物质以形成SOG膜。

公开(公告)号：US06402844B1

公开(公告)日：2002-06-11

申请号：US09391408

申请日：1999-09-08

申请人： Koji Harada ,  Ryoichi Uemura

发明人： Koji Harada ,  Ryoichi Uemura

IPC分类号： C23C1600

CPC分类号： H01L21/67253 ,  C23C16/45523 ,  C23C16/45557 ,  H01L21/67248

摘要： Process gas supply/stop operations are intermittently performed. As the hydrophobic process progresses, the temperature of a gas contract portion of a wafer lowers. While the hydrophobic process stops, the temperature of the gas contact portion of the wafer rises to the original temperature. Thereafter, the hydrophobic process resumes. Thus, while the temperature of the gas contact portion of wafer is suppressed from largely lowering, the hydrophobic process can be performed. Thus, non-uniformity of the hydrophobic process on the front surface of the wafer is reduced.

公开(公告)号：US06402508B2

公开(公告)日：2002-06-11

申请号：US09729714

申请日：2000-12-06

申请人： Koji Harada ,  Issei Ueda

发明人： Koji Harada ,  Issei Ueda

IPC分类号： F27D312

CPC分类号： H01L21/67178 ,  H01L21/67109

摘要： The present invention is an apparatus for performing heat and cooling treatments for a substrate includes: a heating table for mounting the substrate thereon to perform the heat treatment for the substrate; a cooling table for mounting the substrate thereon to perform the cooling treatment for the substrate; a waiting table for allowing the substrate to wait; a carrying mechanism for carrying the substrate between the heating table, the cooling table, and the waiting table; and airflow formation means for forming airflow in a space in which the heating table, the cooling table, and the waiting table are arranged.

摘要翻译： 本发明是一种用于对基板进行加热和冷却处理的装置，包括：加热台，用于将基板安装在其上以对基板进行热处理; 用于将基板安装在其上以对基板执行冷却处理的冷却台; 用于允许衬底等待的等待表; 用于在加热台，冷却台和等待台之间承载基板的承载机构; 以及用于在其中布置有加热台，冷却台和等待台的空间中形成气流的气流形成装置。

公开(公告)号：US5782990A

公开(公告)日：1998-07-21

申请号：US789537

申请日：1997-01-27

申请人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.

摘要翻译： 用于清洗物体的清洗方法包括以下步骤：将洗涤液体供应到洗涤容器中，并将物品浸入容纳在洗涤容器中的洗涤液体中。 该方法还包括以下步骤：从洗涤容器排出至少一次液体，并且当液体从洗涤容器中排出时，当物体部分暴露在空气中时，开始将洗涤液施加到物体上。 在将物体暴露于空气中期间继续洗涤液体的应用，以防止物体的表面被干燥和染色。

公开(公告)号：US5671764A

公开(公告)日：1997-09-30

申请号：US560708

申请日：1995-11-20

申请人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

发明人： Shinya Murakami ,  Yuuji Kamikawa ,  Sinichiro Izumi ,  Noriyuki Anai ,  Takami Satoh ,  Hirofumi Shiraishi ,  Koji Harada ,  Takayuki Tomoeda ,  Hiroshi Tanaka

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  H01L21/00 ,  H01L21/677 ,  B08B15/00

CPC分类号： H01L21/67754 ,  B08B3/02 ,  B08B3/04 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67757 ,  Y10S134/902

摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

摘要翻译： 本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。 该室具有开口，设计用于清洗从外部通过开口运送的物体。 打开/关闭机构设计成打开和关闭洗涤室的开口。 喷嘴用于清洗打开/关闭机构。 该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当清洗液体从洗涤液中排出时物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上 船只。

公开(公告)号：US09203287B2

公开(公告)日：2015-12-01

申请号：US13574743

申请日：2010-08-25

申请人： Shigehiko Omata ,  Koji Harada ,  Shigenori Nakazato ,  Mitsuhiro Arai ,  Shouta Ohkoshi

发明人： Shigehiko Omata ,  Koji Harada ,  Shigenori Nakazato ,  Mitsuhiro Arai ,  Shouta Ohkoshi

IPC分类号： H02K7/10 ,  F02N15/02 ,  H02K11/00 ,  F02N15/06

CPC分类号： H02K11/0015 ,  F02N15/023 ,  F02N15/067 ,  F02N2200/041 ,  F02N2200/048 ,  H02K11/21

摘要： Starter for vehicle-use engine which can detect a rotational speed signal in a stable manner even when a clutch cover is mounted on an outer periphery of a clutch outer of a one-way clutch. The starter D for a vehicle-use engine which transmits a rotational drive force of a stator to a ring gear of a crankshaft by a pinion of the starter includes: a one-way clutch which is arranged between the pinion and an armature shaft of the stator; and a rotational speed detection device which detects a rotational speed of the pinion. A part to be detected for a rotational speed is formed of through holes formed on a circumference of the clutch cover, and a circular circumferential groove formed on an outer peripheral surface of a clutch outer along the circumference on which the through holes are formed.

摘要翻译： 即使在离合器盖安装在单向离合器的离合器外侧的外周上的情况下，也能够稳定地检测转速信号的车用起动器。 用于通过起动机的小齿轮将定子的旋转驱动力传递到曲轴的环形齿轮的车辆用发动机的起动器D包括：单向离合器，其布置在小齿轮和电动机的电枢轴之间 定子; 以及检测小齿轮的转速的转速检测装置。 检测转速的部分由形成在离合器盖的圆周上的通孔和形成在离合器外侧的外周面上形成有通孔的圆周方向槽形成。