LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
    47.
    发明申请
    LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS 审中-公开
    等离子体加工系统的低温冲击

    公开(公告)号:US20160225652A1

    公开(公告)日:2016-08-04

    申请号:US14612857

    申请日:2015-02-03

    Abstract: A wafer chuck assembly includes a puck, a shaft and a base. The puck includes an electrically insulating material that defines a top surface of the puck; a plurality of electrodes are embedded within the electrically insulating material. The puck also includes an inner puck element that forms one or more channels for a heat exchange fluid, the inner puck element being in thermal communication with the electrically insulating material, and an electrically conductive plate disposed proximate to the inner puck element. The shaft includes an electrically conductive shaft housing that is electrically coupled with the plate, and a plurality of connectors, including electrical connectors for the electrodes. The base includes an electrically conductive base housing that is electrically coupled with the shaft housing, and an electrically insulating terminal block disposed within the base housing, the plurality of connectors passing through the terminal block.

    Abstract translation: 晶片卡盘组件包括圆盘,轴和基座。 圆盘包括限定冰球顶表面的电绝缘材料; 多个电极嵌入电绝缘材料内。 该圆盘还包括内部圆盘元件,其形成用于热交换流体的一个或多个通道,内部圆盘元件与电绝缘材料热连通,以及设置在靠近内部圆锥元件的导电板。 所述轴包括与所述板电耦合的导电轴壳体,以及包括用于所述电极的电连接器的多个连接器。 基座包括与轴壳体电耦合的导电基座壳体,以及设置在基座壳体内的电绝缘接线块,多个连接器穿过接线端子。

    HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
    48.
    发明申请
    HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS 有权
    用于等离子体加工系统的高温冲击

    公开(公告)号:US20160225651A1

    公开(公告)日:2016-08-04

    申请号:US14612472

    申请日:2015-02-03

    CPC classification number: H01L21/6833 H01L21/3065 H01L21/67103

    Abstract: A wafer chuck assembly includes a puck, a shaft and a base. An insulating material defines a top surface of the puck, a heater element is embedded within the insulating material, and a conductive plate lies beneath the insulating material. The shaft includes a housing coupled with the plate, and electrical connectors for the heater elements and the electrodes. A conductive base housing couples with the shaft housing, and the connectors pass through a terminal block within the base housing. A method of plasma processing includes loading a workpiece onto a chuck having an insulating top surface, providing a DC voltage differential across two electrodes within the top surface, heating the chuck by passing current through heater elements, providing process gases in a chamber surrounding the chuck, and providing an RF voltage between a conductive plate beneath the chuck, and one or more walls of the chamber.

    Abstract translation: 晶片卡盘组件包括圆盘,轴和基座。 绝缘材料限定了圆盘的顶表面,加热元件嵌入绝缘材料内,导电板位于绝缘材料的下方。 轴包括与板连接的壳体,以及用于加热器元件和电极的电连接器。 导电基座壳体与轴壳体耦合,并且连接器穿过基座壳体内的端子块。 等离子体处理的方法包括将工件加载到具有绝缘顶表面的卡盘上,在顶表面内的两个电极之间提供直流电压差,通过使电流通过加热器元件来加热卡盘,在围绕卡盘的腔室中提供工艺气体 并且在卡盘下方的导电板与腔室的一个或多个壁之间提供RF电压。

    Digital phase controller for two-phase operation of a plasma reactor
    49.
    发明授权
    Digital phase controller for two-phase operation of a plasma reactor 有权
    数字相位控制器,用于等离子体反应器的两相操作

    公开(公告)号:US09312106B2

    公开(公告)日:2016-04-12

    申请号:US14174511

    申请日:2014-02-06

    Abstract: Phase angle between opposing electrodes in a plasma reactor is controlled in accordance with a user selected phase angle. Direct digital synthesis of RF waveforms of different phases for the different electrodes is employed. The synthesis is synchronized with a reference clock. The address generator employed for direct digital synthesis is synchronized with an output clock signal that is generated in phase with the reference clock using a phase lock loop. The phase lock loop operates only during a limited initialization period.

    Abstract translation: 根据用户选择的相位角来控制等离子体反应器中的相对电极之间的相位角。 采用不同电极的不同相的RF波形的直接数字合成。 该合成与参考时钟同步。 用于直接数字合成的地址发生器与使用锁相环与参考时钟同相产生的输出时钟信号同步。 锁相环只在有限的初始化时段内工作。

    Radial waveguide systems and methods for post-match control of microwaves

    公开(公告)号:US09299538B2

    公开(公告)日:2016-03-29

    申请号:US14221146

    申请日:2014-03-20

    Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

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