公开(公告)号：US07560141B1

公开(公告)日：2009-07-14

申请号：US12268562

申请日：2008-11-11

申请人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

发明人： Ho-Cheol Kim ,  Charles T. Rettner ,  Sang-Min Park

IPC分类号： B05D3/02

CPC分类号： B05D3/02 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/0337

摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包含第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。

公开(公告)号：US20050255707A1

公开(公告)日：2005-11-17

申请号：US11184702

申请日：2005-07-19

申请人： Mark Hart ,  Ho-Cheol Kim ,  Robert Miller ,  Gregory Wallraff

发明人： Mark Hart ,  Ho-Cheol Kim ,  Robert Miller ,  Gregory Wallraff

IPC分类号： B01L3/00 ,  H01L21/322 ,  H01L21/31

CPC分类号： B01L3/5085 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/00644 ,  B01L2200/12 ,  B01L2300/0609 ,  B01L2300/069 ,  B01L2300/0829 ,  B01L2300/0851 ,  B01L2300/165 ,  B01L2300/168 ,  C40B60/08

摘要： A biomolecular array includes a substrate across which is distributed an array of discrete regions of a porous substance formed from a porogen-containing organosilicate material. The porous substance is designed to bind chemical targets useful in biotechnology applications, such as gene expression, protein, antibody, and antigen experiments. The regions are preferably optically isolated from each other and may be shaped to enhance detection of optical radiation emanating from the porous substance, e.g., as a result of irradiation of the regions with ultraviolet light. The discrete regions may be configured as microscopic wells within the substrate, or they may reside on top of the substrate in the form of microscopic mesas.

摘要翻译： 生物分子阵列包括基底，其上分布有由含致孔剂的有机硅酸盐材料形成的多孔物质的离散区域的阵列。 多孔物质被设计用于结合可用于生物技术应用的化学靶，例如基因表达，蛋白质，抗体和抗原实验。 这些区域优选地彼此光学隔离，并且可以被成形为增强从多孔物质发出的光辐射的检测，例如，作为由紫外线照射该区域的结果。 离散区域可以被配置为衬底内的微观阱，或者它们可以以微观台面的形式驻留在衬底的顶部上。

公开(公告)号：US08349203B2

公开(公告)日：2013-01-08

申请号：US12554175

申请日：2009-09-04

申请人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

发明人： Ho-Cheol Kim ,  Sang-min Park ,  Charles T. Rettner

IPC分类号： C03C15/00

CPC分类号： H01L29/0657 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/24802

摘要： A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.

摘要翻译： 形成嵌段共聚物图案的方法包括提供包括地形预图案的基材，所述地貌预图案包括从沟槽表面分开高度h，大于0纳米的脊表面; 在所述地形预图案上设置包含两个或更多个嵌段组分的嵌段共聚物，以在所述脊表面和所述沟槽表面上形成厚度大于0纳米的层; 并退火所述层以形成具有所述地形预图案的周期性的嵌段共聚物图案，所述嵌段共聚物图案包括设置在所述脊表面上的自组装嵌段共聚物的微区域和所述沟槽表面，其中所述微区域设置在所述脊表面上 与设置在沟槽表面上的微区域相比具有不同的取向。

公开(公告)号：US08343578B2

公开(公告)日：2013-01-01

申请号：US11554079

申请日：2006-10-30

申请人： Ho-Cheol Kim ,  Charles Thomas Rettner

发明人： Ho-Cheol Kim ,  Charles Thomas Rettner

IPC分类号： B05D5/00 ,  B05D3/02 ,  B05D3/12

CPC分类号： C08L53/00 ,  C08L2666/02

摘要： A method and associated structure. A substrate is provided. The substrate has an energetically neutral corrugated surface layer. A film is formed on the corrugated surface layer. The film includes a combination of a di-block copolymer and a stiffening compound. The di-block copolymer includes lamellar microdomains of a first polymer block and lamellar microdomains of a second polymer block. The stiffening compound is dissolved within the first polymer block. At least one lamellar microdomain is removed from the film such that an oriented structure remains on the surface layer.

摘要翻译： 一种方法和相关结构。 提供基板。 衬底具有能量中性的波纹表面层。 在波纹表面层上形成膜。 该膜包括二嵌段共聚物和硬化化合物的组合。 二嵌段共聚物包括第一聚合物嵌段的层状微区和第二聚合物嵌段的层状微区。 硬化化合物溶解在第一聚合物嵌段内。 从薄膜中去除至少一个层状微畴，使得取向结构保留在表面层上。

公开(公告)号：US08247904B2

公开(公告)日：2012-08-21

申请号：US12540759

申请日：2009-08-13

申请人： Sarunya Bangsaruntip ,  Daniel C. Edelstein ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Steven Koester ,  Paul M. Soloman

发明人： Sarunya Bangsaruntip ,  Daniel C. Edelstein ,  William D. Hinsberg ,  Ho-Cheol Kim ,  Steven Koester ,  Paul M. Soloman

IPC分类号： H01L23/48

CPC分类号： H01L21/76816 ,  H01L21/31144 ,  H01L21/76838 ,  H01L21/76897 ,  H01L2924/0002 ,  H01L2924/00

摘要： An interconnection between a sublithographic-pitched structure and a lithographic pitched structure is formed. A plurality of conductive lines having a sublithographic pitch may be lithographically patterned and cut along a line at an angle less than 45 degrees from the lengthwise direction of the plurality of conductive lines. Alternately, a copolymer mixed with homopolymer may be placed into a recessed area and self-aligned to form a plurality of conductive lines having a sublithographic pitch in the constant width region and a lithographic dimension between adjacent lines at a trapezoidal region. Yet alternately, a first plurality of conductive lines with the sublithographic pitch and a second plurality of conductive lines with the lithographic pitch may be formed at the same level or at different.

摘要翻译： 形成了亚光刻间距结构和光刻凸出结构之间的互连。 具有亚光刻间距的多条导线可以被光刻图案化并且沿着与多根导线的长度方向成小于45度的角度的切割。 或者，与均聚物混合的共聚物可以放置在凹陷区域中并自对准以形成在恒定宽度区域具有亚光刻间距的多条导线，以及在梯形区域处的相邻线之间的光刻尺寸。 或者，具有亚光刻间距的第一多个导线和具有光刻间距的第二多个导线可以形成在相同的水平或不同的位置。

公开(公告)号：US20120183743A1

公开(公告)日：2012-07-19

申请号：US13432036

申请日：2012-03-28

申请人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl Radens

发明人： Timothy J. Dalton ,  Bruce B. Doris ,  Ho-Cheol Kim ,  Carl Radens

IPC分类号： B32B3/30

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/0338 ,  Y10T428/24612

摘要： A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.

公开(公告)号：US20110111339A1

公开(公告)日：2011-05-12

申请号：US12613800

申请日：2009-11-06

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Hiroshi Ito ,  Atsuko Ito ,  Hoa D. Truong

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Hiroshi Ito ,  Atsuko Ito ,  Hoa D. Truong

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/091 ,  G03F7/0392 ,  G03F7/095

摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.

摘要翻译： 双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。 双层系统可以在单一的曝光和开发过程中暴露和发展。

公开(公告)号：US07846502B2

公开(公告)日：2010-12-07

申请号：US12482583

申请日：2009-06-11

申请人： Ho-Cheol Kim ,  Charles T Rettner ,  Sang-Min Park

发明人： Ho-Cheol Kim ,  Charles T Rettner ,  Sang-Min Park

IPC分类号： B05D3/00

CPC分类号： B05D3/02 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/0337

摘要： A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

摘要翻译： 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准（横向位置）的方法，所述方法包括以下步骤：获得具有能量中性的表面层的基材，该基材包括第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。

公开(公告)号：US07828986B2

公开(公告)日：2010-11-09

申请号：US11926722

申请日：2007-10-29

申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

IPC分类号： B44C1/22 ,  H01L21/302

CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

摘要： A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.

摘要翻译： 一个方法。 提供了一种嵌段共聚物和另外的材料的组合。 共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 第一聚合物包括聚苯乙烯，第二聚合物包括聚（环氧乙烷）。 包括聚二甲基戊二酰亚胺的第一层粘附到包括电介质涂覆的硅晶片的基材的表面上。 该组合物直接由第一层的表面形成。 附加材料的纳米结构在第一聚合物嵌段内自组装。 同时蚀刻膜和第一层。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 部分电影被删除。 特征保留在第一层的表面上。

公开(公告)号：US20090181171A1

公开(公告)日：2009-07-16

申请号：US12060516

申请日：2008-04-01

申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

IPC分类号： B44C1/22 ,  C08F283/10 ,  B05D5/00

CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。