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41.发明授权Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby 有权光学元件，光刻设备，用于制造和/或保护光学元件的方法，由此制造的器件制造方法和器件公开(公告)号：US08137869B2
公开(公告)日：2012-03-20
申请号：US10936716
申请日：2004-09-09
CPC分类号： G03F7/70958 , G03F7/70575 , G03F7/70983
摘要： A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.
摘要翻译： 一种用于制造和/或保护光学元件的方法，其中所述光学元件具有包括具有高度差的轮廓的至少一个表面，从而提供具有预定最大高度差的空腔和高度，包括在所述空腔中和在所述腔 光学元件的高度，透射层在空腔中具有大于预定最大高度差的第一高度，并且在提供透射层之后，使透射层铺展，使得透射层在高度上具有第二高度， 基本上为零或更大，由此提供具有基本平坦表面的透射层。
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公开(公告)号：US08129702B2
公开(公告)日：2012-03-06
申请号：US12771466
申请日：2010-04-30
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21F1/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。
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公开(公告)号：US20110121665A1
公开(公告)日：2011-05-26
申请号：US13054552
申请日：2009-07-13
IPC分类号： H02J9/00
CPC分类号： H02J7/00
摘要： To solve or mitigate the problem of lacking the “last mile” connection to a power grid, the invention provides a power supply apparatus for supplying electric energy to a plurality of devices. The apparatus comprises a power dock (130) configured to electrically couple to a power pack (110), wherein the power pack is configured to store electric energy; and a plurality of connectors each being configured to supply electric energy from the power dock to one of the plurality of devices (132, 134, 136). By utilizing the power pack, particularly a removable super capacitor (112), accessing power becomes easier for those people living away from power grids or suffering from an unstable power supply.
摘要翻译： 为了解决或减轻与电网的“最后一英里”连接缺乏的问题，本发明提供一种用于向多个设备提供电能的电源装置。 该装置包括被配置为电耦合到电源组（110）的功率坞（130），其中所述电源组被配置为存储电能; 以及多个连接器，每个连接器被配置为将电能从功率基座提供给多个设备（132,134,136）中的一个。 通过利用动力组件，特别是可移除的超级电容器（112），对于远离电网或遭受不稳定电源的人来说，接入电力变得更容易。
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44.发明授权Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权用于去除光学元件上的沉积的方法，光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07868304B2
公开(公告)日：2011-01-11
申请号：US11051477
申请日：2005-02-07
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Johannes Christiaan Leonardus Franken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Johannes Christiaan Leonardus Franken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
IPC分类号： A61N5/00
CPC分类号： G03F7/70175 , G03F7/70916
摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.
摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。
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公开(公告)号：US20100238311A1
公开(公告)日：2010-09-23
申请号：US12161187
申请日：2007-01-16
IPC分类号： H04N5/228
摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.
摘要翻译： 用于形成样本物体的图像的成像装置包括光学装置和处理单元。 光学器件捕获对象的傅里叶谱。 处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像 和参考对象。
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公开(公告)号：US07776390B2
公开(公告)日：2010-08-17
申请号：US11878989
申请日：2007-07-30
申请人： Ralph Kurt , Levinus Pieter Bakker
发明人： Ralph Kurt , Levinus Pieter Bakker
IPC分类号： B05D5/06
摘要： A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing the lacquer, removing the substrate, and baking the first layer.
摘要翻译： 一种滤光器窗口制造方法，包括在基板上制造导线的结构，在导线和基板上沉积漆，沉积第一层，该第一层包括选自由AlN，Ru，Ir，Au，SiN，Rh ，C及其组合，除去漆，除去基材，并烘烤第一层。
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公开(公告)号：US20090115980A1
公开(公告)日：2009-05-07
申请号：US12318291
申请日：2008-12-24
申请人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
发明人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
CPC分类号： G03F7/70916
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。
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48.发明授权Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system 失效用于提供可操作的滤波器系统的方法，用于从辐射束，滤波器系统，装置和包括滤波器系统的光刻设备中过滤颗粒公开(公告)号：US07414251B2
公开(公告)日：2008-08-19
申请号：US11317240
申请日：2005-12-27
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70916
摘要： A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.
摘要翻译： 公开了一种提供用于在光刻中从辐射束中过滤颗粒的可操作的过滤系统的方法。 该方法包括提供用于拦截颗粒的松弛箔或线，将箔或线的至少第一点或一侧安装到安装组件的第一位置，并且至少在松弛的箔或线的束 辐射，基本上平行于辐射传播的方向。
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公开(公告)号：US07405825B2
公开(公告)日：2008-07-29
申请号：US10539540
申请日：2003-12-19
申请人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
发明人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/10 , G01J3/28 , G01J3/36 , G01N21/274 , G01N21/31 , G01N2021/3196 , G01N2201/129
摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
摘要翻译： 用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。 光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。 血液分析系统（40）包括根据本发明的光学分析系统（20）。
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50.发明授权Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权镜面，光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07382436B2
公开(公告)日：2008-06-03
申请号：US10887306
申请日：2004-07-09
CPC分类号： G03F7/70958 , G02B5/09 , G02B5/1861 , G21K1/06
摘要： A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or a first protrusion including a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and a second protrusion including a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and the first and second materials are not the same. A lithographic projection apparatus includes such a mirror. A device manufacturing method includes reflecting a beam of radiation by use of such a mirror. A device is manufactured according to the method.
摘要翻译： 反射镜具有镜面，其中镜面包括包括选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Nb中的至少一种的材料的突起 Mo，Ba，La，Ce，Pr，Pa和U，或包含选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr中的至少一种的第一材料的第一突起 ，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，以及第二突起，其包括选自Be，B，C，Si，P，S，K，Ca中的至少一种的第二材料 ，Sc，Br，Rb，Sr，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，第一和第二材料不相同。 光刻投影装置包括这样的反射镜。 一种器件制造方法包括通过使用这种反射镜来反射辐射束。 根据该方法制造装置。
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