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70 条记录 (耗时 0.03 秒)

    Adjusting apparatus for an optical element in a lens system
    41.
    发明授权
    Adjusting apparatus for an optical element in a lens system 有权

    公开(公告)号：US06594093B2

    公开(公告)日：2003-07-15

    申请号：US10039841

    申请日：2002-01-03

    申请人： Timo Moeller ,  Bernhard Gellrich

    发明人： Timo Moeller ,  Bernhard Gellrich

    IPC分类号： G02B702

    CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

    摘要： In the case of an adjusting apparatus for an optical element in a lens system, in particular a lens in a projection lens system for semiconductor lithography, for producing tilting movements, having at least one actuator, the optical element is connected via elastic connecting members, directly or indirectly via an inner mount, to an outer mount. The elastic connecting members or the at least one actuator are/is provided in each case with bearing bridges which have bearing locations for a connection to the optical element or to the inner mount, and bridge arms which are connected to the bearing locations. The bridge arms are provided with piezoceramic elements in plate or sheet form which undergo changes in length upon activation. The piezoceramic elements of the various bearing bridges can be activated individually or together.

    Method of straightening the supporting surfaces of supporting elements for optical elements
    42.
    发明授权
    Method of straightening the supporting surfaces of supporting elements for optical elements 失效
    矫正用于光学元件的支撑元件的支撑表面的方法

    公开(公告)号：US06366413B1

    公开(公告)日：2002-04-02

    申请号：US09692256

    申请日：2000-10-19

    申请人： Michael Trunz ,  Bernhard Gellrich

    发明人： Michael Trunz ,  Bernhard Gellrich

    IPC分类号： G02B702

    CPC分类号： G03F7/70241 ,  G02B7/026 ,  G03F7/70825

    摘要： In a method of straightening the supporting surfaces (5) of supporting elements (3) for optical elements (1), in particular in lens systems of microlithography projection exposure equipment, the supporting elements (3) and/or at least one bearing part (2, 6) connected to the supporting elements (3) for the optical elements (1) are deformed by a laser beam (A, B, C, D) produced by a laser (7) in such a way that the supporting surfaces (5) are at least approximately aligned with a common supporting plane or some other prescribed distribution.

    摘要翻译： 在用于矫正用于光学元件（1）的支撑元件（3）的支撑表面（5）的方法中，特别是在微光刻投影曝光设备的透镜系统中，支撑元件（3）和/或至少一个轴承部件 连接到用于光学元件（1）的支撑元件（3）的光束（2,6）通过由激光器（7）产生的激光束（A，B，C，D）变形，使得支撑表面 5）至少大致与公共支撑平面或某些其他规定分布对准。

    Optical imaging device and method for reducing dynamic fluctuations in pressure difference
    46.
    发明授权
    Optical imaging device and method for reducing dynamic fluctuations in pressure difference 有权
    光学成像装置和降低压差动态波动的方法

    公开(公告)号：US08027023B2

    公开(公告)日：2011-09-27

    申请号：US11985884

    申请日：2007-11-19

    申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

    发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/68 ,  G03B27/60

    CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

    摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

    摘要翻译： 提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1） 光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。 提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

    OPTICAL SYSTEM FOR MICROLITHOGRAPHY
    47.
    发明申请
    OPTICAL SYSTEM FOR MICROLITHOGRAPHY 有权
    用于微光学的光学系统

    公开(公告)号：US20110069295A1

    公开(公告)日：2011-03-24

    申请号：US12993540

    申请日：2009-04-07

    申请人： Daniel Kraehmer ,  Wilhelm Ulrich ,  Matthias Manger ,  Bernhard Gellrich

    发明人： Daniel Kraehmer ,  Wilhelm Ulrich ,  Matthias Manger ,  Bernhard Gellrich

    IPC分类号： G03B27/54 ,  G02B13/18

    CPC分类号： G03F7/70308

    摘要： An optical system (10), in particular a projection objective (12), for microlithography, has an optical axis and at least one optical correction arrangement (44), which has a first optical correction element (48) and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement (44) has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.

    摘要翻译： 用于微光刻的光学系统（10），特别是投影物镜（12）具有光轴和至少一个光学校正装置（44），其具有第一光学校正元件（48）和至少一个第二光学校正元件 校正元件，其中所述第一校正元件设置有第一非球面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零， 其中所述校正装置（44）具有用于所述两个校正元件中的至少一个的移动的至少一个驱动器。 在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器 旋转轴。

    Optical Projection System
    48.
    发明申请
    Optical Projection System 有权
    光学投影系统

    公开(公告)号：US20090174874A1

    公开(公告)日：2009-07-09

    申请号：US11664896

    申请日：2005-10-01

    申请人： Johannes Rau ,  Armin Schoeppach ,  Bernhard Gellrich ,  Jens Kugler ,  Martin Mahlmann ,  Bernhard Geuppert ,  Thomas Petasch ,  Gerhard Fuerter

    发明人： Johannes Rau ,  Armin Schoeppach ,  Bernhard Gellrich ,  Jens Kugler ,  Martin Mahlmann ,  Bernhard Geuppert ,  Thomas Petasch ,  Gerhard Fuerter

    IPC分类号： G03B27/54 ,  G03B27/62

    CPC分类号： G03F7/7015 ,  G02B7/00 ,  G02B7/008 ,  G02B7/021 ,  G02B7/028 ,  G02B7/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70883

    摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.

    摘要翻译： 提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。 第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。 所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。 第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。 第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。 此外，第一壳体轴线与第二光轴基本共线。

    Optical element with an optical axis
    50.
    发明授权
    Optical element with an optical axis 失效
    具有光轴的光学元件

    公开(公告)号：US07295331B2

    公开(公告)日：2007-11-13

    申请号：US10489030

    申请日：2002-10-18

    申请人： Thomas Petasch ,  Hartmut Muenker ,  Bernhard Gellrich

    发明人： Thomas Petasch ,  Hartmut Muenker ,  Bernhard Gellrich

    IPC分类号： G02B5/08

    CPC分类号： G03F7/70266 ,  G02B7/005 ,  G03F7/70258 ,  G03F7/70825

    摘要： The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2′) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2′) is designed to apply a force in said extension (2, 2′).

    摘要翻译： 本发明涉及具有光轴（3）的光学元件（1），其特别设计用于半导体光刻中使用的曝光透镜。 所述光学元件在光轴（3）的方向上至少包括延伸部（2,2'）。 装置（11）能够在所述光学元件（1）中引起双波或多波变形。 安装在延伸区域（2,2'）中的至少一个系统（12）被设计成在所述延伸部（2,2'）中施加力。