Method, System and Computer Program Product for Preventing Execution of Software Without a Dynamically Generated Key
    41.
    发明申请
    Method, System and Computer Program Product for Preventing Execution of Software Without a Dynamically Generated Key 失效
    方法,系统和计算机程序产品,用于防止没有动态生成的密钥执行软件

    公开(公告)号:US20090063867A1

    公开(公告)日:2009-03-05

    申请号:US11850079

    申请日:2007-09-05

    CPC classification number: G06F21/125 H04L9/0822 H04L9/083

    Abstract: A method, system and computer program product for partitioning the binary image of a software program, and partially removing code bits to create an encrypted software key, to increase software security. The software program's binary image is partitioned along a random segment length or a byte/nibble segment length, and the code bits removed, and stored, along with their positional data in a software key. The software key is encrypted and is separately distributed from the inoperable binary image to the end user. The encrypted key is stored on a secure remote server. When the end user properly authenticates with the developer's remote servers, the encrypted security key is downloaded from the secure remote server and is locally decrypted. The removed code bits are reinserted into the fractioned binary image utilizing the positional location information. The binary image is then operable to complete execution of the software program.

    Abstract translation: 一种方法,系统和计算机程序产品,用于对软件程序的二进制图像进行分区,并部分地移除代码位以创建加密的软件密钥,以增加软件安全性。 软件程序的二进制图像沿随机分段长度或字节/半字节段长度进行分区,并将代码位与其位置数据一起删除并存储在软件密钥中。 软件密钥被加密,并且从不可操作的二进制图像分开分发给最终用户。 加密的密钥存储在安全的远程服务器上。 当最终用户对开发者的远程服务器进行正确认证时,加密的安全密钥从安全远程服务器下载,并被本地解密。 使用位置位置信息将去除的代码位重新插入分级二进制图像。 然后二进制图像可操作以完成软件程序的执行。

    Unlock Mode in Source Synchronous Receivers
    42.
    发明申请
    Unlock Mode in Source Synchronous Receivers 失效
    源同步接收机中的解锁模式

    公开(公告)号:US20080205570A1

    公开(公告)日:2008-08-28

    申请号:US11678256

    申请日:2007-02-23

    CPC classification number: H03L7/0812 H04L7/0008

    Abstract: A phase locked loop generates an output corresponding to a source synchronous input and an input link clock signal. A phase locking feedback system receives the input and an input link clock signal and detects phase deviations between the output and the input. The phase locking feedback system also adjusts an adjusted clock signal based on the phase deviations thereby causing the phase locking feedback system to generate the output so that the output has a steady phase relationship with the input. A first mechanism causes the phase locking feedback system not to track phase deviations between the output and the input upon occurrence of a first predefined event, thereby maintaining the adjusted clock signal at a current state.

    Abstract translation: 锁相环产生对应于源同步输入和输入链路时钟信号的输出。 相位锁定反馈系统接收输入和输入链路时钟信号,并检测输出和输入之间的相位偏差。 相位锁定反馈系统还基于相位偏差来调整调整的时钟信号,从而使相位锁定反馈系统产生输出,使得输出与输入具有稳定的相位关系。 第一机制使得相位锁定反馈系统在出现第一预定义事件时不跟踪输出和输入之间的相位偏差,从而将经调整的时钟信号保持在当前状态。

    Method and apparatus for measurement and control of photomask to substrate alignment
    46.
    发明授权
    Method and apparatus for measurement and control of photomask to substrate alignment 失效
    用于测量和控制光掩模到衬底对准的方法和装置

    公开(公告)号:US08003412B2

    公开(公告)日:2011-08-23

    申请号:US12888600

    申请日:2010-09-23

    Abstract: A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction minor arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.

    Abstract translation: 将基板与光掩模对准的方法,结构,系统。 该方法包括:将光穿过光刻工具中的光掩模的透明区域,通过工具的透镜并且在基底上的一组至少三个衍射反射镜阵列上,该组的至少三个衍射镜阵列 衍射次要阵列包括单排反射镜,在任何特定衍射镜阵列中间隔相同距离的所有反射镜,在不同距离上间隔开的不同衍射镜阵列中的反射镜; 测量从所述至少三个衍射反射镜阵列组衍射的光的强度到光电检测器阵列上; 以及基于所测量的光强度来调节光掩模或光掩模和透镜的温度。

    Preventing execution of software without a dynamically generated key
    47.
    发明授权
    Preventing execution of software without a dynamically generated key 失效
    防止没有动态生成的密钥执行软件

    公开(公告)号:US07992001B2

    公开(公告)日:2011-08-02

    申请号:US11850079

    申请日:2007-09-05

    CPC classification number: G06F21/125 H04L9/0822 H04L9/083

    Abstract: A method, system and computer program product for partitioning the binary image of a software program, and partially removing code bits to create an encrypted software key, to increase software security. The software program's binary image is partitioned along a random segment length or a byte/nibble segment length, and the code bits removed, and stored, along with their positional data in a software key. The software key is encrypted and is separately distributed from the inoperable binary image to the end user. The encrypted key is stored on a secure remote server. When the end user properly authenticates with the developer's remote servers, the encrypted security key is downloaded from the secure remote server and is locally decrypted. The removed code bits are reinserted into the fractioned binary image utilizing the positional location information. The binary image is then operable to complete execution of the software program.

    Abstract translation: 一种方法,系统和计算机程序产品,用于对软件程序的二进制图像进行分区,并部分地移除代码位以创建加密的软件密钥,以增加软件安全性。 软件程序的二进制图像沿随机分段长度或字节/半字节段长度进行分区,并将代码位与其位置数据一起删除并存储在软件密钥中。 软件密钥被加密,并且从不可操作的二进制图像分开分发给最终用户。 加密的密钥存储在安全的远程服务器上。 当最终用户对开发者的远程服务器进行正确认证时,加密的安全密钥从安全远程服务器下载,并被本地解密。 使用位置位置信息将去除的代码位重新插入分级二进制图像。 然后二进制图像可操作以完成软件程序的执行。

    Method and apparatus for measurement and control of photomask to substrate alignment
    48.
    发明授权
    Method and apparatus for measurement and control of photomask to substrate alignment 失效
    用于测量和控制光掩模到衬底对准的方法和装置

    公开(公告)号:US07989968B2

    公开(公告)日:2011-08-02

    申请号:US12888697

    申请日:2010-09-23

    Abstract: A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.

    Abstract translation: 将基板与光掩模对准的方法,结构,系统。 该方法包括:将光穿过光刻工具中的光掩模的透明区域,通过工具的透镜并且在基底上的一组至少三个衍射反射镜阵列上,该组的至少三个衍射镜阵列 包括单行反射镜的衍射镜阵列,在任何特定衍射镜阵列中间隔相同距离的所有反射镜,在不同距离上间隔开的不同衍射镜阵列中的反射镜; 测量从所述至少三个衍射反射镜阵列组衍射的光的强度到光电检测器阵列上; 以及基于所测量的光强度来调节光掩模或光掩模和透镜的温度。

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