MAGNETIC PLASMONIC NANOPARTICLE DIMER
    56.
    发明申请
    MAGNETIC PLASMONIC NANOPARTICLE DIMER 有权
    磁性等离子体纳米二极管

    公开(公告)号:US20170076844A1

    公开(公告)日:2017-03-16

    申请号:US14853410

    申请日:2015-09-14

    Applicant: Elwha LLC

    CPC classification number: H01F1/06 G02B5/008 H01F1/0018 H01F1/0045 H01F1/20

    Abstract: Described embodiments include a system, method, and apparatus. The apparatus includes a plasmonic nanoparticle dimer. The dimer includes a first plasmonic nanoparticle having a first magnetic element covered by a first negative-permittivity layer comprising a first plasmonic outer surface. The dimer includes a second plasmonic nanoparticle having a second magnetic element covered by a second negative-permittivity layer comprising a second plasmonic outer surface. The dimer includes a separation control structure configured to establish a dielectric-filled gap between the first plasmonic outer surface and the second plasmonic outer surface. A magnetic attraction between the first magnetic element and the second magnetic element binds the first plasmonic nanoparticle and the second plasmonic nanoparticle together, separated by the dielectric-filled gap established by the separation control structure. The first plasmonic outer surface, the dielectric-filled gap, and the second plasmonic outer surface are configured to cooperatively support one or more mutually coupled plasmonic excitations.

    Abstract translation: 所描述的实施例包括系统,方法和装置。 该装置包括等离子体激元纳米颗粒二聚体。 二聚体包括具有由包含第一等离子体激元外表面的第一负介电常数层覆盖的第一磁性元件的第一等离子体纳米颗粒。 二聚体包括具有由包含第二等离子体激元外表面的第二负介电常数层覆盖的第二磁性元件的第二等离子体纳米颗粒。 二聚体包括分离控制结构,其被配置为在第一等离子体激元外表面和第二等离子体激元外表面之间建立介电填充间隙。 第一磁性元件和第二磁性元件之间的磁吸引力将第一等离子体激元纳米粒子和第二等离子体激元纳米粒子结合在一起,由分离控制结构建立的介电填充间隙分开。 第一等离子体激元外表面,电介质填充间隙和第二等离子体激元外表面被配置为协同地支持一个或多个相互耦合的等离激元激发。

    MAGNETIC PLASMONIC NANOPARTICLE POSITIONED ON A MAGNETIC PLASMONIC SUBSTRATE
    57.
    发明申请
    MAGNETIC PLASMONIC NANOPARTICLE POSITIONED ON A MAGNETIC PLASMONIC SUBSTRATE 有权
    位于磁性等离子体基板上的磁性等离子体纳米颗粒

    公开(公告)号:US20170076843A1

    公开(公告)日:2017-03-16

    申请号:US14853370

    申请日:2015-09-14

    Applicant: Elwha LLC

    CPC classification number: H01F1/0045 G02B5/008

    Abstract: Described embodiments include a system, method, and apparatus. The apparatus includes a magnetic substrate at least partially covered by a first negative-permittivity layer comprising a first plasmonic outer surface. The apparatus includes a plasmonic nanoparticle having a magnetic element at least partially covered by a second negative-permittivity layer comprising a second plasmonic outer surface. The apparatus includes a dielectric-filled gap between the first plasmonic outer surface and the second outer surface. The first plasmonic outer surface, the dielectric-filled gap, and the second plasmonic outer surface are configured to support one or more mutually coupled plasmonic excitations.

    Abstract translation: 所描述的实施例包括系统,方法和装置。 该装置包括至少部分地由包括第一等离子体激元外表面的第一负介电常数层覆盖的磁性基底。 该装置包括等离子体纳米颗粒,其具有至少部分地由包含第二等离子体外部表面的第二负介电常数层覆盖的磁性元件。 该装置包括在第一等离子体激元外表面和第二外表面之间的介电填充间隙。 第一等离子体体外表面,电介质填充间隙和第二等离子体外表面被配置为支撑一个或多个相互耦合的等离激元激发。

Patent Agency Ranking