公开(公告)号：US20090115980A1

公开(公告)日：2009-05-07

申请号：US12318291

申请日：2008-12-24

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03B27/52 ,  G01J3/10 ,  G03B27/72

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07414251B2

公开(公告)日：2008-08-19

申请号：US11317240

申请日：2005-12-27

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  G03F7/70916

摘要： A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.

摘要翻译： 公开了一种提供用于在光刻中从辐射束中过滤颗粒的可操作的过滤系统的方法。 该方法包括提供用于拦截颗粒的松弛箔或线，将箔或线的至少第一点或一侧安装到安装组件的第一位置，并且至少在松弛的箔或线的束 辐射，基本上平行于辐射传播的方向。

公开(公告)号：US07382436B2

公开(公告)日：2008-06-03

申请号：US10887306

申请日：2004-07-09

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B17/00

CPC分类号： G03F7/70958 ,  G02B5/09 ,  G02B5/1861 ,  G21K1/06

摘要： A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or a first protrusion including a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and a second protrusion including a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and the first and second materials are not the same. A lithographic projection apparatus includes such a mirror. A device manufacturing method includes reflecting a beam of radiation by use of such a mirror. A device is manufactured according to the method.

摘要翻译： 反射镜具有镜面，其中镜面包括包括选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Nb中的至少一种的材料的突起 Mo，Ba，La，Ce，Pr，Pa和U，或包含选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr中的至少一种的第一材料的第一突起 ，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，以及第二突起，其包括选自Be，B，C，Si，P，S，K，Ca中的至少一种的第二材料 ，Sc，Br，Rb，Sr，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，第一和第二材料不相同。 光刻投影装置包括这样的反射镜。 一种器件制造方法包括通过使用这种反射镜来反射辐射束。 根据该方法制造装置。

公开(公告)号：US07309869B2

公开(公告)日：2007-12-18

申请号：US11127312

申请日：2005-05-12

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US07307263B2

公开(公告)日：2007-12-11

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

公开(公告)号：US07247866B2

公开(公告)日：2007-07-24

申请号：US10743265

申请日：2003-12-23

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21G5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.

摘要翻译： 公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。 污染屏障包括内环，外环和多个薄片。 薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。 每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

公开(公告)号：US07233009B2

公开(公告)日：2007-06-19

申请号：US10647120

申请日：2003-08-25

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

摘要： A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

摘要翻译： 光刻投影装置包括掠入射收集器。 放射入射收集器由多个反射器组成。 为了减少收集器上的热量，反射器被涂覆。 收集器外部的反射器在外部具有红外辐射层。 内部反射器在外部涂有EUV反射层。

公开(公告)号：US07116394B2

公开(公告)日：2006-10-03

申请号：US10738976

申请日：2003-12-19

申请人： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

发明人： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70916 ,  B08B6/00 ,  B08B7/0035 ,  G03F7/70925

摘要： A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

摘要翻译： 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。 清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US07030963B2

公开(公告)日：2006-04-18

申请号：US10836613

申请日：2004-05-03

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。