公开(公告)号：US06247548B1

公开(公告)日：2001-06-19

申请号：US09000030

申请日：1998-05-21

申请人： Toshiro Hayashi ,  Yuichi Nanae ,  Hiroyoshi Hayashi ,  Ichiro Katagiri ,  Naomasa Sato ,  Tetsuo Endo ,  Hiroyuki Itoh

发明人： Toshiro Hayashi ,  Yuichi Nanae ,  Hiroyoshi Hayashi ,  Ichiro Katagiri ,  Naomasa Sato ,  Tetsuo Endo ,  Hiroyuki Itoh

IPC分类号： B62M2302

CPC分类号： B62M6/45 ,  B60L11/007 ,  B60L11/1801 ,  B60L11/1872 ,  B60L2200/12 ,  B60L2240/36 ,  B62M6/50 ,  B62M6/65 ,  G01R31/36 ,  H02J7/1415 ,  H02K7/14 ,  H02K11/048 ,  H02K21/22 ,  H02K29/10 ,  Y02T10/641 ,  Y02T10/7005 ,  Y02T10/705 ,  Y10T428/249923

摘要： A moving apparatus with a driving force assist mechanism traveled mainly by human power. This moving apparatus detects, in a non-contact manner, with respect to rotating portion such as traveling wheel, etc., rotation speed of the rotating portion to detect traveling state to deliver, from the driving force assist mechanism, assistant driving force corresponding to speed change information that a person who operates the moving apparatus intends to give on the basis of the detected traveling information to carry out traveling to thereby permit smooth traveling even in the case where traveling by only human power becomes difficult.

摘要翻译： 具有主要由人力驱动的驱动力辅助机构的移动装置。 该移动装置以非接触的方式相对于诸如行进轮等的旋转部来检测旋转部的旋转速度，以检测行驶状态，从驱动力辅助机构传递对应于 操作移动装置的人员的变速信息旨在基于检测到的行驶信息进行行驶，从而即使在仅通过人力行驶变得困难的情况下也允许顺利行驶。

公开(公告)号：US6088080A

公开(公告)日：2000-07-11

申请号：US65524

申请日：1998-04-24

申请人： Hiroyuki Itoh

发明人： Hiroyuki Itoh

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52 ,  G03B27/68

CPC分类号： G03F7/70616 ,  G03F7/70241 ,  G03F7/70633 ,  G03F7/70875

摘要： An exposure apparatus includes a stage for holding a substrate at an exposure station, an arm mechanism for conveying a substrate to be exposed, onto the stage, and a sensor provided on one of the stage and the arm mechanism, for measuring temperature of the substrate to be exposed. On the basis of the measured temperature, pattern projection magnification to the workpiece, for example, is corrected.

摘要翻译： 曝光装置包括用于在曝光站保持基板的台，用于将待曝光的基板输送到台上的臂机构和设置在台架和臂机构之一上的传感器，用于测量基板的温度 被暴露。 在测量温度的基础上，例如对工件的图案投影放大率进行校正。

公开(公告)号：US5993081A

公开(公告)日：1999-11-30

申请号：US732718

申请日：1996-10-18

申请人： Hiroyuki Itoh ,  Shinji Tsutsui ,  Masahide Sato

发明人： Hiroyuki Itoh ,  Shinji Tsutsui ,  Masahide Sato

IPC分类号： B65G49/07 ,  G03F7/20 ,  H01L21/677 ,  G03D5/00 ,  B65G25/00

CPC分类号： H01L21/67748 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67745 ,  H01L21/67778 ,  Y10S414/137 ,  Y10S414/138

摘要： An in-line processing system having an exposure processing unit and a coating and development processing unit is provided with a conveyance arm for transferring a workpiece between these units. The conveyance arm can access to each of these units, and these units have horizontal workpiece holding planes of substantially the same level. The workpiece can be conveyed between these units while being kept laid horizontally.

摘要翻译： 具有曝光处理单元和涂布显影处理单元的在线处理系统设置有用于在这些单元之间传送工件的输送臂。 输送臂可以接近这些单元中的每一个，并且这些单元具有基本上相同水平的水平工件保持平面。 工件可以在这些单元之间传送并保持水平放置。

公开(公告)号：US5972772A

公开(公告)日：1999-10-26

申请号：US922334

申请日：1997-09-03

申请人： Minoru Sasaki ,  Yuji Tange ,  Yutaka Hojyo ,  Kazuyoshi Oonuki ,  Hiroyuki Itoh

发明人： Minoru Sasaki ,  Yuji Tange ,  Yutaka Hojyo ,  Kazuyoshi Oonuki ,  Hiroyuki Itoh

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01L21/76

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2061 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/3175

摘要： An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure apparatus. At least two marks formed in each chip formed on a wafer are detected for a predetermined number of chips, and the relation between the shape distortion of each chip in the wafer plane and the wafer coordinates is determined from the positions of the detected marks and the designed positions of the marks by a statistical processing. Patterns are drawn in all chips while correcting the patterns to be drawn on the individual chips, by using the relation between the determined chip shape distortion and the wafer coordinates. As a result, the superposition exposure with the lower layer can be achieved with a high throughput and with a high accuracy without any manual adjustment.

摘要翻译： 一种高产量的电子束拉制工艺，能够应对下层曝光装置或光学还原曝光装置的静态失真和动态变形的变化。 对于预定数量的芯片，检测在晶片上形成的每个芯片中形成的至少两个标记，并且根据检测到的标记和晶片坐标的位置确定晶片平面中每个芯片的形状失真与晶片坐标之间的关系 通过统计处理设计标记的位置。 通过使用确定的芯片形状失真和晶片坐标之间的关系来校正在各个芯片上绘制的图案，在所有芯片中绘制图案。 因此，无需任何手动调整，可以以高产量和高精度实现与较低层的重叠曝光。

公开(公告)号：US5759423A

公开(公告)日：1998-06-02

申请号：US563329

申请日：1995-11-28

申请人： Yasunari Sohda ,  Yasuhiro Someda ,  Hiroyuki Itoh ,  Katsuhiro Kawasaki ,  Norio Saitou

发明人： Yasunari Sohda ,  Yasuhiro Someda ,  Hiroyuki Itoh ,  Katsuhiro Kawasaki ,  Norio Saitou

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  B44C1/22 ,  H01L21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.

摘要翻译： 电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁 横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。 每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。

公开(公告)号：US5545715A

公开(公告)日：1996-08-13

申请号：US904737

申请日：1992-06-26

申请人： Hiroyuki Itoh ,  Masanori Suzuki ,  Akira Kamiya ,  Takeki Furuyama

发明人： Hiroyuki Itoh ,  Masanori Suzuki ,  Akira Kamiya ,  Takeki Furuyama

IPC分类号： C08L25/04 ,  C08L25/18 ,  C08L33/04 ,  C08L33/08 ,  C08L33/18 ,  C08L33/24 ,  C08L35/00 ,  C08L51/00 ,  C08L51/04 ,  C08L51/08 ,  C08L53/00 ,  C08J5/10 ,  C08K3/10

CPC分类号： C08L51/04 ,  C08L25/18 ,  C08L51/085

摘要： The present invention provides a flame-retardant resin composition comprising 100 parts by weight of a bromine-containing copolymer composition containing 1 to 40% by weight of bromine, and comprising 0 to 30 parts by weight of a flame-retarding adjuvant and 0.5 to 30 parts by weight of a polyorganosiloxane-reinforced resin component obtained by polymerizing a vinyl monomer (d) in the presence of a polyorganosiloxane polymer. The flame-retardant resin composition of the present invention has attained a remarkably higher flame retardancy by the inclusion of a polyorganosiloxane-reinforced resin. A significant improvement in the dripping phenomenon has also been achieved. Further, this composition exhibits superior impact resistance and moldability, and a superior outer appearance in the formed products.

摘要翻译： 本发明提供一种阻燃性树脂组合物，其包含100重量份含有1〜40重量％的溴的含溴共聚物组合物，并含有0〜30重量份的阻燃助剂和0.5〜30重量份 通过在聚有机硅氧烷聚合物的存在下聚合乙烯基单体（d）获得的聚有机硅氧烷增强树脂组分的重量份。 通过包含聚有机硅氧烷增强树脂，本发明的阻燃树脂组合物获得了显着更高的阻燃性。 滴水现象也有明显的改善。 此外，该组合物表现出优异的耐冲击性和成型性，并且在成型体中表现出优异的外观。

公开(公告)号：US5526150A

公开(公告)日：1996-06-11

申请号：US183722

申请日：1994-01-19

申请人： Hitoshi Mazaki ,  Takehiro Toyooka ,  Hiroyuki Itoh

发明人： Hitoshi Mazaki ,  Takehiro Toyooka ,  Hiroyuki Itoh

IPC分类号： C09K19/38 ,  C09K19/42 ,  G02F1/13363 ,  G02F1/1347 ,  G02F1/1335

CPC分类号： G02F1/13363 ,  C09K19/3809 ,  C09K19/42 ,  G02F1/13471 ,  G02F2413/03

摘要： A viewing angle compensator for a liquid crystal display having characteristics such as being able to diminish the visual angle dependency of the liquid crystal display is provided. The viewing angle compensator of the present invention comprises a light transmitting base and a film of a liquid crystalline polymer formed on the base, the liquid crystalline polymer taking in the state of liquid crystal a structure wherein a refractive index in the thickness direction is larger than a refractive index in any direction within the plane of the polymer and assuming a glassy state at a temperature lower than the liquid crystal transition point thereof.

摘要翻译： 提供了具有能够降低液晶显示器的视角依赖性的特性的液晶显示器的视角补偿器。 本发明的视角补偿器包括透光基底和形成在基底上的液晶聚合物膜，液晶聚合物处于液晶状态，其中厚度方向的折射率大于 在聚合物的平面内的任何方向上的折射率，并且在低于其液晶转变点的温度下呈现玻璃状态。

公开(公告)号：US5508835A

公开(公告)日：1996-04-16

申请号：US127137

申请日：1993-09-27

申请人： Yasushi Takahashi ,  Hiroyuki Itoh

发明人： Yasushi Takahashi ,  Hiroyuki Itoh

IPC分类号： G02B6/00 ,  G06F1/06 ,  G06F1/10 ,  H04B10/2507 ,  H04B10/556 ,  H04L7/00 ,  H04L7/033 ,  H04J14/08 ,  H04B10/00

CPC分类号： H04L7/0075 ,  G06F1/06 ,  G06F1/105 ,  H04L7/0337

摘要： A logic processing apparatus comprises a plurality of integrated circuits, a multi-phase clock generator for distributing clock signals having different phases from one another to the respective integrated circuits, and a package, for air tight sealing the multi-phase clock generator and the plurality of integrated circuits, which has an optical signal transmissible window for transmitting the master clock signal to the multi-phase clock generator through the optical transmitting line.

摘要翻译： 逻辑处理装置包括多个集成电路，用于将具有彼此不同相位的时钟信号分配给各个集成电路的多相时钟发生器和用于气密密封多相时钟发生器和多个时钟发生器的封装 的集成电路，其具有用于通过光发送线将主时钟信号发送到多相时钟发生器的光信号传输窗。

公开(公告)号：US5440008A

公开(公告)日：1995-08-08

申请号：US246289

申请日：1994-05-19

申请人： Fumiaki Ichikawa ,  Mineo Kobayashi ,  Masahiro Ohta ,  Yasunori Yoshida ,  Shoji Obuchi ,  Hiroyuki Itoh

发明人： Fumiaki Ichikawa ,  Mineo Kobayashi ,  Masahiro Ohta ,  Yasunori Yoshida ,  Shoji Obuchi ,  Hiroyuki Itoh

IPC分类号： C08G63/06 ,  C08G63/78 ,  C08G63/82

CPC分类号： C08G63/823 ,  C08G63/06 ,  C08G63/785

摘要： A process for preparing polyhydroxycarboxylic acid by conducting dehydration polycondensation of hydroxycarboxylic acids in the presence or absence of a catalyst and in the presence or absence of an organic solvent, comprising using a vertical high viscosity reactor during all or a portion of the dehydration polycondensation steps and conducting hot polycondensation while separating and removing low boiling components. The process can provide high molecular weight polyhydroxycarboxylic acid with ease and cheaply in industry.

摘要翻译： 在存在或不存在催化剂的情况下以及存在或不存在有机溶剂的情况下通过羟基羧酸的脱水缩聚制备聚羟基羧酸的方法，包括在全部或部分脱水缩聚步骤中使用垂直高粘度反应器，和 在分离和除去低沸点组分的同时进行热缩聚。 该工艺可以在工业上轻松便宜地提供高分子量的聚羟基羧酸。

公开(公告)号：US5302647A

公开(公告)日：1994-04-12

申请号：US728223

申请日：1991-07-12

申请人： Masanori Suzuki ,  Hiroyuki Itoh ,  Masaaki Mawatari ,  Tateki Furuyama

发明人： Masanori Suzuki ,  Hiroyuki Itoh ,  Masaaki Mawatari ,  Tateki Furuyama

IPC分类号： C08K5/00 ,  C08K5/523 ,  C09K21/14 ,  C08K3/28 ,  C08K3/32

CPC分类号： C09K21/14 ,  C08K5/0066 ,  C08K5/523

摘要： A flame retardant resin composition which includes the following component (A) and component (B) blended in the ratio (A):(B)=100:1-40 parts by weight. Component (A) is a thermoplastic resin including 0-70% by weight of a rubber component and 100-30% by weight of a polymer component formed from monomers comprising a methylated aromatic vinyl monomer and an hydroxylated aromatic vinyl monomer and, optionally, an aromatic vinyl monomer other than the above monomers, a cyanated vinyl monomer, a (meth)acrylic acid ester monomer, maleic anhydride, and a maleimide monomer; graft ratio of the thermoplastic resin being 10-150% when the rubber component is used. Component (B) is a flame retarder.

摘要翻译： 一种阻燃树脂组合物，其包含以（A）：（B）的比例共混的以下组分（A）和组分（B）= 100：1-40重量份。 组分（A）是包含0-70重量％的橡胶组分和100-30重量％的由包含甲基化芳族乙烯基单体和羟基化芳族乙烯基单体的单体形成的聚合物组分的热塑性树脂，任选地， 芳族乙烯基单体，上述单体，氰化乙烯基单体，（甲基）丙烯酸酯单体，马来酸酐和马来酰亚胺单体; 当使用橡胶组分时，热塑性树脂的接枝率为10-150％。 组分（B）是阻燃剂。