公开(公告)号：US08011084B2

公开(公告)日：2011-09-06

申请号：US12184054

申请日：2008-07-31

Applicant: Quang Le ,  Jui-Lung Li

Inventor： Quang Le ,  Jui-Lung Li

IPC: G11B5/127 ,  H04R31/00

CPC classification number: G11B5/3909 ,  B82Y10/00 ,  B82Y25/00 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3163 ,  G11B5/3932 ,  G11B2005/3996 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

Abstract: A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because all areas other than the area directly over the sensor are substantially planar a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.

Abstract translation: 一种用于制造磁阻传感器的方法，该传感器允许传感器被构造成具有非常窄且良好控制的轨道宽度。 该方法包括在一系列传感器层上沉积一层类似金刚石的碳。 然后形成第一掩模以限定传感器，并且执行离子铣削以去除未被第一掩模保护的传感器材料。 然后，形成第二掩模，并且在传感器层的厚度上沉积硬偏置层。 然后将第二掩模剥离并执行CMP以除去第一掩模结构。 由于除传感器正上方的区域以外的所有区域基本上是平面的（由于第二掩模的移除和硬偏置材料的低水平），可以使用快速，温和的CMP来去除第一掩模层，即使 第一个掩模很小，如定义非常窄的轨道宽度传感器。

公开(公告)号：US20100128392A1

公开(公告)日：2010-05-27

申请号：US12646858

申请日：2009-12-23

Applicant: Christian Rene Bonhote ,  Thomas Dudley Boone, JR. ,  Quang Le ,  Jui-Lung Li ,  Jeffrey S. Lille ,  Scott Arthur MacDonald ,  Neil Leslie Robertson ,  Xhavin Sinha ,  Petrus Antonius Van Der Heijden

Inventor： Christian Rene Bonhote ,  Thomas Dudley Boone, JR. ,  Quang Le ,  Jui-Lung Li ,  Jeffrey S. Lille ,  Scott Arthur MacDonald ,  Neil Leslie Robertson ,  Xhavin Sinha ,  Petrus Antonius Van Der Heijden

IPC: G11B5/127

CPC classification number: G11B5/3146 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

Abstract: A magnetic write head for data recording having a magnetic write pole with a stepped magnetic shell structure that defines a secondary flare point. The secondary flare point defined by the magnetic shell portion can be more tightly controlled with respect to its distance from the air bearing surface (ABS) of the write head than can a traditional flare point that is photolithographically on the main pole structure. This allows the effective flare point of the write head to be moved much closer to the ABS than would otherwise be possible using currently available tooling and photolithography techniques. The write head also includes a non-magnetic spacer layer formed over the magnetic shell structure and a trailing magnetic shield, a portion of which is formed over the non-magnetic spacer.

Abstract translation: 一种用于数据记录的磁写头，具有限定二次闪光点的阶梯状磁性壳结构的磁性写入极。 由磁性壳体部分限定的次级火炬点可以相对于与写入磁头的空气轴承表面（ABS）的距离比在主极结构上光刻的传统闪光点更加严格地控制。 这使得使用当前可用的工具和光刻技术可以使写入头的有效喇叭点移动得更接近ABS。 写头还包括形成在磁性壳结构上的非磁性间隔层和尾部磁屏蔽，其一部分形成在非磁性间隔物上。

公开(公告)号：US20100126001A1

公开(公告)日：2010-05-27

申请号：US12646884

申请日：2009-12-23

Applicant: Christian Rene Bonhote ,  Thomas Budley Boone, JR. ,  Quang Le ,  Jui-Lung Li ,  Jeffrey S. Lille ,  Scott Arthur MacDonald ,  Neil Leslie Robertson ,  Xhavin Sinha ,  Petrus Antonius Van Der Heijden

Inventor： Christian Rene Bonhote ,  Thomas Budley Boone, JR. ,  Quang Le ,  Jui-Lung Li ,  Jeffrey S. Lille ,  Scott Arthur MacDonald ,  Neil Leslie Robertson ,  Xhavin Sinha ,  Petrus Antonius Van Der Heijden

IPC: G11B5/127

CPC classification number: G11B5/3146 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

Abstract: A method for self aligning a lapping guide with a structure of a write pole. A write pole is formed over a substrate and an electrically conductive material lapping guide material is deposited in a location that is removed from the write pole. A mask is then formed over a portion of the write pole and a portion of the electrically conductive material. A material removal process such as reactive ion etching can then be performed to remove a portion of the magnetic material that is not protected by the mask structure. An magnetic material is then electroplated over the write pole with the write pole, with the mask still in place. In this way, the electroplated material has an edge that is self aligned with an edge of the electrically conductive lapping guide material, both being defined by the same mask structure.

Abstract translation: 一种用于将研磨导向器与写入杆的结构自对准的方法。 写入极在衬底上形成，并且导电材料研磨引导材料沉积在从写柱移除的位置。 然后在写入极的一部分和导电材料的一部分上形成掩模。 然后可以执行诸如反应离子蚀刻的材料去除处理以去除未被掩模结构保护的磁性材料的一部分。 然后将磁性材料用写入极电镀在写入极上，同时掩模仍然在位。 以这种方式，电镀材料具有与导电研磨导向材料的边缘自对准的边缘，两者都由相同的掩模结构限定。

公开(公告)号：US20060288565A1

公开(公告)日：2006-12-28

申请号：US11469132

申请日：2006-08-31

Applicant: Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

Inventor： Quang Le ,  Edward Lee ,  Jui-Lung Li ,  Aron Pentek ,  Nian-Xiang Sun

IPC: G11B5/127

CPC classification number: G11B5/1278 ,  G11B5/112 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

Abstract: Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

Abstract translation: 形成写头的方法 一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。 另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。 另一种方法包括在极尖中形成凹陷。

公开(公告)号：US20050219747A1

公开(公告)日：2005-10-06

申请号：US10815286

申请日：2004-03-31

Applicant: Yimin Hsu ,  Quang Le ,  Jui-Lung Li ,  Ian McFadyen ,  James Nix ,  Neil Robertson ,  Mason Williams

Inventor： Yimin Hsu ,  Quang Le ,  Jui-Lung Li ,  Ian McFadyen ,  James Nix ,  Neil Robertson ,  Mason Williams

IPC: G11B5/127 ,  G11B5/147 ,  G11B5/187 ,  G11B5/31

CPC classification number: G11B5/3146 ,  G11B5/1278 ,  G11B5/1872 ,  G11B5/3116

Abstract: A magnetic write head for us in perpendicular magnetic recording tapered trailing shield design for improved write flux, and field gradient performance.

Abstract translation: 一种用于我们的磁性写头，用于垂直磁记录锥形后屏蔽设计，用于改善写通量和场梯度性能。

公开(公告)号：US08296930B2

公开(公告)日：2012-10-30

申请号：US12645323

申请日：2009-12-22

Applicant: Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

Inventor： Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

IPC: G11B5/127 ,  H04R31/00

CPC classification number: G11B5/3163 ,  G11B5/112 ,  G11B5/3912 ,  G11B5/398 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.

Abstract translation: 一种用于制造磁阻传感器的方法，其导致传感器具有非常平坦的顶部磁屏蔽。 该过程包括沉积多个传感器层，然后在传感器层上沉积薄的高密度碳CMP停止层，并在CMP停止层上形成掩模。 执行离子铣削来定义传感器。 然后沉积薄的绝缘层和磁性硬偏置层。 进行化学机械抛光以除去掩模，并执行反应离子蚀刻以除去剩余的碳CMP停止层。 因为CMP停止层非常致密且硬，所以可以使其非常薄。 这意味着当通过反应离子蚀刻去除时，在传感器上几乎没有凹口，从而允许上部屏蔽（沉积在其上）非常薄。

公开(公告)号：US20120127616A1

公开(公告)日：2012-05-24

申请号：US12954508

申请日：2010-11-24

Applicant: HONGLIN ZHU ,  Liubo Hong ,  Hicham M. Sougrati ,  Quang Le ,  Jui-Lung Li ,  Chando Park

Inventor： HONGLIN ZHU ,  Liubo Hong ,  Hicham M. Sougrati ,  Quang Le ,  Jui-Lung Li ,  Chando Park

IPC: G11B5/33 ,  B44C1/22 ,  B05D5/12

CPC classification number: G11B5/3163 ,  G01R33/098 ,  G11B5/3909 ,  G11B5/3929 ,  G11B5/3932

Abstract: Embodiments herein generally relate to TMR readers and methods for their manufacture. The embodiments discussed herein disclose TMR readers that utilize a structure that avoids use of the DLC layer over the sensor structure and over the hard bias layer. The capping structure over the sensor structure functions as both a protective layer for the sensor structure and a CMP stop layer. The hard bias capping structure functions as both a protective structure for the hard bias layer and as a CMP stop layer. The capping structures that are free of DLC reduce the formation of notches in the second shield layer so that second shield layer is substantially flat.

Abstract translation: 本文的实施方案通常涉及TMR读取器及其制造方法。 本文讨论的实施例公开了使用避免在传感器结构上以及硬偏压层上使用DLC层的结构的TMR读取器。 传感器结构上的封盖结构用作传感器结构的保护层和CMP停止层。 硬偏置封盖结构既用作硬偏置层的保护结构又用作CMP停止层。 没有DLC的封盖结构减少了第二屏蔽层中的凹口的形成，使得第二屏蔽层基本上是平的。

公开(公告)号：US07572499B2

公开(公告)日：2009-08-11

申请号：US11044777

申请日：2005-01-26

Applicant: Zvonimir Z. Bandic ,  A. David Erpelding ,  Jordan Asher Katine ,  Quang Le ,  Kim Y. Lee ,  Jui-Lung Li ,  Michael J. Rooks

Inventor： Zvonimir Z. Bandic ,  A. David Erpelding ,  Jordan Asher Katine ,  Quang Le ,  Kim Y. Lee ,  Jui-Lung Li ,  Michael J. Rooks

IPC: G11B5/64 ,  G11B5/66 ,  G11B5/65 ,  G11B5/86

CPC classification number: G11B5/865 ,  G11B5/855 ,  Y10T428/24612

Abstract: A contact magnetic transfer (CMT) master template has a flexible plastic film with a planarized top or upper surface containing magnetic islands separated from one another by nonmagnetic regions. The flexible plastic film is secured at its perimeter to a silicon annulus that provides rigid support at the perimeter of the film. The plastic film is preferably polyimide that has recesses filled with the magnetic material that form the pattern of magnetic islands. The upper surfaces of the islands and the upper surfaces of the nonmagnetic regions form a continuous planar surface. The nonmagnetic regions are formed of chemical-mechanical-polishing (CMP) stop layer material that remains after a CMP process has planarized the upper surface of the plastic film.

Abstract translation: 接触磁传递（CMT）主模板具有柔性塑料膜，其具有包含通过非磁性区域彼此分离的磁岛的平坦化顶部或上部表面。 柔性塑料膜在其周边固定在硅环上，该硅环在膜的周边提供刚性支撑。 塑料膜优选为具有填充有形成磁岛图案的磁性材料的凹部的聚酰亚胺。 岛的上表面和非磁性区的上表面形成连续的平坦表面。 非磁性区域由化学机械抛光（CMP）阻挡层材料形成，其在CMP工艺已经使塑料膜的上表面平坦化之后残留。

公开(公告)号：US07160477B2

公开(公告)日：2007-01-09

申请号：US11044288

申请日：2005-01-26

Applicant: Zvonimir Z. Bandic ,  A. David Erpelding ,  Jordan Asher Katine ,  Quang Le ,  Kim Y. Lee ,  Jui-Lung Li ,  Michael J. Rooks

Inventor： Zvonimir Z. Bandic ,  A. David Erpelding ,  Jordan Asher Katine ,  Quang Le ,  Kim Y. Lee ,  Jui-Lung Li ,  Michael J. Rooks

IPC: B44C1/22

CPC classification number: G11B5/865 ,  B82Y10/00 ,  C23F3/04 ,  C23F4/00 ,  G11B5/72 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  Y10T29/4903 ,  Y10T29/49032

Abstract: A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.

Abstract translation: 通过首先将塑料膜粘附到硅晶片的第一表面上来制造接触磁传递（CMT）主模板。 然后在聚酰亚胺膜上形成抗蚀剂图案，并通过抗蚀剂反应离子蚀刻聚酰亚胺以形成凹陷。 去除抗蚀剂，并在化学机械抛光（CMP）停止层上沉积在聚酰亚胺的非凹陷区域上，并且任选地沉积到凹部的底部中。 然后将一层磁性材料沉积在聚酰亚胺膜上以填充凹部。 然后执行CMP处理以除去凹部上方的磁性材料并且在非凹陷区域上方并继续直到达到CMP停止层。 所得到的聚酰亚胺膜的上表面是磁性岛的连续平面膜和作为模板的非磁性区域的CMP停止层材料的区域。

公开(公告)号：US08778198B2

公开(公告)日：2014-07-15

申请号：US13172739

申请日：2011-06-29

Applicant: Quang Le ,  Shin Funada ,  Jui-Lung Li

Inventor： Quang Le ,  Shin Funada ,  Jui-Lung Li

IPC: B44C1/22

CPC classification number: G03F7/20 ,  B82Y10/00 ,  G11B5/3169 ,  G11B5/3909 ,  G11B2005/3996

Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.

Abstract translation: 一种用传感器材料的硬偏置结构沉积和图案化的电研磨导向器制造磁传感器的方法。 该方法包括沉积传感器材料，以及图案化和离子铣削传感器材料以限定传感器的轨道宽度。 然后沉积磁性，硬偏置材料，并且执行第二图案化和离子铣削工艺以同时限定电研磨引导件的后边缘和传感器的后边缘。