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公开(公告)号：US12105424B2
公开(公告)日：2024-10-01
申请号：US17639240
申请日：2020-08-19
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Thomas L. Laidig , Joseph R. Johnson
CPC classification number: G03F7/2057 , G03F7/203 , G03F7/70625
Abstract: Examples described herein provide a system, a software application, and a method of a lithography process to write multiple tones in a single pass. A system includes a stage and a lithography system. The lithography system includes image projection systems, a controller, and memory. The controller is coupled to the memory, which stores instruction code. Execution of the instruction code by the controller causes the controller to control the stage and the image projection systems to iteratively expose a photoresist supported by the stage and to move the stage relative to the image projection systems a step distance between sequential pairs of the exposures. Each exposure includes using write beam(s) projected from the image projection systems. Each exposure is at a respective one of different dosage amounts. An accumulation of the different dosage amounts is a full tone dosage amount for the photoresist.
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公开(公告)号：US20240088116A1
公开(公告)日：2024-03-14
申请号：US18511865
申请日：2023-11-16
Applicant: Applied Materials, Inc.
Inventor： Lisong Xu , Byung Sung Kwak , Mingwei Zhu , Hou T. Ng , Nag B. Patibandla , Christopher Dennis Bencher
CPC classification number: H01L25/167 , H01L25/0753 , H01L33/0095 , H01L33/483 , H01L33/58 , H01L33/60 , H01L33/44 , H01L2933/005 , H01L2933/0058
Abstract: A display screen includes a backplane, an array of light-emitting diodes electrically integrated with the backplane, the array of light-emitting diodes configured to emit UV light in a first wavelength range, and a plurality of isolation walls formed on the backplane between adjacent light-emitting diodes of the array of light-emitting diodes with the isolation walls spaced apart from the light-emitting diodes and extending above the light-emitting diodes. The plurality of isolation walls include a core of a first material and a coating covering at least a portion of the core extending above the light-emitting diodes. The coating is an opaque second material having transmittance less than 1% of light in the first wavelength range.
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43.发明授权公开(公告)号：US11815818B2
公开(公告)日：2023-11-14
申请号：US17740750
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Christopher Dennis Bencher
CPC classification number: G03F7/70466 , G03F7/70191 , G02B26/105
Abstract: Methods for patterning a substrate are described. A substrate is scanned using a spatial light modulator with a plurality of exposures timed according to a non-crystalline shot pattern. Lithography systems for performing the substrate patterning method and non-transitory computer-readable medium for executing the patterning method are also described.
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公开(公告)号：US20220310575A1
公开(公告)日：2022-09-29
申请号：US17701607
申请日：2022-03-22
Applicant: Applied Materials, Inc.
Inventor： Lisong Xu , Byung Sung Kwak , Mingwei Zhu , Hou T. Ng , Nag B. Patibandla , Christopher Dennis Bencher
Abstract: A display screen includes a backplane, an array of light-emitting diodes electrically integrated with the backplane, the array of light-emitting diodes configured to emit UV light in a first wavelength range, and a plurality of isolation walls formed on the backplane between adjacent light-emitting diodes of the array of light-emitting diodes with the isolation walls spaced apart from the light-emitting diodes and extending above the light-emitting diodes. The plurality of isolation walls include a core of a first material and a coating covering at least a portion of the core extending above the light-emitting diodes. The coating is an opaque second material having transmittance less than 1% of light in the first wavelength range.
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公开(公告)号：US11309163B2
公开(公告)日：2022-04-19
申请号：US16676717
申请日：2019-11-07
Applicant: Applied Materials, Inc.
Inventor： Mehdi Vaez-Iravani , Christopher Dennis Bencher , Krishna Sreerambhatla , Hussein Fawaz , Lior Engel , Robert Perlmutter
IPC: H01J37/317 , H01J37/147 , H01J37/04 , G03F7/20 , H01J37/09 , H01J37/20 , H01J37/21 , H01L21/027 , H01L21/768
Abstract: A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.
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Patent Agency Ranking
公开(公告)号：US10983444B2
公开(公告)日：2021-04-20
申请号：US15964018
申请日：2018-04-26
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson
IPC: G03F7/20
Abstract: Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizontal rows and vertical columns. The variable intensity of each group of solid state emitters, for example an entire row or column of solid state emitters, is controllable for improved field brightness uniformity and stitching. Controlling the variable intensity includes, for example, varying the signal, such as voltage, that is applied to each of the rows of solid state emitters to attenuate the brightness from the middle of the array to the edges of the array to accommodate for overlapping exposures during photolithography processing.
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公开(公告)号：US10935890B2
公开(公告)日：2021-03-02
申请号：US16662196
申请日：2019-10-24
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson , Thomas L. Laidig
Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.
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公开(公告)号：US10705433B2
公开(公告)日：2020-07-07
申请号：US16597718
申请日：2019-10-09
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Thomas L. Laidig , Christopher Dennis Bencher
Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
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公开(公告)号：US10705431B2
公开(公告)日：2020-07-07
申请号：US16509675
申请日：2019-07-12
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson , David Markle , Mehdi Vaez-Iravani
Abstract: Embodiments of the present disclosure provide methods for producing images on substrates. The method includes providing a p-polarization beam to a first mirror cube having a first digital micromirror device (DMD), providing an s-polarization beam to a second mirror cube having a second DMD, and reflecting the p-polarization beam off the first DMD and reflecting the s-polarization beam off the second DMD such that the p-polarization beam and the s-polarization beam are reflected towards a light altering device configured to produce a plurality of superimposed images on the substrate.
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公开(公告)号：US10394130B2
公开(公告)日：2019-08-27
申请号：US15207991
申请日：2016-07-12
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson , Dave Markle , Mehdi Vaez-Iravani
Abstract: The present disclosure provides a method for producing an image on a substrate. The method includes providing a single beam of light to a multiple DMD assembly, splitting the single beam of light into an s-polarization beam and a p-polarization beam, and reflecting the s-polarization beam and the p-polarization beam through the multiple DMD assembly such that the multiple DMD assembly produces a plurality of superimposed images on the substrate.
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