公开(公告)号：US07595896B2

公开(公告)日：2009-09-29

申请号：US12068062

申请日：2008-02-01

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据，从而确定至少一层处理结构的厚度（d'1或d'2）。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：US07495782B2

公开(公告)日：2009-02-24

申请号：US11931598

申请日：2007-10-31

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US20080204721A1

公开(公告)日：2008-08-28

申请号：US12068062

申请日：2008-02-01

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01N21/00 ,  G01J3/00

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

公开(公告)号：US20080074665A1

公开(公告)日：2008-03-27

申请号：US11945058

申请日：2007-11-26

Applicant: Boaz BRILL ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz BRILL ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  G01N21/84

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造过程中层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US20080043229A1

公开(公告)日：2008-02-21

申请号：US11924365

申请日：2007-10-25

Applicant: Giora DISHON ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

Inventor： Giora DISHON ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

IPC: G01N21/00

CPC classification number: G03F7/70058 ,  G01B11/14 ,  G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8867 ,  G03F7/3028 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70675 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67155

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract translation: 用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站 具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站 的光刻工艺。

公开(公告)号：US07289234B2

公开(公告)日：2007-10-30

申请号：US11389297

申请日：2006-03-27

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01B11/28

CPC classification number: G01N21/8422 ,  G01B11/0625 ,  G01N21/211 ,  G01N21/3563 ,  G01N21/9501

Abstract: A method and system are presented for optical measurements in multi-layer structures to determine the properties of at least some of the layers. The structure is patterned by removing layer materials within a measurement site of the structure from the top layer to the lowermost layer of interests. Optical measurements are sequentially applied to the layers, by illuminating a measurement area in the layer under measurements, when the layer material above said layer under measurements is removed, thereby obtaining measured data portions for the at least some of the layers, respectively. The properties of each of the at least some layers are calculated, by analyzing the measured data portion of the lowermost layer, and then sequentially interpreting the measured data portions of all the other layers towards the uppermost layer, while utilizing for each layer the calculation results of the one or more underlying layers.

Abstract translation: 提出了一种用于多层结构中的光学测量的方法和系统，以确定至少一些层的性质。 通过将结构的测量位置内的层材料从顶层移除到最下层来图案化该结构。 当去除在测量下的所述层上方的层材料时，分别通过照射测量层中的测量区域来分别对所述层中的至少一些层进行光学测量。 通过分析最下层的测量数据部分，然后依次将所有其它层的测量数据部分顺序地解释为最上层，同时为每个层使用计算结果来计算每个至少一些层的属性 的一个或多个下层。

公开(公告)号：US20070238394A1

公开(公告)日：2007-10-11

申请号：US11726805

申请日：2007-03-23

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: B24B49/04

CPC classification number: B05C11/1005 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12

Abstract: A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predetermined value of a desired parameter of the article being processed. The article is processed with the processing tool. Upon completing the processing in response to the end-point signal generated by an end-point detector continuously operating during the processing of the article, integrated monitoring is applied to the processed article to measure the value of the desired parameter. The measured value of the desired parameter is analyzed to determine a correction value thereof to be used for adjusting the end-point signal corresponding to the predetermined value of the desired parameter for terminating the processing of the next article in the stream.

Abstract translation: 提出了一种方法和系统，用于通过处理工具监视顺序地施加到基本上相同的物品流的处理，以便在检测到对应于期望参数的预定值的终点信号时终止处理工具的操作 的被处理物品。 文章用处理工具处理。 一旦响应由在物品处理过程中持续运行的端点检测器产生的终点信号完成处理，则将综合监控应用于经处理的物品以测量所需参数的值。 分析所需参数的测量值以确定其用于调整对应于期望参数的预定值的终点信号的修正值，以终止流中下一个物品的处理。

公开(公告)号：US07251043B2

公开(公告)日：2007-07-31

申请号：US10494577

申请日：2002-11-10

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01B11/02 ,  G01B11/06

CPC classification number: G01B11/0616

Abstract: An optical system is presented for use in a measurement system (100) for use in measurements of thin films of a workpiece (W), the system comprising an optical assembly (14), comprising illuminator assembly, a detector assembly, and a light directing assembly (FA-OF) for directing illuminating light to a plurality of measurement sites in the workpiece (W) arranged in an array of substantially concentric ring-like regions, such that an area defined by the measurement sites within one of the substantially concentric ring-like regions is substantially equal to that of the other substantially concentric ring-like region.

Abstract translation: 光学系统被呈现用于测量系统（100）中，用于测量工件（W）的薄膜，所述系统包括光学组件（14），其包括照明器组件，检测器组件和光导向 组件（FA-OF），用于将照明光引导到布置成基本上同心的环状区域的阵列中的工件（W）中的多个测量位置，使得由基本上同心的环内的测量位置限定的区域 类似的区域基本上等于另一个基本上同心的环状区域的区域。

公开(公告)号：US20060232777A1

公开(公告)日：2006-10-19

申请号：US10569466

申请日：2004-06-17

Applicant: Moshe Finarov ,  Ido Hocman

Inventor： Moshe Finarov ,  Ido Hocman

IPC: G01B11/00

CPC classification number: G03F7/70633 ,  G03F9/7088

Abstract: A method and system are presented for automatic target finding by using two imaging channels with relatively low and high magnifications, using the low magnification channel (relatively large field of view) for finding a region of interest (i.e., that of the targets location within the field), scanning this zone by grabbing images via the high magnification channel (relatively small field of view) and marking the overlay targets using image processing algorithms.

Abstract translation: 提出一种方法和系统，通过使用具有相对较低和高放大倍率的两个成像通道，使用低倍率通道（相对较大的视野）来找到感兴趣的区域（即，目标位置内的目标位置） 字段），通过高倍率通道（相对较小的视野）拍摄图像并使用图像处理算法标记覆盖目标来扫描该区域。

公开(公告)号：US20060001883A1

公开(公告)日：2006-01-05

申请号：US10525568

申请日：2003-05-08

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/55

CPC classification number: G01N21/55

Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.

Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。