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公开(公告)号：US5115278A
公开(公告)日：1992-05-19
申请号：US542018
申请日：1990-06-22
IPC分类号： G03G15/20
CPC分类号： G03G15/2064
摘要： A heating apparatus for heating a visualized image on a recording material includes a stationary heater; a film in sliding contact with the heater, wherein the recording material has a visualized image which is heated through the film by heat from the heater; wherein the film comprises plural layers each having a volume resistivity of not more than 10.sup.11 ohm.cm; and a device for maintaining a potential of one of the layers contactable with the film substantially at a predetermined level.
摘要翻译： 用于加热记录材料上的可视化图像的加热装置包括固定加热器; 与加热器滑动接触的薄膜，其中记录材料具有通过来自加热器的热量通过薄膜加热的可视化图像; 其中所述膜包括多个体积电阻率不大于1011欧姆·厘米的层; 以及用于保持与膜接触的一个层的电位基本上保持在预定水平的装置。
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42.发明授权Image forming apparatus having a heater in contact with a film to fix a toner image 失效图像形成装置具有与胶片接触的加热器以固定调色剂图像
公开(公告)号：US5043763A
公开(公告)日：1991-08-27
申请号：US409341
申请日：1989-09-19
申请人： Shokyo Koh , Yoshihiko Suzuki , Shigeo Kimura , Atsushi Hosoi , Masahide Kinoshita , Kensaku Kusaka , Hiroyuki Adachi
发明人： Shokyo Koh , Yoshihiko Suzuki , Shigeo Kimura , Atsushi Hosoi , Masahide Kinoshita , Kensaku Kusaka , Hiroyuki Adachi
IPC分类号： G03G15/20
CPC分类号： G03G15/2064 , G03G15/2039
摘要： An image fixing apparatus includes a heater which is fixed during an image fixing operation, a film for sliding movement of the heater, wherein a toner image on a recording material is heated by heat from the heater through the film, detecting means for detecting non-movement of the film, and power supply stopping means for stopping energization of the heater in response to an output of the detecting means.
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43.发明授权
公开(公告)号：US4468979A
公开(公告)日：1984-09-04
申请号：US262247
申请日：1981-05-11
申请人： Takashi Inagaki , Goroei Wakatsuki , Shigeo Kimura
发明人： Takashi Inagaki , Goroei Wakatsuki , Shigeo Kimura
IPC分类号： F16H37/02 , F16H57/027 , F16H57/05 , F16H57/02
CPC分类号： F16H57/0489 , F16H37/021 , F16H57/027 , F16H57/05 , Y10T74/2186
摘要： A breather passage is provided to perform breathing function for both two casings, one being a first casing housing therein a power-transmission means and the other being a second casing housing therein a gear-transmission mechanism. The breather passage is defined between interfacing surfaces of a main body and a cover those providing the second casing. A gasket is interposed between the main body and the cover so as to devide the breather passage into two passages. The breather passage has one end formed with a first breather hole opened to an atmosphere and the other end formed with a second breather hole opened to an interior of said second casing. The breather passage is further formed with a branch passage at the position rearward from said second breather hole to permit liquid communication between an interior of the first casing and the atmosphere.
摘要翻译： 一个通气通道用于对两个壳体进行呼吸功能，一个是在其中容纳动力传递装置的第一壳体，另一个是容纳齿轮传动机构的第二壳体。 通气通道限定在主体的接口表面和提供第二壳体的盖之间。 在主体和盖子之间插入垫圈，以将通气通道分成两个通道。 通气通道的一端形成有向大气开放的第一通气孔，另一端形成有向第二壳体的内部开口的第二通气孔。 通气通道在从所述第二通气孔的后方位置处进一步形成有分支通道，以允许第一壳体的内部与大气之间的液体连通。
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公开(公告)号：US4107385A
公开(公告)日：1978-08-15
申请号：US579471
申请日：1975-05-21
CPC分类号： G11B5/71 , Y10S428/90 , Y10T428/31507 , Y10T428/31511 , Y10T428/31565 , Y10T428/31587 , Y10T428/31591 , Y10T428/31609
摘要： A magnetic recording medium comprising a base, for example, of a non-magnetic plastic resin, and a magnetic layer coated on the base and composed of a binder with a magnetic powder dispersed therein, is provided with a friction-reducing additive in the magnetic layer constituted by a boron compound obtained by the esterification of boric acid with a polyhydric alcohol having vicinal hydroxyl groups, such as, glycerin. The amount of such boron compound is from 1 to 15, and preferably, from 4 to 10 parts by weight for each 100 parts by weight of the binder. The preferred boron compounds are those including mono- or di-esters of a fatty acid with or without ethylene oxide.
摘要翻译： 包括例如非磁性塑料树脂的基底和涂覆在基底上并由其中分散有磁性粉末的粘合剂组成的磁性层的磁记录介质在磁性材料中设置有减摩添加剂 由硼酸与具有相邻羟基的多元醇如甘油酯化得到的硼化合物构成的层。 这种硼化合物的量相对于100重量份的粘合剂为1〜15，优选为4〜10重量份。 优选的硼化合物是包括具有或不具有环氧乙烷的脂肪酸的单酯或二酯的硼化合物。
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公开(公告)号：US20130216956A1
公开(公告)日：2013-08-22
申请号：US13879125
申请日：2011-10-07
申请人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
CPC分类号： G03F7/0752 , C07F7/1804 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/165 , G03F7/20 , G03F7/30
摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
摘要翻译： 提供了在基材上形成单层或多层的组合物。 用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子 的烷基任选被氟原子取代]和有机溶剂。
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公开(公告)号：US20110311915A1
公开(公告)日：2011-12-22
申请号：US12817648
申请日：2010-06-17
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C4-20 fluoroalkylcarboxylic acid or a salt of the fluoroalkylcarboxylic acid (D); and a solvent (E). The polymer (A) includes a unit structure selected from unit structures of Formula (1), Formula (2), and Formula (3);
摘要翻译： 在光刻工艺中使用的抗蚀剂下层膜成膜组合物包括：含有具有羟基的单元结构的聚合物（A），具有羧基的单元结构或其组合; 具有至少两个乙烯基醚基团的交联性化合物（B） 光致酸发生器（C）; C4-20氟代烷基羧酸或氟烷基羧酸（D）的盐; 和溶剂（E）。 聚合物（A）包括选自式（1），式（2）和式（3）的单元结构的单元结构;
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公开(公告)号：US20100215281A1
公开(公告)日：2010-08-26
申请号：US12772507
申请日：2010-05-03
申请人： Kamen Kanev , Shigeo Kimura
发明人： Kamen Kanev , Shigeo Kimura
IPC分类号： G06K9/62
CPC分类号： G06T1/005 , G06K19/06037 , G06T2201/0051 , G06T2201/0065 , H04N19/17 , H04N19/20
摘要： Clustering-definition-based encoding schemes printed as a computer-oriented digital layer onto a physical surface whereby the surface functions as an interface enabling, via a simple image-acquisition device scanning a minimal field required to establish the clustering definition, the provision, to a suitable data processing and human-oriented display means, of feedback on the orientation of the image-acquisition device relative to the digital layer overall.
摘要翻译： 基于聚类定义的编码方案被打印为面向计算机的数字层到物理表面上，由此表面用作接口，使得能够经由简单的图像采集设备扫描建立聚类定义所需的最小场， 合适的数据处理和面向人的显示装置，对于整个图像采集装置相对于数字层的取向的反馈。
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48.发明申请公开(公告)号：US20080138744A1
公开(公告)日：2008-06-12
申请号：US11596391
申请日：2005-05-11
CPC分类号： G03F7/0392 , G03F7/091 , G03F7/095 , G03F7/11 , G03F7/168
摘要： There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.
摘要翻译： 提供了一种用于制造半导体器件的光刻中的抗反射涂层形成组合物和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层，以及通过使用 抗反射涂层形成组合物。 抗反射涂层形成组合物包含具有至少两个乙烯基醚基团的化合物，具有至少两个酚羟基或羧基的碱溶性化合物，光致酸产生剂和溶剂。
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49.发明申请Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography 有权含磺酸盐的防反射涂料组合物用于光刻公开(公告)号：US20080003524A1
公开(公告)日：2008-01-03
申请号：US11666080
申请日：2005-10-25
IPC分类号： G03F7/11 , C08G59/14 , H01L21/027
CPC分类号： G03F7/091 , C08G59/1433 , C08G59/1483 , C08G59/26 , C08G59/28 , Y10S438/952
摘要： There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
摘要翻译： 提供了一种用于光刻的抗反射涂层形成组合物，其包含高分子化合物，交联化合物，交联催化剂，磺酸盐化合物和溶剂。 由组合物得到的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，与光致抗蚀剂相比具有更高的干蚀刻速率，可以形成在下部没有基脚的光致抗蚀剂图案，并且可以用于 通过使用诸如ArF准分子激光束和F2准分子激光束等光的光刻工艺
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50.发明申请公开(公告)号：US20070004228A1
公开(公告)日：2007-01-04
申请号：US10569471
申请日：2004-08-27
IPC分类号： H01L21/31
CPC分类号： G03F7/091 , Y10S438/952
摘要： There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.
摘要翻译： 提供了用于光刻和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层的抗反射涂层形成组合物，以及通过使用抗反射涂层形成法形成光刻胶图案的方法 组成。 具体地，该组合物包含由四羧酸二酐化合物制得的聚酰胺酸和具有至少一个羧基的二胺化合物，具有至少两个环氧基的化合物和溶剂。
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