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    High brightness x-ray reflection source
    51.
    发明授权
    High brightness x-ray reflection source 有权

    公开(公告)号：US10991538B2

    公开(公告)日：2021-04-27

    申请号：US16866953

    申请日：2020-05-05

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  William Henry Hansen

    IPC: H01J35/00 ,  H01J35/12 ,  H01J35/30 ,  H01J35/14

    Abstract: An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.

    System and method for x-ray fluorescence with filtering
    52.
    发明授权
    System and method for x-ray fluorescence with filtering 有权

    公开(公告)号：US10962491B2

    公开(公告)日：2021-03-30

    申请号：US16555143

    申请日：2019-08-29

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Janos Kirz ,  Benjamin Donald Stripe ,  Sylvia Jia Yun Lewis

    IPC: G01N23/223 ,  G21K1/06 ,  G21K1/02

    Abstract: An x-ray optical filter includes at least one x-ray optical mirror configured to receive a plurality of x-rays having a first x-ray spectrum with a first intensity as a function of energy in a predetermined solid angle range and to separate at least some of the received x-rays by multilayer reflection or total external reflection into reflected x-rays and non-reflected x-rays and to form an x-ray beam including at least some of the reflected x-rays and/or at least some of the non-reflected x-rays. The x-ray beam has a second x-ray spectrum with a second intensity as a function of energy in the solid angle range, the second intensity greater than or equal to 50% of the first intensity across a first continuous energy range at least 3 keV wide, the second intensity less than or equal to 10% of the first intensity across a second continuous energy range at least 100 eV wide.

    X-ray emission spectrometer system
    54.
    发明授权
    X-ray emission spectrometer system 有权

    公开(公告)号：US10578566B2

    公开(公告)日：2020-03-03

    申请号：US16371606

    申请日：2019-04-01

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Srivatsan Seshadri ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G01N23/223 ,  G01N23/22 ,  G01N23/2209 ,  G01N23/2204

    Abstract: Systems and methods for x-ray emission spectroscopy are provided in which at least one x-ray analyzer is curved and receives and diffracts fluorescence x-rays emitted from a sample, and at least one spatially-resolving x-ray detector receives the diffracted x-rays. The at least one x-ray analyzer and the at least one spatially-resolving x-ray detector are positioned on the Rowland circle. In some configurations, the fluorescence x-rays are emitted from the same surface of the sample that is irradiated by the x-rays from an x-ray source and the system has an off-Rowland circle geometry. In some other configurations, an x-ray optical train receives the fluorescence x-rays emitted from a sample impinged by electrons within an electron microscope and focuses at least some of the received fluorescence x-rays to a focal spot.

    Detector for X-rays with high spatial and high spectral resolution
    55.
    发明授权
    Detector for X-rays with high spatial and high spectral resolution 有权

    公开(公告)号：US10295486B2

    公开(公告)日：2019-05-21

    申请号：US15240972

    申请日：2016-08-18

    Applicant: SIGRAY, INC.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Benjamin Donald Stripe

    IPC: G01N23/223 ,  G01N23/20058 ,  G01N23/04

    Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.

    X-ray surface analysis and measurement apparatus
    58.
    发明授权
    X-ray surface analysis and measurement apparatus 有权

    公开(公告)号：US09823203B2

    公开(公告)日：2017-11-21

    申请号：US15060477

    申请日：2016-03-03

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G01N23/205 ,  H01J35/08 ,  G21K1/06

    CPC classification number: G01N23/205 ,  G21K1/062 ,  H01J35/08 ,  H01J2235/086

    Abstract: Systems for x-ray diffraction/scattering measurements having greater x-ray flux and x-ray flux density are disclosed. These are useful for applications such as material structural analysis and crystallography. The higher flux is achieved by using designs for x-ray targets comprising a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density, and used to illuminate materials for the analysis based on their scattering/diffractive effects.

    X-ray surface analysis and measurement apparatus
    59.
    发明授权
    X-ray surface analysis and measurement apparatus 有权
    X射线表面分析和测量仪器

    公开(公告)号：US09594036B2

    公开(公告)日：2017-03-14

    申请号：US14634834

    申请日：2015-03-01

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: H01J35/08 ,  G01N23/223 ,  G01B15/02 ,  G01N23/207 ,  G21K1/06 ,  H01J35/14 ,  G01N23/06

    CPC classification number: G01N23/223 ,  G01B15/02 ,  G01N23/085 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

    Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.

    Abstract translation: 本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的全反射x射线荧光测量的系统。 因此，这些可用于诸如微量元素检测和/或全反射荧光分析的应用。 较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。 这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。 然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

    X-ray illuminators with high flux and high flux density
    60.
    发明授权
    X-ray illuminators with high flux and high flux density 有权

    公开(公告)号：US09449781B2

    公开(公告)日：2016-09-20

    申请号：US14544191

    申请日：2014-12-08

    Applicant: Sigray, Inc.

    Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

    IPC: G21K1/06 ,  H01J35/08 ,  G01N23/223

    CPC classification number: H01J35/08 ,  G01N23/223 ,  G21K1/06 ,  H01J2235/081 ,  H01J2235/086

    Abstract: This disclosure presents systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

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