Scatterometry metrology using inelastic scattering
    41.
    发明授权
    Scatterometry metrology using inelastic scattering 有权
    散射测量使用非弹性散射

    公开(公告)号:US07433056B1

    公开(公告)日:2008-10-07

    申请号:US11182171

    申请日:2005-07-15

    Applicant: Gary R. Janik

    Inventor: Gary R. Janik

    CPC classification number: G01B11/0616 G01N21/65 G01N2021/653

    Abstract: A system for characterizing material properties in miniature semiconductor structures performs a scatterometry analysis on inelastically scattered light. The system can include a narrowband probe beam generator and a detector. A single wavelength probe beam from the narrowband probe beam generator produces scattered light from a measurement pattern on a test sample. The scattered light is measured by the detector, and the measurement data (e.g., Raman spectrum) is used in a scatterometry analysis to determine material properties for the measurement pattern. The detector can measure either incoherent inelastically scattered light (e.g., using a spectrometer) or coherent inelastically scattered light (e.g., using an array detector). If the measurement pattern dimensions are substantially similar to actual device dimensions, the material property distributions determined for the measurement pattern can be applied to the actual devices on the test sample.

    Abstract translation: 用于表征微型半导体结构中的材料性质的系统对非弹性散射光进行散射分析。 该系统可以包括窄带探测光束发生器和检测器。 来自窄带探测光束发生器的单个波长探测光束从测试样品上的测量图形产生散射光。 通过检测器测量散射光,并且在散射分析中使用测量数据(例如,拉曼光谱)来确定测量图案的材料特性。 检测器可以测量非相干非弹性散射光(例如,使用光谱仪)或相干非弹性散射光(例如,使用阵列检测器)。 如果测量图形尺寸基本上类似于实际的装置尺寸,则可以将测量图案确定的材料特性分布应用于测试样品上的实际装置。

    Automated feature analysis with off-axis tilting
    43.
    发明授权
    Automated feature analysis with off-axis tilting 有权
    带离轴倾斜的自动特征分析

    公开(公告)号:US07423269B1

    公开(公告)日:2008-09-09

    申请号:US11360325

    申请日:2006-02-22

    Abstract: One embodiment relates to a method of automated microalignment using off-axis beam tilting. Image data is collected from a region of interest on a substrate at multiple beam tilts. Potential edges of a feature to be identified in the region are determined, and computational analysis of edge-related data is performed to positively identify the feature(s). Another embodiment relates to a method of automated detection of undercut on a feature using off-axis beam tilting. For each beam tilt, a determination is made of difference data between the edge measurement of one side and the edge measurement of the other side. An undercut on the feature is detected from the difference data. Other embodiments are also disclosed.

    Abstract translation: 一个实施例涉及使用离轴光束倾斜的自动微距对准方法。 在多个光束倾斜的基底上从感兴趣的区域收集图像数据。 确定要在该区域中识别的特征的潜在边缘,并且执行边缘相关数据的计算分析以肯定地识别特征。 另一实施例涉及使用离轴光束倾斜在特征上自动检测底切的方法。 对于每个光束倾斜,确定一侧的边缘测量与另一侧的边缘测量之间的差数据。 根据差异数据检测该特征的底切。 还公开了其他实施例。

    Atomic force microscope
    44.
    发明授权
    Atomic force microscope 失效
    原子力显微镜

    公开(公告)号:US07423264B2

    公开(公告)日:2008-09-09

    申请号:US11518320

    申请日:2006-09-08

    CPC classification number: G01Q60/38 G01Q70/02

    Abstract: In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.

    Abstract translation: 在一个实施例中,原子力显微镜包括框架,在第一端耦合到框架的梁和第二端,安装到梁的探针,用于引导梁和下面的表面之间的相对运动的装置,以及用于 检测光束的特性。

    Gas purge system and methods
    45.
    发明授权
    Gas purge system and methods 有权
    气体净化系统和方法

    公开(公告)号:US07420681B1

    公开(公告)日:2008-09-02

    申请号:US11457524

    申请日:2006-07-14

    Abstract: Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing. First, second, and third flows of purge gas may be supplied through the input beam optics housing, collection optics housing and gas purge manifold respectively. The purge gas is delivered directly to a measurement position of a surface of a substrate through the gas purge manifold, the first nosecone and the second nose cone.

    Abstract translation: 公开了气体吹扫系统和方法以及分光椭偏仪。 吹扫气体系统可以包括输入光束光学器件壳体,收集光学器件壳体和气体吹扫歧管。 输入光束光学器件壳体可以包括在第一气体入口和靠近测量位置的第一鼻锥中的孔之间的第一气体流动路径。 收集光学器件壳体可以包括在第二气体入口和靠近测量位置的第二鼻锥中的孔之间的第二气体流动路径。 气体吹扫歧管可以设置在输入光束光学器件壳体和收集光学器件壳体之间。 气体吹扫歧管在靠近测量位置的第三气体入口和气体歧管中的孔之间具有第三气体流动路径。 椭偏仪可以包括输入光束光学器件中的输入光束,并且在收集光学器件壳体中收集光学元件。 吹扫气体的第一,第二和第三流动可以分别通过输入光束光学器件壳体,收集光学器件壳体和气体吹扫歧管提供。 净化气体通过气体净化歧管,第一鼻锥和第二鼻锥直接输送到衬底的表面的测量位置。

    Registration target design for managing both reticle grid error and wafer overlay
    46.
    发明授权
    Registration target design for managing both reticle grid error and wafer overlay 有权
    用于管理两个标线网格错误和晶圆覆盖的注册目标设计

    公开(公告)号:US07408642B1

    公开(公告)日:2008-08-05

    申请号:US11356878

    申请日:2006-02-17

    Applicant: Tony DiBiase

    Inventor: Tony DiBiase

    CPC classification number: G03F7/70633 G03F9/7076

    Abstract: A combined overlay target and methods for its use are disclosed. The combined overlay target includes a grating-type overlay target and an image placement error target having substantially perpendicular features with spaced apart edges. The grating-type target and the image placement error target have a common centroid and are sufficiently separated that the grating-type overlay target does not interfere with measurement of image placement error.

    Abstract translation: 公开了组合覆盖目标及其使用方法。 组合的覆盖目标包括光栅型覆盖目标和具有基本垂直的具有间隔开的边缘的特征的图像放置误差目标。 光栅型目标和图像放置误差目标具有共同的质心并被充分分离,使得光栅型覆盖目标不影响图像放置误差的测量。

    Film measurement using reflectance computation
    48.
    发明授权
    Film measurement using reflectance computation 有权
    使用反射计算的电影测量

    公开(公告)号:US07362686B1

    公开(公告)日:2008-04-22

    申请号:US11000771

    申请日:2004-12-01

    CPC classification number: G01B11/06

    Abstract: A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The mathematical model is solved using a diagonal T matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the layered media are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the layered media are reported as the actual properties of the layered media.

    Abstract translation: 确定分层介质实际属性的方法。 入射光束被引向分层介质,使得入射光束作为反射光束从分层介质反射。 测量反射光束的实际特性,估算分层介质的性质。 分层介质的数学模型通过分层介质的估计性质来解决,以产生反射光束的理论特性。 使用对角T矩阵算法求解数学模型。 将反射光束的理论性质与反射光束的实际特性进行比较,以产生成本函数。 迭代地调整分层介质的估计性质,并且迭代地求解数学模型,直到成本函数在期望的公差内。 分层介质的估计性质被报告为分层介质的实际性质。

    Automated pattern recognition of imprint technology
    49.
    发明授权
    Automated pattern recognition of imprint technology 失效
    压印技术的自动图案识别

    公开(公告)号:US07360851B1

    公开(公告)日:2008-04-22

    申请号:US11355699

    申请日:2006-02-15

    Inventor: Bryan L. Snyder

    Abstract: An apparatus and method for control of spreading of liquid drops are disclosed. An initial pattern of drops of liquid is deposited on a first surface. A second surface is brought into sufficient contact with the initial pattern of the drops that the liquid starts to spread. Two or more digital images of the liquid are captured after it begins to spread. A digital analysis is performed on these images to determine whether one or more portions of the initial pattern of drops require more or less liquid. A subsequent pattern of liquid droplets is adjusted based on the digital analysis.

    Abstract translation: 公开了一种用于控制液滴扩散的装置和方法。 在第一表面上沉积有液滴的初始图案。 使第二表面与液体开始扩散的液滴的初始模式充分接触。 液体的两个或多个数字图像在开始扩展后被捕获。 对这些图像进行数字分析以确定初始图案的一个或多个部分是否需要更多或更少的液体。 基于数字分析调整液滴的后续模式。

    Automatic supervised classifier setup tool for semiconductor defects
    50.
    发明授权
    Automatic supervised classifier setup tool for semiconductor defects 有权
    用于半导体缺陷的自动监控分类器设置工具

    公开(公告)号:US07359544B2

    公开(公告)日:2008-04-15

    申请号:US10713628

    申请日:2003-11-13

    CPC classification number: G06K9/6253 G06T7/0004

    Abstract: Disclosed are methods and apparatus for efficiently setting up and maintaining a defect classification system. In general terms, the setup procedure optionally includes automatically grouping a set of provided defects and presenting a representative set from each defect group to the user for classification. After the initial manual classification of the representative defects, the setup procedure includes an automatic procedure for classifying the non-reviewed or unclassified defects based on the manual class codes from the user-reviewed defects. After the automatic classification operation, the user may also be presented with defects from each class which may require re-classification. In particular embodiments, the user is iteratively presented with defects which have classifications that are suspect, which are near classification boundaries, or have classifications that have a low confidence level until each class is pure or contains a same type of defect classes as assigned by the user.

    Abstract translation: 公开了用于有效地建立和维护缺陷分类系统的方法和装置。 一般来说,设置过程可选地包括自动地对一组提供的缺陷进行分组,并将来自每个缺陷组的代表集合给用户进行分类。 在对代表性缺陷进行初步手动分类后,安装步骤包括根据用户审查缺陷的手册类代码分类未经审查或未分类的缺陷的自动程序。 在自动分类操作之后,用户也可能会出现每个类别可能需要重新分类的缺陷。 在特定实施例中,用户被迭代地呈现具有可疑的分类的缺陷,其接近分类边界,或者具有低置信度水平的分类,直到每个类是纯的或包含由所分配的相同类型的缺陷类别 用户。

Patent Agency Ranking