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公开(公告)号:US20210035617A1
公开(公告)日:2021-02-04
申请号:US16530739
申请日:2019-08-02
Applicant: Micron Technology, Inc.
Inventor: Eric J. Stave , George E. Pax , Yogesh Sharma , Gregory A. King , Chan H. Yoo , Randon K. Richards , Timothy M. Hollis
Abstract: Systems, apparatuses, and methods for operating a memory device or devices are described. A memory device or module may introduce latency in commands to coordinate operations at the device or to improve timing or power consumption at the device. For example, a host may issue a command to a memory module, and a component or feature of the memory module may receive the command and modify the command or the timing of its execution in manner that is invisible or non-disruptive to the host while facilitating operations at the memory module. In some examples, components or features of a memory module may be disabled to effect or introduce latency in operation without affecting timing or operation of a host device. A memory module may operate in different modes that allow for different latencies; the use or introduction of latencies may not affect other features or operability of the memory module.
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52.
公开(公告)号:US20210005575A1
公开(公告)日:2021-01-07
申请号:US16503353
申请日:2019-07-03
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Owen R. Fay , Eiichi Nakano
IPC: H01L25/065 , H05K1/02 , H01L23/373 , H01L23/498 , H01L23/00
Abstract: Semiconductor assemblies including thermal layers and associated systems and methods are disclosed herein. In some embodiments, the semiconductor assemblies comprise one or more semiconductor devices over a substrate. The substrate includes a thermal layer configured to transfer thermal energy along a lateral plane and across the substrate. The thermal energy is transferred along a non-lateral direction from the semiconductor device to the graphene layer using one or more thermal connectors.
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公开(公告)号:US20200321317A1
公开(公告)日:2020-10-08
申请号:US16905435
申请日:2020-06-18
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Mark E. Tuttle
IPC: H01L25/065 , H01L25/00 , H01L21/56 , H01L21/683
Abstract: Semiconductor devices including a dual-sided redistribution structure and having low-warpage across all temperatures and associated systems and methods are disclosed herein. In one embodiment, a semiconductor device includes a first semiconductor die electrically coupled to a first side of a redistribution structure and a second semiconductor die electrically coupled to a second side of the redistribution structure opposite the first side. The semiconductor device also includes a first molded material on the first side, a second molded material on the second side, and conductive columns electrically coupled to the first side and extending through the first molded material. The first and second molded materials can have the same volume and/or coefficients of thermal expansion to inhibit warpage of the semiconductor device.
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公开(公告)号:US20200272564A1
公开(公告)日:2020-08-27
申请号:US16797571
申请日:2020-02-21
Applicant: Micron Technology, Inc.
Inventor: Brent Keeth , Owen Fay , Chan H. Yoo , Roy E. Greeff , Matthew B. Leslie
IPC: G06F12/06 , G11C29/12 , G11C11/4093 , H01L25/18 , H01L25/065
Abstract: Apparatus and methods are disclosed, including memory devices and systems. Example memory devices, systems and methods include a buffer interface to translate high speed data interactions on a host interface side into slower, wider data interactions on a DRAM interface side. The slower, and wider DRAM interface may be configured to substantially match the capacity of the narrower, higher speed host interface. In some examples, the buffer interface may be configured to provide multiple sub-channel interfaces each coupled to one or more regions within the memory structure and configured to facilitate data recovery in the event of a failure of some portion of the memory structure. Selected example memory devices, systems and methods include an individual DRAM die, or one or more stacks of DRAM dies coupled to a buffer die.
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公开(公告)号:US10714456B2
公开(公告)日:2020-07-14
申请号:US16379078
申请日:2019-04-09
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Mark E. Tuttle
IPC: H01L25/065 , H01L21/56 , H01L25/00 , H01L21/683 , H01L23/00 , H01L23/31
Abstract: Semiconductor devices including a dual-sided redistribution structure and having low-warpage across all temperatures and associated systems and methods are disclosed herein. In one embodiment, a semiconductor device includes a first semiconductor die electrically coupled to a first side of a redistribution structure and a second semiconductor die electrically coupled to a second side of the redistribution structure opposite the first side. The semiconductor device also includes a first molded material on the first side, a second molded material on the second side, and conductive columns electrically coupled to the first side and extending through the first molded material. The first and second molded materials can have the same volume and/or coefficients of thermal expansion to inhibit warpage of the semiconductor device.
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公开(公告)号:US10593568B2
公开(公告)日:2020-03-17
申请号:US16123158
申请日:2018-09-06
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , John F. Kaeding , Ashok Pachamuthu , Mark E. Tuttle
Abstract: Semiconductor devices having a semiconductor die electrically coupled to a redistribution structure and a molded material over the redistribution structure are disclosed herein, along with associated systems and methods. In one embodiment, a semiconductor device includes a semiconductor die attached to a first side of a substrate-free redistribution structure, and a plurality of conductive columns extending through a molded material disposed on the first side of the redistribution structure. The semiconductor device can also include a second redistribution structure on the molded material and electrically coupled to the conductive columns. A semiconductor device can be manufactured using a single carrier and requiring processing on only a single side of the semiconductor device.
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公开(公告)号:US20190237438A1
公开(公告)日:2019-08-01
申请号:US16379078
申请日:2019-04-09
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Mark E. Tuttle
IPC: H01L25/065 , H01L21/56 , H01L25/00
Abstract: Semiconductor devices including a dual-sided redistribution structure and having low-warpage across all temperatures and associated systems and methods are disclosed herein. In one embodiment, a semiconductor device includes a first semiconductor die electrically coupled to a first side of a redistribution structure and a second semiconductor die electrically coupled to a second side of the redistribution structure opposite the first side. The semiconductor device also includes a first molded material on the first side, a second molded material on the second side, and conductive columns electrically coupled to the first side and extending through the first molded material. The first and second molded materials can have the same volume and/or coefficients of thermal expansion to inhibit warpage of the semiconductor device.
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公开(公告)号:US20190067145A1
公开(公告)日:2019-02-28
申请号:US15683059
申请日:2017-08-22
Applicant: Micron Technology, Inc.
Inventor: Hyunsuk Chun , Shams U. Arifeen , Chan H. Yoo , Tracy N. Tennant
IPC: H01L23/31 , H01L21/48 , H01L23/498 , H01L21/683 , H01L21/56
Abstract: A semiconductor device having a semiconductor die, a redistribution layer (RDL), and an encapsulant. The RDL layer can be formed on a first surface of the semiconductor die. The encapsulant can enclose a second surface and side surfaces of the semiconductor die. The encapsulant can enclose side portions of the RDL.
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59.
公开(公告)号:US20250112105A1
公开(公告)日:2025-04-03
申请号:US18979453
申请日:2024-12-12
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Owen R. Fay
IPC: H01L23/36 , H01L23/00 , H01L23/42 , H01L23/498 , H01L25/00 , H01L25/065 , H01L25/10 , H05K7/20
Abstract: Semiconductor assemblies including thermal management configurations for reducing heat transfer between overlapping devices and associated systems and methods are disclosed herein. A semiconductor assembly may comprise a supporting structure and a device with a thermal management layer disposed between the supporting structure and the device. The thermal management layer may be configured to reduce heat transfer between the supporting structure and the device.
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公开(公告)号:US12243801B2
公开(公告)日:2025-03-04
申请号:US18154615
申请日:2023-01-13
Applicant: Micron Technology, Inc.
Inventor: Hyunsuk Chun , Xiaopeng Qu , Chan H. Yoo
IPC: H01L23/373 , H01L21/48 , H01L23/00 , H01L23/367 , H01L23/498
Abstract: Semiconductor device assemblies are provided with a package substrate including one or more layers of thermally conductive material configured to conduct heat generated by one or more of semiconductor dies of the assemblies laterally outward towards an outer edge of the assembly. The layer of thermally conductive material can comprise one or more allotropes of carbon, such as diamond, graphene, graphite, carbon nanotubes, or a combination thereof. The layer of thermally conductive material can be provided via deposition (e.g., sputtering, PVD, CVD, or ALD), via adhering a film comprising the layer of thermally conductive material to an outer surface of the package substrate, or via embedding a film comprising the layer of thermally conductive material to within the package substrate.
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