摘要:
Disclosed in the present invention are a fluorine-containing polymerizable compound of the general formula (1) and a polymer compound obtained therefrom: where A represents a single bond, an oxygen atom, a sulfur atom, SO2, CH2, CO, C(CH3)2, C(CH3)(CH2CH3), C(CF3)2, C(CH3)(C6H5), CH2—C6H4—CH2 or a divalent organic group obtained by elimination of two hydrogen atoms from benzene, biphenyl, naphthalene, cyclohexene or fluorene; and a and b each independently represent an integer of 0 to 2 and satisfy a relationship of 1≦a+b≦4. The thus-obtained polymer compound combines adequate hydrophilicity and high transparency with low water adsorption of fluorine-containing compound.
摘要:
A fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
摘要:
Photosensitive polyimide compositions include a photosensitive additive and a polymer comprising a repeating unit represented by the following formula (I): wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R3 represents hydrogen or an organic group comprising a hydrophilic group, an acid-cleavable group, a base-cleavable group, a cross-linkable group, or combinations thereof, and h represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a processing solvent, followed by a relatively low-temperature cyclization process in which the precursor polymer is converted to the final polymer. The resulting polyimide may be separated from the solution and purified. It may then be combined with a casting solvent and a photosensitive additive.
摘要:
A fluorine-containing diamine represented by the formula (1), [Chemical Formula 29] is provided. Furthermore, a fluorine-containing polymer is provided by using this fluorine-containing amine as a monomer. The fluorine-containing polymer can exhibit superior characteristics such as low dielectric property and high transparency, while maintaining high fluorine content and retaining adhesive property.
摘要:
There are provided: an air blower 25 that introduces indoor air from an air inlet 13 and delivers the air through air outlets 29 and 30; and a dust collecting filter 55 that collects dust contained in air. The dust collecting filter 55 carries a porous microcapsule 37 impregnated with an aromatic agent, and is formed of an HEPA filter having a filtering material 55a impregnated with an antiviral agent. On the surface of the dust collecting filter 55, there is provided a breathable antibacterial sheet 37 impregnated with an antiallergenic agent.
摘要:
A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
摘要:
A chemically amplified resist composition comprising an alternating copolymer of an acrylate monomer having a fluoroalkyl group at alpha-position with a norbornene derivative, when processed through ArF excimer laser exposure by lithography, is improved in resolution and dry etching resistance and minimized in line edge roughness.
摘要:
A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
摘要:
A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要:
The present invention is an electronic-endoscope apparatus for compensating for lack of light quantity caused by a delayed response from a light shielding mechanism when an all-pixel reading system is used. In the case of, for example, a moving image, this apparatus reads pixel mix data out from a CCD to reproduce motions faithfully. For a still image, this apparatus reads out all pixels obtained by the CCD during a single exposure period using a light shielding period set by a light shielding plate, and outputs this data to a mixing circuit via memories to form a pixel mix signal. This configuration enables a high-quality still image to be obtained. In this case, however, the light quantity may be insufficient due to a delayed response from the light shielding plate. Thus, during the exposure period for still-image formation, the lamp voltage is increased above a normal amount or the diaphragm aperture is increased in order to compensate for the shortage of light quantity. In addition, this light quantity compensation can be achieved by amplifying a video signal or controlling the increase of the electronic shutter time.