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公开(公告)号:US07898672B1
公开(公告)日:2011-03-01
申请号:US12082846
申请日:2008-04-15
申请人: Dong Chen
发明人: Dong Chen
IPC分类号: G01B11/02
CPC分类号: G01B9/02079 , G01B9/02071 , G01B9/02083 , G01B9/0209 , G01B11/2441
摘要: An error correction for scanner position is implemented by adjusting the filter parameters of the quadrature demodulation module of an HDVSI algorithm using a reference signal from an independent position measurement device (PMD). The step size generated by the PMD at each scanner step is substituted for the nominal scanner step in the quadrature demodulation algorithm calculating phase and in the coherent envelope algorithm calculating peak. This substitution eliminates all errors produced by scanner nonlinearities. Furthermore, over the large number of steps carried out during a normal scanning range, random scanner-position errors (such as produced by vibration and other system noise) are automatically corrected by integration over their normal distribution around the noise-free position value. Therefore, a complete correction of scanner-position error may be achieved using the reference signal.
摘要翻译: 通过使用来自独立位置测量装置(PMD)的参考信号调整HDVSI算法的正交解调模块的滤波器参数来实现扫描器位置的纠错。 由PMD在每个扫描步骤产生的步长代替正交解调算法计算阶段中的标称扫描步长,以及相干包络算法计算峰值。 此替代消除了扫描仪非线性产生的所有错误。 此外,在正常扫描范围内执行的大量步骤中,通过在其无噪声位置值周围的正态分布上的积分自动校正随机扫描仪位置误差(例如由振动和其他系统噪声产生的)误差。 因此,可以使用参考信号来实现扫描仪位置误差的完全校正。
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公开(公告)号:US20110041308A1
公开(公告)日:2011-02-24
申请号:US12546146
申请日:2009-08-24
IPC分类号: B23P15/28
CPC分类号: B27B5/34 , B28D5/029 , Y10T29/49826
摘要: A ganged saw blade assembly for dicing of wafers includes a plurality of circular saw blades positioned along a common central axis and erodible pitch spacers positioned along the common central axis between adjacent saw blades. The pitch spacers are eroded to a desired diameter relative to the common central axis to maintain a desired saw exposure, e.g. by sawing into an abrasive material with the saw blade assembly. The saw blade assembly thus permits use of the saw blades over longer periods notwithstanding erosion of the blades.
摘要翻译: 用于切割晶片的联合锯片组件包括沿着公共中心轴线定位的多个圆锯片和沿相邻锯片之间的公共中心轴线定位的可蚀刻节距间隔件。 间距垫片相对于共同的中心轴线被侵蚀到所需的直径,以保持期望的锯片暴露,例如, 通过用锯片组件锯成研磨材料。 锯片组件因此允许锯片在更长的时间内使用,尽管叶片受到侵蚀。
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公开(公告)号:US20100282167A1
公开(公告)日:2010-11-11
申请号:US12818101
申请日:2010-06-17
申请人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
发明人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
IPC分类号: C23C16/448 , C23C16/44
CPC分类号: C23C14/243 , C23C14/26 , C23C14/562
摘要: A deposition source includes a crucible for containing deposition material and a body comprising a conductance channel. An input of the conductance channel is coupled to an output of the crucible. A heater heats the crucible so that the crucible evaporates the deposition material into the conductance channel. A heat shield comprising a plurality of heat resistant material layers is positioned around at least one of the heater and the body. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.
摘要翻译: 沉积源包括用于容纳沉积材料的坩埚和包括电导通道的主体。 电导通道的输入耦合到坩埚的输出端。 加热器加热坩埚,使得坩埚将沉积材料蒸发到电导通道中。 包括多个耐热材料层的隔热屏围绕加热器和主体中的至少一个定位。 多个喷嘴被耦合到电导通道的输出端,使得蒸发的沉积材料从坩埚通过导电通道传送到多个喷嘴,其中蒸发的沉积材料从多个喷嘴喷射以形成沉积焊剂。
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公开(公告)号:US20100143588A1
公开(公告)日:2010-06-10
申请号:US12631079
申请日:2009-12-04
申请人: Mikhail Belousov , Bojan Mitrovic , Keng Moy
发明人: Mikhail Belousov , Bojan Mitrovic , Keng Moy
CPC分类号: C30B25/14 , C23C16/45574 , C23C16/45578 , C23C16/4584
摘要: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.
摘要翻译: 用于化学气相沉积反应器(10)的流入口元件(22)由多个细长管状元件(64,65)形成,所述多个细长管状元件(64,65)在横向于上游到下游方向的平面中彼此并排延伸 反应堆。 管状元件具有用于沿下游方向喷射气体的入口。 晶片载体(14)围绕上游到下游轴线旋转。 气体分布元件可以提供相对于延伸穿过轴线的中间平面(108)不对称的气体分布图案。
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公开(公告)号:US07684956B2
公开(公告)日:2010-03-23
申请号:US11605175
申请日:2006-11-28
申请人: Gregory A. Dahlen , William Foreman
发明人: Gregory A. Dahlen , William Foreman
摘要: A method of extracting the shape of a probe tip of a probe-based instrument from data obtained by the instrument is provided. The method employs algorithms based on the principle that no reconstructed image points can physically occupy the same region as the tip during imaging. Sequential translates of the tip shape or volume sweep out an area or volume that is an “exclusion zone” similar to morphological erosion. The embodiments of the alternative method use either the region defined by the tip boundary or simply the tip boundary.
摘要翻译: 提供了一种从由仪器获得的数据中提取基于探针的仪器的探针尖端的形状的方法。 该方法采用基于以下原理的算法:在成像期间,重建图像点在物理上不会与尖端物理占据相同的区域。 尖端形状或体积的顺序平移扫出与形态侵蚀类似的“排除区”的区域或体积。 替代方法的实施例使用由尖端边界或简单的尖端边界限定的区域。
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公开(公告)号:US07666323B2
公开(公告)日:2010-02-23
申请号:US10920589
申请日:2004-08-18
IPC分类号: C23F1/00
CPC分类号: C23F1/26 , C21D7/06 , C21D2261/00 , C22F1/18 , F28F13/18 , F28F2245/06
摘要: A system and method is disclosed for increasing the emissivity of solid materials, wherein first the surface of the material is mechanically worked to create micro-level defects, and then etched to create a deep micro-rough surface morphology. In this manner, higher efficiencies and lower energy consumption can be obtained when these modified materials are used for heating elements. Heating elements made in accordance with this process thus operate at lower temperatures with longer lifetimes, when the improved heating elements are used with various heating devices.
摘要翻译: 公开了用于增加固体材料的辐射率的系统和方法,其中首先将材料的表面机械加工以产生微观级缺陷,然后蚀刻以产生深的微粗糙表面形态。 以这种方式,当这些改性材料用于加热元件时,可以获得更高的效率和更低的能量消耗。 因此,当改进的加热元件与各种加热装置一起使用时,根据该方法制造的加热元件在较低的温度下工作,寿命更长。
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公开(公告)号:US07654685B2
公开(公告)日:2010-02-02
申请号:US11714343
申请日:2007-03-06
申请人: Der-Shen Wan , Colin Farrell , Erik L. Novak
发明人: Der-Shen Wan , Colin Farrell , Erik L. Novak
CPC分类号: G01B9/02007
摘要: An illumination system for an interferometer combines a white-light source and a green source with a reflective green dichroic filter. When the green source alone is energized for PSI measurements, the output of the illumination system is green only. When a white-light output is desired for VSI measurements, both sources are energized and the intensity of the green light is judiciously calibrated to match the spectral band filtered out by the dichroic mirror. Therefore, the system can switch between green and white light simply by changing the selection of energized sources, without any mechanical switching and attendant delays and vibrations. Multiple narrowband sources may be combined with white light in a similar manner.
摘要翻译: 用于干涉仪的照明系统将白光源和绿色源与反射式绿色二向色滤光片组合。 当单独的绿色光源为PSI测量通电时,照明系统的输出仅为绿色。 当VSI测量需要白光输出时,两个源都通电,并且绿色光的强度被明智地校准以匹配由分色镜滤除的光谱带。 因此,通过改变通电源的选择,系统可以在绿灯和白光之间切换,无需任何机械切换和随之而来的延迟和振动。 多个窄带源可以以类似的方式与白光组合。
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公开(公告)号:US20090260113A1
公开(公告)日:2009-10-15
申请号:US12419898
申请日:2009-04-07
申请人: Alan F. Rice , Lin Huang
发明人: Alan F. Rice , Lin Huang
IPC分类号: G12B21/08
CPC分类号: G01Q10/065 , G01Q30/04
摘要: A scanning probe microscope and method of operation for monitoring and assessing proper tracking between the tip and sample, as well as automating at least some aspects of AFM setup previously done manually. Preferably, local slopes corresponding to the acquired data are compared to determine a tracking metric that is self-normalizing.
摘要翻译: 扫描探针显微镜和操作方法,用于监测和评估尖端和样品之间的适当跟踪,以及自动化以前手动完成的AFM设置的至少一些方面。 优选地,对应于所获取的数据的局部斜率进行比较,以确定自标准化的跟踪度量。
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公开(公告)号:US07584653B2
公开(公告)日:2009-09-08
申请号:US11436386
申请日:2006-05-18
申请人: Chanmin Quanmin Su , Sergei Magonov
发明人: Chanmin Quanmin Su , Sergei Magonov
CPC分类号: G01Q70/04 , G01N3/00 , G01N2203/0051 , G01N2203/0075 , G01N2203/0094 , G01N2203/0286 , G01Q60/38
摘要: Dynamic nanomechanical analysis of a sample is performed by using a cantilever probe that interacts with the sample using a force applied across a wide range of frequencies that includes frequencies greater than 300 Hz. The motion of the cantilever probe is detected in response to the applied force over the range of frequencies and analyzed over at least a portion of the wide range of frequencies to determine a mechanical response of the sample, preferably including quality factor and modulus of the sample. The analysis of the motion of the cantilever probe is preferably performed in terms of amplitude, phase, and frequency of both the probe and the sample and preferably, where the applied force is analyzed to determine both a real and an imaginary modulus of a mechanical response of the sample. Preferably, the force is applied so as to produce a minimum of phase and amplitude response variation in the absence of the sample. Furthermore the motion of the cantilever can be flexural or torsional and combinations thereof.
摘要翻译: 样品的动态纳米力学分析是通过使用悬臂式探头进行的,该悬臂探头使用施加在包括大于300Hz的频率的宽频率范围内的力与样品相互作用。 响应于在频率范围上施加的力来检测悬臂探头的运动,并且在宽频率范围的至少一部分上分析以确定样品的机械响应,优选地包括样品的质量因子和模量 。 优选地,根据探针和样品的振幅,相位和频率来执行悬臂探头的运动分析,并且优选地,在分析所施加的力以确定机械响应的实数和虚数模量的情况下 的样品。 优选地,施加力以在没有样品的情况下产生最小的相位和幅度响应变化。 此外,悬臂的运动可以是弯曲的或扭转的以及它们的组合。
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公开(公告)号:US07570368B2
公开(公告)日:2009-08-04
申请号:US11127834
申请日:2005-05-12
申请人: Mikhail Belousov , Boris Volf
发明人: Mikhail Belousov , Boris Volf
IPC分类号: G01B11/24
CPC分类号: G01B11/24
摘要: A method for monitoring the curvature of a surface of a body such as a semiconductor wafer (22) includes directing a beam of light along an impingement axis (36) onto the surface so that a beam of light (41) is reflected from the surface at a point of impingement. The position of the reflected beam (41) is detected in two dimensions (x,y). The body (22) is moved relative to the impingement axis (41) in a direction transverse to the impingement axis and the beam-directing and position determining steps are repeated. The curvature of the surface is calculated from the detected positions of the reflected beam in a plurality of repetitions.
摘要翻译: 用于监测诸如半导体晶片(22)的主体的表面的曲率的方法包括将光束沿着冲击轴线(36)引导到表面上,使得光束(41)从表面反射 在撞击点。 在二维(x,y)中检测反射光束(41)的位置。 主体(22)相对于冲击轴线(41)在横向于冲击轴线的方向上移动,并且重新进行光束定向和位置确定步骤。 从多个重复的反射光束的检测位置算出表面的曲率。
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