利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

159 条记录 (耗时 0.042 秒)

    Illumination System Including Grazing Incidence Mirror For Microlithography Exposure System
    42.
    发明申请
    Illumination System Including Grazing Incidence Mirror For Microlithography Exposure System 审中-公开
    包括用于微光刻曝光系统的放映入射镜的照明系统

    公开(公告)号：US20090073392A1

    公开(公告)日：2009-03-19

    申请号：US11855359

    申请日：2007-09-14

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Daniel Kraemer ,  Toralf Gruner ,  Aurelian Dodoc

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Daniel Kraemer ,  Toralf Gruner ,  Aurelian Dodoc

    IPC分类号： G03B21/28 ,  G03B21/06

    CPC分类号： G03F7/70233 ,  G03F7/702

    摘要： In general, in one aspect, the invention features a system that includes a catoptric projection objective having an optical axis and including a plurality of projection objective elements positioned between an object plane and an image plane, the object and image planes being orthogonal to the optical axis, the projection objective being configured so that during operation the projection objective directs radiation reflected at the object plane to the image plane to form an image at the image plane of an object positioned in a field at the object plane, the field having a first dimension of 8 mm or more and a second dimension of 8 mm or more, the first and second dimensions being along orthogonal directions. The system also includes an illumination system including a plurality of illumination system elements, the illumination system being configured so that during operation the illumination system directs the radiation to the field at the object plane, where a chief ray of the radiation has an angle of incidence of 10° or less at the object plane.

    摘要翻译： 通常，在一个方面，本发明的特征在于一种系统，其包括具有光轴并且包括位于物平面和图像平面之间的多个投影物镜元件的反射投影物镜，物体和像平面正交于光学 所述投影物镜被配置为使得在操作期间，投影物镜将在物平面处反射的辐射引导到像平面以在位于物平面处的场中的物体的像平面处形成图像，该场具有第一 尺寸为8mm以上，第二尺寸为8mm以上，第一尺寸和第二尺寸沿正交方向。 该系统还包括包括多个照明系统元件的照明系统，照明系统被配置为使得在操作期间照明系统将辐射引导到物平面处的场，其中辐射的主射线具有入射角 在物平面上为10°以下。

    COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT
    43.
    发明申请
    COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
    用于投影安排的组合停止

    公开(公告)号：US20090021714A1

    公开(公告)日：2009-01-22

    申请号：US12173595

    申请日：2008-07-15

    申请人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

    发明人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70941 ,  G02B5/005 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025

    摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.

    摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

    Method of determining lens materials for a projection exposure apparatus
    47.
    发明授权
    Method of determining lens materials for a projection exposure apparatus 有权
    确定投影曝光装置的透镜材料的方法

    公开(公告)号：US07239450B2

    公开(公告)日：2007-07-03

    申请号：US11181694

    申请日：2005-07-14

    申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

    发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70891 ,  G02B1/02 ,  G02B1/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

    摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

    摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    49.
    发明申请
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 审中-公开
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号：US20060146427A1

    公开(公告)日：2006-07-06

    申请号：US11361345

    申请日：2006-02-24

    申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/02

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

    Method for making an optical system with coated optical components and optical system made by the method
    50.
    发明申请
    Method for making an optical system with coated optical components and optical system made by the method 审中-公开
    用该方法制造具有涂层光学部件和光学系统的光学系统的方法

    公开(公告)号：US20060132917A1

    公开(公告)日：2006-06-22

    申请号：US11274152

    申请日：2005-11-16

    申请人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    发明人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70958 ,  G02B27/0012 ,  G02B27/283 ,  G03F7/705

    摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.

    摘要翻译： 在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量， 沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性 干涉层系统。 该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。 根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。