Method of chemical mechanical polishing with high throughput and low dishing
    51.
    发明授权
    Method of chemical mechanical polishing with high throughput and low dishing 失效
    化学机械抛光方法,具有高通量和低凹陷

    公开(公告)号:US06780773B2

    公开(公告)日:2004-08-24

    申请号:US10193469

    申请日:2002-07-11

    IPC分类号: H01L21641

    摘要: Method and apparatus are provided for polishing conductive materials with low dishing of features and reduced or minimal remaining residues. In one aspect, a method is provided for processing a substrate by polishing the substrate to remove bulk conductive material and polishing the substrate by a ratio of carrier head rotational speed to platen rotational speed of between about 2:1 and about 3:1 to remove residual conductive material. In another aspect, a method is provided for processing a substrate including polishing the substrate at a first relative linear velocity between about 600 mm/second and about 1900 mm/second at the center of the substrate, and polishing the substrate at a second relative linear velocity between about 100 mm/second and about 550 mm/second at the center of the substrate.

    摘要翻译: 提供了用于抛光导电材料的方法和装置,其具有低的特征凹陷和减少的或最小的剩余残余物。 在一个方面,提供了一种通过抛光衬底以去除体导电材料并通过载体头部旋转速度与平板旋转速度的比率在约2:1至约3:1之间来抛光衬底来进行衬底处理的方法,以去除 残留导电材料。 在另一方面,提供了一种用于处理衬底的方法,包括在衬底的中心以约600mm /秒至约1900mm /秒的第一相对线速度抛光衬底,并以第二相对线性 在衬底的中心处的速度在约100mm /秒到约550mm /秒之间。

    Planarization methods for patterned media disks
    53.
    发明授权
    Planarization methods for patterned media disks 失效
    图案化媒体盘的平面化方法

    公开(公告)号:US08474128B2

    公开(公告)日:2013-07-02

    申请号:US13082189

    申请日:2011-04-07

    IPC分类号: G11B5/127 H04R31/00

    摘要: A method is provided for forming a plurality of regions of magnetic material in a substrate having a first approximately planar surface. The method comprises the steps of fabricating projections in the first surface of the substrate, depositing onto the first surface a magnetic material in such a way that the tops of the projections are covered with magnetic material, and depositing filler material atop the substrate so produced. The filler material may then be planarized, for example by chemical-mechanical polishing. In an alternative embodiment magnetic material is deposited on a substrate and portions of it are removed, leaving islands of material. Filler material is then deposited, which may be planarized.

    摘要翻译: 提供了一种用于在具有第一近似平面的基板中形成多个磁性材料区域的方法。 该方法包括以下步骤:在基板的第一表面中制造突起,在第一表面上沉积磁性材料,使得凸起的顶部被磁性材料覆盖,并将填充材料沉积在如此制造的基板上。 然后可以例如通过化学机械抛光将填料材料平坦化。 在替代实施例中,磁性材料沉积在基底上,并且其部分被去除,留下材料岛。 然后沉积填料,其可以被平坦化。

    METHOD FOR MANUFACTURING AN ADVANCED MAGNETIC READ SENSOR
    54.
    发明申请
    METHOD FOR MANUFACTURING AN ADVANCED MAGNETIC READ SENSOR 审中-公开
    制造先进磁性读出传感器的方法

    公开(公告)号:US20120231296A1

    公开(公告)日:2012-09-13

    申请号:US13045724

    申请日:2011-03-11

    IPC分类号: G11B5/33 B44C1/22

    摘要: A method for manufacturing a magnetic sensor that minimizes topography resulting from stripe height defining masking and patterning in order to facilitate definition of track width. The method includes depositing a series of mask layers and then masking and ion milling the series of sensor layers to define a back edge of a sensor. A non-magnetic fill layer is then deposited, the magnetic fill layer being constructed of a material that has an ion mill rate that is similar to that of the series of sensor layers. A second masking and milling process is then performed to define the track width of the sensor and hard bias is deposited. Because the non-magnetic fill layer is removed at substantially the same rate as the sensor material the structure has a very flat topography on which to form the sensor track width.

    摘要翻译: 一种用于制造磁传感器的方法,其使由限定掩模和图案化的条纹高度导致的形貌最小化,以便于轨道宽度的定义。 该方法包括沉积一系列掩模层,然后掩蔽和离子铣削该系列传感器层以限定传感器的后边缘。 然后沉积非磁性填充层,磁性填充层由具有类似于该系列传感器层的离子磨机速率的材料构成。 然后执行第二掩蔽和铣削过程以限定传感器的轨道宽度,并且沉积硬偏置。 由于非磁性填充层以与传感器材料基本相同的速率被去除,所以结构具有非常平坦的形状,以形成传感器轨道宽度。

    Planarization methods for patterned media disks
    55.
    发明授权
    Planarization methods for patterned media disks 有权
    图案化媒体盘的平面化方法

    公开(公告)号:US07941911B2

    公开(公告)日:2011-05-17

    申请号:US11641237

    申请日:2006-12-18

    IPC分类号: G11B5/127 H04R31/00

    摘要: A method is provided for forming a plurality of regions of magnetic material in a substrate having a first approximately planar surface. The method comprises the steps of fabricating projections in the first surface of the substrate, depositing onto the first surface a magnetic material in such a way that the tops of the projections are covered with magnetic material, and depositing filler material atop the substrate so produced. The filler material may then be planarized, for example by chemical-mechanical polishing. In an alternative embodiment magnetic material is deposited on a substrate and portions of it are removed, leaving islands of material. Filler material is then deposited, which may be planarized.

    摘要翻译: 提供了一种用于在具有第一近似平面的基板中形成多个磁性材料区域的方法。 该方法包括以下步骤:在衬底的第一表面中制造突起,在第一表面上沉积磁性材料,使得突起的顶部被磁性材料覆盖,并将填充材料沉积在如此制造的衬底上。 然后可以例如通过化学机械抛光将填料材料平坦化。 在替代实施例中,磁性材料沉积在基底上,并且其部分被去除,留下材料岛。 然后沉积填料,其可以被平坦化。

    MANUFACTURING A NARROW TRACK READ HEAD
    56.
    发明申请
    MANUFACTURING A NARROW TRACK READ HEAD 有权
    制造一个窄幅追踪阅读头

    公开(公告)号:US20100112487A1

    公开(公告)日:2010-05-06

    申请号:US12261241

    申请日:2008-10-30

    申请人: Quang Le Jui-Lung Li

    发明人: Quang Le Jui-Lung Li

    IPC分类号: G03F7/20

    摘要: Embodiments of the invention operate to narrow the track width of a read head used in a disk drive. In one embodiment, a magnetic read head has a track width of about 40 nm or less. The read head is fabricated by a method that includes fabricating a film stack from a substrate, a sensor material, a stop material, a first release material, a mask material, and a photo resist material. The mask material may include a masking substrate material and a second release material. The film stack is processed by forming a read head image in the photo resist material, removing portions of the film stack that lie outside the read head image of the photo resist material, stripping the film stack to remove the photo resist, mask and first release materials, and milling the sensor material according to the read head image.

    摘要翻译: 本发明的实施例用于缩小磁盘驱动器中使用的读取头的磁道宽度。 在一个实施例中,磁读头具有约40nm或更小的轨道宽度。 读取头通过包括从基底,传感器材料,止挡材料,第一释放材料,掩模材料和光致抗蚀剂材料制造薄膜叠层的方法制造。 掩模材料可以包括掩蔽衬底材料和第二释放材料。 通过在光致抗蚀剂材料中形成读头图像来处理胶片堆叠,去除位于光致抗蚀剂材料的读取头图像之外的膜堆叠的部分,剥离胶片堆叠以除去光致抗蚀剂,掩模和第一释放 材料,并根据读头图像铣削传感器材料。

    Method to fabricate side shields for a magnetic sensor
    57.
    发明授权
    Method to fabricate side shields for a magnetic sensor 失效
    制造磁性传感器侧面屏蔽的方法

    公开(公告)号:US07574791B2

    公开(公告)日:2009-08-18

    申请号:US11126508

    申请日:2005-05-10

    IPC分类号: G11B5/187

    摘要: A method for fabricating magnetic side shields for an MR sensor of a magnetic head. Following the deposition of MR sensor layers, a first DLC layer is deposited. Milling mask layers are then deposited, and outer portions of the milling mask layers are removed such that a remaining central portion of the milling mask layers is formed having straight sidewalls and no undercuts. Outer portions of the sensor layers are then removed such that a relatively thick remaining central portion of the milling mask resides above the remaining sensor layers. A thin electrical insulation layer is deposited, followed by the deposition of magnetic side shields. A second DLC layer is deposited and the remaining mask layers are then removed utilizing a chemical mechanical polishing (CMP) liftoff step. Thereafter, the first DLC layer and the second DLC layer are removed and a second magnetic shield layer is then fabricated thereabove.

    摘要翻译: 一种用于制造用于磁头的MR传感器的磁性侧屏蔽的方法。 在MR传感器层的沉积之后,沉积第一DLC层。 然后沉积铣削掩模层,并且去除铣削掩模层的外部,使得铣削掩模层的剩余中心部分形成为具有直的侧壁并且没有底切。 然后去除传感器层的外部部分,使得铣削掩模的相对较厚的剩余中心部分位于剩余传感器层的上方。 沉积薄的电绝缘层,随后沉积磁性侧屏蔽层。 沉积第二DLC层,然后利用化学机械抛光(CMP)剥离步骤除去剩余的掩模层。 此后,去除第一DLC层和第二DLC层,然后在其上制造第二磁屏蔽层。

    Method for forming a write head having an air bearing surface (ABS)
    58.
    发明授权
    Method for forming a write head having an air bearing surface (ABS) 失效
    用于形成具有空气轴承表面(ABS)的写入头的方法

    公开(公告)号:US07464457B2

    公开(公告)日:2008-12-16

    申请号:US11469132

    申请日:2006-08-31

    IPC分类号: G11B5/127 H04R31/00

    摘要: Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

    摘要翻译: 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层,其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层,停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层,其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。