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    SUPERCONDUCTING MAGNET AND MAGNETIC RESONANCE IMAGING APPARATUS USING THE SAME
    41.
    发明申请
    SUPERCONDUCTING MAGNET AND MAGNETIC RESONANCE IMAGING APPARATUS USING THE SAME 有权
    超导磁体和磁共振成像装置使用它

    公开(公告)号：US20070152789A1

    公开(公告)日：2007-07-05

    申请号：US11617765

    申请日：2006-12-29

    申请人： Hiroyuki Watanabe ,  Jun Kawamura ,  Tomoo Chiba ,  Miki Yamazaki ,  Teruhiro Takizawa

    发明人： Hiroyuki Watanabe ,  Jun Kawamura ,  Tomoo Chiba ,  Miki Yamazaki ,  Teruhiro Takizawa

    IPC分类号： H01F6/00

    CPC分类号： G01R33/3815 ,  G01R33/3806 ,  G01R33/421

    摘要： A superconducting magnet includes: first and second torus coolant containers substantially symmetrically, vertically arranged to have a space and a symmetrical plane therebetween for storing a coolant. Each of the first and second torus coolant containers includes therein a main coil bobbin with a main coil for generating a measurement magnetic field, a shield coil bobbin with a shield coil for generating a shielding magnetic field for suppressing outside leak of the measurement magnetic field, a plate member vertically reinforced at a plane thereof opposite to a plane thereof facing the symmetrical plane for supporting the shield coil bobbin and the main coil bobbin. The main coil bobbin is further supported by the shield coil bobbin, to cause the main coil to generate the measurement magnetic field having a substantially uniform magnetic field intensity at a middle region of the space. A magnetic resonance imaging apparatus using the superconducting magnet is also disclosed.

    摘要翻译： 超导磁体包括：第一和第二环形冷却剂容器，基本对称地垂直地布置成在其间具有用于存储冷却剂的空间和对称的平面。 第一和第二环面冷却剂容器中的每一个包括具有用于产生测量磁场的主线圈的主线圈架，具有用于产生用于抑制测量磁场的外部泄漏的屏蔽磁场的屏蔽线圈架的屏蔽线圈架， 在与面对对称平面的平面相对的平面上垂直加强的板构件，用于支撑屏蔽线圈架和主线圈架。 主线圈骨架由屏蔽线圈架线圈进一步支撑，使主线圈产生在该空间的中间区域具有大致均匀的磁场强度的测量磁场。 还公开了使用超导磁体的磁共振成像装置。

    Alphatic polymer having ketone group and ether bonding in its main chain, and resin composition
    42.
    发明申请
    Alphatic polymer having ketone group and ether bonding in its main chain, and resin composition 失效
    在其主链中具有酮基和醚键的Alphatic聚合物和树脂组合物

    公开(公告)号：US20060287470A1

    公开(公告)日：2006-12-21

    申请号：US10567907

    申请日：2004-04-30

    申请人： Taishi Shigematsu ,  Chikara Manabe ,  Masaki Hirakata ,  Kentaro Kishi ,  Miho Watanabe ,  Hiroyuki Watanabe

    发明人： Taishi Shigematsu ,  Chikara Manabe ,  Masaki Hirakata ,  Kentaro Kishi ,  Miho Watanabe ,  Hiroyuki Watanabe

    IPC分类号： C08G16/00

    CPC分类号： C08G65/34 ,  B82Y30/00 ,  C08G65/48 ,  C08K3/08

    摘要： The invention provides an aliphatic polymer having a ketone group and ether bonding in its main chain, characterized by comprising structural units represented by the Formula (1) and by the Formula (2). In the Formulae (1) and (2), Ra and Rb each independently represents a substituted or unsubstituted divalent aliphatic hydrocarbon group. Rc represents a substituted or unsubstituted divalent aliphatic hydrocarbon group having ether bonding in a terminal thereof, or a single bond. n1 represents an integer of 1 or more. n2 represents an integer of 0 or more. And, n1+n2 is in a range of 2 to 1000. The polymer preferably contains ether bonds and ketone groups in a ratio of 0.01 to 100. The polymer can be substantially comprised of a structural unit represented by the Formula (1) as a repeating unit. A resin composition containing as a component structural units represented by the Formula (1) is also provided. The resin composition may further comprise an electrically conductive powder.

    摘要翻译： 本发明提供了在其主链中具有酮基和醚键的脂族聚合物，其特征在于包括由式（1）和式（2）表示的结构单元。 在式（1）和（2）中，Ra和Rb各自独立地表示取代或未取代的二价脂族烃基。 Rc表示在其末端具有醚键的取代或未取代的二价脂族烃基或单键。 n1表示1以上的整数。 n2表示0以上的整数。 并且，n1 + n2在2〜1000的范围内。聚合物优选以0.01〜100的比例含有醚键和酮基。聚合物可以基本上由式（1）表示的结构单元作为 重复单位。 还提供了含有由式（1）表示的组分结构单元的树脂组合物。 树脂组合物还可以包含导电粉末。

    Active electronic device and electronic apparatus
    44.
    发明授权
    Active electronic device and electronic apparatus 有权
    有源电子设备和电子设备

    公开(公告)号：US07087921B2

    公开(公告)日：2006-08-08

    申请号：US10724192

    申请日：2003-12-01

    申请人： Kazunori Anazawa ,  Chikara Manabe ,  Hiroyuki Watanabe ,  Hirotsugu Kashimura ,  Masaaki Shimizu

    发明人： Kazunori Anazawa ,  Chikara Manabe ,  Hiroyuki Watanabe ,  Hirotsugu Kashimura ,  Masaaki Shimizu

    IPC分类号： H01L47/02

    CPC分类号： H01L51/0508 ,  B82Y10/00 ,  B82Y30/00 ,  G11C13/025 ,  H01L51/0048 ,  H01L51/0558

    摘要： To provide an active electronic device which is formed from a carbon nanotube and which excels in high frequency operation and an electronic apparatus using the active electronic device. Provided are the active electronic device including: a carbon nanotube (1); a first electrode (S) connected to one end of the carbon nanotube; a second electrode (D) connected to the other end of the carbon nanotube; and a third electrode (G) facing the carbon nanotube (1) to irradiate the carbon nanotube (1) with electromagnetic waves, in which the amount of current flowing into the carbon nanotube (1) is changed by electromagnetic waves, at least high frequency electromagnetic waves, radiated from the third electrode onto the carbon nanotube (1), and the electronic apparatus using the active electronic device.

    摘要翻译： 提供一种由碳纳米管形成并且在高频操作中优异的有源电子器件和使用该有源电子器件的电子设备。 提供的有源电子器件包括：碳纳米管（1）; 连接到所述碳纳米管的一端的第一电极（S） 与碳纳米管的另一端连接的第二电极（D）; 和面向碳纳米管（1）的第三电极（G），用电磁波照射碳纳米管（1），其中流入碳纳米管（1）的电流量由电磁波改变，至少高频 从第三电极辐射到碳纳米管（1）上的电磁波，以及使用有源电子器件的电子设备。

    Cerium-based abrasive material and abrasive material slurry, and method for producing cerium based abrasive material
    48.
    发明授权
    Cerium-based abrasive material and abrasive material slurry, and method for producing cerium based abrasive material 失效
    铈基研磨材料和研磨材料浆料，以及铈基研磨材料的制造方法

    公开(公告)号：US06946009B2

    公开(公告)日：2005-09-20

    申请号：US10467307

    申请日：2002-03-08

    申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

    发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

    IPC分类号： B24B37/00 ,  C09C1/68 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304

    CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C09K3/1463 ,  Y10T428/256 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： There is provided a cerium-based abrasive containing cerium oxide as a main component, in which the abrasive particles composing the abrasive are coated with a coating layer containing at least either one of a silicon component of silicon or a silicon compound and an aluminum component of aluminum or an aluminum compound. The cerium-based abrasive can be produced by wet-dispersing the cerium-based abrasive in a dispersion medium to obtain a slurry and carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry. Further, the cerium-based abrasive can be produced by carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry during the pulverization step or after the pulverization step in the conventional cerium-based abrasive production process and after that roasting and classifying the obtained cerium-based abrasive.

    摘要翻译： 提供了一种含有氧化铈作为主要成分的铈基研磨剂，其中构成研磨剂的磨料颗粒被涂覆有包含硅或硅化合物的硅成分中的至少一种的涂层和铝 铝或铝化合物。 铈系研磨剂可以通过将铈系研磨剂在分散介质中进行湿式分散而得到浆料，并通过将含有硅化合物和铝化合物中的至少一种的处理溶液添加至 泥浆。 此外，可以通过在粉碎步骤期间或在常规铈 - 铝合金中的粉碎步骤之后，将含有硅化合物和铝化合物中的至少一种的处理溶液添加到浆料中来进行表面处理来制备铈基研磨剂， 之后对所获得的铈基磨料进行焙烧和分级。

    Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive
    49.
    发明申请
    Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive 审中-公开
    铈基研磨剂，磨料浆料和铈基磨料的生产

    公开(公告)号：US20050198913A1

    公开(公告)日：2005-09-15

    申请号：US11121009

    申请日：2005-05-04

    申请人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

    发明人： Terunori Ito ,  Naoyoshi Mochizuki ,  Kazuya Ushiyama ,  Hiroyuki Watanabe

    IPC分类号： B24B37/00 ,  C09C1/68 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  B24D3/02

    CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1445 ,  C09K3/1463 ,  Y10T428/256 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： There is provided a cerium-based abrasive containing cerium oxide as a main component, in which the abrasive particles composing the abrasive are coated with a coating layer containing at least either one of a silicon component of silicon or a silicon compound and an aluminum component of aluminum or an aluminum compound. The cerium-based abrasive can be produced by wet-dispersing the cerium-based abrasive in a dispersion medium to obtain a slurry and carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry. Further, the cerium-based abrasive can be produced by carrying out surface treatment by adding a treatment solution containing at least either one of the silicon compound and the aluminum compound to the slurry during the pulverization step or after the pulverization step in the conventional cerium-based abrasive production process and after that roasting and classifying the obtained cerium-based abrasive.

    摘要翻译： 提供了一种含有氧化铈作为主要成分的铈基研磨剂，其中构成研磨剂的磨料颗粒被涂覆有包含硅或硅化合物的硅成分中的至少一种的涂层和铝 铝或铝化合物。 铈系研磨剂可以通过将铈系研磨剂在分散介质中进行湿式分散而得到浆料，并通过将含有硅化合物和铝化合物中的至少一种的处理溶液添加至 泥浆。 此外，可以通过在粉碎步骤期间或在常规铈 - 铝合金中的粉碎步骤之后，将含有硅化合物和铝化合物中的至少一种的处理溶液添加到浆料中来进行表面处理来制备铈基研磨剂， 之后对所获得的铈基磨料进行焙烧和分级。