公开(公告)号：US20060013092A1

公开(公告)日：2006-01-19

申请号：US11177870

申请日：2005-07-08

Applicant: Sung-Man Lee ,  Byung-Am Lee ,  Byung-Seol Ahn ,  Jae-Sun Cho ,  Chang-Hoon Lee ,  Young-Kyu Lim

Inventor： Sung-Man Lee ,  Byung-Am Lee ,  Byung-Seol Ahn ,  Jae-Sun Cho ,  Chang-Hoon Lee ,  Young-Kyu Lim

IPC: G11B7/00

CPC classification number: G01N21/95607

Abstract: A method of aligning a substrate can comprise primarily aligning the substrate having a pattern, obtaining pattern information corresponding to a configuration of the pattern, comparing the pattern information with predetermined reference pattern information to corroborate the acceptability of the pattern information, selectively exchanging the predetermined reference pattern information with the pattern information based on the acceptability of the pattern information, and secondarily aligning the substrate to correlate the position of the pattern with the pattern information.

Abstract translation: 对准衬底的方法可以包括主要对准具有图案的衬底，获得对应于图案的配置的图案信息，将图案信息与预定的参考图案信息进行比较，以证实图案信息的可接受性，选择性地交换预定的参考 基于图案信息的可接受性的图案信息的图案信息，并且二次对准基板以将图案的位置与图案信息相关联。

公开(公告)号：US20060012782A1

公开(公告)日：2006-01-19

申请号：US11181162

申请日：2005-07-13

Applicant: Young-Kyu Lim ,  Byung-Am Lee ,  Byung-Seol Ahn ,  Jae-Sun Cho ,  Chang-Hoon Lee ,  Jung-Lan Lee ,  Sung-Man Lee

Inventor： Young-Kyu Lim ,  Byung-Am Lee ,  Byung-Seol Ahn ,  Jae-Sun Cho ,  Chang-Hoon Lee ,  Jung-Lan Lee ,  Sung-Man Lee

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/95607

Abstract: A method and apparatus of classifying repetitive defects on a substrate is provided. Defects of dies on the substrate are sequentially compared with a predetermined reference die. Sets of coordinates are marked on the reference die which are corresponding to the position of the defects on the dies on the substrate. Then, repetitive defects are classified which are repeatedly marked in a specified region on the reference die.

Abstract translation: 提供了在基板上分类重复缺陷的方法和装置。 将衬底上的裸片的缺陷与预定的参考裸片顺序地进行比较。 在基准管芯上标记坐标集合，其对应于衬底上的管芯上的缺陷的位置。 然后，在参考芯片上的指定区域中重复地标记重复缺陷。

公开(公告)号：US20050264749A1

公开(公告)日：2005-12-01

申请号：US11137378

申请日：2005-05-26

Applicant: Chang-Hoon Lee

Inventor： Chang-Hoon Lee

IPC: G02F1/1333 ,  G02F1/1339 ,  G02F1/1345

CPC classification number: G02F1/13394 ,  G02F1/1333 ,  G02F2001/133354 ,  G02F2001/133368

Abstract: A liquid crystal display panel includes a first substrate and a second substrate, a column spacer between the first substrate and the second substrate to maintain a cell-gap, contact surfaces between the column spacer and one of the first substrate and the second substrate, at least one of the contact surfaces having a plurality of holes; and a liquid crystal layer between the first substrate and the second substrate.

Abstract translation: 液晶显示面板包括第一基板和第二基板，在第一基板和第二基板之间的柱间隔件，以保持单元间隙，柱间隔件与第一基板和第二基板中的一个之间的接触表面在 至少一个所述接触表面具有多个孔; 以及在第一基板和第二基板之间的液晶层。

公开(公告)号：US06888261B2

公开(公告)日：2005-05-03

申请号：US10690105

申请日：2003-10-21

Applicant: Won Song ,  Seong-Il Kim ,  Sang-Il Han ,  Chang-Hoon Lee ,  Choung-Hee Kim

Inventor： Won Song ,  Seong-Il Kim ,  Sang-Il Han ,  Chang-Hoon Lee ,  Choung-Hee Kim

IPC: G03F9/00 ,  H01L21/027 ,  H01L23/544 ,  H01L21/76

CPC classification number: H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  Y10S438/975 ,  H01L2924/00

Abstract: An alignment mark and an exposure alignment system and method using the alignment mark for aligning wafers are described. The alignment mark is formed of a plurality of mesa or trench type unit marks that are aligned in an inline pattern within an underlying layer under a layer to which a chemical mechanical polishing process is applied to form an alignment signal during an alignment process, thereby preventing a dishing phenomenon caused by the chemical mechanical process.

Abstract translation: 描述了对准标记和使用对准标记对准晶片的曝光对准系统和方法。 对准标记由多个台面或沟槽型单位标记形成，该多个台面或沟槽型单位标记在下面的层内以下列方式对准，在层之下，在对准过程期间施加化学机械抛光工艺以形成对准信号，从而防止 由化学机械过程引起的凹陷现象。

公开(公告)号：US5625230A

公开(公告)日：1997-04-29

申请号：US532984

申请日：1995-09-22

Applicant: Jin-woo Park ,  Chang-hoon Lee

Inventor： Jin-woo Park ,  Chang-hoon Lee

IPC: H01L23/00 ,  H01L21/56 ,  H01L21/60 ,  H01L23/48

CPC classification number: H01L24/81 ,  H01L21/563 ,  H01L24/29 ,  H01L2224/1147 ,  H01L2224/16225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/81801 ,  H01L2224/83192 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01079 ,  H01L2924/07802 ,  H01L2924/14

Abstract: An integrated circuit chip structure, which prevents electrical shorts between adjacent electrodes and contributes to miniaturization, and a method for forming an integrated circuit chip structure are provided. A first electrode of a predetermined pattern is formed on the integrated circuit chip and a second electrode is formed on a base in correspondence with the first electrode. A first adhesive made of elastomer is deposited on the second electrode and a conductive metal substance is coated thereon. Finally, the second electrode is joined with the first electrode by pressure, after a second adhesive is deposited on the upper surface of the metal substance.

Abstract translation: 一种集成电路芯片结构，其防止相邻电极之间的电短路并有助于小型化，并且提供了一种用于形成集成电路芯片结构的方法。 在集成电路芯片上形成预定图案的第一电极，并且在与第一电极对应的基底上形成第二电极。 在第二电极上沉积由弹性体制成的第一粘合剂，并在其上涂覆导电金属物质。 最后，在第二粘合剂沉积在金属物质的上表面上之后，第二电极通过压力与第一电极接合。

公开(公告)号：US20230091962A1

公开(公告)日：2023-03-23

申请号：US17991580

申请日：2022-11-21

Applicant: Chang Hoon LEE

Inventor： Chang Hoon LEE

IPC: H01J37/32 ,  H01J37/244

Abstract: A system for detecting an operation failure of a plasma generating device includes a plasma generating device including one or more nozzle units configured to emit a plasma beam, a camera module that generates image data of the plasma beam emitted by the one or more nozzle units, and a control device that detects and determines whether or not the plasma generating device has an operation failure based on the image data received from the camera module, and controls an operation of the plasma generating device according to a result of determining whether or not the plasma generating device has the operation failure.

公开(公告)号：US20220020562A1

公开(公告)日：2022-01-20

申请号：US17150826

申请日：2021-01-15

Applicant: Chang Hoon LEE

Inventor： Chang Hoon LEE

IPC: H01J37/32

Abstract: A roll-to-roll surface cleaning treatment system may include an upper housing containing a first plasma generating device and a first transfer roller that faces a nozzle from which a plasma beam generated by the first plasma generating device is discharged and that winds and transfers a flexible substrate, the upper housing comprising a gas inlet, an entrance through which the flexible substrate is introduced, and an outlet through which the flexible substrate is discharged, and a lower housing connected to the entrance of the upper housing and containing a second plasma generating device and a second transfer roller that faces a nozzle from which a plasma beam generated by the second plasma generating device is discharged and that winds and transfers the flexible substrate, the lower housing comprising a gas outlet, and an inlet through which the flexible substrate is introduced.

公开(公告)号：US10761560B2

公开(公告)日：2020-09-01

申请号：US16160075

申请日：2018-10-15

Applicant: Chang Hoon Lee ,  John Edward Vincent ,  Louis-Philippe Hamelin ,  Paul Alepin

Inventor： Chang Hoon Lee ,  John Edward Vincent ,  Louis-Philippe Hamelin ,  Paul Alepin

IPC: G06F1/10 ,  H03K5/135 ,  G06F30/327 ,  G06F119/06 ,  G06F119/12

Abstract: The embodiments employ a transaction based design methodology to supply clocking when clock pulses are requested. The transactional module receives a clock when it requests a clock pulse and one stage of a logic pipeline is clocked at a time. This methodology reduces dynamic power dissipation by the transactional module from the dynamic power dissipated by traditional synchronous logic designs.

公开(公告)号：US09711395B2

公开(公告)日：2017-07-18

申请号：US14810621

申请日：2015-07-28

Applicant: Jong-Su Kim ,  Dong-Woon Park ,  Tae-Hoi Park ,  Yong-Kug Bae ,  Tae-Hwan Oh ,  Chang-Hoon Lee ,  Boo-Hyun Ham

Inventor： Jong-Su Kim ,  Dong-Woon Park ,  Tae-Hoi Park ,  Yong-Kug Bae ,  Tae-Hwan Oh ,  Chang-Hoon Lee ,  Boo-Hyun Ham

IPC: H01L21/768 ,  H01L21/8234 ,  H01L21/311 ,  H01L27/02 ,  G03F7/20 ,  H01L21/285

CPC classification number: H01L21/76816 ,  G03F7/70633 ,  G03F7/70683 ,  H01L21/28518 ,  H01L21/31144 ,  H01L21/76811 ,  H01L21/76897 ,  H01L21/823437 ,  H01L21/823475 ,  H01L27/0207

Abstract: In a method of fabricating a semiconductor device, a substrate including a circuit area and an overlay mark area is provided. Conductive gate patterns are formed on the substrate in the circuit area such that the overlay mark area is free of the gate patterns, and conductive contact patterns are formed on the substrate between the gate patterns in the circuit area. A mirror pattern is formed on the substrate in the overlay mark area, where the mirror pattern and the contact patterns comprising a same reflective material. Related semiconductor devices, overlay marks, and fabrication methods are also discussed.

公开(公告)号：US09115652B2

公开(公告)日：2015-08-25

申请号：US13312745

申请日：2011-12-06

Applicant: Byong Young Choi ,  Young Hong Kwak ,  Gee Wook Shin ,  Jin Kook Kong ,  Soo Hyung Woo ,  Chang-Hoon Lee

Inventor： Byong Young Choi ,  Young Hong Kwak ,  Gee Wook Shin ,  Jin Kook Kong ,  Soo Hyung Woo ,  Chang-Hoon Lee

IPC: F16K15/00 ,  F02D13/02 ,  F01L13/00 ,  F16K15/18 ,  F16K31/06 ,  F15B13/04 ,  F01L1/24 ,  F01L1/344

CPC classification number: F02D13/0253 ,  F01L13/0015 ,  F01L2001/2444 ,  F01L2001/3443 ,  F15B13/0405 ,  F16K15/183 ,  F16K31/0637 ,  Y02T10/18 ,  Y10T137/7838

Abstract: An oil control valve includes a housing having a control port and a drain port, a first seat with a first penetration hole forming a first chamber, a second seat with a second penetration hole forming a second chamber communicated with the control port, the second seat with the housing forming a third chamber communicating with the drain port, a first check valve within the first chamber selectively closing the first penetration hole, a second check valve within the third chamber selectively closing the second penetration hole, and a third penetration hole, a control portion selectively opening the first check valve and simultaneously closing the second check valve or selectively closing the first check valve and simultaneously opening the second check valve and an orifice connecting the first chamber with the second chamber.

Abstract translation: 油控阀包括具有控制口和排水口的壳体，具有形成第一室的第一穿透孔的第一座，具有与控制口连通的第二孔的第二孔，第二座 其中所述壳体形成与所述排水口连通的第三室，所述第一室内的第一止回阀选择性地关闭所述第一穿透孔，所述第三室内的第二止回阀选择性地闭合所述第二穿透孔，以及第三穿透孔， 控制部分选择性地打开第一止回阀并同时关闭第二止回阀或选择性地关闭第一止回阀并同时打开第二止回阀和连接第一室与第二室的孔。