公开(公告)号：US5422222A

公开(公告)日：1995-06-06

申请号：US250114

申请日：1994-05-26

申请人： Yuw Akaki ,  Junichi Higashi ,  Naozumi Iwasawa

发明人： Yuw Akaki ,  Junichi Higashi ,  Naozumi Iwasawa

IPC分类号： C09D5/44 ,  C09D133/04 ,  C09D133/14 ,  G03F7/022 ,  G03F7/023 ,  H05K3/00 ,  H05K3/06

CPC分类号： H05K3/0076 ,  C09D5/448 ,  G03F7/022 ,  G03F7/0233

摘要： A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of not more than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group,R.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, andA represents a carboxylic acid ester linkage, in a molecule and; or a photosensitive compound obtained by reacting a polyfunctional amino compound with o-benzoquinonediazidesulfonic acid chloride or o-naphthoquinonediazidesulfonic acid chloride, and (B) a water-soluble or water-dispersible resin having a salt-forming group.Said composition is suitable for forming a printed wiring photoresist by coating an electrically conductive material-clad laminated plate by electrodeposition to form a smooth film whose portion exposed to actinic rays such as ultraviolet light through a positive photomask can be washed away with a developing solution.

摘要翻译： 一种正型感光电沉积涂料组合物，其包含（A）分子量不大于6,000的光敏化合物，并含有至少一种由下式（I）表示的改性醌二叠氮化物单元，其中R1表示< 图像R 2表示氢原子，烷基，环烷基或烷基醚基，R 3表示亚烷基，亚环烷基或亚烷基醚基，A表示羧酸酯键， 或通过多官能氨基化合物与邻苯并二氮杂萘磺酰氯或邻萘醌二叠氮化物氯化物反应得到的光敏化合物，和（B）具有成盐基团的水溶性或水分散性树脂。 所述组合物适用于通过电沉积涂覆导电材料包覆的层压板来形成印刷布线光致抗蚀剂以形成其中通过正光掩模暴露于诸如紫外光的光化射线部分的部分可以用显影溶液冲洗掉的光滑膜。

公开(公告)号：US5370971A

公开(公告)日：1994-12-06

申请号：US968313

申请日：1992-10-29

申请人： Tetsuo Ogawa ,  Kenji Seko ,  Tetsu Maki ,  Naozumi Iwasawa

发明人： Tetsuo Ogawa ,  Kenji Seko ,  Tetsu Maki ,  Naozumi Iwasawa

IPC分类号： C08F299/02 ,  C08F290/00 ,  C08F299/08 ,  C08G59/14 ,  C08L83/04 ,  C09J163/00 ,  G03F7/027 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H05K3/06 ,  G03C1/725 ,  C08G59/18

CPC分类号： G03F7/0388 ,  C08G59/1433 ,  C09J163/00 ,  G03F7/038

摘要： A photopolymerizable composition comprising:(a) an aromatic epoxy resin derivative containing, per kilogram of the resin, 0.3 to 10 mole equivalents of a polymerizable unsaturated group and 0.1 to 3 mole equivalents of a specific aprotic onium salt-containing group,(b) a polysiloxane having a specific polysiloxane chain in a molecule, and containing 0.01 to 5 mole equivalents, per kilogram of the polysiloxane, of the aprotic onium salt-containing group, and(c) a photopolymerization initiator.Said photopolymerizable composition can form a resist film excellent in adhesion to a substrate, heat resistance, chemical resistance, impact resistance and solder plating property, and is suitable as a solder resist in particular.

摘要翻译： 一种可光聚合组合物，其包含：（a）每千克树脂含有0.3-10摩尔当量的可聚合不饱和基团和0.1-3摩尔当量的特定非质子含鎓盐基团的芳族环氧树脂衍生物，（b） 分子中具有特定聚硅氧烷链的聚硅氧烷，每千克聚硅氧烷含有0.01〜5摩尔当量的非质子性含盐盐基团，和（c）光聚合引发剂。 所述光聚合性组合物可以形成对基材的粘附性，耐热性，耐化学性，耐冲击性和焊料镀覆性优异的抗蚀剂膜，特别适合作为阻焊剂。

公开(公告)号：US5344740A

公开(公告)日：1994-09-06

申请号：US879101

申请日：1992-05-04

申请人： Naozumi Iwasawa ,  Junichi Higashi ,  Shinsuke Onishi

发明人： Naozumi Iwasawa ,  Junichi Higashi ,  Shinsuke Onishi

IPC分类号： G03F7/023 ,  C09D5/00 ,  C09D5/44 ,  C09D133/04 ,  C25D13/06 ,  G03F7/022 ,  H05K3/06 ,  G03F7/30

CPC分类号： G03F7/0226 ,  G03F7/023

摘要： A positive-type photosensitive electrodeposition coating composition comprising(A) a resin component containing in a molecule at least one unit selected from the group consisting of an ortho-benzoquinonediazidesulfone unit represented by the general formula ##STR1## an ortho-naphthoquinonediazidesulfone unit represented by the general formula ##STR2## as a photosensitive group, and an anion-forming group; and (B) at least one of the specified particular nitrogen-containing compounds. The composition is useful for the production of a circuit plate.

摘要翻译： 一种正型光敏电沉积涂料组合物，其包含（A）在分子中含有至少一个单元的树脂组分，所述单元选自由以下通式表示的邻苯醌二叠氮化物单元：邻苯并醌醌二叠氮化物单元 通式成型组; 和（B）至少一种特定的含氮化合物。 该组合物可用于生产电路板。

公开(公告)号：US5262242A

公开(公告)日：1993-11-16

申请号：US745527

申请日：1991-08-15

申请人： Takeshi Tomiyama ,  Sadaaki Hashimoto ,  Naozumi Iwasawa ,  Kazuhisa Koizumi

发明人： Takeshi Tomiyama ,  Sadaaki Hashimoto ,  Naozumi Iwasawa ,  Kazuhisa Koizumi

IPC分类号： B32B38/14 ,  C08J3/09 ,  C09D175/04 ,  B32B27/20 ,  B32B27/24 ,  B32B27/40

CPC分类号： B32B38/14 ,  C08J3/091 ,  C09D175/04 ,  C08J2375/06 ,  Y10T428/1424 ,  Y10T428/31551 ,  Y10T428/31554 ,  Y10T428/31565 ,  Y10T428/31573 ,  Y10T428/31591 ,  Y10T428/31855

摘要： A colored coating composition containing, as essential components,(I) a resin composition comprising at least one selected from a group consisting of a mixture of a polyol resin having a mean molecular weight of 1000 to 30,000 and hydroxyl group on backbone chain terminals with a polyisocyanate compound as a crosslinking agent and having a mean molecular weight of 400 or more, a mixture of acrylic resin with a vinyl chloride/vinyl acetate copolymer resin, and polyurethane resin;(II) a coloring material, and(III) an organic solvent; and a colored film comprising a colored coating layer formed by use of the colored coating composition and suitable for use in vacuum forming.

摘要翻译： 作为必要成分的着色涂料组合物含有（I）树脂组合物，该树脂组合物含有选自平均分子量为1000〜30,000的多元醇树脂与主链末端的羟基的混合物中的至少一种， 聚异氰酸酯化合物作为交联剂，平均分子量为400以上，丙烯酸树脂与氯乙烯/乙酸乙烯酯共聚物树脂的混合物和聚氨酯树脂; （II）着色材料，和（III）有机溶剂; 以及着色膜，其包含通过使用着色涂料组合物形成并适用于真空成型的着色涂层。

公开(公告)号：US5196487A

公开(公告)日：1993-03-23

申请号：US712279

申请日：1991-06-10

申请人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

发明人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

IPC分类号： C07F7/18 ,  C08F2/46 ,  C08F299/00 ,  C09D5/08 ,  C09D183/07 ,  C09D183/08

CPC分类号： C07F7/1836 ,  C08F299/00 ,  C09D183/08 ,  C09D5/08

摘要： A corrosion preventive resin having in the molecule at least one chelate forming group selected from among groups represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are each a hydrogen atom or alkyl having 1 to 8 carbon atoms, and groups represented by teh general formula ##STR2## wherein R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are the same or different and are each a hydrogen atom, alkyl having 1 to 8 carbon atoms or a group forming a bivalent o-phenylene group along with two carbon atoms attached thereto. A photopolymerizable composition which includes (a) a resin having in the molecule at least one mole of polymerizable double bond per 1000 g of the resin and having per molecule at least one chelate forming group selected from among the groups represented by formula (II) and formula (III), and (b) a photopolymerization initiator is also disclosed.

摘要翻译： 一种防腐树脂，其在分子中具有至少一种螯合形成基团，其选自由式（I）表示的基团，其中R 1和R 2相同或不同，各自为氢原子或具有1至8个碳原子的烷基 原子和由通式（II）表示的基团，其中R 3，R 4，R 5和R 6相同或不同，各自为氢原子，具有1至8个碳原子的烷基或形成二价o- 亚苯基以及与其连接的两个碳原子。 一种可光聚合组合物，其包含（a）分子中每1000克所述树脂具有至少1摩尔可聚合双键并且每分子具有选自式（II）表示的基团中的至少一种螯合形成基团和 式（III）和（b）光聚合引发剂也被公开。