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262 条记录 (耗时 0.016 秒)

    Anti-fog mirror and method for manufacturing the same
    42.
    发明申请
    Anti-fog mirror and method for manufacturing the same 审中-公开
    防雾镜及其制造方法

    公开(公告)号：US20010030808A1

    公开(公告)日：2001-10-18

    申请号：US09863489

    申请日：2001-05-23

    发明人： Toru Komatsu ,  Masatoshi Nakamura

    IPC分类号： G02B001/00 ,  G02B005/08 ,  G02B005/26 ,  G02B027/14

    CPC分类号： C03C17/3615 ,  C03C17/3417 ,  C03C17/36 ,  C03C17/3649 ,  C03C17/3663 ,  C03C2217/211 ,  C03C2217/214 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/231 ,  C03C2217/232 ,  C03C2217/24 ,  C03C2217/241 ,  C03C2217/242 ,  C03C2217/243 ,  C03C2217/244 ,  C03C2217/425 ,  C03C2217/71 ,  C03C2217/75 ,  C03C2217/78

    摘要： The invention is directed to a film structure of a hydrophilic film in an anti-fog mirror of a type in which an inorganic oxide film is formed as a hydrophilic film on a surface of a mirror and to a method for manufacturing such film structure. A photocatalyzing TiO2 film having a thickness within a range from 100 nm to 1000 nm is formed on a surface of a mirror and a porous SiO2 film having a thickness within a range from 10 nm to 50 nm is formed on the TiO2 film. The porous SiO2 film is adapted to have surface roughness of 2 nm or over. A reflecting film is formed on a rear surface of a transparent glass substrate and then photocatalyzing TiO2 film and the porous SiO2 film are formed on a front surface of the substrate by vacuum deposition while the temperature of the substrate is maintained within a range from 200null C. to 450null C.

    摘要翻译： 本发明涉及一种在反射镜表面形成无机氧化物膜作为亲水膜的防雾镜中的亲水膜的膜结构及其制造方法。 在镜面上形成厚度在100nm〜1000nm范围内的光催化剂TiO 2膜，在TiO 2膜上形成厚度在10nm〜50nm范围内的多孔SiO 2膜。 多孔SiO 2膜适于具有2nm或更大的表面粗糙度。 在透明玻璃基板的后表面上形成反射膜，然后对TiO 2膜进行光催化，并且通过真空沉积在基板的前表面上形成多孔SiO 2膜，同时基板的温度保持在200° C.至450℃

    Compounds and compositions for coating glass with silicon oxide
    43.
    发明授权
    Compounds and compositions for coating glass with silicon oxide 失效
    用氧化硅涂覆玻璃的化合物和组合物

    公开(公告)号：US5599387A

    公开(公告)日：1997-02-04

    申请号：US472589

    申请日：1995-06-07

    申请人： George A. Neuman ,  Patricia R. Athey ,  Royann L. Stewart-Davis

    发明人： George A. Neuman ,  Patricia R. Athey ,  Royann L. Stewart-Davis

    IPC分类号： C03C17/00 ,  C03C17/245 ,  C03C17/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/453 ,  C23C16/54 ,  C09D5/00

    CPC分类号： C03C17/002 ,  C03C17/245 ,  C03C17/2453 ,  C03C17/3417 ,  C23C16/401 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/545 ,  C03C2217/211 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/219 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/241 ,  C03C2217/244 ,  C03C2218/152

    摘要： Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sup.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.

    摘要翻译： 公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物，以及可用作增加氧化硅沉积速率的促进剂的化合物。 含硅前体包括结构式：其中R 1是可以被取代的烷基，链烯基，炔基或芳基，R 2是通过将电子密度从 硅原子，例如氢，卤素，烯基，炔基，卤代烷基和全卤代烷基。 促进剂是选择用于利用硅原子上的部分正电荷的化合物。 这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮，硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。 还公开了包含另外的含金属的涂层前体，例如有机锡化合物，以沉积另外的金属氧化物和氧化硅的组合物。

    Method of fabricating a zinc oxide thin film
    46.
    发明授权
    Method of fabricating a zinc oxide thin film 失效
    氧化锌薄膜的制造方法

    公开(公告)号：US4336120A

    公开(公告)日：1982-06-22

    申请号：US240578

    申请日：1981-03-04

    申请人： Mitsuo Sakakura ,  Tetsuo Takaku

    发明人： Mitsuo Sakakura ,  Tetsuo Takaku

    IPC分类号： H03H3/08 ,  C03C17/245 ,  C23C14/08 ,  H01L41/18 ,  H01L41/39 ,  C23C15/00

    CPC分类号： C03C17/245 ,  C23C14/086 ,  H01L41/316 ,  C03C2217/216 ,  C03C2217/24 ,  C03C2218/155

    摘要： A method of fabricating a zinc oxide thin film by a sputtering process, wherein a substance, such as boron, having an ion radius smaller than that of zinc is sputtered in an oxygen atmosphere. A body of zinc and a body of such a substance may be separately provided as targets of a cathode so that such separate targets may be simultaneously sputtered to thereby produce a thin film such as mentioned above. Alternatively, use may be made of a cathode provided with a zinc target having a substance buried therein which has an ion radius smaller than that of zinc.

    摘要翻译： 通过溅射法制造氧化锌薄膜的方法，其中在氧气氛中溅射离子半径小于锌的物质，例如硼。 可以将锌体和这种物质的主体单独地设置为阴极的靶，使得可以同时溅射这些分离的靶，从而产生如上所述的薄膜。 或者，可以使用具有埋入其中具有比锌的离子半径小的离子半径的锌靶的阴极。

    Systems With Infrared Reflective Coatings
    50.
    发明公开
    Systems With Infrared Reflective Coatings 审中-公开

    公开(公告)号：US20230406761A1

    公开(公告)日：2023-12-21

    申请号：US18193507

    申请日：2023-03-30

    申请人： Apple Inc.

    发明人： Vijayen S. Veerasamy ,  Peter F. Masschelein

    IPC分类号： C03C17/36

    CPC分类号： C03C17/3613 ,  C03C17/3626 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3642 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/211 ,  C03C2217/216 ,  C03C2217/78 ,  C03C2218/153 ,  C03C2218/156

    摘要： A transparent structure may have structural layers such as an inner layer and an outer layer, which may be formed from glass. The transparent structure may be curved. At least one of the inner layer and the outer layer may be coated with an infrared reflection coating. The infrared reflection coating may be formed from multiple optical resonators. Each of the resonators may include two half-mirrors separated by a dielectric layer. The half-mirrors may include infrared reflective material, such as silver. At least some of the resonators may additionally include a getter layer. The getter layer may be formed from amorphous material, nanoparticles in dielectric material, or other desired material, and may protect the infrared reflective material while the infrared reflection coating is being deposited. Additionally, the getter layer may reduce the color shift exhibited by high angle light as it passes through the transparent structure.