METHOD FOR TREATING TANTALUM METAL THIN FILM, QUANTUM DEVICE, AND QUANTUM CHIP

    公开(公告)号:US20240164221A1

    公开(公告)日:2024-05-16

    申请号:US18486548

    申请日:2023-10-13

    CPC classification number: H10N60/01 G06N10/40 H10N60/85

    Abstract: The present disclosure discloses a method for treating a tantalum metal thin film, a quantum device, and a quantum chip. The method includes: preparing an initial tantalum metal thin film; and increasing, after cooling the initial tantalum metal thin film to a predetermined extremely low temperature, the temperature from the predetermined extremely low temperature to normal temperature to obtain a target tantalum metal thin film. The present disclosure solves the technical problem in the related technology: a post-treatment technology for a tantalum metal thin film after preparation of the tantalum metal thin film has a limited positive effect on reducing the energy dissipation of a tantalum-based superconducting quantum device.

    Superconductor-to-insulator devices

    公开(公告)号:US11832532B2

    公开(公告)日:2023-11-28

    申请号:US16798195

    申请日:2020-02-21

    Inventor: Faraz Najafi

    CPC classification number: H10N60/84 H10N60/01 H10N60/30 H10N60/85

    Abstract: A device includes a superconductor layer and a piezoelectric layer positioned adjacent to the superconductor layer. The piezoelectric layer is configured to apply a first strain to the superconductor layer in response to receiving a first voltage that is below a predefined voltage threshold and to apply a second strain to the superconductor layer in response to receiving a second voltage that is above the predefined voltage threshold. While the device is maintained below a superconducting threshold temperature for the superconductor layer and is supplied with current below a superconducting threshold current for the superconductor layer, the superconductor layer is configured to 1) operate in a superconducting state when the piezoelectric layer applies the first strain to the superconductor layer and 2) operate in an insulating state when the piezoelectric layer applies the second strain to the superconductor layer.

    SUPERCONDUCTING HYDRIDE MATERIALS AND METHODS OF MAKING AND IDENTIFYING SAME

    公开(公告)号:US20230301203A1

    公开(公告)日:2023-09-21

    申请号:US18017075

    申请日:2021-07-20

    CPC classification number: H10N60/85 H10N60/0661 H10N60/0772 H10N60/0884

    Abstract: Compositions of matter and methods of identifying and making compositions of matter are disclosed. Some embodiments disclose making and chemically and/or compositionally tuning superconducting hydride materials. Some embodiments disclose an apparatus for making and compositionally tuning superconducting materials. Some embodiments disclose a composition of matter including a solid hydride exhibiting superconductivity at a temperature of at least 150 kelvin at an ambient pressure below 180 gigapascals, or at a temperature of at least 261 kelvin. In one or more embodiments, the superconductor includes a covalent metal hydride having at least three different chemical elements wherein an inter-atomic distance between the hydrogen in the covalent metal hydride is in a range of 1.1-2 angstroms. In yet further examples, the superconductor is formed using molecular exchange and compression of a Van der Waals solid. In yet further examples, the superconductor comprises molecular hydrogen disposed in 1-dimensional channels. These and other embodiments are disclosed herein.

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