公开(公告)号：US4719491A

公开(公告)日：1988-01-12

申请号：US13425

申请日：1987-02-11

申请人： Eiichi Katoh ,  Hiroshi Yasuda

发明人： Eiichi Katoh ,  Hiroshi Yasuda

IPC分类号： G03G21/14 ,  G03G15/00 ,  G03G15/04 ,  G03G15/043 ,  G03G15/06 ,  G03G15/09 ,  H02K7/10

CPC分类号： G03G15/757 ,  G03G15/0935

摘要： A copier includes one motor for driving a photoconductive element unit, a developing unit, a fixing unit and other units, and another motor for driving an optical system. A clutch is interposed between the various units and the motor adapted to drive them. A device is provided for uncoupling the clutch for a predetermined period of time to interrupt the transmission of a drive force to the various units. The motor assigned to the units, clutch and drive force interrupting device are controlled such that the drive force interrupting device maintains the clutch uncoupled until the motor reaches a predetermined synchronous rotation speed after the start of rotation so as to interrupt the transmission of the drive force to the load, the clutch being coupled upon the lapse of the predetermined period of time to drive the load.

摘要翻译： 复印机包括用于驱动光电元件单元，显影单元，定影单元和其它单元的一个电动机和用于驱动光学系统的另一个电动机。 离合器插入在各个单元之间并且电动机适于驱动它们。 提供了一种用于使离合器分离预定时间段的装置，以中断向各种单元的驱动力的传递。 分配给单元的电动机，离合器和驱动力中断装置被控制，使得驱动力中断装置保持离合器分离直到电动机在旋转开始之后达到预定的同步转速，以便中断驱动力的传递 对于负载，离合器在经过预定时间段时被耦合以驱动负载。

公开(公告)号：US4586141A

公开(公告)日：1986-04-29

申请号：US536322

申请日：1983-09-27

申请人： Hiroshi Yasuda ,  Haruo Tsuchikawa ,  Junichi Kai ,  Koichi Kobayashi

发明人： Hiroshi Yasuda ,  Haruo Tsuchikawa ,  Junichi Kai ,  Koichi Kobayashi

IPC分类号： H01J37/305 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  G06F15/62

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01L21/30 ,  H01J2237/31764 ,  H01J2237/31776

摘要： An electron beam exposure system and method which varies beam size from pattern to pattern corresponding to the accuracy required for each pattern. In order to improve the throughput of the exposer, the beam size is adjusted to the maximum size useable for each pattern. The pattern is divided into rectangles equal to the maximum beam size determined by the pattern size or the accuracy required for the pattern. If a residual part of the pattern smaller than a rectangle remains, the rectangles are adjusted to be smaller than the maximum beam size, so the entire area of the pattern can be divided into equal size rectangles. The pitch and size of the beam are adjusted to this new beam size and exposure is repeated according to the new size rectangles. To increase the processing speed, all the patterns to be exposed in one process are checked as to their size and required accuracy, and the data necessary for the pattern generation such as beam size, pitch and number of exposures are calculated in advance and stored in a memory of a beam controller.

摘要翻译： 一种电子束曝光系统和方法，其根据每种图案所需的精度将光束尺寸从图案变化到图案。 为了提高曝光机的吞吐量，将光束尺寸调整到每个图案可用的最大尺寸。 该图案被分成等于由图案尺寸或图案所需精度确定的最大光束尺寸的矩形。 如果小于矩形的图案的剩余部分保留，则矩形被调整为小于最大光束尺寸，因此图案的整个区域可以被划分成相等尺寸的矩形。 光束的间距和尺寸被调整到这个新的光束尺寸，并且根据新的尺寸矩形重复曝光。 为了提高处理速度，将检查在一个处理中暴露的所有图案的尺寸和所需的精度，并且预先计算诸如光束尺寸，间距和曝光次数的图案生成所需的数据并存储在 光束控制器的存储器。

公开(公告)号：US4585943A

公开(公告)日：1986-04-29

申请号：US502571

申请日：1983-06-09

申请人： Hiroshi Yasuda ,  Haruo Tsuchikawa

发明人： Hiroshi Yasuda ,  Haruo Tsuchikawa

IPC分类号： H01L21/027 ,  H01J37/304 ,  H01J37/317 ,  H01L21/30 ,  H01J37/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01L21/30 ,  H01J2237/0209 ,  H01J2237/15 ,  H01J2237/3045 ,  H01J2237/30455

摘要： An electron beam exposure apparatus having a control apparatus wherein the positioning error caused by transient response characteristics of an electron beam deflection device is detected by using a knife-edge type gauge and a reflecting electron detector. A compensation signal to compensate for the positioning error is produced in a compensation device, and the compensation signal is applied to the electron beam deflection device, whereby the deviation of the position of the electron beam, from the normal position, caused by the transient response characteristics, is reduced.

摘要翻译： 一种具有控制装置的电子束曝光装置，其中通过使用刀刃式量规和反射电子检测器来检测由电子束偏转装置的瞬态响应特性引起的定位误差。 在补偿装置中产生用于补偿定位误差的补偿信号，并且补偿信号被施加到电子束偏转装置，由此由瞬态响应引起的电子束与正常位置的位置的偏离 特点，减少。

公开(公告)号：US4545942A

公开(公告)日：1985-10-08

申请号：US597817

申请日：1984-04-09

申请人： Mitsuo Nagano ,  Koichi Hirai ,  Kouichi Kitamura ,  Kenkichi Shinkai ,  Hiroshi Yasuda

发明人： Mitsuo Nagano ,  Koichi Hirai ,  Kouichi Kitamura ,  Kenkichi Shinkai ,  Hiroshi Yasuda

IPC分类号： A61K31/275 ,  A61K20060101 ,  A61K31/165 ,  A61K31/19 ,  A61K31/195 ,  A61K31/215 ,  A61P35/00 ,  A61P37/04 ,  C07C20060101 ,  C07C67/00 ,  C07C253/00 ,  C07C255/24 ,  C07C255/26 ,  C07C255/29 ,  C07C255/32 ,  C07C255/44 ,  C07C255/56 ,  C07C255/66 ,  C07D317/68 ,  C07C121/78

CPC分类号： C07C255/00

摘要： New compounds useful as immunoregulatory and antineoplastic agents are amino-acid derivatives of formula: ##STR1## wherein: n is an integer from 1 to 5;R.sup.1 is a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom, a mercapto group, an alkylmercapto group, a hydroxy group, an alkoxy group, an acyloxy group, a carboxyl group, an alkoxycarbonyl group, an amino group, an alkyl-substituted amino group, an aryl-substituted amino group, an acylamino group, a haloalkoxycarbonylamino group, an alkanesulphonyl group, a nitro group or a cyano group (and, when n is an integer from 2 to 5, the radicals R.sup.1 may be the same or different);R.sup.2 and R.sup.3 may be the same or different and each is a hydrogen atom or an alkyl group;R.sup.4 is a hydrogen atom, an alkyl group, a cyano group, a cyanoalkyl group, a hydroxyalkyl group, an alkoxycarbonyl group, a carboxyl group, an aryl group, an aralkyl group, a mercaptoalkyl group, an alkylthioalkyl group, or a thioalkyl group (the free bond of the sulphur in said thioalkyl group being joined to the sulphur of another moiety of the same formula); andA is a hydroxy group, an alkoxy group, an amino group, an alkyl-substituted amino group (optionally halogen- or carbamoyl- substituted in the alkyl moiety), a hydrazino group, an alkyl- or aryl- substituted hydrazino group, a hydroxylamino group, an alkoxyamino group or an aralkyloxyamino group;and the pharmaceutically acceptable salts thereof.

摘要翻译： 可用作免疫调节和抗肿瘤剂的新化合物是下式的氨基酸衍生物：其中：n是1至5的整数; R1是氢原子，烷基，卤代烷基，卤素原子，巯基，烷基巯基，羟基，烷氧基，酰氧基，羧基，烷氧基羰基，氨基， 烷基取代的氨基，芳基取代的氨基，酰氨基，卤代烷氧基羰基氨基，链烷磺酰基，硝基或氰基（当n为2至5的整数时，基团R 1可以 相同或不同）; R2和R3可以相同或不同，各自为氢原子或烷基; R4是氢原子，烷基，氰基，氰基烷基，羟基烷基，烷氧基羰基，羧基，芳基，芳烷基，巯基烷基，烷硫基烷基或硫代烷基 （所述硫代烷基中的硫的游离键与相同式的另一部分的硫连接）; 并且A是羟基，烷氧基，氨基，烷基取代的氨基（在烷基部分中任选被卤素取代或氨基甲酰基取代），肼基，烷基或芳基取代的肼基， 羟基氨基，烷氧基氨基或芳烷氧基氨基; 及其药学上可接受的盐。

公开(公告)号：US4487795A

公开(公告)日：1984-12-11

申请号：US363857

申请日：1982-03-31

申请人： Hiroshi Yasuda ,  Yasutaka Ban

发明人： Hiroshi Yasuda ,  Yasutaka Ban

IPC分类号： H01L21/3213 ,  H01L21/027 ,  H01L21/30 ,  H01L21/768 ,  H01L23/528 ,  B32B3/24 ,  G03C5/00

CPC分类号： H01L21/30 ,  H01L21/0277 ,  H01L21/76885 ,  H01L23/5283 ,  H01L2924/0002 ,  Y10S428/901 ,  Y10T428/24331 ,  Y10T428/24802 ,  Y10T428/24917

摘要： A conductor pattern consisting of conductor lines is formed in an electronic device by an electron-beam lithography process using a positive resist. After the formation of a positive resist layer on a conductive layer, a linear pattern of latent images is formed by exposure of an electron-beam along the contours of the conductor lines to be formed. The positive resist layer is developed and then serves as a mask against an etchant. The conductive layer is selectively etched to divide it into the patterned conductor lines and remaining conductor portions.

摘要翻译： 通过使用正性抗蚀剂的电子束光刻工艺在电子器件中形成由导体线组成的导体图案。 在导电层上形成正的抗蚀剂层之后，通过沿着要形成的导体线的轮廓电子束的曝光来形成潜像的线性图案。 显影正性抗蚀剂层，然后作为抵抗蚀刻剂的掩模。 选择性地蚀刻导电层以将其分成图案化的导体线和剩余的导体部分。

公开(公告)号：US4362942A

公开(公告)日：1982-12-07

申请号：US213681

申请日：1980-12-05

申请人： Hiroshi Yasuda

发明人： Hiroshi Yasuda

IPC分类号： H01L21/027 ,  H01J37/147 ,  H01J37/153 ,  H01J37/302 ,  H01J37/304 ,  H01J37/00 ,  H01J3/26

CPC分类号： H01J37/302 ,  H01J37/1475 ,  H01J37/153 ,  H01J37/304

摘要： An electron beam exposure system for projecting an electron beam onto a medium placed on a continuously moving stage, comprises a correction memory storing correction data for at least one of a field curvature, an astigmatism, and a distortion which changes in accordance with a deflection amount of the electron beam. An amount of actual deflection of the electron beam is obtained from the difference between a position data of the medium and the beam deflection position data with the electron beam then being controlled by the corresponding correction data read from the correction memory according to the amount of beam deflection.

摘要翻译： 一种用于将电子束投影到放置在连续移动台上的介质上的电子束曝光系统，包括校正存储器，其存储校正数据，用于根据偏转量而变化的场曲率，像散和失真中的至少一个 的电子束。 根据介质的位置数据和光束偏转位置数据之间的差异，电子束的实际偏转量由电子束然后由根据光束的量从校正存储器读取的对应的校正数据来控制 偏转。

公开(公告)号：US4076783A

公开(公告)日：1978-02-28

申请号：US532466

申请日：1974-12-13

申请人： Hiroshi Yasuda ,  Susumu Omori

发明人： Hiroshi Yasuda ,  Susumu Omori

IPC分类号： D01F6/84 ,  C08G63/688 ,  D01F6/62 ,  D06P5/22 ,  D01F1/04

CPC分类号： C08G63/6886 ,  D01F6/84 ,  Y10S8/922

摘要： A method for producing polyester fibers having excellent dyeability with basic dyes or disperse dyes, which comprises melt-spinning a polyester comprising predominantly (at least 80% by mol) repeating units of ethylene terephthalate and containing 0.5% by mol or more, preferably 1.5 to 5% by mol of an ester unit derived from a dicarboxylic acid or diol containing at least one metal sulfonate group under the condition of being highly oriented so as to give filaments having a birefringence (.DELTA.n) of 0.015 to 0.100 and drawing the resulting filaments at a fixed temperature and in a fixed draw ratio, and the polyester fibers which can be dyed with basic dyes or disperse dyes at a temperature of less than 100.degree. C at a sufficiently high dye adsorption rate to give dyed fibers.

摘要翻译： 一种生产与碱性染料或分散染料具有优异染色性的聚酯纤维的方法，其包括熔融纺丝主要包含（至少80摩尔％）对苯二甲酸乙二醇酯的重复单元和含有0.5摩尔％以上，优选1.5至1.5重量％ 在高度取向的条件下，衍生自含有至少一种金属磺酸盐基团的二羧酸或二醇的酯单元为5摩尔％，得到双折射（DELTA n）为0.015〜0.100的长丝，并将所得长丝 在固定的温度和固定的拉伸比下，可以用足够高的染料吸附速率在低于100℃的温度下用碱性染料或分散染料染色的聚酯纤维，得到染色的纤维。

公开(公告)号：US08012842B2

公开(公告)日：2011-09-06

申请号：US12137817

申请日：2008-06-12

申请人： Scott Balster ,  Badih El-Kareh ,  Hiroshi Yasuda

发明人： Scott Balster ,  Badih El-Kareh ,  Hiroshi Yasuda

IPC分类号： H01L21/331

CPC分类号： H01L27/0623 ,  H01L21/82285 ,  H01L21/8249 ,  H01L21/84 ,  H01L27/0826 ,  H01L27/1203

摘要： An integrated semiconductor structure that has first and second bipolar transistor structures. The first bipolar transistor structure has a doped tank region in contact with a doped tank region located underneath a contacting sinker. The second bipolar transistor structure has a doped buried region that is the same dopant type as its doped tank region. A method for fabricating an integrated semiconductor structure in a bulk semiconductor wafer. A first patterned photomask is used to form a doped buried region and a doped tank region within the first bipolar transistor structure. A second patterned photomask is used to form a doped buried region and a doped tank region within the second bipolar transistor, plus a doped buried region and a doped tank region underneath a contacting sinker adjacent to the first bipolar transistor.

摘要翻译： 具有第一和第二双极晶体管结构的集成半导体结构。 第一双极晶体管结构具有与位于接触沉降片下方的掺杂槽区接触的掺杂槽区。 第二双极晶体管结构具有与其掺杂槽区相同的掺杂剂类型的掺杂掩埋区。 一种用于在体半导体晶片中制造集成半导体结构的方法。 第一图案化光掩模用于在第一双极晶体管结构内形成掺杂掩埋区和掺杂槽区。 第二图案化光掩模用于在第二双极晶体管内形成掺杂掩埋区和掺杂槽区，加上与第一双极晶体管相邻的接触沉积片下方的掺杂掩埋区和掺杂槽区。

公开(公告)号：US20110172421A1

公开(公告)日：2011-07-14

申请号：US13121048

申请日：2009-10-01

申请人： Isao Yamagami ,  Yoshihiko Maeda ,  Hiroshi Yasuda ,  Katsumi Murofushi

发明人： Isao Yamagami ,  Yoshihiko Maeda ,  Hiroshi Yasuda ,  Katsumi Murofushi

IPC分类号： C07D265/30 ,  C07C269/00 ,  C07D211/06 ,  C07C271/06

CPC分类号： C07D295/205 ,  C07C269/00 ,  C07C269/02 ,  C07C271/24 ,  C07D211/06 ,  C07D211/16 ,  C07D317/52 ,  C07D317/62

摘要： An object of the present invention is to provide a novel photobase generator which can sensitively generate a base even by h-ray in place of a conventional 2-nitro-4,5-dimethoxybenzyloxycarbonylamine compound. Disclosed is an N-(α-aromatic group-substituted-2-nitro-4,5-dialkoxybenzyloxycarbonyl)amine compound represented by the following general formula (I). (In the above formula (I), R1 to R9 denote specific groups.)

摘要翻译： 本发明的目的是提供一种新的光碱产生剂，其可以通过h射线代替常规的2-硝基-4,​​5-二甲氧基苄氧羰基胺化合物敏感地产生碱。 公开了由以下通式（I）表示的N-（α-芳族基团取代-2-硝基-4,​​5-二烷氧基苄氧基羰基）胺化合物。 （上式（I）中，R 1〜R 9表示具体的基团。）

公开(公告)号：US07947876B2

公开(公告)日：2011-05-24

申请号：US11662650

申请日：2004-09-14

申请人： Koichi Sugita ,  Saori Kasahara ,  Hiroyasu Ebinuma ,  Humio Takaiwa ,  Hiroshi Yasuda ,  Takahito Jomori ,  Yuji Hayashi ,  Akira Tashita

发明人： Koichi Sugita ,  Saori Kasahara ,  Hiroyasu Ebinuma ,  Humio Takaiwa ,  Hiroshi Yasuda ,  Takahito Jomori ,  Yuji Hayashi ,  Akira Tashita

IPC分类号： A01H5/00 ,  C12N15/82

CPC分类号： A61K38/26 ,  A23L33/105 ,  C12N15/8257

摘要： The present invention is regarding plants and plant storage organs thereof in which GLP-1 derivatives are accumulated, and methods of producing them. The transgenic plants and plant storage organs thereof accumulate tandem repeated GLP-1 derivatives cleavable with intestinal digestive enzyme to monomeric molecules and are produced by methods comprising: integrating into vectors linked DNAs which comprise tandem repeated DNAs encoding the GLP-1 derivative with trypsin resistance in which the amino acid in the 26th position is Gln, the amino acid in the 34th position is Asn or Asp, and C-terminal consists of Arg or Lys to produce monomeric molecules; introducing the vectors into plant cells; and redifferentiating the obtained transformants. The edible transgenic plants and plant storage organs are useful for treating diabetes and can be ingested by diabetic patients.

摘要翻译： 本发明涉及其中积累GLP-1衍生物的植物和植物贮藏器官及其生产方法。 其转基因植物和植物储存器官将可与肠消化酶切割的串联重复的GLP-1衍生物积聚到单体分子中，并通过以下方法产生：包括：将包含编码GLP-1衍生物的串联重复DNA与胰蛋白酶抗性的连锁DNA连接 其中第26位的氨基酸是Gln，第34位的氨基酸是Asn或Asp，C末端由Arg或Lys组成以产生单体分子; 将载体导入植物细胞; 并重新分化获得的转化体。 可食用的转基因植物和植物贮藏器官可用于治疗糖尿病并可被糖尿病患者摄入。