公开(公告)号：US20090139450A1

公开(公告)日：2009-06-04

申请号：US12324802

申请日：2008-11-26

申请人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： B05C11/00

CPC分类号： B05C13/00 ,  B05C9/12 ,  B05C11/08 ,  B05C13/02 ,  C23C14/568 ,  G03F7/16 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/135

摘要： A treating section includes a plurality of treating blocks juxtaposed horizontally. Each treating block is vertically divided into stories. Each story includes treating units and a main transport mechanism. Substrates are transportable between the same stories of the treating blocks. Further, the substrates are transportable between different stories. Thus, the apparatus can transport the substrates flexibly between the treating blocks.

摘要翻译： 处理部包括水平并列的多个处理块。 每个处理块垂直分为故事。 每个故事包括处理单位和主要运输机制。 底物可在治疗块的相同故事之间运输。 此外，基材可在不同的故事之间运输。 因此，该装置可以在处理块之间灵活地输送基板。

公开(公告)号：US20060159449A1

公开(公告)日：2006-07-20

申请号：US11295257

申请日：2005-12-06

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： H01L21/67034 ,  G03F7/38 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67207

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is subjected to cleaning and drying processing by the drying processing group.

摘要翻译： 基板处理装置包括分度器块，防反射膜处理块，抗蚀剂膜处理块，显影处理块，干燥处理块和界面块。 曝光装置设置在接口块附近。 干燥处理块包括干燥处理组。 接口块包括接口传送机制。 基板经曝光装置进行曝光处理，随后通过界面输送机构输送到干燥处理组。 通过干燥处理组对基板进行清洗和干燥处理。

公开(公告)号：US20060152693A1

公开(公告)日：2006-07-13

申请号：US11294727

申请日：2005-12-06

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： G03B27/52

CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，用于液浸曝光处理的处理块和界面块。 曝光装置设置在接口块附近。 用于液浸曝光处理的处理块包括用于抗蚀剂覆盖膜的涂覆处理组和抗蚀剂覆盖膜的去除处理组。 在曝光处理之前，在用于液浸曝光处理的处理块中形成抗蚀剂覆盖膜。 在曝光处理之后，在用于液浸曝光处理的处理块中去除抗蚀剂覆盖膜。

公开(公告)号：US06649338B2

公开(公告)日：2003-11-18

申请号：US10164021

申请日：2002-06-05

申请人： Tsuyoshi Mitsuhashi

发明人： Tsuyoshi Mitsuhashi

IPC分类号： G03C1498

CPC分类号： G03C1/49863 ,  G03C1/04 ,  G03C1/061 ,  G03C1/09 ,  G03C1/46 ,  G03C1/498 ,  G03C1/49845 ,  G03C2001/096 ,  G03C2200/26

摘要： A silver salt photohermographic material is disclosed, comprising a support having provided thereon a light-sensitive layer containing light-sensitive silver halide, a light-insensitive organic silver salt and a binder, wherein the photohermographic material exhibits a gradation of 2.0 to 5.0 within the density region of 0.5 and 2.0 on a photographic characteristic curve obtained when the photothermographic material is subjected to exposure of 50 &mgr;J/cm2 and thermal development at 124° C. for 16 sec.; the light-sensitive layer comprises lower and upper layers and a glass transition temperature of a binder contained in the lower layer being higher than that of a binder contained in the upper layer.

摘要翻译： 公开了一种银盐光刻胶材料，其包括在其上设置有含有感光卤化银的感光层，不透光有机银盐和粘合剂的载体，其中该光蚀刻材料在该 当光热敏成像材料暴露于50μJ/ cm 2且在124℃的热显影16秒时获得的照相特征曲线上的密度区域为0.5和2.0。 感光层包括下层和上层，并且下层中包含的粘合剂的玻璃化转变温度高于上层中所含的粘合剂的玻璃化转变温度。

公开(公告)号：US06436626B1

公开(公告)日：2002-08-20

申请号：US09625460

申请日：2000-07-25

申请人： Yusuke Kawahara ,  Tsukasa Ito ,  Tsuyoshi Mitsuhashi

发明人： Yusuke Kawahara ,  Tsukasa Ito ,  Tsuyoshi Mitsuhashi

IPC分类号： G03C1498

CPC分类号： G03C1/498 ,  G03C1/49881 ,  G03C2200/60

摘要： A heat-developable light-sensitive element is disclosed. The element comprises a non-light-sensitive organic silver salt and a light-sensitive silver halide and an average radius r of the sphere of influence is from 0.35 &mgr;m to 10 &mgr;m when the element is exposed to light of from 35 &mgr;J/cm2 to 50 &mgr;J/cm2 and developed by a developing drum at a temperature of 123°±3° C. for a time of 16±3 seconds.

摘要翻译： 公开了一种可热显影的感光元件。 该元件包括非感光有机银盐和感光卤化银，并且当元件暴露于35μJ/ cm 2的光下时，影响球的平均半径r为0.35μm至10μm， 50微克/平方厘米，并由显影鼓在123±3℃的温度下显影16秒±3秒。

公开(公告)号：US5871893A

公开(公告)日：1999-02-16

申请号：US900998

申请日：1997-07-25

申请人： Tsuyoshi Mitsuhashi

发明人： Tsuyoshi Mitsuhashi

IPC分类号： G03C1/35 ,  G03C1/85 ,  G03C5/16

CPC分类号： G03C1/853 ,  G03C1/35 ,  Y10S430/166

摘要： A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a transparent support having thereon a hydrophilic colloid layer comprising a silver halide emulsion layer and an electric conductive layer, in which the electric conductive layer contains colloidal particles of a kind of metal oxide and at least one layer of the hydrophilic colloid layer contains a leucocompound of a blue dye.

摘要翻译： 公开了一种卤化银照相感光材料。 感光材料包括其上具有包含卤化银乳剂层和导电层的亲水胶体层的透明载体，其中导电层含有一种金属氧化物的胶体颗粒和至少一层亲水性 胶体层含有蓝色染料的化合物。

公开(公告)号：US5779928A

公开(公告)日：1998-07-14

申请号：US799478

申请日：1997-02-12

申请人： Tetsuro Yamashita ,  Tsuyoshi Mitsuhashi ,  Manabu Yabe

发明人： Tetsuro Yamashita ,  Tsuyoshi Mitsuhashi ,  Manabu Yabe

IPC分类号： B05C11/08 ,  B05D3/10 ,  B08B3/08 ,  C11D7/50 ,  C11D11/00 ,  H01L21/00 ,  H01L21/311 ,  B44C1/22 ,  B08B6/00

CPC分类号： H01L21/6715 ,  B08B3/08 ,  C11D11/0047 ,  C11D7/5022 ,  H01L21/31133

摘要： A film dissolving liquid is ejected from a needle-shaped nozzle onto a peripheral edge portion of a substrate surface of a SOG film, while being subjected to the film dissolving liquid. The substrate is rotated in order to dissolve and remove the SOG film from the peripheral edge portion of the substrate. The film dissolving liquid is a solvent or mixture of two or more solvents selected from the group cyclohexanone, .gamma.-butyrolactone, ethyl lactate or ethyl pyruvate. As a result, a swelling of the SOG film is not created at the edge portion of the substrate. A crack is not therefore created at the edge portion of the SOG film, and generation of particles due to a damage at the film swelling portion thereof is prevented.

摘要翻译： 将薄膜溶解液从针状喷嘴喷射到SOG膜的基板表面的周边部分上，同时进行溶解液体。 旋转基板以从基板的周边部分溶解并除去SOG膜。 膜溶解液是选自环己酮，γ-丁内酯，乳酸乙酯或丙酮酸乙酯的两种或更多种溶剂的溶剂或混合物。 结果，在基板的边缘部分处不产生SOG膜的膨胀。 因此，在SOG膜的边缘部分处不产生裂纹，并且防止了由于其在膜膨胀部分处的损坏而产生的颗粒。

公开(公告)号：US5049483A

公开(公告)日：1991-09-17

申请号：US532946

申请日：1990-06-04

申请人： Naoko Yatsuyanagi ,  Tsuyoshi Mitsuhashi

发明人： Naoko Yatsuyanagi ,  Tsuyoshi Mitsuhashi

IPC分类号： G03C1/485

CPC分类号： G03C1/48515 ,  Y10S430/141 ,  Y10S430/164

摘要： There is disclosed a direct positive silver halide light-sensitive material which can be processed in ultra-rapid processing and have a higher sensitivity, a lower Dmin, an excellent antistatic property and less flactuation of the properties in storing. The light-sensitive material contains an electron-accepting compound in a silver halide emulsion layer, and a fluorinated surfactant and/or at least one of the compounds represented by Formulas I-a to II-b in a photographic component layer: ##STR1## wherein R.sub.1 to R.sub.4 represent independently a hydrogen atom, a lower alkyl group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, a sulfo group, a halogen atom, and a nitro group, provided that at least one of R.sub.1 and R.sub.2 is a carboxy group, an alkoxycarbonyl group or a sulfo group.