Reflection type demagnification optical system, exposure apparatus, and device fabricating method
    53.
    发明授权
    Reflection type demagnification optical system, exposure apparatus, and device fabricating method 失效
    反射型缩小光学系统,曝光装置和器件制造方法

    公开(公告)号:US06666560B2

    公开(公告)日:2003-12-23

    申请号:US10136722

    申请日:2002-04-30

    申请人: Masayuki Suzuki

    发明人: Masayuki Suzuki

    IPC分类号: G02B510

    CPC分类号: G03F7/70233 G02B17/0657

    摘要: A reflection type magnification projection optical system includes five light-reflecting mirrors arranged from an object side to an image side in a sequence of a concave mirror (M1), a convex mirror (M2), a concave mirror (M3), a convex mirror (M4), and a concave mirror (M5) such that those mirrors basically form a coaxial system, and forming no intermediate image, and wherein an object point and an image point are respectively on opposite sides across an optical axis, and the object point and the image point are kept 400˜1500 mm apart with respect to a direction orthogonal to the optical axis.

    摘要翻译: 反射型放大投影光学系统包括从凹面镜(M1),凸面镜(M2),凹面镜(M3),凸面镜(M3),凸面镜 (M4)和凹面镜(M5),使得这些反射镜基本上形成同轴系统,并且不形成中间图像,并且其中物点和像点分别在光轴的相对侧上,并且物点 并且相对于与光轴正交的方向,图像点保持400〜1500mm。

    Phase shift mask blank, phase shift mask and method of manufacture
    54.
    发明授权
    Phase shift mask blank, phase shift mask and method of manufacture 有权
    相移掩模空白,相移掩模和制造方法

    公开(公告)号:US06511778B2

    公开(公告)日:2003-01-28

    申请号:US09753517

    申请日:2001-01-04

    IPC分类号: G03F900

    CPC分类号: G03F1/32 G03F1/26

    摘要: A phase shift mask blank comprising a transparent substrate and at least one layer of a phase shifter thereon, wherein the phase shifter is a film composed primarily of a fluorine-doped metal silicide, can be fabricated into a high-performance phase shift mask having adequate transmittance and good stability over time even when used with light sources that emit short-wavelength light. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.

    摘要翻译: 一种相移掩模坯料,其包括透明基板和至少一层其上的移相器,其中移相器是主要由掺氟金属硅化物构成的膜,可以被制成具有足够的高性能相移掩模 即使在与发出短波长光的光源一起使用时,透射率和稳定性也很好。 相移掩模可用于将半导体集成电路制造成更小的最小特征尺寸和更高的集成度。

    Magnetic head gimbal assembly and magnetic disk unit
    55.
    发明授权
    Magnetic head gimbal assembly and magnetic disk unit 有权
    磁头万向节组件和磁盘单元

    公开(公告)号:US06493179B2

    公开(公告)日:2002-12-10

    申请号:US09964738

    申请日:2001-09-28

    IPC分类号: G11B1700

    CPC分类号: G11B5/4833

    摘要: A magnetic disk unit includes a magnetic disk, a slider having a magnetic head, a suspension for providing the slider, and an actuator arm for positioning the slider on the magnetic disk a first pad including the magnetic head and second pads including no magnetic heads are disposed on an air bearing surface of the slider. A load point of the suspension with respect to the slider is positioned between a leading edge of the slider and a position located at a distance equivalent to substantially 0.42 times a whole length of the slider from the leading edge of the slider. When the slider is seek-positioned on a certain track on the magnetic disk, a frictional force exerted between the first pad of the slider and the magnetic disk is smaller than a product of lateral stiffness of the suspension in a seeking direction and a track width.

    摘要翻译: 磁盘单元包括磁盘,具有磁头的滑块,用于提供滑块的悬架,以及用于将滑块定位在磁盘上的驱动臂,包括磁头的第一焊盘和不包括磁头的第二焊盘, 设置在滑块的空气支承表面上。 悬架相对于滑动件的载荷点位于滑动件的前缘之间,并且位于距离滑块的前缘相当于滑块整个长度的大约0.42倍的距离的位置。 当滑块被寻找定位在磁盘上的某个轨道上时,在滑块的第一垫和磁盘之间施加的摩擦力小于在寻道方向上的悬架的横向刚度和轨道宽度 。

    Method of producing metal band of metal belt for belt-type continuously variable transmission
    56.
    发明授权
    Method of producing metal band of metal belt for belt-type continuously variable transmission 失效
    带式无级变速器金属带金属带生产方法

    公开(公告)号:US06467148B1

    公开(公告)日:2002-10-22

    申请号:US09208496

    申请日:1998-12-10

    IPC分类号: B23Q300

    摘要: A producing method of a metal band of a metal belt for a belt-type continuously variable transmission includes the following steps of: superposing a predetermined number of blank rings concentrically on one another to constitute a laminated blank rings; fitting the laminated blank rings to an outer periphery of a circle jig made of material having higher thermal expansivity than that of the blank ring; heating the laminated blank rings together with the circle jig; and deforming the laminated blank rings plastically by thermal expansion of the circle jig.

    摘要翻译: 用于带式无级变速器的金属带的金属带的制造方法包括以下步骤:将预定数量的坯环彼此同心地叠置以构成层压坯环; 将层压的坯环装配到由具有比空白环的热膨胀性高的材料制成的圆形夹具的外周; 加热层叠的空白环与圆形夹具一起; 并通过圆形夹具的热膨胀塑造层压的坯环。

    Silicon-based functional matrix substrate and optical integrated oxide device

    公开(公告)号:US06229159B1

    公开(公告)日:2001-05-08

    申请号:US09386731

    申请日:1999-08-31

    申请人: Masayuki Suzuki

    发明人: Masayuki Suzuki

    IPC分类号: H01L2715

    摘要: An optical integrated oxide device uses a silicon-based functional matrix substrate on which both an oxide device and a semiconductor light emitting device can be commonly integrated with an optimum structure and a high density. A single-crystal Si substrate has formed on its surface a first region where a cleaned surface of the single-crystal Si substrate itself appears, and a second region in which a CeO2 thin film is preferentially (100)-oriented or epitaxially grown on the single-crystal Si substrate. A semiconductor laser is integrated in the first region by epitaxial growth or atomic layer bonding, and an optical modulation device or optical detection device made of oxides are formed in the second region, to make up an optical integrated oxide device. A MgAl2O4 thin film may be used instead of CeO2 thin film.

    Ferroelectric memory device and their manufacturing methods
    59.
    发明授权
    Ferroelectric memory device and their manufacturing methods 失效
    铁电存储器件及其制造方法

    公开(公告)号:US06171871B2

    公开(公告)日:2001-01-09

    申请号:US09078678

    申请日:1998-05-14

    IPC分类号: H01L2100

    摘要: It is intended to provide a ferroelectric that exhibits superior ferroelectricity. A ferroelectric provided is an oxide having a layered crystal structure that is composed of Bi, a first element Me, a second element R, and O. The first element Me is at least one element selected from the group consisting of Na, K, Ca, Ba, Sr, Pb, and Bi. The second element R is at least one element selected from the group consisting of Fe, Ti, Nb, Ta, and W. Ninety-eight percent or more of the entire body of the ferroelectric exhibits ferroelectricity. After an oxide having a layered crystal structure has been grown by a vapor-phase method (crystal growth step), electrodes are attached to the oxide having a layered crystal structure and a voltage is applied thereto (voltage application step). As a result, strains of crystal lattices are corrected at least partially, whereby portions that did not exhibit ferroelectricity at all or did not exhibit superior ferroelectricity due to such large strains that the symmetry of crystal lattices is lost are changed so as to exhibit superior ferroelectricity.

    摘要翻译: 旨在提供具有优异的铁电性的铁电体。 提供的铁电体是具有由Bi,第一元素Me,第二元素R和O组成的层状晶体结构的氧化物。第一元素Me是选自Na,K,Ca ,Ba,Sr,Pb和Bi。 第二元素R是选自Fe,Ti,Nb,Ta和W中的至少一种元素。铁电体全体的98%以上表现出铁电性。 在通过气相法(晶体生长步骤)生长具有层状晶体结构的氧化物之后,将电极附着到具有层状晶体结构的氧化物并施加电压(电压施加步骤)。 结果,至少部分地校正晶格的应变,由于由于失去晶格的对称性的这种大的应变,完全不显示铁电性的部分或者没有表现出优异的铁电性,从而表现出优异的铁电性 。

    Silicon-based functional matrix substrate and optical integrated oxide
device
    60.
    发明授权
    Silicon-based functional matrix substrate and optical integrated oxide device 失效
    硅基功能矩阵基板和光学整体氧化器件

    公开(公告)号:US6100578A

    公开(公告)日:2000-08-08

    申请号:US143051

    申请日:1998-08-28

    申请人: Masayuki Suzuki

    发明人: Masayuki Suzuki

    摘要: An optical integrated oxide device uses a silicon-based functional matrix substrate on which both an oxide device and a semiconductor light emitting device can be commonly integrated with an optimum structure and a high density. A single-crystal Si substrate has formed on its surface a first region where a cleaned surface of the single-crystal Si substrate itself appears, and a second region in which a CeO.sub.2 thin film is preferentially (100)-oriented or epitaxially grown on the single-crystal Si substrate. A semiconductor laser is integrated in the first region by epitaxial growth or atomic layer bonding, and an optical modulation device or optical detection device made of oxides are formed in the second region, to make up an optical integrated oxide device. A MgAl.sub.2 O.sub.4 thin film may be used instead of CeO.sub.2 thin film.

    摘要翻译: 光学综合氧化器件使用硅基功能性基质基底,氧化物质和半导体发光器件都可以在其上共同地结合有最佳结构和高密度。 单晶Si衬底在其表面上形成有单晶Si衬底自身出现的清洁表面的第一区域,以及其中CeO2薄膜优先(100)取向或外延生长的第二区域 单晶硅衬底。 通过外延生长或原子层结合将半导体激光器集成在第一区域中,并且在第二区域中形成由氧化物构成的光学调制装置或光学检测装置,以构成光学整合氧化物装置。 可以使用MgAl 2 O 4薄膜代替CeO 2薄膜。