Red printing ink for color filter applications
    51.
    发明申请
    Red printing ink for color filter applications 审中-公开
    用于滤色镜应用的红色油墨

    公开(公告)号:US20070015847A1

    公开(公告)日:2007-01-18

    申请号:US11182501

    申请日:2005-07-15

    IPC分类号: C03C17/00

    CPC分类号: C09D11/322

    摘要: Red inks for displays are provided. In one aspect, the red inks include one or more red organic pigments, one or more monomers, one or more polymeric dispersants, and one or more organic solvents. In another aspect, the red inks include one or more red organic pigments, one or more yellow pigments, one or more monomers, one or more oligomers, one or more polymeric dispersants, and one or more organic solvents. Methods of forming displays that include dispensing the red inks by inkjetting onto a substrate and displays that include the red inks are also provided.

    摘要翻译: 提供了用于显示器的红色油墨。 一方面,红色油墨包括一种或多种红色有机颜料,一种或多种单体,一种或多种聚合物分散剂和一种或多种有机溶剂。 另一方面,红色油墨包括一种或多种红色有机颜料,一种或多种黄色颜料,一种或多种单体,一种或多种低聚物,一种或多种聚合物分散剂和一种或多种有机溶剂。 形成显示器的方法包括通过喷墨到基板上分配红色油墨并且还提供包括红色油墨的显示器。

    Method for dechucking a substrate
    52.
    发明授权
    Method for dechucking a substrate 失效
    剥离基材的方法

    公开(公告)号:US07160392B2

    公开(公告)日:2007-01-09

    申请号:US10688384

    申请日:2003-10-17

    IPC分类号: H01L21/027 C23C16/00

    CPC分类号: H01L21/68742 C23C16/458

    摘要: A substrate support assembly and method for dechucking a substrate is provided. In one embodiment, a support assembly includes a substrate support having a support surface, a first set of lift pins and one or more other lift pins movably disposed through the substrate support. The first set of lift pins and the one or more lift pins project from the support surface when the pins are in an actuated position. When in the actuated position, the first set of lift pins project a longer distance from the support surface than the one or more other lift pins. In another aspect of the invention, a method for dechucking a substrate from a substrate support is provided. In one embodiment, the method includes the steps of projecting a first set of lift pins a first distance above a surface of a substrate support, and projecting a second set of lift pins a second distance above the surface of the substrate support that is less than the first distance.

    摘要翻译: 提供了一种用于对基板进行脱扣的基板支撑组件和方法。 在一个实施例中,支撑组件包括具有支撑表面的基板支撑件,第一组提升销和可移动地设置穿过基板支撑件的一个或多个其他提升销。 当销处于致动位置时,第一组提升销和一个或多个提升销从支撑表面突出。 当处于致动位置时,第一组提升销与支撑表面比一个或多个其他提升销突出较长的距离。 在本发明的另一方面,提供了一种用于从基板支撑件去除基板的方法。 在一个实施例中,该方法包括以下步骤:将第一组提升销投影在衬底支撑件的表面之上的第一距离处,并且将第二组提升销投影在衬底支撑件的表面上方的第二距离处,该第二组提升销小于 第一个距离。

    Methods and apparatus for precision control of print head assemblies
    55.
    发明申请
    Methods and apparatus for precision control of print head assemblies 失效
    打印头组件精密控制的方法和装置

    公开(公告)号:US20060092207A1

    公开(公告)日:2006-05-04

    申请号:US11061120

    申请日:2005-02-18

    IPC分类号: B41J29/38

    摘要: The present invention provides methods and apparatus for controlling the quantity of fluid output (e.g., drop size) by individual nozzles of a print head to a very high precision at a frequency equal to the frequency at which fluid is normally dispensed. This is achieved by mapping fluid quantity control information into the data that represents the image to be printed. Data representative of an image is received and converted into pixel data. In at least one embodiment, the pixel data includes pixels represented by N bits, and the N bits may represent a drop size for the pixel and a union of the N bits may represent a nozzle status. A print head may be controlled based on the pixel data, and the print head may include nozzles that are each adapted to deposit at least one drop size quantity of a fluid on a substrate.

    摘要翻译: 本发明提供了用于以等于通常分配流体的频率的频率将打印头的各个喷嘴的流体输出量(例如,液滴尺寸)控制到非常高的精度的方法和装置。 这通过将流体量控制信息映射到表示要打印的图像的数据来实现。 接收表示图像的数据并将其转换为像素数据。 在至少一个实施例中,像素数据包括由N位表示的像素,并且N位可以表示像素的液滴大小,并且N位的并集可以表示喷嘴状态。 可以基于像素数据来控制打印头,并且打印头可以包括各自适于在衬底上沉积至少一个液滴量的流体的喷嘴。

    Droplet visualization of inkjetting
    56.
    发明申请
    Droplet visualization of inkjetting 审中-公开
    喷墨的液滴可视化

    公开(公告)号:US20060071957A1

    公开(公告)日:2006-04-06

    申请号:US11123502

    申请日:2005-05-04

    IPC分类号: B41J2/09

    CPC分类号: B41J2/12 B41J29/393

    摘要: The embodiments of the present invention describe an apparatus and a method of visualizing droplets dispensed from an inkjet printing system. A droplet visualization system is integrated with the inkjet printing system and is capable of measuring the sizes and the speeds of dispensed inkjet droplets and capturing the trajectories of the dispensed inkjet droplets. The measured information regarding the sizes, the speeds and trajectories of the droplets is feedback to the inkjet printing system to monitor and to control the dispense operation of the inkjet printing system. Due to this feedback control, the uniformities of the sizes, the speeds and the trajectories can be monitored and be improved.

    摘要翻译: 本发明的实施例描述了一种可视化从喷墨打印系统分配的液滴的装置和方法。 液滴可视化系统与喷墨打印系统集成,并且能够测量分配的喷墨液滴的尺寸和速度并捕获分配的喷墨液滴的轨迹。 关于液滴的尺寸,速度和轨迹的测量信息被反馈到喷墨打印系统以监视和控制喷墨打印系统的分配操作。 由于这种反馈控制,可以监测和改进尺寸,速度和轨迹的均匀性。

    Shadow frame with cross beam for semiconductor equipment
    58.
    发明授权
    Shadow frame with cross beam for semiconductor equipment 有权
    用于半导体设备的横梁的阴影框架

    公开(公告)号:US06960263B2

    公开(公告)日:2005-11-01

    申请号:US10136249

    申请日:2002-04-25

    摘要: A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom engagement surface; and a cross beam disposed between at least two edges of the frame, the cross beam having a top surface and a bottom engagement surface, the engagement surface of the cross beam configured to be flush with the engagement surface of the lip; wherein one or more of the engagement surfaces are configured to cover metal interconnect bonding areas on a carrier disposed below the frame. The shadow frame is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications used to make active matrix liquid crystal displays (AMLCDs) and solar cells.

    摘要翻译: 一种用于半导体制造设备的阴影框架和框架系统,包括具有四个边缘的矩形框架,所述边缘形成具有顶部表面和底部接合表面的内部唇部; 以及设置在所述框架的至少两个边缘之间的横梁,所述横梁具有顶表面和底部接合表面,所述横梁的接合表面被配置为与所述唇缘的接合表面齐平; 其中所述接合表面中的一个或多个构造成覆盖设置在所述框架下方的载体上的金属互连结合区域。 阴影框架在用于制造有源矩阵液晶显示器(AMLCD)和太阳能电池的等离子体增强化学气相沉积(PECVD)应用中特别有用。

    Method and apparatus for enhanced chamber cleaning
    60.
    发明授权
    Method and apparatus for enhanced chamber cleaning 有权
    用于增强腔室清洁的方法和装置

    公开(公告)号:US06863077B2

    公开(公告)日:2005-03-08

    申请号:US10195718

    申请日:2002-07-15

    CPC分类号: H01L21/67063 H01L21/67069

    摘要: A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

    摘要翻译: 提供了一种用于在室内处理基板并且用于从腔室部件清洗积聚的材料的系统。 该系统包括适于产生反应性气体种类的反应物种发生器,用于从腔室部件化学蚀刻积聚的材料,以及处理室,其具有至少一个具有暴露于反应物质的镜面抛光表面的部件。 优选地,为了对室清洁效率具有最大的影响,镜面抛光表面是诸如气体分配板或背板的部件的表面,和/或是多个较小部件的表面(例如,室壁衬套 ,气体导电线等),以便构成暴露于反应性物质的大部分表面积。 最优选地,反应性物质接触的所有裸铝表面被镜面抛光。