摘要:
Hydrophilic and/or rutile and anatase titanium oxide are obtained by sputter depositing titanium metal oxide on a film of zirconium oxide in the cubic phase. Another technique is to deposit a titanium metal on a film of zinc oxide in the cubic phase and heating the coating in an oxidizing atmosphere to provide an anatase and/or rutile phase(s) of titanium oxide.
摘要:
Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, for sputtering in oxygen, inert gas, nitrogen or a mixture of nitrogen and oxygen. The chromium in the target may be replaced in part with nickel to produce coatings of silicon-chromium-nickel and the oxides, nitrides and oxynitrides thereof.
摘要:
Amorphous metal oxide barrier layers of titanium oxide, zirconium oxide and zinc/tin oxide are effective as alkali metal ion barrier layers at thicknesses below 180 Angstroms. The amorphous metal oxide barrier layers are most effective when the density of the layer is equal to or greater than 90% of the crystalline density. The barrier layers prevent migration of alkali metal ions such as sodium ions from glass substrates into a medium e.g. electrolyte of a photochromic cell, liquid material of a liquid crystal display device contacting the glass surface. The properties of the medium, particularly electroconductive metal oxide coatings, are susceptible to deterioration by the presence of sodium ions migrating from the glass.
摘要:
Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-chromium, silicon-chromium nitride or silicon-chromium oxynitride respectively. The chromium in the target may be replaced in part with nickel, preferably in the range of 5 to 15 weight percent, to produce coatings of silicon-chromium-nickel and the oxides, nitrides and oxynitrides thereof.
摘要:
A multiple-layer, high transmittance, low emissivity coated article which can be subjected to high temperature processing such as bending, annealing, tempering, laminating or glass welding as a result of primer layers comprising metal and metal oxide is disclosed for use as an electroconductive coating for an electrically heatable transparency.
摘要:
A multiple layer high transmittance, low emissivity coated article is disclosed with improved chemical resistance as a result of a protective overcoat of titanium oxide.
摘要:
A coating composition that contains at least one degradable coating layer and at least one layer of barrier coating is disclosed. The coating composition can be used to make a coated substrate having improved performance over conventional coated substrates after exposure to heat and certain chemicals like halides such as chlorides, sulfur, salt, chlorine, alkali, and enamels.
摘要:
A coated substrate is disclosed. The coated substrate includes a substrate and a coating composition over the substrate comprising at least one metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and mixtures and alloys of cobalt and chromium; and at least one dielectric layer including SixNy, where x/y ranges from 0.75 to 1.5, over the metal based layer. The ΔEcmc (1.5:1) (T), ΔEcmc (1.5:1) (R1) and ΔEcmc (1.5:1) (R2) of a non-heat treated, coated substrate as compared to a heat treated, coated substrate according to the present invention are no greater than 8 units.
摘要:
An electrochromic device includes a first substrate spaced from a second substrate. A first conductive member is formed over at least a portion of the first substrate. A first electrochromic electrode comprising a tungsten oxide coating is formed over at least a portion of the first conductive member. A second conductive member is formed over at least a portion of the second substrate. A second electrochromic electrode is formed over at least a portion of the second conductive member. An ionic liquid is positioned between the first electrode and the second electrode. In one aspect of the invention, the ionic liquid can include nanoparticles of metals or metal oxides. In a further aspect of the invention, the second conductive member and second electrode can be formed by a single material.
摘要:
A coated article includes a pyrolytic applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In one embodiment of the invention, the method is practiced using a vaporized coating mixture including a vaporized niobium precursor; a vaporized titanium precursor, and a carrier gas to deposit a niobium doped titanium oxide film having a sheet resistance greater than 1.2 and an index of refraction of 2.3 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiOX where X is in the range of 1.8-2.1.