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    EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY
    31.
    发明申请
    EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY 审中-公开
    EUV收集器的EUV收集器镜子

    公开(公告)号：US20130176614A1

    公开(公告)日：2013-07-11

    申请号：US13753127

    申请日：2013-01-29

    Applicant: Carl Zeiss Laser Optics GmbH

    Inventor： Willi Anderl ,  Holger Kierey ,  Markus Bauer ,  Jens Kugler

    IPC: G02B5/08

    CPC classification number: G02B5/0891 ,  G02B5/0808 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/065 ,  G21K2201/067

    Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.

    Abstract translation: 用于EUV光刻的EUV收集器的EUV收集器镜壳包括具有光入射侧前部具有反射光学有效区域，后部以及前部和后部之间的空腔的主体。 空腔基本上沿着整个光学有效区域延伸，并且空腔用于接收冷却介质。 主体还具有用于冷却介质的至少一个入口和至少一个出口。 多个流量影响元件位于空腔中，从前部延伸到后部，并且将前部连接到后部并且与前部和后部整体地形成。

    HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
    32.
    发明申请
    HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM 审中-公开
    具有液体金属界面的高热负载光源，可用于超极紫外光刻系统

    公开(公告)号：US20120099088A1

    公开(公告)日：2012-04-26

    申请号：US13331549

    申请日：2011-12-20

    Applicant: Alton H. Phillips

    Inventor： Alton H. Phillips

    IPC: G03B27/70 ,  G02B7/195

    CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The minor assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first minor block to the heat exchanger.

    Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 次要组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一小块转移到热交换器。

    Cooled spider and method for grazing-incidence collectors
    33.
    发明申请
    Cooled spider and method for grazing-incidence collectors 有权
    冷藏蜘蛛和放牧收集器的方法

    公开(公告)号：US20110181860A1

    公开(公告)日：2011-07-28

    申请号：US12657650

    申请日：2010-01-25

    Applicant: John E. Hill ,  Robert J. Munns

    Inventor： John E. Hill ,  Robert J. Munns

    IPC: G03B27/72 ,  G02B5/08

    CPC classification number: G21K1/067 ,  G02B7/1815 ,  G02B7/182 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/70891 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

    Abstract: A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path through the spider. The general cooling-fluid flow path has input and output points located substantially 180° apart so that the flow path diverges at the input point into two branch flow paths that flow in opposite directions through the spider, and then converge at the output point. Input and output cooling fluid manifolds are fluidly connected to the outer ring at the input and output points and serve to flow cooling fluid over the cooling-fluid flow path.

    Abstract translation: 用于放牧收集器的冷却的蜘蛛包括机械地和流体地连接内圈和外圈的外圈，内圈和轮辐。 外环和内环和轮辐中的冷却通道限定通过该蜘蛛的通用冷却液流动路径。 一般的冷却流体流动路径具有大致相距180°的输入和输出点，使得流动路径在输入点处分叉成两个分支流动路径，该分支流动路径沿相反方向流过蜘蛛，然后在输出点处会聚。 输入和输出冷却流体歧管在输入和输出点处流体地连接到外环，并用于使冷却流体流过冷却流体流动路径。

    Extreme UV radiation source device
    35.
    发明授权
    Extreme UV radiation source device 有权
    极紫外线辐射源装置

    公开(公告)号：US07622727B2

    公开(公告)日：2009-11-24

    申请号：US11617163

    申请日：2006-12-28

    Applicant: Takahiro Shirai ,  Kyohei Seki

    Inventor： Takahiro Shirai ,  Kyohei Seki

    IPC: H01J7/36 ,  H05H1/00

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G21K2201/065 ,  H05G2/003 ,  H05G2/005

    Abstract: An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

    Abstract translation: 具有腔室的EUV辐射源装置，其被分成放电空间和设置有EUV收集器光学器件的收集器反射镜空间。 在它们之间提供了具有被冷却的开口的孔部件。 旋转第一放电电极和第二放电电极。 用激光照射Sn或Li。 在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照 曝光工具的光学系统。 存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。 放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。

    Lithographic apparatus and device manufacturing method
    36.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    光刻设备和器件制造方法

    公开(公告)号：US07397531B2

    公开(公告)日：2008-07-08

    申请号：US10960784

    申请日：2004-10-08

    Applicant: Dominicus Jacobus Petrus Adrianus Franken

    Inventor： Dominicus Jacobus Petrus Adrianus Franken

    IPC: G03B27/52 ,  G03B27/68 ,  G02B7/02

    CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K2201/065

    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

    Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 图案形成装置或投影系统中的至少一个以及照明系统包括反射器组件，该反射器组件包括具有用于反射入射辐射的一部分的反射表面的反射器基板，以及构造和布置成交换热量的热交换器系统 与反射器基板。 热交换器系统包括热活性元件，该热活性元件设置在反射器基板的与反射表面不同的一侧的凹部中。

    EUV light source
    39.
    发明申请
    EUV light source 有权

    公开(公告)号：US20070158597A1

    公开(公告)日：2007-07-12

    申请号：US11647016

    申请日：2006-12-27

    Applicant: Igor Fomenkov ,  Alexander Ershov

    Inventor： Igor Fomenkov ,  Alexander Ershov

    IPC: G01J3/10

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis. of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

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