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59 条记录 (耗时 0.028 秒)

    Coating material, paint, and process for producing coating material
    31.
    发明申请
    Coating material, paint, and process for producing coating material 审中-公开
    涂料，涂料和生产涂料的工艺

    公开(公告)号：US20040254267A1

    公开(公告)日：2004-12-16

    申请号：US10482411

    申请日：2004-07-23

    发明人： Yoshiyuki Nagae

    IPC分类号： C09D001/00

    CPC分类号： C09D5/00 ,  B01J35/002 ,  B01J35/004 ,  B01J37/0219

    摘要： It is an object to provide a coating agent and a paint, which enable sufficient exhibition of the capability of a photocatalyst such as the capability to decompose an organic substance or the like; particularly, sufficient exhibition of the capability on a thin coating film. A coating agent of the present invention is manufactured as follows. Specifically, after photo-semiconductor powder has been dispersed in water, colloids such as a fluorine emulsion or the like are mixed into the aqueous dispersion. The particle size of the particles in the colloids is one time or more the particle size of the photo-semiconductor powder in the photo-semiconductor powder, and the photo-semiconductor particles assume a weight ratio of 0.1 to 10% in the entire coating agent. The photo-semiconductor particles are caused to be adsorbed on the surface of the colloidal particle within the range of one to five layers. Further, a porous sol solution may also be added to the coating agent. Alternatively, powder formed by coating photo-semiconductor powder with an adsorptive function substance may be employed in place of the photo-semiconductor powder.

    摘要翻译： 本发明的目的是提供一种涂料和涂料，其能够充分展现光催化剂的能力，例如分解有机物质等的能力; 特别是在薄涂层上充分展现能力。 本发明的涂布剂如下制造。 具体地说，在光半导体粉末已经分散在水中之后，将诸如氟乳液等的胶体混合到水性分散体中。 胶体中的粒子的粒径是光半导体粉末中的光半导体粉末的粒径的一倍以上，光致半导体粒子在整个涂布剂中的重量比为0.1〜10％ 。 导致光致半导体颗粒被吸附在胶体颗粒的表面上在1-5层的范围内。 此外，也可以向涂布剂中添加多孔溶胶溶液。 或者，可以使用通过用吸光功能物质涂布光半导体粉末而形成的粉末来代替光半导体粉末。

    Ultra low residual reflection, low stress lens coating
    32.
    发明申请
    Ultra low residual reflection, low stress lens coating 失效
    超低残留反射，低应力透镜涂层

    公开(公告)号：US20040234780A1

    公开(公告)日：2004-11-25

    申请号：US10444582

    申请日：2003-05-23

    发明人： Glen A. Koenig ,  Nicholas G. Niejelow

    IPC分类号： B05D005/06 ,  C09D001/00 ,  B32B009/00

    CPC分类号： G02B1/115 ,  C03C17/245 ,  C03C17/30 ,  C03C17/3417 ,  C03C2217/214 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2218/15 ,  C03C2218/154 ,  C08K3/22 ,  C08K3/36 ,  C09D7/42 ,  C09D7/61 ,  C23C14/547 ,  G02B1/10 ,  G02B1/11

    摘要： A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light. The stress of the AR coating is also controlled by adjusting the optical thickness for each layer, if necessary, to minimize the difference in the tensile stresses and compressive stresses between low index/high index layers.

    摘要翻译： 提供了一种用于涂覆具有抗反射（AR）涂层的光学透镜和其它光学制品的方法。 透镜具有低反射率，提供基本上白光反射并具有低应力AR涂层，并且理想地适用于使用提供低应力透镜基底的成型方法制造的光学透镜。 在一个方面，该方法使用特殊的涂料组合物，其中一种是高折射率折射组合物，另一种是低折射率组合物。 在另一方面，还公开了一种结合常规气相沉积设备的光学监视器的方法，由此使用光学参考透镜并测量特定的反射光的光频率，然后使用该测量来确定何时所需的光学涂层 已完成。 在另一方面，该方法还优选使用反射光中的蓝色至绿色的特定比例来计算每层的光学厚度。 如果需要，AR涂层的应力也可以通过调节各层的光学厚度来控制，以最小化低折射率/高折射率层之间的拉伸应力和压缩应力的差异。

    Composition for printing on vellum and the like
    33.
    发明申请
    Composition for printing on vellum and the like 失效
    用于在牛皮纸等上打印的组合物

    公开(公告)号：US20040206268A1

    公开(公告)日：2004-10-21

    申请号：US10728478

    申请日：2003-12-05

    发明人： Amy C. Roszak

    IPC分类号： C09D001/00

    CPC分类号： B41M5/52 ,  B41M5/508 ,  B41M5/5218 ,  C09D11/037 ,  G03G7/006 ,  G03G7/0093

    摘要： There is disclosed a powdered composition that enhances the adherence of print to hard and uneven finish printing stock such as vellum, as well as a method of using the composition on such printing stock.

    摘要翻译： 公开了一种粉末状组合物，其增强了印刷品对硬质和不均匀的最终印刷原料如牛皮纸的粘附性，以及在该印刷原料上使用该组合物的方法。

    Component, method for coating a component, and powder
    34.
    发明申请
    Component, method for coating a component, and powder 审中-公开
    组分，涂料组分和粉末的方法

    公开(公告)号：US20040191488A1

    公开(公告)日：2004-09-30

    申请号：US10820483

    申请日：2004-04-08

    发明人： Thomas Berndt ,  Nigel-Philip Cox ,  Andreas Griep ,  Guido Kern ,  Gerhard Reich ,  Peter Sindlhauser

    IPC分类号： C23C016/00 ,  C09D001/00 ,  B32B015/16 ,  B32B003/10

    CPC分类号： C23C14/042 ,  C23C4/01 ,  C23C10/04 ,  C23C16/042 ,  Y10T428/24802 ,  Y10T428/24926

    摘要： Coatings which are applied to a component have to be removed again in a complex way in certain regions, since a coating was not desired to be present in those regions. The subsequent removal of this layer adversely affects the component, for example its geometry. The method according to the invention for coating a component includes a masking which at least partially comprises a ceramic powder and can therefore easily be removed after the component has been coated.

    摘要翻译： 由于在这些区域不希望存在涂层，因此在某些区域中必须以复杂的方式再次去除涂覆在组分上的涂层。 随后的该层的去除对构件有不利影响，例如其几何形状。 根据本发明的用于涂覆组分的方法包括至少部分地包含陶瓷粉末的掩模，因此可以在组分被涂覆之后容易地除去。

    Coating liquid for forming transparent conductive film, substrate with transparent conductive film, and display device
    37.
    发明申请
    Coating liquid for forming transparent conductive film, substrate with transparent conductive film, and display device 审中-公开
    用于形成透明导电膜的涂布液，具有透明导电膜的基板和显示装置

    公开(公告)号：US20040016914A1

    公开(公告)日：2004-01-29

    申请号：US10621871

    申请日：2003-07-17

    申请人： CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.

    发明人： Masayuki Matsuda ,  Mitsuaki Kumazawa ,  Yoichi Ishihara ,  Toshiharu Hirai ,  Michio Komatsu

    IPC分类号： H01C001/00 ,  C09D001/00

    CPC分类号： H05K9/0096 ,  C08K3/08 ,  C08K3/10 ,  C08K3/36 ,  C09D1/00 ,  C09D5/24 ,  C09D183/02 ,  C09D183/04 ,  H01B1/16 ,  H01B1/18

    摘要： Disclosed is a coating liquid for forming a transparent conductive film, comprising conductive fine particles having an average particle diameter of 1 to 200 nm, silica particles having an average particle diameter of 4 to 200 nm and a polar solvent. The silica particles are in the form of chain silica particles having 2 to 10 silica particles on an average being connected. The content of an alkali in the silica particles is not more than 1000 ppm in terms of an alkali metal M. Also disclosed is a substrate with a transparent conductive film, comprising a substrate, a transparent conductive fine particle layer formed on the substrate and containing conductive fine particles having an average particle diameter of 1 to 200 nm and silica particles having an average particle diameter of 4 to 200 nm and/or chain silica particles having 2 to 10 silica particles on an average being connected, and a transparent film provided on the transparent conductive fine particle layer and having a refractive index lower than that of the transparent conductive fine particle layer. A display device using the substrate with a transparent conductive film is further disclosed. The coating liquid for forming a transparent conductive film is capable of forming a transparent conductive film having low surface resistance, excellent antistatic properties, excellent electromagnetic blocking properties, high film strength and excellent adhesion to a substrate.

    摘要翻译： 公开了一种用于形成透明导电膜的涂布液，其包含平均粒径为1〜200nm的导电性微粒，平均粒径为4〜200nm的二氧化硅粒子和极性溶剂。 二氧化硅颗粒是平均连接有2至10个二氧化硅颗粒的链二氧化硅颗粒的形式。 二氧化硅颗粒中的碱的含量以碱金属M计为1000ppm以下。还公开了具有透明导电膜的基板，包括基板，形成在基板上的透明导电微粒层， 平均粒径为1〜200nm的导电性微粒和平均粒径为4〜200nm的二氧化硅粒子和/或平均连接有2〜10个二氧化硅粒子的链二氧化硅粒子，以及设置在 该透明导电微粒层的折射率低于透明导电性微粒层的折射率。 进一步公开了使用具有透明导电膜的基板的显示装置。 用于形成透明导电膜的涂布液能够形成具有低表面电阻，优异的抗静电性，优异的电磁阻隔性，高膜强度和对基材的优异粘附性的透明导电膜。

    Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods
    38.
    发明申请
    Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods 有权
    用于贵金属特征基板的化学机械平面化的组合物，相关方法和由这些方法制备的基材

    公开(公告)号：US20030194879A1

    公开(公告)日：2003-10-16

    申请号：US10057206

    申请日：2002-01-25

    发明人： Robert J. Small ,  Zhefei J. Chen

    IPC分类号： H01L021/302 ,  C09G001/02 ,  C09G001/04 ,  C09G001/00 ,  C08H001/00 ,  H01L021/461 ,  C09D001/00 ,  C09C001/68 ,  B24D003/02 ,  C09K003/14

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C23F3/00 ,  H01L28/60

    摘要： A composition for chemical-mechanical planarization comprises periodic acid and an abrasive present in a combined amount sufficient to planarize a substrate surface having a feature thereon comprising a noble metal, noble metal alloy, noble metal oxide, or any combination thereof. In one embodiment, the periodic acid is present in an amount in a range of from about 0.05 to about 0.3 moles/kilogram, and the abrasive is present in an amount in a range of from about 0.2 to about 6 weight percent. In another embodiment, the composition further comprises a pH-adjusting agent present in an amount sufficient to cause the pH of the composition to be in a range of from about pH 5 to about pH 10, or of from about pH 1 to about pH 4. A method for planarizing a substrate surface having a feature thereon comprising at least one noble metal, noble metal alloy, or noble metal oxide, or a combination thereof, comprises providing a composition or slurry comprising periodic acid and an abrasive in a combined amount sufficient to planarize the substrate surface, and polishing the surface with the slurry. A substrate produced by such a method is also provided.

    摘要翻译： 用于化学机械平面化的组合物包括高碘酸和研磨剂，其组合量足以使其上具有特征的基材表面平坦化，其中包含贵金属，贵金属合金，贵金属氧化物或其任何组合。 在一个实施方案中，高碘酸的存在量为约0.05至约0.3摩尔/千克，磨料的存在量为约0.2至约6重量％。 在另一个实施方案中，组合物还包含pH调节剂，其量足以使组合物的pH在约pH 5至约pH 10，或约pH 1至约pH 4的范围内 包括至少一种贵金属，贵金属合金或贵金属氧化物或其组合的其上具有其特征的基材表面的平面化方法包括提供组合物或浆料，所述组合物或浆料包含合成量足够的高碘酸和磨料 平坦化基板表面，并用浆料抛光表面。 还提供了通过这种方法制造的基板。

    Polishing composition having a surfactant
    39.
    发明申请
    Polishing composition having a surfactant 有权
    具有表面活性剂的抛光组合物

    公开(公告)号：US20020189169A1

    公开(公告)日：2002-12-19

    申请号：US10121887

    申请日：2002-04-12

    发明人： Wesley D. Costas ,  Tirthankar Ghosh ,  Jinru Bian ,  Karel-Anne Valentine

    IPC分类号： C09K003/14 ,  C09D001/00 ,  C09C001/68

    CPC分类号： C09G1/02

    摘要： A polishing composition for polishing a semiconductor substrate has a pH of under 5.0 and comprises (a) a carboxylic acid polymer comprising polymerized unsaturated carboxylic acid monomers having a number average molecular weight of about 20,000 to 1,500,000 or blends of high and low number average molecular weight polymers of polymerized unsaturated carboxylic acid monomers, (b) 1 to 15% by weight of an oxidizing agent, (c) up to 3.0% by weight of abrasive particles, (d) 50-5,000 ppm (parts per million) of an inhibitor, (e) up to 3.0% by weight of a complexing agent, such as, malic acid, and (f) 0.1 to 5.0% by weight of a surfactant.

    摘要翻译： 用于研磨半导体衬底的抛光组合物的pH值低于5.0，并且包含（a）包含数均分子量为约20,000至1,500,000的聚合的不饱和羧酸单体的羧酸聚合物或高和低数均分子量的共混物 聚合的不饱和羧酸单体的聚合物，（b）1至15重量％的氧化剂，（c）至多3.0重量％的磨料颗粒，（d）50-5,000ppm（百万分之几）的抑制剂 ，（e）至多3.0重量％的络合剂如苹果酸，和（f）0.1-5.0重量％的表面活性剂。