公开(公告)号：US07138362B2

公开(公告)日：2006-11-21

申请号：US10369877

申请日：2003-02-19

申请人： Yumiko Abe ,  Norio Ishikawa ,  Hidemitsu Aoki ,  Hiroaki Tomimori ,  Yoshiko Kasama

发明人： Yumiko Abe ,  Norio Ishikawa ,  Hidemitsu Aoki ,  Hiroaki Tomimori ,  Yoshiko Kasama

IPC分类号： C11D7/50

CPC分类号： C11D3/2082 ,  C11D1/004 ,  C11D1/22 ,  C11D1/24 ,  C11D1/345 ,  C11D1/72 ,  C11D3/2086 ,  C11D11/0047

摘要： There is provided a washing liquid composition for a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees, the washing liquid composition including an aliphatic polycarboxylic acid and a surfactant, and the washing liquid composition having a contact angle of at most 50 degrees when dropped on the semiconductor substrate. It is thereby possible to effectively remove particles and metals on the surface of a hydrophobic substrate without corroding it.

公开(公告)号：US07022169B2

公开(公告)日：2006-04-04

申请号：US10732323

申请日：2003-12-10

申请人： Ryota Iwai ,  Tomoaki Tokuhisa ,  Masaru Kato

发明人： Ryota Iwai ,  Tomoaki Tokuhisa ,  Masaru Kato

IPC分类号： C23C18/42 ,  C23C18/44 ,  B05D1/18

CPC分类号： C23C18/42 ,  C23C18/44

摘要： An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1), provided that, in a case in which the solution contains a gold complex of sulfite and the decomposition inhibitor is cytosine, the pH 6.0 or less is excluded. In the formula, R1 to R4 denote hydrogen atom(s), alkyl group(s) having 1 to 10 carbon atom(s), which may have substituent(s), aryl group(s) having 6 to 10 carbon atoms, which may have substituent(s), alkoxy group(s) having 1 to 10 carbon atom(s), which may have substituent(s), amino group(s) (—NH2), hydroxyl group(s) (—OH), ═O, or halogen atom(s), R2 and R3 or R3 and R4 may crosslink with each other and form a saturated or unsaturated ring and the saturated or unsaturated ring may include oxygen, sulfur or nitrogen atom(s), each of the above-mentioned substituents may be a halogen atom or a cyano group, and may be a single bond or a double bond.

摘要翻译： 提供一种无电镀金液，其不含有氰化合物作为金源，并且含有通式（1）表示的分解抑制剂，条件是在溶液含有亚硫酸盐金分子和分解物的情况下 抑制剂是胞嘧啶，不包括pH6.0或更低。 在式中，R 1至R 4表示氢原子，可具有取代基的具有1至10个碳原子的烷基（一个或多个） s），可具有取代基的碳原子数6〜10的芳基，可以具有取代基的碳原子数1〜10的烷氧基，氨基（s） ）（-NH 2），羟基（-OH），-O或卤素原子，R 2和R 3， / SUB或R 3和R 4可以彼此交联并形成饱和或不饱和环，并且饱和或不饱和环可以包括氧，硫或氮原子（ s），上述取代基中的每一个可以是卤素原子或氰基，并且可以是单键或双键。

公开(公告)号：US20060035797A1

公开(公告)日：2006-02-16

申请号：US11201910

申请日：2005-08-10

申请人： Hiroshi Tomita ,  Yuji Yamada ,  Hiroaki Yamada ,  Norio Ishikawa ,  Yumiko Abe

发明人： Hiroshi Tomita ,  Yuji Yamada ,  Hiroaki Yamada ,  Norio Ishikawa ,  Yumiko Abe

IPC分类号： C23G1/00 ,  B08B3/00

CPC分类号： H01L21/02052 ,  C11D7/08 ,  C11D7/34 ,  C11D7/36 ,  C11D11/0047

摘要： A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.

摘要翻译： 提供一种半导体衬底清洗液组合物，其包含一种或多种选自每分子具有至少两个磺酸基的化合物，植酸和缩合磷酸化合物的类型; 无机酸; 和水。 还提供了一种清洗半导体衬底的方法，该方法包括使用半导体衬底清洗液组合物清洗半导体衬底的第一步骤，在第一步骤之后，用纯水，臭氧水清洗半导体衬底的第二步骤 通过将臭氧气体溶解在纯水或过氧化氢水溶液中形成。

公开(公告)号：US20050252523A1

公开(公告)日：2005-11-17

申请号：US11185290

申请日：2005-07-20

申请人： Norio Ishikawa ,  Yoshitaka Kinomura ,  Hideki Hijiya

发明人： Norio Ishikawa ,  Yoshitaka Kinomura ,  Hideki Hijiya

IPC分类号： H05B33/10 ,  B08B3/12 ,  C09K11/06 ,  C11D1/00 ,  C11D7/50 ,  H01L51/50 ,  H05B33/12 ,  H05B33/14

CPC分类号： C11D7/5004

摘要： A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device, wherein cleaning is carried out by immersion or jet flow using the cleaning solution.

公开(公告)号：US20050209119A1

公开(公告)日：2005-09-22

申请号：US11128622

申请日：2005-05-13

申请人： Norio Ishikawa ,  Kiyoto Mori

发明人： Norio Ishikawa ,  Kiyoto Mori

IPC分类号： C23F1/14 ,  C09K13/00 ,  H01L21/3213 ,  H01L31/18 ,  C11D1/00

CPC分类号： H01L31/1884 ,  C09K13/00 ,  H01L21/32134 ,  Y02E10/50

摘要： The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.

公开(公告)号：US20050136672A1

公开(公告)日：2005-06-23

申请号：US11001737

申请日：2004-12-02

申请人： Kazuhiro Fujikawa ,  Tsuguhiro Tago

发明人： Kazuhiro Fujikawa ,  Tsuguhiro Tago

IPC分类号： C09K13/06 ,  C09K13/08 ,  C23F1/16 ,  C23F1/20 ,  H01L21/302 ,  H01L21/308 ,  H01L21/3205 ,  H01L21/3213 ,  H01L21/461

CPC分类号： C23F1/20 ,  H01L21/32134

摘要： The present invention aims to provide an etching solution composition which enables to etch a metal film in a controllable manner, form a desired definite tapered shape, and obtain a smooth surface without causing etching solution exudation trace. Said problems have been solved by the present invention, which is an etching solution composition for etching metal films containing one or more surfactants selected from the group consisting of alkyl sulfate or perfluoroalkenyl phenyl ether sulfonic acid and the salts thereof.

摘要翻译： 本发明的目的在于提供一种能够以可控制的方式蚀刻金属膜，形成期望的定形锥形形状的蚀刻溶液组合物，并获得光滑表面而不引起蚀刻溶液渗出痕迹。 所述问题已经通过本发明来解决，本发明是用于蚀刻含有一种或多种选自烷基硫酸盐或全氟链烯基苯基醚磺酸的表面活性剂的金属膜的蚀刻溶液组合物及其盐。

公开(公告)号：US20040118317A1

公开(公告)日：2004-06-24

申请号：US10732323

申请日：2003-12-10

申请人： Kanto Kagaku Kabushiki Kaisha

发明人： Ryota Iwai ,  Tomoaki Tokuhisa ,  Tomoaki Tokuhisa

IPC分类号： C23C018/42 ,  C23C018/44 ,  B05D001/18

CPC分类号： C23C18/42 ,  C23C18/44

摘要： An electroless gold plating solution is provided that contains no cyanide compound as a source of gold and that contains a decomposition inhibitor represented by general formula (1) (provided that a case in which the solution contains a gold complex of sulfite, the decomposition inhibitor is cytosine, and the pH is 6.0 or less is excluded) 1 in the formula, R1 to R4 denote hydrogen atom(s), alkyl group(s) having 1 to 10 carbon atom(s), which may have substituent(s), aryl group(s) having 6 to 10 carbon atoms, which may have substituent(s), alkoxy group(s) having 1 to 10 carbon atom(s), which may have substituent(s), amino group(s) (nullNH2), hydroxyl group(s) (nullOH), nullO, or halogen atom(s), R2 and R3 or R3 and R4 may crosslink with each other and form a saturated or unsaturated ring and the saturated or unsaturated ring may include oxygen, sulfer or nitrogen atom(s), each of the above-mentioned substituents is a halogen atom or a cyano group, and 2 is a single bond or a double bond.

摘要翻译： 提供一种无电镀金液，其不含有氰化物作为金源，并且含有由通式（1）表示的分解抑制剂（条件是溶液含有亚硫酸盐金分子，分解抑制剂为 胞嘧啶，pH为6.0以下）式中，R 1〜R 4表示氢原子，可以具有取代基的碳原子数为1〜10的烷基，芳基 可以具有取代基的碳原子数为6〜10的基团，可以具有取代基的碳原子数1〜10的烷氧基，氨基（-NH 2） ），羟基（-OH），= O或卤素原子，R2和R3或R3和R4可以彼此交联并形成饱和或不饱和环，饱和或不饱和环可以包括氧 硫原子或氮原子，上述取代基各自为卤素原子或氰基，为单键或双键。

公开(公告)号：US20030166978A1

公开(公告)日：2003-09-04

申请号：US10330501

申请日：2002-12-27

申请人： Kanto Kagaku Kabushiki Kaisha

发明人： Kunihiko Tsutsumi ,  Kunihiko Murata ,  Takeshi Ota ,  Takao Ikariya

IPC分类号： C07C029/14 ,  C07F015/00

CPC分类号： C07F15/0053

摘要： The invention provides novel ruthenium complexes having an optically active diphosphine compound, which has asymmetry on carbon and is easy to synthesize, as the ligand and a process for preparing optically active alcoholic compounds using said complexes as the catalysts, wherein said process is the process for preparing optically active alcoholic compounds, which are excellent in terms of reactivity, enatioselectivity and the like in an asymmetric hydrogenation of carbonyl compounds compared with conventional ruthenium complex catalysts having an optically active diphosphine compound having the axial chirality or the asymmetry on carbon as the ligand. In a preferred embodiment, the invention provides an optically active ruthenium complex represented by the general formula (1) 1 wherein X and Y, which can be identical to or different from each other, represent a hydrogen atom or an anion group, R1 and R2, which can be identical to or different from each other, represent a chain or cyclic hydrocarbon group of carbon number 1 to 20, which can be substituted, R3 and R4, which can be identical to or different from each other, represent a hydrogen atom or a hydrocarbon group of carbon number 1 to 3, and R5, R6, R7 and R8, which can be identical to or different from one another, represent a hydrocarbon group of carbon number 1 to 30, which can be substituted, with the proviso that when X and Y are bromine, R1 and R2 are a methyl group, and when R3 and R4 are a hydrogen atom, at least one of R5, R6, R7 and R8is not a phenyl group.

摘要翻译： 本发明提供具有光学活性二膦化合物的新型钌络合物，其具有碳不对称性并易于合成，作为配体，以及使用所述络合物作为催化剂制备光学活性醇化合物的方法，其中所述方法是 制备光学活性醇类化合物，与具有轴向手性或碳不对称性的光学活性二膦化合物作为配体的常规钌络合物催化剂相比，在羰基化合物的不对称氢化方面具有优异的反应性，选择性等优异性。 在优选的实施方案中，本发明提供由通式（1）表示的光学活性钌络合物，其中X和Y可以相同或不同，表示氢原子或阴离子基团R1和R2， 其可以相同或不同，表示碳原子数为1〜20的可被取代的链状或环状烃基，可以相同或不同的R 3和R 4表示氢原子或 可以相同或不同的碳原子数1〜3的烃基，可以相同或不同的R5，R6，R7和R8表示可以被取代的碳数为1〜30的烃基，条件是 当X和Y是溴时，R 1和R 2是甲基，当R 3和R 4是氢原子时，R 5，R 6，R 7和R 8中的至少一个不是苯基。

公开(公告)号：US6098848A

公开(公告)日：2000-08-08

申请号：US216119

申请日：1998-12-18

申请人： Tsutomu Kawashima ,  Koji Ueda ,  Tsugio Saito ,  Kenji Kageyama

发明人： Tsutomu Kawashima ,  Koji Ueda ,  Tsugio Saito ,  Kenji Kageyama

IPC分类号： B67D1/08 ,  B67D7/02 ,  B67D5/00

CPC分类号： B67D7/0272 ,  B67D1/0831 ,  B67D1/0835 ,  B67D1/0851 ,  B67D7/0294

摘要： The object of the present invention is to simplify the process of connecting a reservoir for charging and discharging 2 or more fluids with a pipeline for conveying said fluid and to assist the automation of this process.In the present invention, a reservoir, having, at its end face, 2 or more openings for fluids for charging and discharging 2 or more fluids respectively, is connected with pipelines by using a connecting means having flow paths for 2 or more fluids and, at its end face, 2 or more openings for fluids corresponding to each of the flow paths, and each of the respective fluids is passed, when by aligning the center of 1 of the openings for fluids of the reservoir end face with 1 of the openings for fluids of the connecting means end face and by linking said openings for fluids to each other, closed passage spaces are respectively formed which are common to the 1 or more other opening(s) for fluids of the reservoir end face and to the 1 or more corresponding other opening(s) of the connecting means end face respectively, and each fluid is passed via said spaces respectively.

摘要翻译： 本发明的目的是简化连接用于对2个或更多个流体进行充气和排出的储存器与用于输送所述流体的管道并帮助该过程的自动化的过程。 在本发明中，在其端面具有2个以上分别用于对2个以上的流体进行充放电的流体的开口的储存器通过使用具有2个以上流体的流路的连接装置与管道连接， 在其端面处有两个或更多个对应于每个流动路径的流体的开口，并且当通过使用于储存器端面的流体的开口的1的中心与1个开口 对于连接装置端面的流体并且通过将流体的所述开口彼此连接，分别形成用于储存器端面的流体的1个或更多个其它开口和1或更多的其它开口的共同的封闭通道空间 分别连接装置端面的更多对应的其他开口，并且每个流体分别经过所述空间。

公开(公告)号：US5892075A

公开(公告)日：1999-04-06

申请号：US936169

申请日：1997-09-23

申请人： Kunihiko Murata ,  Junichi Hori ,  Masahiro Yoshida

发明人： Kunihiko Murata ,  Junichi Hori ,  Masahiro Yoshida

IPC分类号： C07F17/00 ,  C07F7/00

CPC分类号： C07F17/00 ,  Y10S526/943

摘要： The object of the invention resides in the development of an improved process for synthesizing metallocene compounds useful as olefin polymerization catalysts.A new process for synthesizing metallocene compounds of formulae (IV) and (IV') comprises a reaction of formula (I) with formula (II) or (II') to afford formula (III) or (III'), and then a reaction of a halogenating agent.In formulae (IV) and (IV') described below, M.sup.1 is a group IV transition-metal atom, L.sup.1 and L.sup.2 can be each other identical or different and are substituted or unsubstituted cyclopentadienyl, substituted or unsubstituted indenyl or substituted or unsubstituted fluorenyl groups, B is a hydrocarbon having 1-20 carbon atoms, silylene having 1-20 carbon atoms, oligosilylene or germylene groups, binding to L.sup.1 and L.sup.2, Y can be identical or different and is each independently of one another a halogen atom. Further, M.sup.1 can be coordinated with an ether or an amine at any coordination number. ##STR1##

摘要翻译： 本发明的目的在于开发可用作烯烃聚合催化剂的金属茂化合物的改进方法。 用于合成式（IV）和（IV'）的茂金属化合物的新方法包括式（I）与式（II）或（II'）的反应，得到式（III）或（III'），然后 卤化剂的反应。 在下述式（IV）和（IV'）中，M1是IV族过渡金属原子，L1和L2可以彼此相同或不同，并且是取代或未取代的环戊二烯基，取代或未取代的茚基或取代或未取代的芴基 B是具有1-20个碳原子的烃，具有1-20个碳原子的亚甲硅基，低级亚烯基或亚甲硅烷基，与L1和L2结合，Y可以相同或不同，并且各自独立地为卤素原子。 此外，M1可以任何配位数与醚或胺配位。 反应方案2