Trench thyristor with improved breakdown voltage characteristics
    51.
    发明授权
    Trench thyristor with improved breakdown voltage characteristics 失效
    具有改善击穿电压特性的沟槽晶闸管

    公开(公告)号:US06259134B1

    公开(公告)日:2001-07-10

    申请号:US09112978

    申请日:1998-07-09

    CPC classification number: H01L29/749 H01L27/0716 H01L29/42308 H01L29/7455

    Abstract: A MOS-controllable power semiconductor trench device has a gate in the form of a trench which extends through a region of p type silicon into an n type region of low conductivity. A discontinous buried p layer below the bottom of the trench forms part of a thyristor which in operation is triggered into conduction by conduction of a PIN diode which is produced when an accumulation layer is formed in the n type region adjacent to the trench under the action of an on-state gate signal. The device has a high on-state conductivity and is protected against high voltage breakdown in its off-state by the presence of the buried layer. An off-state gate signal causes removal of the accumulation layer and conduction of the PIN diode and the thyristor ceases in safe, reliable and rapid manner.

    Abstract translation: MOS可控功率半导体沟槽器件具有沟槽形式的栅极,其延伸穿过p型硅的区域到n型低导电区域。 在沟槽底部下方的不连续埋层p层形成晶闸管的一部分,晶闸管在工作中通过PIN二极管的导通而被触发导通,该PIN二极管是当在作用下邻近沟槽的n型区域中形成蓄积层时产生的 的状态门信号。 器件具有高的导通状态,并且通过存在掩埋层来保护其处于其断开状态的高压击穿。 截止状态的栅极信号使安全,可靠和快速地停止积聚层,PIN二极管和晶闸管的导通停止。

    Semiconductor device
    52.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US6111289A

    公开(公告)日:2000-08-29

    申请号:US289615

    申请日:1999-04-12

    Applicant: Florin Udrea

    Inventor: Florin Udrea

    Abstract: A semiconductor device has first and second electrical terminals. The device comprises at least one n/p or p/n first junction adjacent the first terminal, and at least one of the other of a p/n or n/p second junction adjacent the second terminal. It also has at least one n/p or p/n junction disposed between the first and second junctions and arranged to be transverse thereto, and at least one gate terminal in contact with the p or n doped region of the first junction or the n or p doped region of the second junction.

    Abstract translation: 半导体器件具有第一和第二电端子。 该装置包括与第一端子相邻的至少一个n / p或p / n第一结,以及与第二端子相邻的p / n或n / p第二接头中的至少一个。 它还具有至少一个n / p或p / n结,该n / p或p / n结设置在第一和第二结之间并且布置成横向于其,并且至少一个栅极端子与第一结的p或n掺杂区域或n 或第二结的p掺杂区域。

    Electromigration reduction in micro-hotplates
    54.
    发明授权
    Electromigration reduction in micro-hotplates 有权
    微电镀减少电镀

    公开(公告)号:US08410560B2

    公开(公告)日:2013-04-02

    申请号:US12691104

    申请日:2010-01-21

    CPC classification number: H05B3/267 Y10T29/49083

    Abstract: A micro-hotplate is provided in the form of a device comprising a sensor and one or more resistive heaters within the micro-hotplate arranged to heat the sensor. Furthermore a controller is provided for applying a bidirectional drive current to at least one of the heaters to reduce electromigration. The controller also serves to drive the heater at a substantially constant temperature.

    Abstract translation: 提供微电子装置的形式包括传感器和微电热板内的一个或多个电阻加热器,其布置成加热传感器。 此外,提供了一种控制器,用于向至少一个加热器施加双向驱动电流以减少电迁移。 控制器还用于以基本恒定的温度驱动加热器。

    IR EMITTER AND NDIR SENSOR
    55.
    发明申请
    IR EMITTER AND NDIR SENSOR 有权
    红外发射器和NDIR传感器

    公开(公告)号:US20120267532A1

    公开(公告)日:2012-10-25

    申请号:US13466626

    申请日:2012-05-08

    CPC classification number: H05B3/267 G01J3/108 H05B2203/032

    Abstract: An IR source in the form of a micro-hotplate device including a CMOS metal layer made of at least one layer of embedded on a dielectric membrane supported by a silicon substrate. The device is formed in a CMOS process followed by a back etching step. The IR source also can be in the form of an array of small membranes—closely packed as a result of the use of the deep reactive ion etching technique and having better mechanical stability due to the small size of each membrane while maintaining the same total IR emission level. SOI technology can be used to allow high ambient temperature and allow the integration of a temperature sensor, preferably in the form of a diode or a bipolar transistor right below the IR source.

    Abstract translation: 微电子装置形式的IR源,其包括由至少一层嵌入在由硅衬底支撑的电介质膜上的CMOS金属层。 该器件以CMOS工艺形成,随后是背蚀刻步骤。 IR源也可以是由于使用深反应离子蚀刻技术而紧密堆积的小膜阵列的形式,并且由于每个膜的小尺寸而具有更好的机械稳定性,同时保持相同的总IR 排放水平。 可以使用SOI技术来允许高环境温度并且允许温度传感器的集成,优选地在IR源的正下方的二极管或双极晶体管的形式。

    SCHOTTKY RECTIFIER
    56.
    发明申请
    SCHOTTKY RECTIFIER 有权
    肖特基整流器

    公开(公告)号:US20120098082A1

    公开(公告)日:2012-04-26

    申请号:US13222249

    申请日:2011-08-31

    Abstract: A semiconductor rectifier includes a semiconductor substrate having a first type of conductivity. A first layer, which is formed on the substrate, has the first type of conductivity and is more lightly doped than the substrate. A second layer having a second type of conductivity is formed on the substrate and a metal layer is disposed over the second layer. The second layer is lightly doped so that a Schottky contact is formed between the metal layer and the second layer. A first electrode is formed over the metal layer and a second electrode is formed on a backside of the substrate.

    Abstract translation: 半导体整流器包括具有第一类导电性的半导体衬底。 形成在基板上的第一层具有第一类导电性,并且比衬底更轻掺杂。 在基板上形成具有第二导电类型的第二层,并且金属层设置在第二层上。 第二层被轻掺杂,使得在金属层和第二层之间形成肖特基接触。 第一电极形成在金属层的上方,第二电极形成在基板的背面。

    Semiconductor device and method for forming the same
    57.
    发明授权
    Semiconductor device and method for forming the same 有权
    半导体装置及其形成方法

    公开(公告)号:US07994569B2

    公开(公告)日:2011-08-09

    申请号:US12186966

    申请日:2008-08-06

    CPC classification number: H01L29/7397 H01L29/0834 H01L29/66348

    Abstract: A bipolar high voltage/power semiconductor device having a low voltage terminal and a high voltage terminal is disclosed. The bipolar high voltage/power semiconductor is a vertical insulated gate bipolar transistor with injection efficiency adjustment formed by highly doped n+ islands in a p+ anode layer. The device has a vertical drift region of a first conductivity type and having vertical first and second ends. In one example, a region of the second conductivity type is provided at the second end of the vertical drift region connected directly to the vertical high voltage terminal. In another example, a vertical buffer region of the first conductivity type is provided at the vertical second end of the vertical drift region and a vertical region of a second conductivity type is provided on the other side of the vertical buffer region and connected to the vertical high voltage terminal. A plurality of electrically floating lateral island regions are provided within the vertical drift region at or towards the vertical second end of the vertical drift region, the plurality of electrically floating lateral island regions being of the first conductivity type and being more highly doped than the drift region.

    Abstract translation: 公开了一种具有低电压端子和高电压端子的双极型高压/功率半导体器件。 双极性高压/功率半导体是垂直绝缘栅双极晶体管,其具有由p +阳极层中的高掺杂n +岛形成的注入效率调节。 该器件具有第一导电类型的垂直漂移区,并具有垂直的第一和第二端。 在一个示例中,第二导电类型的区域设置在直接连接到垂直高压端子的垂直漂移区域的第二端。 在另一示例中,第一导电类型的垂直缓冲区域设置在垂直漂移区域的垂直第二端,并且第二导电类型的垂直区域设置在垂直缓冲区域的另一侧并连接到垂直方向 高压端子。 多个电浮动横向岛区域设置在垂直漂移区域内或垂直于垂直漂移区域的垂直第二端处,多个电浮动横向岛区域是第一导电类型并且比漂移更高的掺杂 地区。

    Silicon carbide semiconductor device having junction field effect transistor and method for manufacturing the same
    58.
    发明授权
    Silicon carbide semiconductor device having junction field effect transistor and method for manufacturing the same 有权
    具有结场效应晶体管的碳化硅半导体器件及其制造方法

    公开(公告)号:US07691694B2

    公开(公告)日:2010-04-06

    申请号:US11785276

    申请日:2007-04-17

    CPC classification number: H01L29/1608 H01L29/66068 H01L29/8083 Y10S438/931

    Abstract: A silicon carbide semiconductor device includes a substrate and a junction field effect transistor. The transistor includes: a first semiconductor layer disposed on the substrate; a first gate layer disposed on a surface of the first semiconductor layer; a first channel layer adjacent to the first gate layer on the substrate; a first source layer connecting to the first channel layer electrically; a second gate layer adjacent to the first channel layer to sandwich the first channel layer; a second channel layer adjacent to the second gate layer to sandwich the second gate layer; a third gate layer adjacent to the second channel layer to sandwich the second channel layer; and a second source layer connecting to the second channel layer electrically.

    Abstract translation: 碳化硅半导体器件包括衬底和结场效应晶体管。 晶体管包括:设置在基板上的第一半导体层; 设置在所述第一半导体层的表面上的第一栅极层; 与所述基板上的所述第一栅极层相邻的第一沟道层; 电连接到第一沟道层的第一源极层; 与所述第一沟道层相邻以夹住所述第一沟道层的第二栅极层; 与所述第二栅极层相邻以夹住所述第二栅极层的第二沟道层; 与所述第二沟道层相邻以夹住所述第二沟道层的第三栅极层; 以及电连接到第二沟道层的第二源极层。

    POWER SEMICONDUCTOR DEVICE AND A METHOD OF FORMING A POWER SEMICONDUCTOR DEVICE
    59.
    发明申请
    POWER SEMICONDUCTOR DEVICE AND A METHOD OF FORMING A POWER SEMICONDUCTOR DEVICE 有权
    功率半导体器件和形成功率半导体器件的方法

    公开(公告)号:US20100032712A1

    公开(公告)日:2010-02-11

    申请号:US12186231

    申请日:2008-08-05

    Abstract: A power semiconductor device has a top surface and an opposed bottom surface below a part of which is a thick portion of semiconductor substrate. At least a portion of a drift region of the device has either no or only a thin portion of semiconductor substrate positioned thereunder. The top surface has a high voltage terminal and a low voltage terminal connected thereto to allow a voltage to be applied laterally across the drift region. At least two MOS (metal-oxide-semiconductor) gates are provided on the top surface. The device has at least one relatively highly doped region at its top surface extending between and in contact with said first and second MOS gates. The device has improved protection against triggering of parasitic transistors or latch-up without the on-state voltage drop or switching speed being compromised.

    Abstract translation: 功率半导体器件具有顶表面和相对的底表面,其下面的一部分是半导体衬底的厚部分。 装置的漂移区域的至少一部分具有没有或仅有半导体衬底的薄的部分位于其下方。 顶表面具有高电压端子和与其连接的低电压端子,以允许跨越漂移区域横向施加电压。 在顶表面上设置至少两个MOS(金属氧化物半导体)栅极。 器件在其顶表面处具有至少一个相对高度掺杂的区域,其在所述第一和第二MOS栅极之间延伸并与之接触。 该器件具有改进的防止寄生晶体管触发或闩锁的保护,而不会导致导通电压降或开关速度受损。

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