摘要:
This invention provides a polishing apparatus using a polishing material freely varying its shape in a tri-dimensional space in accordance with the shape of a work, and capable of polishing a narrow, recessed surface inaccessible to human hands or a tool, and a polishing method used therefor.
摘要:
An improved system for magnetorheological finishing of a substrate comprising a vertically oriented bowl-shaped carrier wheel having a horizontal axis. The carrier wheel is preferably an equatorial section of a sphere, such that the carrier surface is spherical. The wheel includes a radial circular plate connected to rotary drive means and supporting the spherical surface which extends laterally from the plate. An electromagnet having planar north and south pole pieces is disposed within the wheel, within the envelope of the sphere and preferably within the envelope of the spherical section defined by the wheel. The magnets extend over a central wheel angle of about 120null such that magnetorheological fluid is maintained in a partially stiffened state ahead of and beyond the work zone. A magnetic scraper removes the MRF from the wheel as the stiffening is relaxed and returns it to a conventional fluid delivery system for conditioning and re-extrusion onto the wheel. The system is useful in finishing large concave substrates, which must extend beyond the edges of the wheel, as well as for finishing very large substrates in a work zone at the bottom dead center position of the wheel.
摘要:
A system for polishing a surface including a polishing material and one or more magnetic means in contact with the polishing material. The one or more magnetic means react upon the polishing material to plasticize it, whereby the plasticized material is then used to polish the surface. Preferably the polishing material intermittently and repeatedly contacts with the surface for polishing. A method for polishing a planar surface including bringing two or more magnetic means into contact with a polishing material, thereby plasticizing the polishing material. Then a planar side of the surface contacts the plasticized polishing material, so that the plasticized polishing material polishes the surface. Upon contact with the surface, the plasticized polishing material liquidizes. After termination of the contact with the surface, the liquidized polishing material solidifies. The surface is moved and the above steps are repeated a multiplicity of times until the surface is polished.
摘要:
The time needed to planarize the surface of an integrated circuit is reduced by causing the planarization liquid to settle in the presence of artificial gravity that supplements natural gravity. A number of different ways to achieve artificial gravity are described. These include centrifuging, magnetic repulsion, vertical pulling by a motor, and providing a pressure differential between the top and bottom sides of the wafer holder.
摘要:
A method and apparatus for finishing a workpiece surface using MR fluid is provided wherein the workpiece is positioned near a carrier surface such that a converging gap is defined between a portion of the workpiece surface and the carrier surface; a magnetic field is applied substantially at said gap; a flow of stiffened MR fluid is introduced into said converging gap such that a work zone is created in the MR fluid to form a sub-aperture transient finishing tool for engaging and causing material removal at the portion of the workpiece surface; and the workpiece or the work zone is moved relative to the other to expose different portions of the workpiece surface to the work zone for predetermined time periods to selectively finish said portions of said workpiece surface to predetermined degrees.
摘要:
A magnetic-abrasive machining of a part includes generating a magnetic field; introducing a part to be machined into the magnetic field; supplying a magnetic-abrasive powder into a machining zone toward a surface of the part to be machined; and generating a vacuum between the magnetic-abrasive powder and the surface of the part to be machined so that the magnetic-abrasive powder is moved relative to the surface of the part to be machined.
摘要:
The time needed to planarize the surface of an integrated circuit is reduced by causing the planarization liquid to settle in the presence of artificial gravity that supplements natural gravity. A number of different ways to achieve artificial gravity are described. These include centrifuging, magnetic repulsion, vertical pulling by a motor, and providing a pressure differential between the top and bottom sides of the wafer holder.
摘要:
Method and apparatus using magnetorheological fluid for finishing a non-image-forming edge of an optical element to a very high degree of smoothness and for removing microscopic fissures from such edges, the method comprising positioning an optical element near a continuous carrier surface such that a converging gap is defined between an edge of the optical element and the carrier surface, the element being disposed such that image-forming refractive and reflective surfaces thereof do not create a gap with the carrier surface; applying a magnetic field substantially at the gap; introducing a magnetorheological fluid onto the carrier surface; driving the magnetorheological fluid through the gap to cause a flow of magnetic field-stiffened magnetorheological fluid through this gap to create a work zone and to form a transient finishing tool for removing material from the edge of the optical element; and moving the optical element relative to the work zone to expose different portions of the edge to the fluid for predetermined time periods to finish the edge to a predetermined degree. The lateral extent of fluid may be broad enough to permit polishing of a plurality of optical elements simultaneously on a single carrier surface, or a plurality of finishing stations may be ganged to finish a plurality of optical elements on a plurality of carrier surfaces.
摘要:
The proposed chamber relates to sheet rolling in metallurgy. The chamber has two halves with a structure for closing, sealing, and opening the halves, and departing one half from the abutment plane, and includes two mechanisms for compacting the abrasive powder. The structure for closing, sealing, and opening the two halves along the abutment plane includes a ring having two cams divided by a slot. The ring sits in annular recesses separated by a slot and arranged on a support of the shaft of the mechanism for compacting the abrasive powder.
摘要:
A method relates to the metallurgical industry. The claimed method includes stretching of the strip (1) flat in a horizontal position through the cleaning zone with abrasive ferromagnetic powder (6), in so doing, the strip is stretched first in one direction, then in the opposite, direction, enclosing the cleaning zone between the upper (2) and lower (3) branches formed on the strip (1).