公开(公告)号：US20160299440A1

公开(公告)日：2016-10-13

申请号：US15184770

申请日：2016-06-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Henrikus Herman Marie COX ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Johannes Catharinus Hubertus MULKENS ,  Gerardus Petrus Matthijs VAN NUNEN ,  Klaus SIMON ,  Bernardus Antonius SLAGHEKKE ,  Alexander STRAAIJER ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martijn HOUKES

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US20160103399A1

公开(公告)日：2016-04-14

申请号：US14975513

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik DE Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Abstract translation: 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。

公开(公告)号：US20150362844A1

公开(公告)日：2015-12-17

申请号：US14743775

申请日：2015-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Antonius Theodorus Anna Maria DERKSEN ,  Christiaan Alexander HOOGENDAM ,  Aleksey KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Theodorus Marinus MODDERMAN ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

公开(公告)号：US20150316858A1

公开(公告)日：2015-11-05

申请号：US14800493

申请日：2015-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

Abstract translation: 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。