Cathode targets of silicon and transition metal
    52.
    发明授权
    Cathode targets of silicon and transition metal 失效
    硅和过渡金属的阴极靶

    公开(公告)号:US06365014B2

    公开(公告)日:2002-04-02

    申请号:US08929176

    申请日:1997-09-08

    申请人: James J. Finley

    发明人: James J. Finley

    IPC分类号: C23C1434

    摘要: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, for sputtering in oxygen, inert gas, nitrogen or a mixture of nitrogen and oxygen. The chromium in the target may be replaced in part with nickel to produce coatings of silicon-chromium-nickel and the oxides, nitrides and oxynitrides thereof.

    摘要翻译: 公开了包含5至80重量%铬的硅 - 铬阴极靶,用于在包含惰性气体,诸如氮气,氧气及其混合物的反应性气体的气氛中的硅 - 铬合金的溅射吸收涂层,其还可包含惰性气体,例如氩 ,以形成氮化物,氧化物和氮氧化物以及金属膜。 在阴极靶中铬的存在提供目标稳定性和提高的溅射速率,与单独的硅靶相比,与目标稳定性和硅 - 镍的溅射速率相当,用于在氧气,惰性气体,氮气或氮气和氧气的混合物中溅射 。 靶中的铬可以部分地被镍替代以产生硅 - 铬 - 镍及其氧化物,氮化物和氮氧化物的涂层。

    Alkali metal diffusion barrier layer
    53.
    发明授权
    Alkali metal diffusion barrier layer 失效
    碱金属扩散阻挡层

    公开(公告)号:US5830252A

    公开(公告)日:1998-11-03

    申请号:US597543

    申请日:1996-02-01

    摘要: Amorphous metal oxide barrier layers of titanium oxide, zirconium oxide and zinc/tin oxide are effective as alkali metal ion barrier layers at thicknesses below 180 Angstroms. The amorphous metal oxide barrier layers are most effective when the density of the layer is equal to or greater than 90% of the crystalline density. The barrier layers prevent migration of alkali metal ions such as sodium ions from glass substrates into a medium e.g. electrolyte of a photochromic cell, liquid material of a liquid crystal display device contacting the glass surface. The properties of the medium, particularly electroconductive metal oxide coatings, are susceptible to deterioration by the presence of sodium ions migrating from the glass.

    摘要翻译: 氧化钛,氧化锆和锌/锡氧化物的无定形金属氧化物阻挡层作为厚度低于180埃的碱金属离子阻挡层是有效的。 当层的密度等于或大于结晶密度的90%时,非晶金属氧化物阻挡层是最有效的。 阻挡层防止诸如钠离子的碱金属离子从玻璃基底迁移到介质中。 光致变色元件的电解液,与玻璃表面接触的液晶显示装置的液体材料。 介质的性质,特别是导电金属氧化物涂层,由于从玻璃迁移的钠离子的存在而易于劣化。

    Cathode targets of silicon and transition metal
    54.
    发明授权
    Cathode targets of silicon and transition metal 失效
    硅和过渡金属的阴极靶

    公开(公告)号:US5709938A

    公开(公告)日:1998-01-20

    申请号:US398932

    申请日:1995-03-06

    申请人: James J. Finley

    发明人: James J. Finley

    摘要: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-chromium, silicon-chromium nitride or silicon-chromium oxynitride respectively. The chromium in the target may be replaced in part with nickel, preferably in the range of 5 to 15 weight percent, to produce coatings of silicon-chromium-nickel and the oxides, nitrides and oxynitrides thereof.

    摘要翻译: 公开了包含5至80重量%铬的硅 - 铬阴极靶,用于在包含惰性气体,诸如氮气,氧气及其混合物的反应性气体的气氛中的硅 - 铬合金的溅射吸收涂层,其可以进一步包含惰性气体,例如氩 ,以形成氮化物,氧化物和氮氧化物以及金属膜。 在阴极靶中存在的铬在5-80重量%的范围内,提供目标稳定性和提高的溅射速率超过目标硅单独,与目标稳定性和硅 - 镍的溅射速率相当,不仅在氧气中溅射到 产生氧化物涂层,而且当在惰性气体,氮气或氮气和氧气的混合物中溅射时,分别产生硅 - 铬,硅 - 氮化铬或硅 - 铬氮氧化物的涂层。 目标中的铬可以部分地被镍替代,优选在5至15重量%的范围内,以产生硅 - 铬 - 镍及其氧化物,氮化物和氮氧化物的涂层。

    Metal based coating composition and related coated substrates
    58.
    发明授权
    Metal based coating composition and related coated substrates 有权
    金属基涂料组合物和相关涂层基材

    公开(公告)号:US08329318B2

    公开(公告)日:2012-12-11

    申请号:US13053478

    申请日:2011-03-22

    IPC分类号: B32B15/04

    摘要: A coated substrate is disclosed. The coated substrate includes a substrate and a coating composition over the substrate comprising at least one metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and mixtures and alloys of cobalt and chromium; and at least one dielectric layer including SixNy, where x/y ranges from 0.75 to 1.5, over the metal based layer. The ΔEcmc (1.5:1) (T), ΔEcmc (1.5:1) (R1) and ΔEcmc (1.5:1) (R2) of a non-heat treated, coated substrate as compared to a heat treated, coated substrate according to the present invention are no greater than 8 units.

    摘要翻译: 公开了涂覆的基材。 涂覆的基底包括基底和涂层组合物,该涂层组合物包括至少一种选自钨,铬,钽,钼,铝,铌的金属基层及其混合物和合金; 钴和铬的混合物和合金; 以及包含SixNy的至少一个电介质层,其中x / y范围为0.75至1.5,超过金属基层。 与热处理相比,非热处理的涂层基材的&Dgr; Ecmc(1.5:1)(T),&Dgr; Ecmc(1.5:1)(R1)和&Dgr; Ecmc(1.5:1)(R2) 根据本发明的经处理的涂覆基材不大于8单位。

    Electrochromic device
    59.
    发明授权
    Electrochromic device 有权
    电致变色装置

    公开(公告)号:US08085460B2

    公开(公告)日:2011-12-27

    申请号:US12545410

    申请日:2009-08-21

    IPC分类号: G02F1/15 G09G3/19

    摘要: An electrochromic device includes a first substrate spaced from a second substrate. A first conductive member is formed over at least a portion of the first substrate. A first electrochromic electrode comprising a tungsten oxide coating is formed over at least a portion of the first conductive member. A second conductive member is formed over at least a portion of the second substrate. A second electrochromic electrode is formed over at least a portion of the second conductive member. An ionic liquid is positioned between the first electrode and the second electrode. In one aspect of the invention, the ionic liquid can include nanoparticles of metals or metal oxides. In a further aspect of the invention, the second conductive member and second electrode can be formed by a single material.

    摘要翻译: 电致变色器件包括与第二衬底间隔开的第一衬底。 在第一衬底的至少一部分上形成第一导电构件。 在第一导电构件的至少一部分上形成包括氧化钨涂层的第一电致变色电极。 在第二衬底的至少一部分上形成第二导电构件。 在第二导电构件的至少一部分上形成第二电致变色电极。 离子液体位于第一电极和第二电极之间。 在本发明的一个方面,离子液体可以包括金属或金属氧化物的纳米颗粒。 在本发明的另一方面,第二导电构件和第二电极可以由单一材料形成。

    METHOD OF DEPOSITING NIOBIUM DOPED TITANIA FILM ON A SUBSTRATE AND THE COATED SUBSTRATE MADE THEREBY
    60.
    发明申请
    METHOD OF DEPOSITING NIOBIUM DOPED TITANIA FILM ON A SUBSTRATE AND THE COATED SUBSTRATE MADE THEREBY 有权
    在底物上沉积铌酸钡薄膜的方法及其涂覆的基板

    公开(公告)号:US20110262757A1

    公开(公告)日:2011-10-27

    申请号:US12767910

    申请日:2010-04-27

    IPC分类号: B32B17/06 B05D5/12 H01B1/02

    摘要: A coated article includes a pyrolytic applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In one embodiment of the invention, the method is practiced using a vaporized coating mixture including a vaporized niobium precursor; a vaporized titanium precursor, and a carrier gas to deposit a niobium doped titanium oxide film having a sheet resistance greater than 1.2 and an index of refraction of 2.3 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiOX where X is in the range of 1.8-2.1.

    摘要翻译: 涂覆制品包括掺铌掺杂的氧化钛的热解涂覆的透明导电氧化物膜。 该制品可以通过使用具有铌前体和钛前体的涂料混合物来制备。 涂层混合物指向加热的基底以分解涂层混合物并在被加热的基底的表面上沉积透明导电的掺铌的氧化钛膜。 在本发明的一个实施方案中,该方法是使用包括蒸发的铌前体的蒸发涂层混合物来实施的; 蒸发的钛前体和载气,以沉积具有大于1.2的薄层电阻并且折射率为2.3或更大的掺铌氧化钛膜。 掺杂铌的氧化钛的化学式是Nb:TiOX,其中X在1.8-2.1的范围内。