公开(公告)号：US20210388485A1

公开(公告)日：2021-12-16

申请号：US17106428

申请日：2020-11-30

申请人： Fook Chi MAK

发明人： Fook Chi MAK

IPC分类号： C23C14/34 ,  C23C14/02 ,  C23C14/14 ,  C23C14/06 ,  D06M11/73 ,  D06M11/77 ,  D06M11/83 ,  A01N59/16 ,  A01N59/00 ,  A61L2/238

摘要： A method for preparing a bactericidal film on fiber cloth, comprising cleansing a reel of fiber cloth; placing the reel of fiber cloth into a vacuum chamber; supplying a DC power and a mid-frequency power; introducing argon gas to increase the chamber pressure to 0.3 Pa; position sputtering targets in the following order: silicon target, silicon carbide target, silver target, silicon carbide target, silver target, silicon carbide target and silver target, and then sputtering the targets simultaneously; wherein the silicon targets act as a bonding layer between the bactericidal film and the substrate; stopping the silicon targets, the silicon carbide targets and the silver targets first, and then turning off the argon gas; injecting air into the chamber until the pressure in the chamber and the atmospheric pressure are balanced.

公开(公告)号：US11198933B2

公开(公告)日：2021-12-14

申请号：US16713957

申请日：2019-12-13

申请人： KABUSHIKI KAISHA TOSHIBA ,  TOSHIBA MATERIALS CO., LTD.

发明人： Tooru Komatsu ,  Nobuaki Nakashima

IPC分类号： C23C14/34 ,  C23G1/02 ,  H01J37/34 ,  B22D7/00 ,  C22F1/10 ,  C22F1/18 ,  C23C14/14 ,  C23G1/10

摘要： The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.

公开(公告)号：US11148398B2

公开(公告)日：2021-10-19

申请号：US16133495

申请日：2018-09-17

申请人： Apple Inc.

发明人： Yoshihiko Yokoyama ,  Naoto Matsuyuki ,  Sungwon Bae ,  Theodore A. Waniuk

IPC分类号： B32B17/10 ,  C23C28/02 ,  C23C14/14 ,  B05D7/14 ,  C23C14/34 ,  B05D7/00 ,  B05D1/00 ,  B05D5/12

摘要： A multilayer composite is provided. The composite may include a plurality of metallic glass layers interleaved with a plurality of polymer layers. The composite may have a thickness of up to 100 microns. The composite may have a fatigue strength of at least 1.5 times of the fatigue strength of a monolithic metallic glass having the same thickness as the composite and the same chemical composition as the metallic glass layer.

公开(公告)号：US11114288B2

公开(公告)日：2021-09-07

申请号：US16271473

申请日：2019-02-08

申请人： APPLIED MATERIALS, INC.

发明人： Kirankumar Neelasandra Savandaiah ,  Junqi Wei ,  Yueh Sheng Ow ,  Wen Long Favier Shoo

IPC分类号： H01J37/34 ,  C23C14/35 ,  C23C14/14 ,  C23C14/34

摘要： Methods and apparatus for physical vapor deposition are provided. The apparatus, for example, includes A PVD apparatus that includes a chamber including a chamber wall; a magnetron including a plurality of magnets configured to produce a magnetic field within the chamber; a pedestal configured to support a substrate; and a target assembly comprising a target made of gold and supported on the chamber wall via a backing plate coupled to a back surface of the target so that a front surface of the target faces the substrate, wherein a distance between a back surface formed in a recess of the backing plate and a bottom surface of the plurality of magnets is about 3.95 mm to about 4.45 mm, and wherein a distance between the front surface of the target and a front surface of the substrate is about 60.25 mm to about 60.75 mm.

公开(公告)号：US20210260892A1

公开(公告)日：2021-08-26

申请号：US17043710

申请日：2020-05-15

申请人： HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

发明人： Jiankui CHEN ,  Zhouping Yin ,  Yongan Huang ,  Hua Yang ,  Yongqing Duan ,  Yixin Wang ,  Qiangqiang Liu ,  Huayang Li ,  Kaiyou Song ,  Zhilong Shao ,  Zhou Zhang ,  Wen Ou

IPC分类号： B41J3/407 ,  B41M3/00 ,  B41J11/00 ,  C23C14/34 ,  C23C14/14

摘要： A manufacturing system for an inkjet printing flexible display device includes a substrate input module, a substrate transferring module, a printing module, a post-printing processing module, a solid content detection module, a film packaging printing module, a film formation detection module, a substrate output module. At the same time, the functional modules are highly integrated and optimized in structure and layout. The manufacturing system for the inkjet printing flexible display device is suitable for industrial production and are adopted to monitor the manufacturing process by using a plurality of detection modules.

公开(公告)号：US11090826B2

公开(公告)日：2021-08-17

申请号：US15420814

申请日：2017-01-31

申请人： BIC-VIOLEX SA

发明人： Anastasios Siozios ,  Konstantinos Mavroeidis ,  Labros Kontokostas ,  Ioannis Papatriantafyllou ,  Taxiarchis Terlilis

IPC分类号： B26B21/60 ,  B26B21/22 ,  C23C14/02 ,  C23C14/14 ,  C23C14/06 ,  B26B21/40 ,  C23C14/34

摘要： A razor blade comprising a blade substrate with a blade edge substrate portion ending in blade tip. The razor blade is covered by a strengthening coating deposited on the blade edge substrate portion via a deposition process. The deposition process causes a hardness value of the strengthening coating layer to be increased, which, among other factors, allows for a decreased thickness of the blade substrate with coating. The blade substrate with coating has (i) a thickness of between about 1.57 and 2.37 micrometers measured at a distance of about five micrometers from the coating tip, (ii) a thickness of between about 4.62 and 6.74 micrometers measured at a distance of about twenty micrometers from the coating tip, and (iii) a thickness of between about 19.82 and 27.52 micrometers measured at a distance of about one hundred micrometers from the coating tip.

公开(公告)号：US20210246544A1

公开(公告)日：2021-08-12

申请号：US17235003

申请日：2021-04-20

申请人： PLANSEE SE

发明人： CHRISTIAN LINKE ,  THOMAS SCHERER

IPC分类号： C23C14/34 ,  B22F3/10 ,  C22C1/04 ,  G02F1/1524 ,  B22F3/16 ,  B22F3/17 ,  C22C19/03 ,  C22C27/04 ,  C22F1/10 ,  C22F1/18 ,  C23C14/14 ,  H01J37/34

摘要： A process for producing a W—Ni sputtering target includes providing the sputtering target with 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% by area on average of intermetallic phases measured at a target material cross section.

公开(公告)号：US20210246542A1

公开(公告)日：2021-08-12

申请号：US17285015

申请日：2019-04-23

申请人： KVARC SERVICES INC

发明人： Leonid KRISHTEIN ,  Vladimir ANISIMOV ,  Oleg POPOV

IPC分类号： C23C14/32 ,  C23C14/35 ,  H01J37/32 ,  C23C14/14 ,  C23C14/54

摘要： A cathode arc evaporator of metals and alloys for coating in a vacuum chamber, including an ignition device adapted for initiating an arc discharge, at least one anode, a water-cooled, consumable tubular cathode arranged along a longitudinal axis and rotatable thereabout, an electromagnetic system disposed within the cathode and adapted for forming an arch-like magnetic field, formed by at least one electromagnetic coil, in the vicinity of a surface of the cathode, resulting in a displaceable cathode spot, which is steerable by the magnetic field, at least one sensor responsive to the proximity of the cathode spot, and a controller which is configured to switch the polarity of the current of the at least one electromagnetic coil in response to the signals received from the at least one sensor.

公开(公告)号：US11081325B2

公开(公告)日：2021-08-03

申请号：US14917094

申请日：2014-09-03

申请人： PLANSEE SE ,  PLANSEE COMPOSITE MATERIALS GMBH

发明人： Peter Polcik ,  Enrico Franzke ,  Marcus Wolff

IPC分类号： H01J37/34 ,  C23C14/34 ,  C23C14/06 ,  C04B35/447 ,  C04B35/645 ,  H01M10/0562 ,  H01M6/40 ,  C23C14/14 ,  H01M10/0525

摘要： The present invention relates to a conductive target material comprising essentially one lithium compound, preferably lithium phosphate, and carbon, and also typical impurities. The invention further relates to a process for producing a conductive target material and to the use thereof.

公开(公告)号：US11072853B2

公开(公告)日：2021-07-27

申请号：US16223320

申请日：2018-12-18

申请人： CITIC Dicastal CO., LTD.

发明人： Zuo Xu ,  Guoyuan Xiong ,  Zaide Wang ,  Huanming Ma ,  Shengchao Zhang ,  Shuai Li ,  Qingwang Wei ,  Chuanming Li

IPC分类号： B05D1/06 ,  B05D3/12 ,  B05D1/38 ,  B05D7/14 ,  B05D7/16 ,  C23C14/14 ,  C23C14/20 ,  C23C14/35 ,  B05D3/10 ,  B05D5/06 ,  B05D7/00 ,  C23C14/02

摘要： The disclosure provides a metal protective layer, sequentially comprising an organic powder coating, a high-gloss organic coating, a ductile periodic variable alloy protective film and a transparent powder coating, wherein the base powder layer is an epoxy resin or pure polyester powder coating; the high-gloss organic coating is an epoxy resin powder coating, a polyester powder coating, or a polybutadiene organic coating; the ductile periodic variable alloy protective film is formed by direct current magnetron sputtering with two targets in a high vacuum environment, and the material of the targets is composed of a Ni—Cr alloy layer and pure Cr; and the transparent powder layer is an acrylic powder coating or a polyester transparent powder coating.