Abstract:
A thermal ink jet printhead (40) for the emission of droplets of ink on a print medium (46) comprises a reservoir (103) containing ink (142), a die (61), a slot (102) engraved in said die (61) and a plurality of ejectors (73), each of which in turn comprises a chamber (74), a resistor (27) and a nozzle (56), each of said chambers (74) being put in fluid communication with said slot (102) through a plurality of elementary ducts (72) lying on a different plane from the bottom (67) of said chamber (74).
Abstract:
A photoresist supply apparatus and a method of supplying photoresist using the same are provided. The photoresist supply apparatus includes a flow length measurer for measuring the flow length of photoresist remaining at the tip of a nozzle unit; a measured data processor for converting data measured by the flow length measurer into an electrical signal; and a valve controller for finely controlling the flow length of photoresist by controlling the amount of air flowing into an automatic on/off valve in response to the electrical signal fed back from the measured data processor. Accordingly, by measuring the flow length of photoresist at the tip of nozzle unit in real time and feeding back the measured flow length, a faulty process due to an irregular flow length of photoresist can be prevented, and a fixed amount of photoresist can be ejected.
Abstract:
The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.
Abstract:
A waste fluid separation and recovery system of the present invention includes a first cup in which the substrate is disposed when the substrate is being coated with the photoresist, a photoresist waste fluid groove connected by a path of fluid communication with the first cup and an exhaust airflow generator for generating an exhaust airflow, which guides photoresist waste fluid from the substrate toward the photoresist waste fluid groove.
Abstract:
A method of partially applying a hot-melt pressure sensitive adhesive composition to a backing material, in which the hot-melt pressure sensitive adhesive composition is applied by an applicator to a moving transfer means in such a way that a film formed from the hot-melt adhesive composition comprises voids; the film applied to the transfer means is subsequently applied to a backing material, which is likewise moving.
Abstract:
A coating apparatus for a traveling web comprising two coating heads and a traveling path changing roller is disclosed. A bar coater is arranged close to a pass roller. The bar coater is fixed at such a position as to contact the web when the pass roller is moved down. An extrusion coater is arranged below a backup roller in such a manner as to move up and down. If the pass roller moves up and bends up the traveling path of the web, the web separates from the bar coater. Then, if the extrusion coater moves up, the web is coated with the coating solution by the extrusion coater. If the pass roller and the extrusion coater move down, the web is coated with the coating solution by the bar coater.
Abstract:
A pasting machine is provided for paste of an active material for a lead battery which is capable of continuously applying stably and favorably, not only a paste of active material for a negative electrode, but also a paste of active material for a positive electrode, to a continuous substrate. There is arranged within a hopper 1 a pair of front and rear paddles 2,2 located above, a delivery roller 3 located below, a vaned roller 5null located at a rear side of the intermediate portion, and an auxiliary roller 4 located diagonally to the upper front of the delivery roller 3 spaced from and opposed tc the delivery roller 3. A delivery opening 6a of an orifice plate 61 fixed to the lower end of the hopper 1 is made open to direct paste in the same direction as the travel direction of a continuous, substrate A.
Abstract:
Throughput is increased, the footprint is reduced, heating may be carried out in a short time, and variations in the temperature of the substrate surface may be reduced. A heating chamber 47 for heating the substrate is formed as an upper level of a load/lock chamber 13, and a cooling chamber 48 for cooling the substrate is formed as a lower level of the load/lock chamber 13. An upper heater 51 and a lower heater 56 are formed above and below the heating chamber 47. A shower plate 52 is located between the upper heater 51 and the lower heater 56. A gas heating space 50 is located between the upper heater 51 and the shower plate 52. An N2 gas introducer 42 is connected to the gas heating space 50, such that N2 gas is introduced into the gas heating space 50. The N2 gas introduced from the N2 gas introducer 42 is heated in the gas heating space 50 and is then supplied to the substrate W in the form of a shower via the shower plate 52. The substrate W is subjected to convection heat transfer from the N2 gas that underwent radial heat transfer from the upper heater 51, as well as from the heated N2 gas, and is also heated by the lower heater 56.
Abstract:
The present invention is a film forming method for forming a film of a coating solution on a substrate, comprising the steps of spreading the coating solution supplied to a center of the substrate by rotating the substrate, and supplying solvent vapor of the coating solution to the coating solution spread over the substrate while rotating the substrate to thin the film of the coating solution formed on the substrate. Accordingly, it becomes possible that the film of the coating solution which is formed by spreading the coating solution over the substrate is maintained at a low viscosity, and that the film can be further thinned. The necessary quantity of the coating solution can be also reduced. Moreover, since solvent vapor is supplied onto the coating film, by controlling the supply quantity or the supply position of the solvent vapor, the uniformity of the coating solution film can be obtained, and the thickness of the coating solution film can be controlled.
Abstract:
An apparatus is disclosed for dispensing liquids on to a rotating surface. The apparatus includes first and second dispense lines connected to at least one liquid source to permit the dispensing of liquids from the first and second dispense lines on to a rotating surface. In a preferred embodiment, the first and second dispense lines are tubular and have first and second dispense tube disposed within the interior region of the first and second dispense lines, respectively. The first and second dispense tubes define first and second annular regions with the dispense lines, which are preferably connected by a fluid channel. A heat exchanger is attached to the first and second annular region to enable a heat transfer medium to be circulated through the first and second annular regions and the fluid channel. Also in a preferred embodiment, a solvent dispense line is disposed between the first and second dispense lines and a vapor solvent bath is provided containing a purge section including a cleaning member to allow excess coating liquid to be rinsed from the first and second dispense lines.