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21 条记录 (耗时 0.032 秒)

    Trash can
    1.
    外观设计
    Trash can 有权

    公开(公告)号：USD1013997S1

    公开(公告)日：2024-02-06

    申请号：US29770906

    申请日：2021-02-17

    申请人： Shi Ping Wang ,  Wenbin Ye

    设计人： Shi Ping Wang ,  Wenbin Ye

    摘要： FIG. 1 is a perspective view of a trash can of our new design.
    FIG. 2 is a front view of FIG. 1.
    FIG. 3 is a rear view of FIG. 1.
    FIG. 4 is a left end view of FIG. 1.
    FIG. 5 is a right end view of FIG. 1; and,
    FIG. 6 is a top view of FIG. 1.
    The broken lines in the figures show portions of the trash can which form no part of the claimed design.

    Sterilization and Deodorization Waste Container
    2.
    发明公开
    Sterilization and Deodorization Waste Container 审中-公开

    公开(公告)号：US20230355828A1

    公开(公告)日：2023-11-09

    申请号：US18222383

    申请日：2023-07-14

    申请人： Shi Ping Wang

    发明人： Shi Ping WANG ,  Jiangqun CHEN ,  Youxi LOU ,  Zhou LIN

    IPC分类号： A61L11/00 ,  B65F1/14

    CPC分类号： A61L11/00 ,  B65F1/14

    摘要： A sterilization and deodorization waste container includes an isolation chamber provided on an inner side of a container lid and a dual-wave band ultraviolet lamp tube installed in the isolation chamber. The dual-wave band ultraviolet lamp tube is capable of simultaneously generating a direct ultraviolet light wave and an ozone ultraviolet light wave. The isolation chamber includes a reflector housing having a light transmitting window facing an inner cavity of a container body. The dual-wave band ultraviolet lamp tube is controlled by a control circuit to turn on to generate the ultraviolets into an inner cavity of the container body while the container lid is closed and to turn off to stop generating the ultraviolet while the container lid is opened.

    SYSTEM AND METHOD FOR IN-SITU HEAD RINSE
    3.
    发明申请
    SYSTEM AND METHOD FOR IN-SITU HEAD RINSE 审中-公开
    用于现场头部冲洗的系统和方法

    公开(公告)号：US20080003931A1

    公开(公告)日：2008-01-03

    申请号：US11562811

    申请日：2006-11-22

    申请人： Antoine Manens ,  Alain Duboust ,  Paul Butterfield ,  Yan Wang ,  Shi-Ping Wang ,  Zhihong Wang ,  Andrew Nagengast ,  Wei-Yung Hsu ,  Liang-Yuh Chen

    发明人： Antoine Manens ,  Alain Duboust ,  Paul Butterfield ,  Yan Wang ,  Shi-Ping Wang ,  Zhihong Wang ,  Andrew Nagengast ,  Wei-Yung Hsu ,  Liang-Yuh Chen

    IPC分类号： B24B53/007

    CPC分类号： B24B37/30 ,  B24B55/00 ,  H01L21/67219

    摘要： A carrier head and a method of cleaning the carrier head are disclosed. The carrier head may have one or more openings through a sidewall that extend into a cavity within the carrier head using a fluid passage. The openings may each have a lip. The lip may have a chamfered edge. Additionally, a fluid passage may slope generally downward from the openings to the cavity. The chamfered lips and the sloped fluid passage reduce back splashing and help ensure that sufficient rinsing fluid reaches the cavity to rinse polishing fluid and particles from the carrier head. The present invention relates to carrier heads for polishing or planarizing semiconductor substrates by chemical mechanical polishing (CMP) or electrochemical mechanical polishing (ECMP). The cavities in the carrier head are cleaned by rinsing fluid (i.e., liquid or gas) from inside the cavity towards a substrate receiving side of the carrier head.

    摘要翻译： 公开了载体头和清洁载体头的方法。 载体头部可以具有穿过侧壁的一个或多个开口，该侧壁使用流体通道延伸到载体头部内的空腔中。 开口可以各自具有唇缘。 唇缘可以具有倒角边缘。 此外，流体通道可以从开口大致向下倾斜到空腔。 倒角的唇缘和倾斜的流体通道减少了飞溅，并有助于确保足够的冲洗流体到达腔体以从载体头部漂洗抛光液和颗粒。 本发明涉及用于通过化学机械抛光（CMP）或电化学机械抛光（ECMP）对半导体衬底进行抛光或平面化的载体头。 载体头部中的空腔通过从空腔内部朝向承载头的基板接收侧的冲洗流体（即，液体或气体）来清洁。

    Metal CMP process on one or more polishing stations using slurries with oxidizers
    5.
    发明申请
    Metal CMP process on one or more polishing stations using slurries with oxidizers 审中-公开
    使用具有氧化剂的浆料在一个或多个抛光站上进行金属CMP处理

    公开(公告)号：US20060219663A1

    公开(公告)日：2006-10-05

    申请号：US11338146

    申请日：2006-01-23

    申请人： Shi-Ping Wang ,  Martin Wohlert ,  Alain Duboust ,  Renhe Jia ,  Feng Liu ,  Yuan Tian ,  Liang-Yuh Chen ,  Stan Tsai ,  Wei-Yung Hsu

    发明人： Shi-Ping Wang ,  Martin Wohlert ,  Alain Duboust ,  Renhe Jia ,  Feng Liu ,  Yuan Tian ,  Liang-Yuh Chen ,  Stan Tsai ,  Wei-Yung Hsu

    IPC分类号： C03C15/00 ,  H01L21/302 ,  B44C1/22 ,  H01L21/461

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C23F3/04 ,  C23F3/06 ,  H01L21/32125 ,  H01L21/7684

    摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. In one aspect, a full sequence electrochemical mechanical planarization technique is provided. In another aspect, a hybrid planarization technique using combination of at least one chemical mechanical polishing process and at least one electrochemical mechanical polishing process is provided. In addition, a multi-step polishing process for polishing a substrate surface using at least two oxidizers in one or more polishing composition is described. The polishing composition may be used in the full sequence or the hybrid planarization technique. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization defects.

    摘要翻译： 提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。 一方面，提供了全序列电化学机械平面化技术。 在另一方面，提供了使用至少一种化学机械抛光工艺和至少一种电化学机械抛光工艺的组合的混合平面化技术。 此外，描述了在一种或多种研磨组合物中使用至少两种氧化剂来研磨衬底表面的多步抛光方法。 抛光组合物可以以全序或混合平面化技术使用。 本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时减小了平坦化缺陷。

    Method of chemical mechanical polishing with high throughput and low dishing
    6.
    发明申请
    Method of chemical mechanical polishing with high throughput and low dishing 失效
    化学机械抛光方法，具有高通量和低凹陷

    公开(公告)号：US20050026442A1

    公开(公告)日：2005-02-03

    申请号：US10924417

    申请日：2004-08-24

    申请人： Shijian Li ,  Jui-Lung Li ,  Shi-Ping Wang ,  Gary Lam ,  David Mai ,  Fred Redeker

    发明人： Shijian Li ,  Jui-Lung Li ,  Shi-Ping Wang ,  Gary Lam ,  David Mai ,  Fred Redeker

    IPC分类号： B24B1/00 ,  B24B5/00 ,  B24B29/00 ,  B24B37/04 ,  C23F1/00 ,  H01L21/306 ,  H01L21/321 ,  H01L21/461 ,  H01L21/4763 ,  H01L21/768 ,  H01L21/302 ,  H01L21/44

    CPC分类号： H01L21/3212 ,  B24B37/042 ,  B24B37/30 ,  H01L21/7684

    摘要： Method and apparatus are provided for polishing conductive materials with low dishing of features and reduced or minimal remaining residues. In one aspect, a method is provided for processing a substrate by polishing the substrate to remove bulk conductive material and polishing the substrate by a ratio of carrier head rotational speed to platen rotational speed of between about 2:1 and about 3:1 to remove residual conductive material. In another aspect, a method is provided for processing a substrate including polishing the substrate at a first relative linear velocity between about 600 mm/second and about 1900 mm/second at the center of the substrate, and polishing the substrate at a second relative linear velocity between about 100 mm/second and about 550 mm/second at the center of the substrate.

    摘要翻译： 提供了用于抛光导电材料的方法和装置，其具有低的特征凹陷和减少的或最小的剩余残余物。 在一个方面，提供了一种通过抛光衬底以去除体导电材料并通过载体头部旋转速度与平板旋转速度的比率在约2:1至约3:1之间来抛光衬底来进行衬底处理的方法，以去除 残留导电材料。 在另一方面，提供了一种用于处理衬底的方法，包括在衬底的中心以约600mm /秒至约1900mm /秒的第一相对线速度抛光衬底，并以第二相对线性 在衬底的中心处的速度在约100mm /秒到约550mm /秒之间。

    Circuit Control Method of Induction Trash Can with Cold Cathode Ultraviolet Lamp Deodorization
    8.
    发明公开
    Circuit Control Method of Induction Trash Can with Cold Cathode Ultraviolet Lamp Deodorization 审中-公开

    公开(公告)号：US20240139359A1

    公开(公告)日：2024-05-02

    申请号：US18204945

    申请日：2023-06-02

    申请人： Shi Ping Wang

    发明人： Shi Ping Wang ,  Jiangqun Chen ,  Hao Jun Lin ,  Zhou Lin

    IPC分类号： A61L2/10 ,  A61L2/24 ,  A61L9/01 ,  B65F1/16 ,  B65F7/00

    CPC分类号： A61L2/10 ,  A61L2/24 ,  A61L9/01 ,  B65F1/1638 ,  B65F7/00 ,  B65F2210/168

    摘要： The present invention relates to a control technology of an electronic household trash container, in particular, a circuit control method of induction trash can with cold cathode ultraviolet lamp deodorization, which includes steps of setting a working cycle and a turn-off cycle of a ultraviolet sterilization and deodorization circuit, setting up an infrared pulse testing circuit to work for a predetermine number of times per second during the working cycle, wherein each working time of the infrared pulse testing circuit is 1 ms˜8 ms. The working time of the infrared pulse testing circuit is embedded in the working time of the sterilization and deodorization circuit so as to effectively implement the separation and integration of the working times thereof to effectively avoid the interference of the infrared pulse testing circuit, ensure the reliability of the induction of the lid, effectively prolong the service life of the cold cathode ultraviolet lamp, and achieve a more ideal sterilization and deodorization effect, with good safety performance, simple and reliable circuit structure, and low cost.

    Garbage bin with lid
    9.
    外观设计
    Garbage bin with lid 有权

    公开(公告)号：USD1011679S1

    公开(公告)日：2024-01-16

    申请号：US29883908

    申请日：2023-02-04

    申请人： Shi Ping Wang ,  Wenbin Ye ,  Jiangqun Chen

    设计人： Shi Ping Wang ,  Wenbin Ye ,  Jiangqun Chen

    摘要： FIG. 1 is a perspective view of a garbage bin with lid showing my new design;
    FIG. 2 is a front view thereof;
    FIG. 3 is a rear view thereof;
    FIG. 4 is a left side view thereof;
    FIG. 5 is a right side view thereof;
    FIG. 6 is a top view thereof;
    FIG. 7 is a perspective view of the Lid of the garbage bin with lid of my new design in close condition; and,
    FIG. 8 is a partial perspective view of the garbage bin with lid of my new design, illustrating the Lid is in open condition.
    The broken lines in the drawings depict portions of the garbage bin with Lid that forms no part of the claimed design.