公开(公告)号：US07749666B2

公开(公告)日：2010-07-06

申请号：US11462022

申请日：2006-08-02

Applicant: Michael J. Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe E. Preil

Inventor： Michael J. Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe E. Preil

IPC: G03C5/00 ,  G01B9/00 ,  G01B9/08 ,  G01B11/00 ,  G01N21/00

CPC classification number: G03F7/70666 ,  G03F7/70641

Abstract: A method of using an in-situ aerial image sensor array is disclosed to separate and remove the focal plane variations caused by the image sensor array non-flatness and/or by the exposure tool by collecting sensor image data at various nominal focal planes and by determining best focus at each sampling location by analysis of the through-focus data. In various embodiments, the method provides accurate image data at best focus anywhere in the exposure field, image data covering an exposure-dose based process window area, and a map of effective focal plane distortions. The focus map can be separated into contributions from the exposure tool and contributions due to topography of the image sensor array by suitable calibration or self-calibration procedures. The basic method enables a wide range of applications, including for example qualification testing, process monitoring, and process control by deriving optimum process corrections from analysis of the image sensor data.

Abstract translation: 公开了一种使用原位空间图像传感器阵列的方法，以分离和去除由图像传感器阵列非平坦度引起的焦平面变化和/或通过曝光工具通过在各种标称焦平面处收集传感器图像数据，并且通过 通过分析焦点数据确定每个采样位置的最佳焦点。 在各种实施例中，该方法在曝光区域的任何地方提供最佳焦点上的精确图像数据，覆盖基于曝光剂量的过程窗口区域的图像数据和有效焦平面失真的映射。 焦点图可以通过适当的校准或自校准程序分为曝光工具的贡献和由于图像传感器阵列的形貌造成的贡献。 基本方法可以通过从图像传感器数据分析中得出最佳的过程校正，实现广泛的应用，包括例如鉴定测试，过程监控和过程控制。

公开(公告)号：US20100115489A1

公开(公告)日：2010-05-06

申请号：US12263278

申请日：2008-10-31

Applicant: Hua Song ,  Lantian Wang ,  Gerard Terrence Luk-Pat ,  James P. Shiely

Inventor： Hua Song ,  Lantian Wang ,  Gerard Terrence Luk-Pat ,  James P. Shiely

IPC: G06F17/50

CPC classification number: G03F7/70466 ,  G03F7/705 ,  G03F7/70666 ,  G03F7/70675

Abstract: One embodiment of the present invention provides a system that performs lithography verification for a double-patterning process on a mask layout without performing a full contour simulation of the mask layout. During operation, the system starts by receiving a first mask which is used in a first lithography step of the double-patterning process, and a second mask which is used in a second lithography step of the double-patterning process. Note that the first mask and the second mask are obtained by partitioning the mask layout. Next, the system receives an evaluation point on the mask layout. The system then determines whether the evaluation point is exclusively located on a polygon of the first mask, exclusively located on a polygon of the second mask, or located elsewhere. The system next computes a printing indicator at the evaluation point for the mask layout based on whether the evaluation point is exclusively located on a polygon of the first mask or exclusively located on a polygon of the second mask.

Abstract translation: 本发明的一个实施例提供一种对掩模布局进行双重图案化处理的光刻验证，而不执行掩模布局的全轮廓模拟的系统。 在操作期间，系统通过接收在双重图案化工艺的第一光刻步骤中使用的第一掩模和在双重图案化工艺的第二光刻步骤中使用的第二掩模开始。 注意，通过分割掩模布局获得第一掩模和第二掩模。 接下来，系统在掩码布局上接收评估点。 然后，系统确定评估点是否仅排列在第一掩模的多边形上，专门位于第二掩模的多边形上，或位于其他位置。 接下来，系统基于评估点是否仅位于第一掩模的多边形上或者仅位于第二掩模的多边形上，来计算掩模布局的评估点处的打印指示符。

公开(公告)号：US07663741B2

公开(公告)日：2010-02-16

申请号：US10929882

申请日：2004-08-31

Applicant: Hans Van Der Laan ,  Christian Wagner

Inventor： Hans Van Der Laan ,  Christian Wagner

IPC: G01B9/00 ,  G03B27/32 ,  G03C5/00

CPC classification number: G03F7/70666 ,  G03F7/70516

Abstract: To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.

Abstract translation: 为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。 操纵器的适当设置被确定为给出最大对比度值的那些。

公开(公告)号：US20090274963A1

公开(公告)日：2009-11-05

申请号：US12433682

申请日：2009-04-30

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G03F7/20 ,  G01B11/26 ,  G03B27/72

CPC classification number: G03B27/72 ,  G03F7/70591 ,  G03F7/70666

Abstract: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the slit, a light receiving element 53 mounted on the stage 60 and including at least two light receiving portions which receive the light transmitted through the slit, a storage unit which stores a relationship between an angle ε and a distance between a center position of the slit 54 and a position where a intensity of light that the light receiving element 53 receives is maximum, a calculation unit which obtains the angle ε, and a stage driving unit 80 which rotates the stage 60 so that the angle ε is equal to zero.

Abstract translation: 照射位于物体平面上的图案以在图像平面上形成空间像40的测量装置，并且经由图像平面上的狭缝54测量空间图像40的光强度分布，测量装置包括平台60移动 狭缝，安装在平台60上的光接收元件53，并且包括容纳透过狭缝的光的至少两个光接收部分;存储单元，该存储单元存储角度ε与中心位置之间的距离 狭缝54和光接收元件53接收的光的强度最大的位置，获得角度ε的计算单元和使平台60旋转以使得角度ε等于零的平台驱动单元80。

公开(公告)号：US20090219500A1

公开(公告)日：2009-09-03

申请号：US12437009

申请日：2009-05-07

Applicant: Wim Tjibbo TEL ,  Hans VAN DER LAAN ,  Cassandra May OWEN ,  Todd J. DAVIS ,  Todd David HIAR ,  Theodore Allen PAXTON

Inventor： Wim Tjibbo TEL ,  Hans VAN DER LAAN ,  Cassandra May OWEN ,  Todd J. DAVIS ,  Todd David HIAR ,  Theodore Allen PAXTON

IPC: G03B27/54

CPC classification number: G03F7/70375 ,  G03F7/70666

Abstract: A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam.

Abstract translation: 光刻设备可以包括以下装置：图案形成系统，投影系统和辐射束检查装置。 图案化系统可以被配置成提供图案化的辐射束。 投影系统可以被配置为将图案化的辐射束投影到基板的目标部分上。 此外，辐射束检查装置可以被配置为检查图案化的辐射束的至少一部分。 在基板曝光位置中，投影系统被配置为使用图案化的辐射束来暴露基板上的辐射图案，并且辐射束装置被配置为使反射装置远离图案化的辐射束的光路。 在辐射束检查位置，辐射束检查装置被配置成将反射装置移动到图案化的辐射束的光路中。

公开(公告)号：US07535640B2

公开(公告)日：2009-05-19

申请号：US10923551

申请日：2004-08-20

Applicant: Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

Inventor： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

IPC: G02B27/28

CPC classification number: G03F7/70566 ,  G02B21/002 ,  G02B27/286 ,  G03F7/70666

Abstract: An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. It is possible to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems Realistic images of the stepper systems can be generated by emulating the occurring vector effects.

Abstract translation: 提供了一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈扫描仪系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择成像光束的不同偏振分量， 可以在成像光束路径中引入具有强度衰减功能的光学元件，由检测器接收掩模和/或样品的图像以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。 尽管结构越来越小，成像系统的图像侧数值孔径越来越高，可以检查光刻掩模的缺陷。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

公开(公告)号：US07486383B2

公开(公告)日：2009-02-03

申请号：US11291658

申请日：2005-11-30

Applicant: Kazunari Sekigawa ,  Hiroaki Samizu ,  Takahiro Inoue

Inventor： Kazunari Sekigawa ,  Hiroaki Samizu ,  Takahiro Inoue

IPC: G03B27/54 ,  G03B27/72

CPC classification number: G03F7/70666 ,  G03F7/70141

Abstract: A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.

Abstract translation: 具有用于将光投射到曝光对象物上的光源的直接曝光装置，更具体而言，是曝光对象基板，包括：测量装置，用于测量与曝光对象基板的曝光面对应的面积上的光的照度分布; 以及控制装置，用于基于从测量装置提供的测量结果控制光源，从而可以获得预期的照度分布。

公开(公告)号：US20080291421A1

公开(公告)日：2008-11-27

申请号：US12120747

申请日：2008-05-15

Applicant: Takafumi Miyaharu

Inventor： Takafumi Miyaharu

IPC: G03F7/20 ,  G01J1/00 ,  G01J1/42

CPC classification number: G03F7/7085 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70508 ,  G03F7/70666

Abstract: The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.

Abstract translation: 本发明提供了一种通过液体曝光基板的曝光装置，包括测量基板，包括被配置为透射通过投影光学系统的光束的透射部分，包括受光面的光接收单元，所述光接收单元被配置为 接收通过液体和透射部分透射的光束，以及计算器，被配置为将由光接收表面接收的光束的受光面上的光强度分布计算成光强度分布 基于指示受光面的位置坐标与投影光学系统的光瞳上的位置坐标之间的相关性的信息，投影光学系统的光瞳面。

公开(公告)号：US20080219562A1

公开(公告)日：2008-09-11

申请号：US12125844

申请日：2008-05-22

Applicant: Azat M. Latypov

Inventor： Azat M. Latypov

IPC: G06K9/76

CPC classification number: G03F7/70441 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70666

Abstract: A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.

Abstract translation: 计算空间光调制器阵列的空间像的方法包括计算空间光调制器阵列的像素之间的成对干涉; 计算与像素的调制状态对应的有效灰度; 并基于成对干扰和有效灰度计算航空图像。 灰度只取决于像素的调制状态。 成对干扰仅取决于位置变量。 位置变量是图像平面中的位置和电磁辐射源的平面中的位置。 成对干扰可以由功能矩阵表示。 成对干扰可以由四维矩阵表示。 使用sinc函数或使用多项式函数近似有效的灰度。

公开(公告)号：US20080212060A1

公开(公告)日：2008-09-04

申请号：US12065451

申请日：2006-09-02

Applicant: Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

Inventor： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC: G03B27/54

CPC classification number: G03F7/70666 ,  G03F7/70308

Abstract: A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

Abstract translation: 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。