Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same
    42.
    发明申请
    Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same 失效
    能够控制光刻胶的流动长度的光致抗蚀剂供给装置及使用其的供给光致抗蚀剂的方法

    公开(公告)号:US20030047136A1

    公开(公告)日:2003-03-13

    申请号:US10237888

    申请日:2002-09-10

    Inventor: Myung-Hun Yang

    CPC classification number: B05C11/1002 B05C11/1013 G03F7/162

    Abstract: A photoresist supply apparatus and a method of supplying photoresist using the same are provided. The photoresist supply apparatus includes a flow length measurer for measuring the flow length of photoresist remaining at the tip of a nozzle unit; a measured data processor for converting data measured by the flow length measurer into an electrical signal; and a valve controller for finely controlling the flow length of photoresist by controlling the amount of air flowing into an automatic on/off valve in response to the electrical signal fed back from the measured data processor. Accordingly, by measuring the flow length of photoresist at the tip of nozzle unit in real time and feeding back the measured flow length, a faulty process due to an irregular flow length of photoresist can be prevented, and a fixed amount of photoresist can be ejected.

    Abstract translation: 提供光致抗蚀剂供应装置和使用其提供光致抗蚀剂的方法。 光致抗蚀剂供给装置包括:流量测量器,用于测量残留在喷嘴单元的尖端处的光致抗蚀剂的流动长度; 用于将由流量测量器测量的数据转换成电信号的测量数据处理器; 以及阀控制器,其通过响应于从测量数据处理器反馈的电信号控制流入自动开/关阀的空气量来精细地控制光致抗蚀剂的流动长度。 因此,通过实时测量喷嘴单元末端的光致抗蚀剂的流动长度并反馈测量的流动长度,可以防止由于光致抗蚀剂的不规则流动长度引起的故障过程,并且可以喷射固定量的光致抗蚀剂 。

    Substrate coating unit and substrate coating method
    43.
    发明申请
    Substrate coating unit and substrate coating method 失效
    基材涂布单元和基材涂布方法

    公开(公告)号:US20020134304A1

    公开(公告)日:2002-09-26

    申请号:US10101707

    申请日:2002-03-21

    CPC classification number: H01L21/6715

    Abstract: The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.

    Abstract translation: 本发明是一种涂布单元,用于将涂布溶液涂布在基材上,该涂布单元包括:排出喷嘴,用于在基板上方沿预定方向往复运动并将涂布溶液排放到基板上; 用于保持基板并在垂直于预定方向的一个方向上可水平移动的保持器; 以及当从平面观察时,当基板沿着一个方向移动到比排出喷嘴更向前时,覆盖基板的上表面的盖,其中盖的下表面倾斜以在 排出口侧。 根据本发明,覆盖基板的上表面的盖子阻止溶剂从施加在基板上的涂布溶液蒸发,以确保涂膜的平坦度。

    System for separating and recovering waste fluid and spin coater
    44.
    发明申请
    System for separating and recovering waste fluid and spin coater 有权
    废液和旋涂机的分离和回收系统

    公开(公告)号:US20020112662A1

    公开(公告)日:2002-08-22

    申请号:US09968629

    申请日:2001-10-02

    CPC classification number: H01L21/67017 H01L21/6715

    Abstract: A waste fluid separation and recovery system of the present invention includes a first cup in which the substrate is disposed when the substrate is being coated with the photoresist, a photoresist waste fluid groove connected by a path of fluid communication with the first cup and an exhaust airflow generator for generating an exhaust airflow, which guides photoresist waste fluid from the substrate toward the photoresist waste fluid groove.

    Abstract translation: 本发明的废流体分离和回收系统包括:第一杯,其中当基底涂覆有光致抗蚀剂时,基底设置在其上;光致抗蚀剂废液槽通过与第一杯流体连通的路径和排气 用于产生排气气流的气流发生器,其将光致抗蚀剂废液从基板引导到光致抗蚀剂废液槽。

    Method and apparatus for applying hot-melt pressure sensitive adhesives to a backing material
    45.
    发明申请
    Method and apparatus for applying hot-melt pressure sensitive adhesives to a backing material 失效
    将热熔压敏粘合剂施加到背衬材料上的方法和设备

    公开(公告)号:US20020035963A1

    公开(公告)日:2002-03-28

    申请号:US09915715

    申请日:2001-07-26

    CPC classification number: B05D1/28 B05D5/10 C09J7/38 C09J2201/28

    Abstract: A method of partially applying a hot-melt pressure sensitive adhesive composition to a backing material, in which the hot-melt pressure sensitive adhesive composition is applied by an applicator to a moving transfer means in such a way that a film formed from the hot-melt adhesive composition comprises voids; the film applied to the transfer means is subsequently applied to a backing material, which is likewise moving.

    Abstract translation: 将热熔压敏粘合剂组合物部分地施加到背衬材料上的方法,其中通过涂布器将热熔压敏粘合剂组合物施加到移动的转移装置,使得由热熔粘合剂组合物形成的膜, 熔融粘合剂组合物包含空隙; 施加到转印装置上的膜随后被施加到同样移动的背衬材料上。

    Coating apparatus for a traveling web
    46.
    发明申请
    Coating apparatus for a traveling web 失效
    用于行进网的涂布装置

    公开(公告)号:US20020026895A1

    公开(公告)日:2002-03-07

    申请号:US09985591

    申请日:2001-11-05

    CPC classification number: B05C5/00 B05C5/0254 B05C9/00 B05C9/06 B05C13/00

    Abstract: A coating apparatus for a traveling web comprising two coating heads and a traveling path changing roller is disclosed. A bar coater is arranged close to a pass roller. The bar coater is fixed at such a position as to contact the web when the pass roller is moved down. An extrusion coater is arranged below a backup roller in such a manner as to move up and down. If the pass roller moves up and bends up the traveling path of the web, the web separates from the bar coater. Then, if the extrusion coater moves up, the web is coated with the coating solution by the extrusion coater. If the pass roller and the extrusion coater move down, the web is coated with the coating solution by the bar coater.

    Abstract translation: 公开了一种用于包括两个涂覆头和行进路径改变辊的行进网的涂覆装置。 涂布机布置在传送辊附近。 当涂布辊向下移动时,刮条涂布机被固定在这样一个位置,以便接触纸幅。 挤压涂布机以支撑辊的下方布置,以便上下移动。 如果通过辊向上移动并弯曲幅材的行进路径,则纸幅与棒涂机分离。 然后,如果挤出涂布机向上移动,则通过挤出涂布机将卷材涂覆在涂布溶液中。 如果通过辊和挤出涂布机向下移动,则通过刮棒涂布机将卷材涂布在涂布溶液中。

    Pasting machine for an active paste for a lead battery
    47.
    发明申请
    Pasting machine for an active paste for a lead battery 失效
    粘贴机用于铅电池的活性浆料

    公开(公告)号:US20020005162A1

    公开(公告)日:2002-01-17

    申请号:US09898045

    申请日:2001-07-05

    Abstract: A pasting machine is provided for paste of an active material for a lead battery which is capable of continuously applying stably and favorably, not only a paste of active material for a negative electrode, but also a paste of active material for a positive electrode, to a continuous substrate. There is arranged within a hopper 1 a pair of front and rear paddles 2,2 located above, a delivery roller 3 located below, a vaned roller 5null located at a rear side of the intermediate portion, and an auxiliary roller 4 located diagonally to the upper front of the delivery roller 3 spaced from and opposed tc the delivery roller 3. A delivery opening 6a of an orifice plate 61 fixed to the lower end of the hopper 1 is made open to direct paste in the same direction as the travel direction of a continuous, substrate A.

    Abstract translation: 本发明提供一种用于铅蓄电池用活性物质糊料的粘贴机,其能够不仅将负极用活性物质的糊料,还可以连续施加用于正极的活性物质的糊剂,而且能够稳定, 连续衬底。 在料斗1内设置有位于上方的一对前后桨叶2,2位于位于中间部分后侧的叶轮5'的位于下方的输送辊3,以及辅助辊4,其位于 输送辊3的上部前部与输送辊3间隔开并与其相对。固定到料斗1的下端的孔板61的输送口6a打开,以与行进方向相同的方向 的连续的底物A.

    Substrate processing apparatus and semiconductor manufacturing method
    48.
    发明申请
    Substrate processing apparatus and semiconductor manufacturing method 审中-公开
    基板加工装置及半导体制造方法

    公开(公告)号:US20010035124A1

    公开(公告)日:2001-11-01

    申请号:US09796483

    申请日:2001-03-02

    Abstract: Throughput is increased, the footprint is reduced, heating may be carried out in a short time, and variations in the temperature of the substrate surface may be reduced. A heating chamber 47 for heating the substrate is formed as an upper level of a load/lock chamber 13, and a cooling chamber 48 for cooling the substrate is formed as a lower level of the load/lock chamber 13. An upper heater 51 and a lower heater 56 are formed above and below the heating chamber 47. A shower plate 52 is located between the upper heater 51 and the lower heater 56. A gas heating space 50 is located between the upper heater 51 and the shower plate 52. An N2 gas introducer 42 is connected to the gas heating space 50, such that N2 gas is introduced into the gas heating space 50. The N2 gas introduced from the N2 gas introducer 42 is heated in the gas heating space 50 and is then supplied to the substrate W in the form of a shower via the shower plate 52. The substrate W is subjected to convection heat transfer from the N2 gas that underwent radial heat transfer from the upper heater 51, as well as from the heated N2 gas, and is also heated by the lower heater 56.

    Abstract translation: 吞吐量增加,占地面积减少,可以在短时间内进行加热,并且可能降低基板表面的温度变化。 形成用于加热基板的加热室47作为装载/锁定室13的上层,并且用于冷却基板的冷却室48形成为装载/锁定室13的下层。上部加热器51和 下部加热器56形成在加热室47的上方和下方。喷淋板52位于上部加热器51和下部加热器56之间。气体加热空间50位于上部加热器51和淋浴板52之间。 N2气体引导器42连接到气体加热空间50,使得N 2气体被引入到气体加热空间50中。从N 2气体导入器42引入的N 2气体在气体加热空间50中被加热,然后被供给到 基板W经由淋浴板52以淋浴的形式。衬底W经受来自上加热器51的径向热传递的N2气以及加热的N 2气的对流传热,并且也是 由下加热器56加热。

    Film forming method and film forming apparatus
    49.
    发明申请
    Film forming method and film forming apparatus 审中-公开
    成膜方法和成膜装置

    公开(公告)号:US20010033895A1

    公开(公告)日:2001-10-25

    申请号:US09840179

    申请日:2001-04-24

    Abstract: The present invention is a film forming method for forming a film of a coating solution on a substrate, comprising the steps of spreading the coating solution supplied to a center of the substrate by rotating the substrate, and supplying solvent vapor of the coating solution to the coating solution spread over the substrate while rotating the substrate to thin the film of the coating solution formed on the substrate. Accordingly, it becomes possible that the film of the coating solution which is formed by spreading the coating solution over the substrate is maintained at a low viscosity, and that the film can be further thinned. The necessary quantity of the coating solution can be also reduced. Moreover, since solvent vapor is supplied onto the coating film, by controlling the supply quantity or the supply position of the solvent vapor, the uniformity of the coating solution film can be obtained, and the thickness of the coating solution film can be controlled.

    Abstract translation: 本发明是一种在基板上形成涂布液的膜的成膜方法,其特征在于,包括以下步骤:通过旋转所述基板将供给到所述基板的中心的涂布液扩散,并将所述涂布液的溶剂蒸气供给到 涂布溶液在衬底上铺展,同时旋转衬底以使形成在衬底上的涂布溶液的薄膜变薄。 因此,通过将涂布液涂布在基板上而形成的涂布液的膜保持低粘度,并且可以进一步减薄膜。 所需量的涂布溶液也可以减少。 此外,由于溶剂蒸气被供给到涂膜上,通过控制溶剂蒸气的供给量或供给位置,可以获得涂布液的均匀性,并且可以控制涂布液膜的厚度。

    Dispenser apparatus and associated method of heating
    50.
    发明申请
    Dispenser apparatus and associated method of heating 失效
    分配器装置及相关加热方法

    公开(公告)号:US20010020442A1

    公开(公告)日:2001-09-13

    申请号:US09769856

    申请日:2001-01-25

    Abstract: An apparatus is disclosed for dispensing liquids on to a rotating surface. The apparatus includes first and second dispense lines connected to at least one liquid source to permit the dispensing of liquids from the first and second dispense lines on to a rotating surface. In a preferred embodiment, the first and second dispense lines are tubular and have first and second dispense tube disposed within the interior region of the first and second dispense lines, respectively. The first and second dispense tubes define first and second annular regions with the dispense lines, which are preferably connected by a fluid channel. A heat exchanger is attached to the first and second annular region to enable a heat transfer medium to be circulated through the first and second annular regions and the fluid channel. Also in a preferred embodiment, a solvent dispense line is disposed between the first and second dispense lines and a vapor solvent bath is provided containing a purge section including a cleaning member to allow excess coating liquid to be rinsed from the first and second dispense lines.

    Abstract translation: 公开了一种用于将液体分配到旋转表面上的装置。 该装置包括连接到至少一个液体源的第一和第二分配线,以允许将液体从第一和第二分配线分配到旋转表面上。 在优选实施例中,第一和第二分配线是管状的,并且分别具有分别设置在第一和第二分配线的内部区域内的第一和第二分配管。 第一和第二分配管限定具有分配线的第一和第二环形区域,其优选地通过流体通道连接。 热交换器附接到第一和第二环形区域,以使传热介质能够通过第一和第二环形区域和流体通道循环。 同样在优选实施方案中,溶剂分配管线设置在第一和第二分配线之间,并且提供蒸气溶剂浴,其包含含有清洁部件的清洗部分,以允许从第一和第二分配管线冲洗多余的涂布液体。

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