公开(公告)号：US5153862A

公开(公告)日：1992-10-06

申请号：US432914

申请日：1989-11-06

申请人： Wilhelm Taylor ,  Michael D. Faucett ,  Daniel J. Woodruff

发明人： Wilhelm Taylor ,  Michael D. Faucett ,  Daniel J. Woodruff

IPC分类号： G11B23/033 ,  G11B7/00 ,  G11B7/004 ,  G11B17/22 ,  G11B17/28 ,  G11B23/023

CPC分类号： G11B17/221

摘要： A mass loader stores a plurality of cartridges for loading a selected one of the cartridges into an optical disk reader. The loader comprises a magazine carrier and a cartridge loading apparatus. The cartridges are stored in a vertical and parallel orientation within slots in a magazine which is then inserted into the magazine carrier. The magazine carrier depends from a follower nut which travels along a lead screw in a direction transverse to the parallel orientation of the cartridges. As the leadscrew turns, the follower nut travels therealong to move the magazine into the correct position to load the selected one of the cartridges into the reader. After the magazine is properly positioned, another lead screw is driven to propel another follower nut therealong. The follower nut has a loading pin protruding therefrom which engages the selected one of the cartridges for loading. The leadscrew is then driven to propel the cartridge via the pin on the follower nut into the reader.

公开(公告)号：US09309603B2

公开(公告)日：2016-04-12

申请号：US13232152

申请日：2011-09-14

申请人： Daniel J. Woodruff

发明人： Daniel J. Woodruff

IPC分类号： B08B7/00 ,  B08B7/04 ,  C25D17/00 ,  C25D21/08

CPC分类号： C25D17/001 ,  C25D17/004 ,  C25D21/08

摘要： A plating apparatus includes a vessel for holding a bath of plating liquid. A head is adapted to hold a work piece, such as a silicon wafer, in the vessel, with a seal on the head sealing against the work piece. A component cleaner assembly may be used to automatically clean a component of the plating apparatus, such as a seal or a contact ring. The cleaner assembly has a component contactor, such as a brush, on an arm. An arm actuator is linked to the arm for moving the arm from a retracted position, to a deployed position, where the contactor is in physical contact with the component. A method for cleaning a component of a plating apparatus includes moving a scrubber or contactor into contact with the component and applying a cleaning liquid onto the component adjacent to the contactor.

摘要翻译： 电镀装置包括用于保持镀液的浴的容器。 头部适于将诸如硅晶片的工件保持在容器中，头部上的密封件密封抵靠工件。 组件清洁器组件可用于自动清洁电镀设备的部件，例如密封件或接触环。 清洁器组件在臂上具有诸如刷子的部件接触器。 臂致动器连接到臂上，用于将臂从缩回位置移动到展开位置，其中接触器与部件物理接触。 一种用于清洁电镀设备的部件的方法包括将洗涤器或接触器移动到与部件接触并将清洁液体施加到与接触器相邻的部件上。

公开(公告)号：US20130061875A1

公开(公告)日：2013-03-14

申请号：US13232152

申请日：2011-09-14

申请人： Daniel J. Woodruff

发明人： Daniel J. Woodruff

IPC分类号： C25D17/00 ,  B08B3/10

CPC分类号： C25D17/001 ,  C25D17/004 ,  C25D21/08

摘要： A plating apparatus includes a vessel for holding a bath of plating liquid. A head is adapted to hold a work piece, such as a silicon wafer, in the vessel, with a seal on the head sealing against the work piece. A component cleaner assembly may be used to automatically clean a component of the plating apparatus, such as a seal or a contact ring. The cleaner assembly has a component contactor, such as a brush, on an arm. An arm actuator is linked to the arm for moving the arm from a retracted position, to a deployed position, where the contactor is in physical contact with the component. A method for cleaning a component of a plating apparatus includes moving a scrubber or contactor into contact with the component and applying a cleaning liquid onto the component adjacent to the contactor.

摘要翻译： 电镀装置包括用于保持镀液的浴的容器。 头部适于将诸如硅晶片的工件保持在容器中，头部上的密封件密封抵靠工件。 组件清洁器组件可用于自动清洁电镀设备的部件，例如密封件或接触环。 清洁器组件在臂上具有诸如刷子的部件接触器。 臂致动器连接到臂上，用于将臂从缩回位置移动到展开位置，其中接触器与部件物理接触。 一种用于清洁电镀设备的部件的方法包括将洗涤器或接触器移动到与部件接触并将清洁液体施加到与接触器相邻的部件上。

公开(公告)号：US08118044B2

公开(公告)日：2012-02-21

申请号：US11075099

申请日：2005-03-08

申请人： Daniel J. Woodruff

发明人： Daniel J. Woodruff

IPC分类号： B08B3/00 ,  B08B3/12 ,  B08B6/00

CPC分类号： C25D17/001 ,  C25D17/16 ,  H01L21/00 ,  Y10S134/902

摘要： A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

摘要翻译： 用于处理半导体晶片的处理室。 该室包括处理室内的至少一个转子。 转子适于接收和/或处理半导体晶片。 处理室的顶部还包括可倾斜的边缘。 该边缘从非倾斜位置倾斜到倾斜位置。 当轮辋处于其倾斜位置时，晶片可以被装载到处理室中并从处理室卸载。

公开(公告)号：US07087143B1

公开(公告)日：2006-08-08

申请号：US08680067

申请日：1996-07-15

申请人： Wayne J. Schmidt ,  Robert W. Berner ,  Daniel J. Woodruff

发明人： Wayne J. Schmidt ,  Robert W. Berner ,  Daniel J. Woodruff

IPC分类号： C25D17/00

CPC分类号： H01L21/6715 ,  C25D7/12 ,  C25D17/001 ,  Y10S134/902

摘要： A workpiece processing station is disclosed. The workpiece processing station has particular applicability in an electroplating process for semiconductor wafers. The apparatus includes a work processing bowl having an outer bowl and an inner cup positioned at a location slightly below the upper rim of the bowl. An annular space is provided between the sides of the processing bowl and the fluid cup. Fluid is provided to the fluid cup through an opening in the bottom of the fluid cup. The fluid overflows the fluid cup and drains down the open annular space between the process bowl and the fluid cup and passes through the opening in the bottom of the process bowl and into a fluid reservoir. A reservoir is preferably used as both the supply and the return for the process fluid. The apparatus further includes filters disposed within the bottom of each fluid cup between the bottom of the fluid cup and the process fluid inlet line such that the process fluid must flow upward through the filter before entering the upper portion of the fluid cup. In the preferred embodiment, the workpiece processing station includes a plurality of the process bowl assemblies all having a common reservoir in which process fluid may drain. The invention also includes the method of flowing process fluid into a process vessel such that it overflows and returns to a common fluid return reservoir during the semiconductor manufacturing process.

摘要翻译： 公开了一种工件加工台。 工件加工台在半导体晶片的电镀工艺中具有特别的适用性。 该设备包括工作处理碗，其具有外碗和位于稍低于碗的上边缘的位置处的内杯。 在处理碗的侧面和流体杯之间设置环形空间。 流体通过流体杯底部的开口提供给流体杯。 流体溢流流体杯并且向下流出处理碗和流体杯之间的开放环形空间，并且通过处理碗底部的开口并流入流体储存器。 储存器优选用作工艺流体的供应和返回。 该设备还包括设置在流体杯的底部和过程流体入口管线之间的每个流体杯的底部内的过滤器，使得过程流体必须在进入流体杯的上部之前向上流过过滤器。 在优选实施例中，工件处理站包括多个处理碗组件，其全部具有工艺流体可以在其中排出的公共储存器。 本发明还包括使工艺流体流入处理容器的方法，使得其在半导体制造过程中溢出并返回到公共的回流储存器。

公开(公告)号：US06773560B2

公开(公告)日：2004-08-10

申请号：US09823948

申请日：2001-03-30

申请人： John M. Pedersen ,  Jeremy Willey ,  Daniel J. Woodruff

发明人： John M. Pedersen ,  Jeremy Willey ,  Daniel J. Woodruff

IPC分类号： C25D1706

CPC分类号： C25D17/001 ,  A61K35/12 ,  C12N2500/25 ,  C12N2500/32 ,  C12N2500/34 ,  C12N2500/40 ,  C12N2501/11 ,  C12N2501/39 ,  C12N2501/395 ,  C12N2506/22 ,  C25D5/08 ,  C25D7/123 ,  C25D17/004 ,  C25D17/06 ,  H01L21/2885

摘要： Contact assemblies, electroplating machines with contact assemblies, and methods for making contact assemblies that are used in the fabrication of microelectronic workpieces. The contact assemblies can be dry-contact assemblies. A contact assembly for use in an electroplating system can comprise a support member and a contact system carried by the support member. The support member, for example, can be a ring or another structure that has an opening configured to receive the workpiece. In one embodiment, the support member is a conductive ring. The contact system can have a plurality of contact members projecting inwardly into the opening relative to the support member. The contact members can comprise electrically conductive biasing elements that have contact sites and the contact members can also have a dielectric coating covering at least a portion of the biasing elements. The contact system can also have a shield carried by the support member and a seal on the lip of the shield. The shield and seal are configured to prevent electroplating solution from engaging the contact members.

摘要翻译： 接触组件，具有接触组件的电镀机以及用于制造微电子工件的接触组件的方法。 接触组件可以是干式接触组件。 用于电镀系统的接触组件可以包括由支撑构件承载的支撑构件和接触系统。 例如，支撑构件可以是具有被构造成接收工件的开口的环或另一结构。 在一个实施例中，支撑构件是导电环。 接触系统可以具有相对于支撑构件向内突出到开口中的多个接触构件。 接触构件可以包括具有接触位置的导电偏置元件，并且接触构件还可以具有覆盖偏置元件的至少一部分的电介质涂层。 接触系统还可以具有由支撑构件承载的护罩和护罩的唇缘上的密封。 屏蔽和密封被构造成防止电镀溶液接触接触构件。

公开(公告)号：US06672820B1

公开(公告)日：2004-01-06

申请号：US08990107

申请日：1997-12-15

申请人： Kyle Hanson ,  Mark Dix ,  Daniel J. Woodruff ,  Wayne J. Schmidt ,  Kevin W. Coyle

发明人： Kyle Hanson ,  Mark Dix ,  Daniel J. Woodruff ,  Wayne J. Schmidt ,  Kevin W. Coyle

IPC分类号： B65H500

CPC分类号： H01L21/681 ,  C25D7/12 ,  C25D17/001 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67259 ,  H01L21/67742 ,  H01L21/67769 ,  H01L21/67781

摘要： A transport system for manipulating a semiconductor wafer in a processing tool is set forth. The system includes a transport unit guide disposed within the processing tool for supporting a wafer transfer unit as the unit moves between a first position and a second position. The transport unit guide comprises a frame, a lateral guide rail mounted on the frame, and a series of magnetic segments arranged upon the transport unit guide proximate the lateral guide rail. The wafer transfer unit includes a tram translatably attached to the lateral guide rail and a wafer transfer arm assembly for manipulating the semiconductor wafer. An electromagnet is mounted on the tram in cooperative relation with the magnetic segments for moving the transfer unit along the guide rail. Actuators are used for controlling the position of the transfer unit and transfer arm assembly, and sensors are used for determining the position of the transfer unit and the transfer arm assembly. A controller is disposed remote of the wafer transfer unit and directs the movement of the transfer unit and transfer arm assembly in response to the sensors using the actuators. A communication link is established between the actuators, sensors and controller. Preferably, the communication link is a fiber optic link.

摘要翻译： 阐述了在处理工具中操纵半导体晶片的传送系统。 该系统包括设置在处理工具内的传送单元引导件，用于当单元在第一位置和第二位置之间移动时支撑晶片传送单元。 运输单元引导件包括框架，安装在框架上的横向导轨以及布置在靠近横向导轨的传送单元引导件上的一系列磁性段。 晶片传送单元包括可平移地附接到横向导轨的电车和用于操纵半导体晶片的晶片传送臂组件。 一个电磁铁与磁性部件协调地安装在电车上，用于沿着导轨移动传送单元。 驱动器用于控制传送单元和传送臂组件的位置，传感器用于确定传送单元和传送臂组件的位置。 控制器设置在远离晶片传送单元的位置，并响应于使用致动器的传感器引导传送单元和传送臂组件的移动。 在执行器，传感器和控制器之间建立通信链路。 优选地，通信链路是光纤链路。

公开(公告)号：US06623609B2

公开(公告)日：2003-09-23

申请号：US09875424

申请日：2001-06-05

申请人： Randy Harris ,  Daniel J. Woodruff

发明人： Randy Harris ,  Daniel J. Woodruff

IPC分类号： C25D1706

CPC分类号： H01L21/67017 ,  C25D7/12 ,  C25D17/06

摘要： A lift and rotate assembly for use in a workpiece processing station. The lift and rotate assembly includes a body having a slim profile and pins located on opposite sides for mounting the assembly onto a tool frame. The lift and rotate assembly is removably and pivotally mounted to an exposed outer surface of the frame. The lift and rotate assembly has a body, a process head movably connected to the body, and control components mounted within the body and configured to move the process head relative to the body. The lift and rotate assembly in one embodiment is positionable in a forward, operating position with the body adjacent to the frame, and in a tilted, service position with the body tilted away from the frame.

摘要翻译： 用于工件加工台的升降和旋转组件。 提升和旋转组件包括具有细长轮廓的主体和位于相对侧上的销，用于将组件安装到工具框架上。 提升和旋转组件可拆卸地枢转地安装到框架的暴露的外表面。 提升和旋转组件具有主体，可移动地连接到主体的过程头，以及安装在主体内并被配置为相对于主体移动过程头的控制部件。 一个实施例中的提升和旋转组件可定位在身体相邻于框架的向前的操作位置中，并且在倾斜的使用位置，其中身体从框架倾斜。

公开(公告)号：US06440178B1

公开(公告)日：2002-08-27

申请号：US09810192

申请日：2001-03-16

申请人： Robert W. Berner ,  Daniel J. Woodruff ,  Wayne J. Schmidt ,  Kevin W. Coyle ,  Vladimir Zila ,  Worm Lund

发明人： Robert W. Berner ,  Daniel J. Woodruff ,  Wayne J. Schmidt ,  Kevin W. Coyle ,  Vladimir Zila ,  Worm Lund

IPC分类号： H01L2100

摘要： The present invention provides for a semiconductor workpiece processing tool and methods for handling semiconductor workpiece therein. The semiconductor workpiece processing tool preferably includes an interface section comprising at least one interface module and a processing section comprising a plurality of processing modules for processing the semiconductor workpieces. The semiconductor workpiece processing tool may have a conveyor for transferring the semiconductor workpieces between the interface modules and the processing modules.

公开(公告)号：US5867344A

公开(公告)日：1999-02-02

申请号：US917807

申请日：1997-08-27

申请人： John F. Ellis ,  Daniel W. Hoekstra ,  Daniel J. Woodruff

发明人： John F. Ellis ,  Daniel W. Hoekstra ,  Daniel J. Woodruff

IPC分类号： G11B15/68 ,  G11B17/24

CPC分类号： G11B15/683

摘要： An automated cartridge handling system or library (20, 20') for storing cartridges (22) of information storage media comprises a cartridge holder (26); a tape drive (30) movably mounted with respect to the cartridge holder; and, a transport system (40) for transporting the tape drive (30) in a drive transport path (42) between a unloaded position and a cartridge loaded position. The cartridges (22) remain stationary in the library while the tape drive is transported between the unloaded position and the cartridge loaded position. The cartridge holder library has a plurality of apertures (70) which receive cartridge holders or spines (80). To retain the cartridge (22) within the spine, each spine has resilient cartridge retaining fingers (100) formed in its interior cavity (90) for engaging a notch (104) on the cartridge. Each spine is provided with stabilization flanges (112) for stabilizing the cartridge. Each spine has asymmetrical orientation flanges (116) so that the cartridge-laden spine can be inserted into the library only in an up-right orientation.

摘要翻译： 用于存储信息存储介质的盒（22）的自动化盒式磁带处理系统或库（20,20'）包括盒保持器（26）; 相对于盒保持器可移动地安装的磁带驱动器（30）; 以及传送系统（40），用于在无负载位置和盒装载位置之间的驱动传送路径（42）中传送带驱动器（30）。 当磁带驱动器在卸载位置和盒装载位置之间传送时，盒（22）保持静止在库中。 墨盒支架库具有多个孔（70），其容纳墨盒保持器或刺（80）。 为了将筒（22）保持在脊柱内，每个脊具有形成在其内部空腔（90）中的弹性筒保持指（100），用于接合盒上的凹口（104）。 每个脊都设有用于稳定盒的稳定凸缘（112）。 每个脊柱具有不对称的取向凸缘（116），使得装满筒的脊柱只能以右上方向插入图书馆。