公开(公告)号：US06265711B1

公开(公告)日：2001-07-24

申请号：US08906602

申请日：1996-12-10

Applicant: Victor B. Kley

Inventor： Victor B. Kley

IPC: H01J3700

CPC classification number: G01N23/225 ,  G01Q10/02 ,  G01Q10/04 ,  G01Q20/02 ,  G01Q60/04 ,  G01Q60/06 ,  G01Q70/02 ,  G01Q80/00 ,  G02B21/002 ,  G03F1/84 ,  G03F7/704 ,  G03F7/70616 ,  G11B5/232 ,  G11B5/3116 ,  G11B9/1409 ,  Y10S977/861 ,  Y10S977/862 ,  Y10S977/863 ,  Y10S977/873

Abstract: A scanning probe microscope assembly that has an atomic force measurement (AFM) mode, a scanning tunneling measurement (STM) mode, a near-field spectrophotometry mode, a near-field optical mode, and a hardness testing mode for examining an object.

Abstract translation: 扫描探针显微镜组件，其具有原子力测量（AFM）模式，扫描隧道测量（STM）模式，近场分光光度测定模式，近场光学模式和用于检查物体的硬度测试模式。

公开(公告)号：US06262423B1

公开(公告)日：2001-07-17

申请号：US09125484

申请日：1998-08-18

Applicant: Stefan Hell ,  Jörg Bewersdorf ,  Rainer Pick

Inventor： Stefan Hell ,  Jörg Bewersdorf ,  Rainer Pick

IPC: H01J3700

CPC classification number: G02B21/002

Abstract: An optical apparatus, especially a scanning microscope (1), wherein an expanded laser beam (2) is divided into several partial beams (4) by micro lenses (5) arranged next to one another. Each partial beam (4) is focused onto a focal point (11) by a common objective lens (7) to optically excite a sample (8). Fluorescent light emanating from the individual focal points (11) of the sample (8) is registered by a photo sensor (13) arranged behind the objective lens (7) as seen from the sample (8). Each photon of the fluorescent light coming from the sample (8) and being registered by the photo sensor (13) is excited by at least two photons of the laser beam (2).

Abstract translation: 一种光学装置，特别是扫描显微镜（1），其中通过彼此相邻布置的微透镜（5）将扩展的激光束（2）分成几个部分光束（4）。 每个部分光束（4）通过公共物镜（7）聚焦在焦点（11）上以光学激发样品（8）。 由样品（8）的各个焦点（11）发出的荧光由配置在物镜（7）后面的光传感器（13）记录在样品（8）上。 来自样品（8）并由光传感器（13）记录的荧光的每个光子被激光束（2）的至少两个光子激发。

公开(公告)号：US06833550B2

公开(公告)日：2004-12-21

申请号：US10643954

申请日：2003-08-20

Applicant: Mitsuo Hayashibara ,  Kishio Hidaka ,  Toshiaki Horiuchi ,  Tadashi Fujieda ,  Yoshimichi Numata ,  Shuuichi Suzuki

Inventor： Mitsuo Hayashibara ,  Kishio Hidaka ,  Toshiaki Horiuchi ,  Tadashi Fujieda ,  Yoshimichi Numata ,  Shuuichi Suzuki

IPC: H01J3700

CPC classification number: H01J37/256 ,  H01J37/02 ,  H01J37/28

Abstract: The disclosure is concerned with an electron microscope comprising a casing for encasing an assembly and a display disposed to the casing. The assembly comprises a vacuum container, a vacuum pump for evacuating the vacuum container, an electron emitter disposed at the upper position of the vacuum vessel, a sample chamber disposed at the lower position of the vacuum container and capable of projecting from the casing and a detector for detecting an electron beam emitted from a sample placed in the sample chamber.

公开(公告)号：US06727507B2

公开(公告)日：2004-04-27

申请号：US09765388

申请日：2001-01-22

Applicant: Nobuo Shimazu ,  Takao Utsumi

Inventor： Nobuo Shimazu ,  Takao Utsumi

IPC: H01J3700

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/08 ,  H01J37/3174 ,  H01J2237/31788

Abstract: The electron beam proximity exposure apparatus comprises: an electron beam source which emits an electron beam; an electron beam shaping device which shapes the electron beam; a mask which has an aperture and is disposed on a path of the shaped electron beam; a deflecting and scanning device which deflects the electron beam to scan the mask with the shaped electron beam; and a stage which holds and moves an object, wherein the mask is disposed in proximity to a surface of the object, and a pattern corresponding to the aperture of the mask is exposed on the surface of the object with the electron beam having passed through the aperture, wherein the electron beam shaping device shapes the electron beam into a slender beam of which cross section has a small width in a direction of the scanning and a large width in a direction perpendicular to the direction of the scanning. Thus, in the electron beam proximity exposure apparatus, the responsiveness of the on-off control over the application of the electron beam can be improved with keeping the scanning width large without lowering the throughput of the exposure apparatus.

Abstract translation: 电子束接近曝光装置包括：发射电子束的电子束源; 形成电子束的电子束整形装置; 具有孔径并设置在成形电子束的路径上的掩模; 偏转和扫描装置，其使电子束偏转以用成形电子束扫描掩模; 以及保持和移动物体的台阶，其中所述掩模设置在所述物体的表面附近，并且与所述掩模的孔径相对应的图案在所述物体的表面上暴露，所述电子束已经通过所述物体 孔，其中电子束成形装置将电子束成形为在扫描方向上横截面具有小宽度并且在垂直于扫描方向的方向上具有大宽度的细长光束。 因此，在电子束接近曝光装置中，通过保持扫描宽度大而不降低曝光装置的生产能力，可以提高对施加电子束的开 - 关控制的响应性。

公开(公告)号：US06717139B2

公开(公告)日：2004-04-06

申请号：US10442223

申请日：2003-05-21

Applicant: Junichi Taniguchi

Inventor： Junichi Taniguchi

IPC: H01J3700

CPC classification number: H01J49/067 ,  H01J49/062

Abstract: A mass spectrometer according to the present invention includes: an ion source; a mass analyzer for analyzing ions generated by the ion source with their mass to charge ratio; an ion lens composed of platelet electrodes of an even number no less than four arranged radially and symmetrically around an ion optical axis connecting the ion source and the mass analyzer; and a voltage generator for applying a voltage composed of a DC voltage and an RF voltage to a group of alternately arranged platelet electrodes and for applying another voltage composed of the same DC voltage and another RF voltage having the same frequency and the opposite polarity to the other group of alternately arranged platelet electrodes. When ions are introduced into the ion traveling space defined by the inner surfaces of the platelet electrodes, the ions travel along the ion optical axis and converge to a rear focal point of the ion lens, while they are vibrated by the voltages applied to the platelet electrodes. By placing a small hole or orifice communicating to the next chamber at the rear focal point of the ion lens, larger number of ions can be sent to the next chamber, which enhances the sensitivity and precision of the mass spectrometer.

Abstract translation: 根据本发明的质谱仪包括：离子源; 用于分析由离子源产生的离子与质荷比的质量分析器; 由连接离子源和质量分析器的离子光轴径向对称地设置偶数不小于4的平板电极构成的离子透镜; 以及电压发生器，用于将由DC电压和RF电压组成的电压施加到一组交替布置的血小板电极，并且用于施加由相同DC电压组成的另一电压和具有相同频率和相反极性的另一RF电压 其他组交替排列血小板电极。 当离子被引入到由血小板电极的内表面限定的离子行进空间中时，离子沿着离子光轴行进并且会聚到离子透镜的后焦点，同时它们被施加到血小板的电压振动 电极。 通过在离子透镜的后焦点放置一个与下一个腔室连通的小孔或孔，可以将更多数量的离子发送到下一个腔室，这提高了质谱仪的灵敏度和精度。

公开(公告)号：US06710360B2

公开(公告)日：2004-03-23

申请号：US10192344

申请日：2002-07-10

Applicant: Joseph Ferrara

Inventor： Joseph Ferrara

IPC: H01J3700

CPC classification number: H01L21/68764 ,  H01J37/3171 ,  H01J2237/20207 ,  H01J2237/20235

Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The traslation member moves along a direction of movement such that a distance that the ion moves through the implantation chamber remains constant during movement of the workpiece along its path of travel.

Abstract translation: 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和真空或注入室，其中工件被定位成与离子束相交，用于通过离子束离子注入工件的表面。 离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构。 工件支撑结构包括可旋转地固定到植入室的旋转构件。 旋转构件相对于注入室的旋转改变了工件相对于植入室内的离子束束线的部分的注入角度。 工件支撑结构还包括平移构件，其可移动地联接到旋转构件并且支撑工件以沿着行进路径线性移动。 扫掠构件沿着移动方向移动，使得离子移动通过植入室的距离在工件沿其行进路径移动期间保持恒定。

公开(公告)号：US06670615B2

公开(公告)日：2003-12-30

申请号：US10245545

申请日：2002-09-18

Applicant: William H Gilmore ,  Keith Graham Dicks

Inventor： William H Gilmore ,  Keith Graham Dicks

IPC: H01J3700

CPC classification number: H01J37/244 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2482

Abstract: An electron detection device for use with an electron microscope defining a sample chamber. The device comprises a housing which in use is mounted to and opens into or forms part of a sample chamber of an electron microscope. A support structure is attached to the detection device housing and is in communication with the sample chamber in use. The support structure supports within it a member from which depends a phosphor scintillator, the member being movable between an extended position in which the phosphor scintillator is close enough to a sample to be struck by electrons and a retracted position. A control system controls movement of the member; and a detector monitors light emitted by the phosphor scintillator in response to electron impact.

公开(公告)号：US06661009B1

公开(公告)日：2003-12-09

申请号：US10159790

申请日：2002-05-31

Applicant: Alexander Groholski ,  Riccardo Drainoni ,  Michael Tanguay

Inventor： Alexander Groholski ,  Riccardo Drainoni ,  Michael Tanguay

IPC: H01J3700

CPC classification number: H01J37/28 ,  H01J37/023 ,  H01J37/16 ,  H01J37/3056 ,  H01J2237/0245

Abstract: The present invention provides a column tilt apparatus and method for providing an off-normal angle of incidence of a beam in a scanned beam system onto a substrate passing through the eucentric point that is electro-mechanically adjustable during operation while maintaining vacuum integrity of the column and work chamber, and without introducing significant vibrations.

Abstract translation: 本发明提供了一种列倾斜装置和方法，用于将扫描光束系统中的光束的偏离正常入射角提供给通过在操作期间电机械可调节的偏心点的基板，同时保持色谱柱的真空完整性 和工作室，没有引起显着的振动。

公开(公告)号：US06642525B2

公开(公告)日：2003-11-04

申请号：US09949193

申请日：2001-09-07

Applicant: Oliver Kienzle ,  Holger Weigand

Inventor： Oliver Kienzle ,  Holger Weigand

IPC: H01J3700

CPC classification number: H01J37/3007 ,  H01J37/1474 ,  H01J2237/3175

Abstract: A magnetic lens assembly for providing a magnetic deflection field for a beam of charged particles is disclosed. The assembly includes a focusing lens device for providing a magnetic field which has substantially rotational symmetry in respect of a symmetry axis of the assembly and acts on the beam traversing the magnetic field as a focusing lens with an optical axis, and includes an axis shifting device for producing a corrective magnetic field which is superposable on the magnetic field provided by the focusing lens device and acts on the beam such that the optical axis is shiftable parallel to the symmetry axis of the assembly. The axis shifting device includes a first set of axially spaced apart rings which are positioned concentrically in respect of the symmetry axis and are made of a material which is substantially not electrically conductive and has a high magnetic permeability. At least one axis shifting coil is provided with a plurality of current conductor windings for producing the corrective magnetic field. The current conductor windings of the axis shifting coil engage around at least one of the rings of the first ring set.

公开(公告)号：US06635872B2

公开(公告)日：2003-10-21

申请号：US09828345

申请日：2001-04-05

Applicant: Michael J. Davidson

Inventor： Michael J. Davidson

IPC: H01J3700

CPC classification number: G01N23/225

Abstract: A method and system for increasing the efficiency and reducing the time required for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for micro-fabrication, flat panel displays, micro-electro-mechanical (MEMs). In one embodiment a method of inspection of micro-fabricated structures is optimized by statistically analyzing defect data during inspection by collecting defect data during inspection, calculating at least one statistic of the defect data, continuing inspection while the at least one statistic is outside a predetermined range and stopping inspection when the at least one statistic is within the predetermined range.