公开(公告)号：US10943838B2

公开(公告)日：2021-03-09

申请号：US16072657

申请日：2018-06-24

Applicant: KLA-TENCOR CORPORATION

Inventor： Choon Hoong Hoo ,  Fangren Ji ,  Amnon Manassen ,  Liran Yerushalmi ,  Antonio Mani ,  Allen Park ,  Stilian Pandev ,  Andrei Shchegrov ,  Jon Madsen

IPC: H01L21/00 ,  H01L21/66 ,  H01L23/544 ,  H01L21/67 ,  G06T7/00 ,  G03F7/20 ,  G06F30/39 ,  G06F119/18

Abstract: A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement. The conversion is by reference to an image parameter quantity derived from a reference image of a feature at the same predetermined manufacturing stage with known overlay (“OVL”). There is also disclosed a method of determining a device inspection recipe for use by an inspection tool comprising identifying device patterns as candidate device care areas that may be sensitive to OVL, deriving an OVL response for each identified pattern, correlating the OVL response with measured OVL, and selecting some or all of the device patterns as device care areas based on the correlation.

公开(公告)号：US10663281B2

公开(公告)日：2020-05-26

申请号：US15574294

申请日：2017-09-14

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill

IPC: G01B11/02 ,  G01B9/02 ,  G03F7/20 ,  G01B11/27

Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

公开(公告)号：US10533940B2

公开(公告)日：2020-01-14

申请号：US16188218

申请日：2018-11-12

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G01B11/00

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US10371626B2

公开(公告)日：2019-08-06

申请号：US15387180

申请日：2016-12-21

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Ohad Bachar

IPC: G01N21/25 ,  G01J3/10 ,  G01J3/12 ,  G03F7/20

Abstract: A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.

公开(公告)号：US20190107727A1

公开(公告)日：2019-04-11

申请号：US16138092

申请日：2018-09-21

Applicant: KLA-Tencor Corporation

Inventor： Dmitry Gorelik ,  Andrew V. Hill ,  Ohad Bachar ,  Amnon Manassen ,  Daria Negri

IPC: G02B27/14 ,  G02B27/10 ,  G02B27/09

Abstract: A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate. The reflective structures split incident light having wavelengths above the selected cutoff wavelength into a reflected beam formed from portions of the incident light reflected from the reflective structures and a transmitted beam formed from portions of the incident light transmitted through the substrate. A splitting ratio of a power of the reflected beam to a power of the transmitted beam is based on a ratio of surface area of the reflective surfaces to an area of the incident light on the substrate. Separation distances between neighboring reflective structures are smaller than the cutoff wavelength such that diffracted power of the incident light having wavelengths above the selected cutoff wavelength is maintained below a selected tolerance.

公开(公告)号：US20190094142A1

公开(公告)日：2019-03-28

申请号：US16188218

申请日：2018-11-12

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G01B11/00

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US10242290B2

公开(公告)日：2019-03-26

申请号：US14152562

申请日：2014-01-10

Applicant: KLA-Tencor Corporation

Inventor： Inna Tarshish-Shapir ,  Yoel Feler ,  Anat Marchelli ,  Berta Dinu ,  Vladimir Levinski ,  Boris Efraty ,  Nuriel Amir ,  Mark Ghinovker ,  Amnon Manassen ,  Sigalit Robinzon

IPC: G01R31/28 ,  G06K9/52 ,  G06T7/00 ,  H01L21/66 ,  G01N21/47

Abstract: Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.

公开(公告)号：US10048132B2

公开(公告)日：2018-08-14

申请号：US15222503

申请日：2016-07-28

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yuri Paskover ,  Yuval Lubashevsky

IPC: G01J4/04 ,  G01B11/27

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：US09958385B2

公开(公告)日：2018-05-01

申请号：US14581719

申请日：2014-12-23

Applicant: Kla-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US20180087900A1

公开(公告)日：2018-03-29

申请号：US15599881

申请日：2017-05-19

Applicant: KLA-Tencor Corporation

Inventor： Yuri Paskover ,  Amnon Manassen ,  Vladimir Levinski

IPC: G01B11/27 ,  G01N21/64 ,  G01B11/30 ,  G01N21/95

CPC classification number: G01B11/272 ,  G01B11/303 ,  G01B2210/56 ,  G01N21/6489 ,  G01N21/9501 ,  G03F7/70633

Abstract: Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.