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    GLOSSING DEVICE AND IMAGE FORMING APPARATUS INCORPORATING SAME
    42.
    发明申请
    GLOSSING DEVICE AND IMAGE FORMING APPARATUS INCORPORATING SAME 有权
    GLOSSING DEVICE和IMAGE FORMING APPARATUS INCORPORATING SAME

    公开(公告)号：US20140016975A1

    公开(公告)日：2014-01-16

    申请号：US13915036

    申请日：2013-06-11

    申请人： Hiroyuki SHIMADA ,  Akiyasu AMITA

    发明人： Hiroyuki SHIMADA ,  Akiyasu AMITA

    IPC分类号： G03G15/20

    CPC分类号： G03G15/6585 ,  G03G15/2017 ,  G03G15/6582 ,  G03G21/206

    摘要： A glossing device for imparting gloss to a toner image formed on a recording medium includes a plurality of rollers, a looped, endless belt, a pressure member, a belt cooler, and a belt retention mechanism. The plurality of rollers is disposed generally parallel to each other, and includes a heat roller subjected to heating. The looped, endless belt is entrained around the plurality of rollers for conveying the recording medium in a longitudinal, conveyance direction thereof. The pressure member is disposed opposite the heat roller to press against the heat roller via the belt to form a glossing nip therebetween, through which the recording medium passes. The belt cooler is disposed inside the loop of the belt to cool the belt during movement between the glossing nip and the separation position.

    摘要翻译： 用于赋予形成在记录介质上的调色剂图像的光泽度的光泽装置包括多个辊，环形环形带，压力构件，带式冷却器和带保持机构。 多个辊子大致平行地设置，并且包括经受加热的加热辊。 环形的环形带被夹带在多个辊周围，用于沿其纵向传送方向传送记录介质。 压力构件与加热辊相对设置，以经由带压靠在加热辊上，以在其间形成光泽区域，记录介质通过该间隙。 带式冷却器设置在带的环内，以在光泽辊隙和分离位置之间移动期间冷却带。

    SEMICONDUCTOR DEVICE, ELECTRO-OPTIC DEVICE, POWER CONVERSION DEVICE, AND ELECTRONIC APPARATUS
    43.
    发明申请
    SEMICONDUCTOR DEVICE, ELECTRO-OPTIC DEVICE, POWER CONVERSION DEVICE, AND ELECTRONIC APPARATUS 有权
    半导体器件，电光器件，功率转换器件和电子设备

    公开(公告)号：US20130049013A1

    公开(公告)日：2013-02-28

    申请号：US13563241

    申请日：2012-07-31

    申请人： Hiroyuki SHIMADA

    发明人： Hiroyuki SHIMADA

    IPC分类号： H01L29/24

    CPC分类号： H01L29/1608 ,  H01L21/0237 ,  H01L21/02381 ,  H01L21/02447 ,  H01L21/02529 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/02647 ,  H01L29/0692 ,  H01L29/42368 ,  H01L29/66068 ,  H01L29/7835

    摘要： A semiconductor device includes a silicon substrate, a silicon carbide film formed on the silicon substrate, a mask member formed on a surface of the silicon carbide film, and having an opening section, single-crystal silicon carbide films each having grown epitaxially from the silicon carbide film exposed in the opening section as a base point, and covering the silicon carbide film and the mask member, and a semiconductor element formed on surfaces of the single-crystal silicon carbide films, an assembly section formed of the single-crystal silicon carbide films assembled to each other exists above the mask member, the semiconductor element has a body contact region, and the body contact region is disposed at a position overlapping the assembly section viewed from a direction perpendicular to the surface of the silicon substrate.

    摘要翻译： 半导体器件包括硅衬底，形成在硅衬底上的碳化硅膜，形成在碳化硅膜的表面上的掩模构件，并且具有开口部，每个都从硅生长外延生长的单晶碳化硅膜 以开口部为露点的碳化物膜为基点，覆盖碳化硅膜和掩模部件，形成在单晶碳化硅膜表面的半导体元件，由单晶碳化硅形成的组装部 彼此组装的膜存在于掩模构件上方，半导体元件具有本体接触区域，并且本体接触区域设置在从与硅衬底的表面垂直的方向观察的与组装部分重叠的位置处。

    Method of manufacturing a semiconductor device
    44.
    发明授权
    Method of manufacturing a semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号：US08304350B2

    公开(公告)日：2012-11-06

    申请号：US12705004

    申请日：2010-02-12

    申请人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

    发明人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

    IPC分类号： H01L21/461

    CPC分类号： H01L21/02686 ,  C23C16/303 ,  C23C16/345 ,  C23C16/402 ,  C23C16/54 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/2022 ,  H01L21/67155 ,  H01L21/67207 ,  H01L27/1281 ,  H01L29/41733 ,  Y10S438/905 ,  Y10S438/908

    摘要： A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber.

    摘要翻译： 基板处理装置包括经由可抽出的公共室彼此连接的多个可抽出的处理室，公共室设有用于在每个处理室之间输送基板的装置。 更具体地，基板处理装置包括多个可排除的处理室，至少一个所述处理室通过其中的气相反应具有成膜功能，所述处理室中的至少一个具有光照射的退火功能， 所述处理室中的至少一个具有加热功能。 所述设备还具有公共室，所述多个可抽出的处理室通过所述公共室彼此连接，以及设置在所述公共室中的输送装置，用于在每个处理室之间输送基板。

    Image forming apparatus capable of stably applying oil for fixing
    46.
    发明授权
    Image forming apparatus capable of stably applying oil for fixing 有权
    能够稳定地施加用于固定的油的图像形成装置

    公开(公告)号：US08023850B2

    公开(公告)日：2011-09-20

    申请号：US12434195

    申请日：2009-05-01

    申请人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

    发明人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

    IPC分类号： G03G15/20

    CPC分类号： G03G15/2025

    摘要： An image forming apparatus includes an oil input device and a fixing device including a fixing member, a pressing member, and an oil applier. In the oil applier, an oil application member applies oil supplied from an oil supply mechanism to one of the fixing member and the pressing member. In the oil supply mechanism, an oil supply member provided adjacent to an oil storage member supplies oil sent from the oil storage member to the oil application member. When the fixing device is reattached to the image forming apparatus after the fixing device is detached from the image forming apparatus, oil sent from the oil input device through an oil inlet overflows the oil storage member, and is supplied to one of the oil supply member and the oil application member provided adjacent to the oil storage member before an image forming operation starts.

    摘要翻译： 图像形成装置包括油输入装置和包括固定构件，按压构件和油加工器的定影装置。 在施油机构中，油施加部件将从供油机构供给的油部施加到固定部件和按压部件之一。 在供油机构中，与储油部件相邻设置的供油部件将从储油部件送出的油向供油部件供给。 当定影装置从图像形成装置拆下之后，当定影装置被重新连接到图像形成装置时，从油输入装置通过进油口输送的油溢出储油构件，并被供给到供油构件 以及在图像形成操作开始之前设置在油存储构件附近的油施加构件。

    SEMICONDUCTOR SUBSTRATE AND ITS MANUFACTURING METHOD
    47.
    发明申请
    SEMICONDUCTOR SUBSTRATE AND ITS MANUFACTURING METHOD 有权
    半导体基板及其制造方法

    公开(公告)号：US20110079793A1

    公开(公告)日：2011-04-07

    申请号：US12887005

    申请日：2010-09-21

    申请人： Hiroyuki SHIMADA

    发明人： Hiroyuki SHIMADA

    IPC分类号： H01L29/24 ,  C30B25/18

    CPC分类号： H01L21/02529 ,  C30B25/183 ,  C30B29/36 ,  H01L21/02381 ,  H01L21/02491 ,  H01L21/02505 ,  H01L21/0251

    摘要： A semiconductor substrate includes: a substrate having a single crystal silicon on at least one surface thereof; a buffer layer that is provided on the single crystal silicon and has at least one cobalt silicide layer primarily containing cobalt silicide; and a silicon carbide single crystal film provided on the buffer layer.

    摘要翻译： 半导体衬底包括：在其至少一个表面上具有单晶硅的衬底; 提供在单晶硅上并具有至少一个主要含有硅化钴的钴硅化物层的缓冲层; 以及设置在缓冲层上的碳化硅单晶膜。

    Fixing device, image forming apparatus, and image fixing method capable of stably applying oil for fixing without adhering oil to sheet
    48.
    发明申请
    Fixing device, image forming apparatus, and image fixing method capable of stably applying oil for fixing without adhering oil to sheet 有权
    固定装置，图像形成装置和图像定影方法，其能够在不将油粘附到片材上的情况下稳定地施加用于定影的油

    公开(公告)号：US20090274496A1

    公开(公告)日：2009-11-05

    申请号：US12453189

    申请日：2009-05-01

    申请人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Takashi Kagami ,  Keisuke Kubota ,  Hiroyuki Shimada

    发明人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Takashi Kagami ,  Keisuke Kubota ,  Hiroyuki Shimada

    IPC分类号： G03G15/20

    CPC分类号： G03G15/2025

    摘要： In a fixing device, a controller switches a pressing member between a pressure application state to contact the pressing member against a fixing member and a pressure release state to separate the pressing member from the fixing member. The controller starts rotation of the pressing member before the pressing member contacts the fixing member in the pressure application state, when the pressing member switches from the pressure release state to the pressure application state. An oil applier includes an oil pan and an oil regulating member. The oil pan is provided under the pressing member to contain oil in which the pressing member is dipped. The oil regulating member is provided downstream from the oil pan in a direction of rotation of the pressing member to contact the pressing member to regulate an amount of oil adhering to the pressing member.

    摘要翻译： 在定影装置中，控制器在压力施加状态之间切换按压构件，以将压紧构件接触固定构件和压力释放状态，以将按压构件与固定构件分离。 当按压构件从压力释放状态切换到压力施加状态时，控制器在加压构件在压力施加状态下接触固定构件之前开始按压构件的旋转。 一种油涂器包括油盘和油调节件。 油底壳设置在按压部件的下面，以容纳浸入按压部件的油。 油调节部件沿着按压部件的旋转方向设置在油盘的下游，以接触按压部件，以调节附着在按压部件上的油量。