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    Communication terminal, and dial registration method and dial registration program therefor
    51.
    发明授权
    Communication terminal, and dial registration method and dial registration program therefor 有权
    通信终端，拨号注册方式和拨号注册程序

    公开(公告)号：US08588857B2

    公开(公告)日：2013-11-19

    申请号：US11538643

    申请日：2006-10-04

    申请人： Toshikazu Houmura ,  Kazuhiro Yoshihara ,  Takako Yamaguchi ,  Kazuma Nagaoka

    发明人： Toshikazu Houmura ,  Kazuhiro Yoshihara ,  Takako Yamaguchi ,  Kazuma Nagaoka

    IPC分类号： H04M1/00

    CPC分类号： H04M1/00 ,  H04M1/2745 ,  H04M1/274508 ,  H04M1/274558 ,  H04M1/7258

    摘要： A communication terminal having one or more one-touch-dial buttons simplifies operations needed for registration of destination data such as phone numbers or mail addresses. A communication terminal (e.g., a cellular phone) having one or more one-touch-dial buttons includes a destination-data registration unit (e.g., a phone-directory database) that allows destination data such as phone numbers or mail addresses to be registered therein, a one-touch-dial registration unit that allows destination data to be registered therein so as to be associated with the one or more one-touch-dial buttons, and a control unit that, in response to an operation of the one or more one-touch-dial buttons, determines whether destination data has been registered in the one-touch-dial registration unit or the destination-data registration unit, and that outputs a result of the determination and a query message regarding registration of the destination data.

    摘要翻译： 具有一个或多个单触拨号按钮的通信终端简化了诸如电话号码或邮件地址的目的地数据的注册所需的操作。 具有一个或多个单触拨号按钮的通信终端（例如，蜂窝电话）包括允许登记诸如电话号码或邮件地址的目的地数据的目的地数据登记单元（例如，电话目录数据库） 其中，允许将目的地数据登记在其中以与所述一个或多个单按钮按钮相关联的单触拨号登记单元，以及控制单元，响应于所述一个或多个 更多的单触拨号按钮，确定目的地数据是否已经登记在单触拨号登记单元或目的地数据登记单元中，并且输出确定结果和关于目的地数据的登记的查询消息 。

    SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER ARRAY MANUFACTURING METHOD, SURFACE EMITTING LASER, SURFACE EMITTING LASER ARRAY, AND OPTICAL APPARATUS INCLUDING SURFACE EMITTING LASER ARRAY
    52.
    发明申请
    SURFACE EMITTING LASER MANUFACTURING METHOD, SURFACE EMITTING LASER ARRAY MANUFACTURING METHOD, SURFACE EMITTING LASER, SURFACE EMITTING LASER ARRAY, AND OPTICAL APPARATUS INCLUDING SURFACE EMITTING LASER ARRAY 有权
    表面发射激光制造方法，表面发射激光阵列制造方法，表面发射激光，表面发射激光阵列和包括表面发射激光阵列的光学装置

    公开(公告)号：US20110076058A1

    公开(公告)日：2011-03-31

    申请号：US12958987

    申请日：2010-12-02

    申请人： Mitsuhiro Ikuta ,  Yasuhisa Inao ,  Takako Yamaguchi

    发明人： Mitsuhiro Ikuta ,  Yasuhisa Inao ,  Takako Yamaguchi

    IPC分类号： G03G15/04 ,  H01S5/18 ,  H01S5/323

    CPC分类号： H01S5/18391 ,  H01S5/18311 ,  H01S5/18347 ,  H01S2301/166 ,  H01S2301/176

    摘要： Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.

    摘要翻译： 本发明提供了一种表面发射激光制造方法等，其减少了对表面起伏结构发生的工艺损伤，能够稳定地提供单一横模特性。 提供了一种包括用于控制上反射镜的发光部分中的反射率的表面浮雕结构的方法，所述表面浮雕结构包括阶梯结构，包括：形成包括用于形成台面结构的图案的抗蚀剂图案和用于形成台阶结构的图案 在上反射镜上或上方形成台阶结构，并执行用于蚀刻上镜的表面层的第一相蚀刻以确定阶梯结构的水平位置; 在执行第一相蚀刻之后形成电流限制结构; 并且在形成电流限制结构之后，执行第二相蚀刻以进一步蚀刻已经执行第一相蚀刻的区域，以确定阶梯结构的深度位置。

    COMMUNICATION TERMINAL, AND DIAL REGISTRATION METHOD AND DIAL REGISTRATION PROGRAM THEREFOR
    54.
    发明申请
    COMMUNICATION TERMINAL, AND DIAL REGISTRATION METHOD AND DIAL REGISTRATION PROGRAM THEREFOR 有权
    通信终端和拨号注册方法及其拨号注册程序

    公开(公告)号：US20100150334A1

    公开(公告)日：2010-06-17

    申请号：US12714813

    申请日：2010-03-01

    申请人： Toshikazu Houmura ,  Kazuhiro Yoshihara ,  Takako Yamaguchi ,  Kazuma Nagaoka

    发明人： Toshikazu Houmura ,  Kazuhiro Yoshihara ,  Takako Yamaguchi ,  Kazuma Nagaoka

    IPC分类号： H04M3/42

    CPC分类号： H04M1/00 ,  H04M1/2745 ,  H04M1/274508 ,  H04M1/274558 ,  H04M1/7258

    摘要： A communication terminal having one or more one-touch-dial buttons simplifies operations needed for registration of destination data such as phone numbers or mail addresses. A communication terminal (e.g., a cellular phone) having one or more one-touch-dial buttons includes a destination-data registration unit (e.g., a phone-directory database) that allows destination data such as phone numbers or mail addresses to be registered therein, a one-touch-dial registration unit that allows destination data to be registered therein so as to be associated with the one or more one-touch-dial buttons, and a control unit that, in response to an operation of the one or more one-touch-dial buttons, determines whether destination data has been registered in the one-touch-dial registration unit or the destination-data registration unit, and that outputs a result of the determination and a query message regarding registration of the destination data.

    摘要翻译： 具有一个或多个单触拨号按钮的通信终端简化了诸如电话号码或邮件地址的目的地数据的注册所需的操作。 具有一个或多个单触拨号按钮的通信终端（例如，蜂窝电话）包括允许登记诸如电话号码或邮件地址的目的地数据的目的地数据登记单元（例如，电话目录数据库） 其中，允许将目的地数据登记在其中以与所述一个或多个单按钮按钮相关联的单触拨号登记单元，以及控制单元，响应于所述一个或多个 更多的单触拨号按钮，确定目的地数据是否已经登记在单触拨号登记单元或目的地数据登记单元中，并且输出确定结果和关于目的地数据的登记的查询消息 。

    Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method
    55.
    发明授权
    Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method 失效
    曝光掩模，其设计和制造方法，曝光方法和装置，图案形成方法和装置制造方法

    公开(公告)号：US07691540B2

    公开(公告)日：2010-04-06

    申请号：US10529891

    申请日：2004-06-25

    申请人： Takako Yamaguchi ,  Yasuhisa Inao

    发明人： Takako Yamaguchi ,  Yasuhisa Inao

    IPC分类号： G03F1/00 ,  G06F17/50

    CPC分类号： B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70425

    摘要： A method of designing an exposure mask for exposing an image forming layer provided on a substrate, by use of near field light leaking from adjoining openings formed in a light blocking member. The method includes determining a width D of the openings and an opening interval of the openings to be formed in the light blocking member, in which a relation D≦(P−W−2T) is satisfied where T is the height of a pattern to be produced by the image forming layer, W is the linewidth of the pattern and P is the pitch of the pattern, so that an electrical field distribution, adjacent to the opening of the light blocking member as exposure light is projected on the light blocking member, is approximated to an electrical field model extending concentric-circularly with an edge of the light blocking member at an image forming layer side as a center.

    摘要翻译： 一种设计曝光掩模的方法，用于通过使用从形成在遮光构件中的相邻开口泄漏的近场光来曝光设置在基板上的图像形成层。 该方法包括确定开口的宽度D和要形成在遮光构件中的开口的开口间隔，其中满足关系D＆nlE;（P-W-2T），其中T是图案的高度 由图像形成层产生，W是图案的线宽，P是图案的间距，使得与遮光构件的开口相邻的作为曝光光的电场分布投影在遮光构件上 近似于在作为中心的图像形成层侧的遮光构件的边缘同心圆周地延伸的电场模型。

    PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD
    58.
    发明申请
    PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD 审中-公开
    使用该方法的图案形成方法和设备生产过程

    公开(公告)号：US20080085479A1

    公开(公告)日：2008-04-10

    申请号：US11866002

    申请日：2007-10-02

    申请人： Takako Yamaguchi ,  Toshiki Ito ,  Natsuhiko Mizutani

    发明人： Takako Yamaguchi ,  Toshiki Ito ,  Natsuhiko Mizutani

    IPC分类号： G03F7/20

    CPC分类号： G03F7/11 ,  G03F7/0751

    摘要： A pattern forming method for forming a pattern comprising a plurality of fine particles disposed on a substrate includes a step of forming, on the substrate, a silane coupling agent-containing layer containing an amino group-containing silane coupling agent; a step of forming a negative resist layer or a dissolution inhibition positive resist layer on the silane coupling agent-containing layer; a step of selectively removing the resist layer to expose the silane coupling agent-containing layer; and a step of disposing the plurality of fine particles on the exposed silane coupling agent-containing layer.

    摘要翻译： 用于形成包括设置在基板上的多个细颗粒的图案的图案形成方法包括在基板上形成含有含氨基的硅烷偶联剂的含硅烷偶联剂的层的步骤; 在含硅烷偶联剂的层上形成负的抗蚀剂层或溶解抑制正性抗蚀剂层的步骤; 选择性地除去抗蚀剂层以暴露含硅烷偶联剂的层的步骤; 以及将多个细颗粒设置在暴露的含硅烷偶联剂的层上的步骤。

    Resist pattern forming method, substrate processing method, and device manufacturing method
    59.
    发明申请
    Resist pattern forming method, substrate processing method, and device manufacturing method 审中-公开
    抗蚀剂图案形成方法，基板处理方法和装置制造方法

    公开(公告)号：US20060003269A1

    公开(公告)日：2006-01-05

    申请号：US11168422

    申请日：2005-06-29

    申请人： Toshiki Ito ,  Natsuhiko Mizutani ,  Takako Yamaguchi

    发明人： Toshiki Ito ,  Natsuhiko Mizutani ,  Takako Yamaguchi

    IPC分类号： G03F7/00

    CPC分类号： G03F7/2014 ,  B82Y10/00 ,  G03F7/023 ,  G03F7/0382 ,  G03F7/0392

    摘要： Disclosed is a pattern forming method for forming a resist pattern on a substrate to be processed. The method includes a resist layer forming step for forming a resist layer on the substrate, an exposure step for exposing the resist layer with near-field light, and a developing step for developing the exposed resist layer, wherein the resist layer is made of a resist material having an Y value calculated from a sensitivity curve, not less than 1.6.

    摘要翻译： 公开了一种用于在待处理的基板上形成抗蚀剂图案的图案形成方法。 该方法包括用于在基板上形成抗蚀剂层的抗蚀剂层形成步骤，用近场光曝光抗蚀剂层的曝光步骤和用于显影曝光的抗蚀剂层的显影步骤，其中抗蚀剂层由 具有由灵敏度曲线计算的Y值的抗蚀剂材料，不小于1.6。

    Photoresist, photolithography method using the same, and method for producing photoresist
    60.
    发明申请
    Photoresist, photolithography method using the same, and method for producing photoresist 审中-公开
    光刻胶，使用其的光刻法和光致抗蚀剂的制造方法

    公开(公告)号：US20050053859A1

    公开(公告)日：2005-03-10

    申请号：US10938586

    申请日：2004-09-13

    申请人： Takako Yamaguchi ,  Yasuhisa Inao

    发明人： Takako Yamaguchi ,  Yasuhisa Inao

    IPC分类号： G03F7/022 ,  G03F1/14 ,  G03F1/60 ,  G03F7/023 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  G03C5/00

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/60 ,  G03F7/0236 ,  G03F7/2014 ,  G03F7/70325

    摘要： There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing for reduced pattern edge roughness, and a photolithography method including a step of exposing by the near-field exposure the photoresist layer for image formation made thereof. In a positive photoresist containing an alkali-soluble novolak resin and a quinone diazide compound, the film thickness of the photoresist at the time of exposure is not larger than 100 nm, and the absorption coefficient of the photoresist α (μm−1) for the exposure light is such that 0.5≦α≦7.

    摘要翻译： 提供了用于近场暴露的正性光致抗蚀剂，即使对于用于图像形成的光致抗蚀剂层的薄层厚度也具有优异的光利用效率，并且允许减小的图案边缘粗糙度，以及包括通过近场曝光的步骤曝光的步骤的光刻方法， 场曝光用于其形成的图像形成用光致抗蚀剂层。 在含有碱溶性酚醛清漆树脂和醌二叠氮化合物的正性光致抗蚀剂中，曝光时的光致抗蚀剂的膜厚不大于100nm，光致抗蚀剂的吸光系数α（mum -1） 因为曝光光使得0.5 <=α<= 7。