Irradiation system with ion beam/charged particle beam
    42.
    发明授权
    Irradiation system with ion beam/charged particle beam 有权
    带离子束/带电粒子束的照射系统

    公开(公告)号:US07315034B2

    公开(公告)日:2008-01-01

    申请号:US11202101

    申请日:2005-08-12

    IPC分类号: H01J37/147

    摘要: In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.

    摘要翻译: 在具有能量过滤器的离子束/带电粒子束的照射系统中,能量过滤器由可以切换使用的偏转电极和偏转磁体形成。 偏转磁体具有通常的窗框形状,并且在其中心形成有中空部分。 偏转电极与抑制电极一起安装在布置在偏转磁体的中空部分中的真空室中。 偏转电极相对于偏转磁体安装,使得由电场引起的光束引起的光束的偏转轨迹和由电场引起的偏转轨迹彼此重叠。 由于可以切换使用偏转电极和偏转磁体,所以系统可以处理更宽范围的光束条件,因此可广泛使用。

    Wafer charge compensation device and ion implantation system having the same
    43.
    发明授权
    Wafer charge compensation device and ion implantation system having the same 有权
    晶圆电荷补偿装置和具有相同的离子注入系统

    公开(公告)号:US07304319B2

    公开(公告)日:2007-12-04

    申请号:US11151308

    申请日:2005-06-14

    IPC分类号: H01J37/317

    摘要: A charge compensation device according to this invention is for suppressing charging of a wafer when the wafer is irradiated with a beam from a beam generation source unit. The charge compensation device comprises at least one first arc chamber having at least one first extraction hole and a second arc chamber having at least one second extraction hole faced on the reciprocal swinging beam of the predetermined scan range. A first arc voltage is applied to the first arc chamber to generate first plasma in the first arc chamber. The generated first plasma is extracted from the first arc chamber and introduced into the second arc chamber. Second plasma is produced in the second arc chamber, and second extracted plasma from the second arc chamber forms a plasma bridge between the second extraction hole and the reciprocal swinging beam.

    摘要翻译: 根据本发明的电荷补偿装置用于当来自光束产生源单元的光束照射晶片时,用于抑制晶片的充电。 电荷补偿装置包括至少一个具有至少一个第一提取孔的第一弧形腔和具有面对预定扫描范围的往复摆动梁上的至少一个第二提取孔的第二弧形腔。 第一电弧电压被施加到第一电弧室以在第一电弧室中产生第一等离子体。 所产生的第一等离子体从第一电弧室提取并被引入第二电弧室。 在第二电弧室中产生第二等离子体,并且来自第二电弧室的第二提取等离子体在第二提取孔和往复摆动梁之间形成等离子体桥。

    Article acquistion game apparatus
    44.
    发明申请
    Article acquistion game apparatus 失效
    文章采集游戏机

    公开(公告)号:US20070126185A1

    公开(公告)日:2007-06-07

    申请号:US10581963

    申请日:2004-11-09

    IPC分类号: A63F9/30

    CPC分类号: A63F9/30 A63F9/305

    摘要: An article acquisition game apparatus includes a storage unit storing articles, and an article transferring unit enabling a player to hold the articles in the storage unit and transfer the articles to a predetermined transfer position when the player operates an operation input unit. The game apparatus comprises a distributing unit dividing the articles transferred to the transfer position into two or more groups, a first accumulation unit accumulating at least one group of the articles divided by the distributing unit, an article disbursement unit allowing the player to take out at least one group of the articles other than those accumulated by the first accumulation unit, an operating information generating unit generating operating information based on predetermined conditions, and an ejecting unit ejecting the articles accumulated by the first accumulation unit, to the article disbursement unit, based on the operating information.

    摘要翻译: 物品获取游戏装置包括存储物品的存储单元和使玩家能够将物品保持在存储单元中的物品传送单元,并且当玩家操作操作输入单元时将物品传送到预定的转移位置。 游戏装置包括:分配单元,将传送到转移位置的物品分成两组或更多组,第一累积单元,累积由分配单元划分的至少一组物品;物品支付单元,允许玩家取出 至少一组不同于第一累积单元累积的物品的组,基于预定条件产生运行信息的运行信息产生单元和将第一累积单元累积的物品弹出到物品支付单元的排出单元 关于操作信息。

    Wafer charge compensation device and ion implantation system having the same
    45.
    发明申请
    Wafer charge compensation device and ion implantation system having the same 有权
    晶圆电荷补偿装置和具有相同的离子注入系统

    公开(公告)号:US20060113492A1

    公开(公告)日:2006-06-01

    申请号:US11151308

    申请日:2005-06-14

    IPC分类号: H01J37/08

    摘要: A charge compensation device according to this invention is for suppressing charging of a wafer when the wafer is irradiated with a beam from a beam generation source unit. The charge compensation device comprises at least one first arc chamber having at least one first extraction hole and a second arc chamber having at least one second extraction hole faced on the reciprocal swinging beam of the predetermined scan range. A first arc voltage is applied to the first arc chamber to generate first plasma in the first arc chamber. The generated first plasma is extracted from the first arc chamber and introduced into the second arc chamber. Second plasma is produced in the second arc chamber, and second extracted plasma from the second arc chamber forms a plasma bridge between the second extraction hole and the reciprocal swinging beam.

    摘要翻译: 根据本发明的电荷补偿装置用于当来自光束产生源单元的光束照射晶片时,用于抑制晶片的充电。 电荷补偿装置包括至少一个具有至少一个第一提取孔的第一弧形腔和具有面对预定扫描范围的往复摆动梁上的至少一个第二提取孔的第二弧形腔。 第一电弧电压被施加到第一电弧室以在第一电弧室中产生第一等离子体。 所产生的第一等离子体从第一电弧室提取并被引入第二电弧室。 在第二电弧室中产生第二等离子体,并且来自第二电弧室的第二提取等离子体在第二提取孔和往复摆动梁之间形成等离子体桥。

    Irradiation system with ion beam/charged particle beam
    46.
    发明申请
    Irradiation system with ion beam/charged particle beam 有权
    带离子束/带电粒子束的照射系统

    公开(公告)号:US20060113467A1

    公开(公告)日:2006-06-01

    申请号:US11202101

    申请日:2005-08-12

    IPC分类号: B01D59/44

    摘要: In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.

    摘要翻译: 在具有能量过滤器的离子束/带电粒子束的照射系统中,能量过滤器由可以切换使用的偏转电极和偏转磁体形成。 偏转磁体具有通常的窗框形状,并且在其中心形成有中空部分。 偏转电极与抑制电极一起安装在布置在偏转磁体的中空部分中的真空室中。 偏转电极相对于偏转磁体安装,使得由电场引起的光束引起的光束的偏转轨迹和由电场引起的偏转轨迹彼此重叠。 由于可以切换使用偏转电极和偏转磁体,所以系统可以处理更宽范围的光束条件,因此可广泛使用。

    Vibration correction apparatus
    47.
    发明授权
    Vibration correction apparatus 失效
    振动校正装置

    公开(公告)号:US06734901B1

    公开(公告)日:2004-05-11

    申请号:US09082301

    申请日:1998-05-20

    IPC分类号: H04N5228

    摘要: A vibration correction apparatus has a motion vector detection circuit for detecting a motion vector signal at a predetermined sampling period, a signal processing circuit for calculating a correction target value in accordance with the motion vector signal detected by the motion vector detection circuit, a correction system for correcting a motion in accordance with the correction target value, and a control circuit for generating a new correction target value through interpolation of the correction target value, shortening a correction period of correction by the correction system shorter than a sampling period of the motion vector, and making the period of correction by the correction system variable with each image pickup system.

    摘要翻译: 振动校正装置具有用于以预定采样周期检测运动矢量信号的运动矢量检测电路,用于根据由运动矢量检测电路检测的运动矢量信号计算校正目标值的信号处理电路,校正系统 用于根据校正目标值校正运动;以及控制电路,用于通过校正目标值的内插产生新的校正目标值,缩短校正系统的校正周期短于运动矢量的采样周期 并且通过每个图像拾取系统使校正系统的校正周期变化。

    Optical apparatus with a control device for a moving member using position information
    48.
    发明授权
    Optical apparatus with a control device for a moving member using position information 有权
    具有使用位置信息的移动构件的控制装置的光学装置

    公开(公告)号:US06570142B1

    公开(公告)日:2003-05-27

    申请号:US09489705

    申请日:2000-01-24

    IPC分类号: G02B2740

    CPC分类号: G02B7/08

    摘要: A position control device arranged to store a stop position of a movable lens member and, after the lens member is moved from the stop position to an arbitrary position, to automatically move the lens member to the stored stop position includes a first encoder which divides a movable range of the lens member into a plurality of areas and detects one of the areas in which the stored stop position is located and a second encoder which outputs pulses according to the movement of the lens member at a finer rate of resolution than the resolution of the first encoder. In the position control device, information on the area detected by the first encoder and the number of pulses detected by the second encoder as a position within the detected area is stored as the information on the stored stop position. The position control device compares the output of the first encoder and that of the second encoder with the stored information in moving the lens member to the stored stop position.

    摘要翻译: 一种位置控制装置,其设置为存储可移动透镜构件的停止位置,并且在透镜构件从停止位置移动到任意位置之后,将透镜构件自动移动到存储的停止位置包括:第一编码器,其将 透镜构件的可移动范围成多个区域,并且检测存储的停止位置所在的区域之一;以及第二编码器,其以比分辨率更高的分辨率根据透镜构件的移动输出脉冲 第一个编码器。 在位置控制装置中,将关于由第一编码器检测的区域的信息和由第二编码器检测的脉冲数作为检测区域内的位置存储作为关于存储的停止位置的信息。 位置控制装置在将透镜构件移动到存储的停止位置时将第一编码器的输出与第二编码器的输出与存储的信息进行比较。