公开(公告)号：US20130223131A1

公开(公告)日：2013-08-29

申请号：US13883075

申请日：2012-06-11

申请人： Takeshi Takagi ,  Koji Katayama

发明人： Takeshi Takagi ,  Koji Katayama

IPC分类号： G11C13/00

CPC分类号： G11C13/0007 ,  G11C13/0064 ,  G11C13/0069 ,  G11C2013/0073 ,  G11C2013/009 ,  G11C2013/0092 ,  G11C2213/15 ,  G11C2213/32

摘要： A driving method for driving a variable resistance element and a nonvolatile memory device, which achieves stable storage operation. In a low resistance write process, a low resistance writing voltage pulse having the negative polarity is applied once to a variable resistance layer included in a variable resistance element while in a high resistance write process, a high resistance writing voltage pulse having the positive polarity is applied more than twice to the same variable resistance layer. Here, when a voltage value of one of the high resistance writing voltage pulses is VH1 and a voltage value of the other high resistance writing voltage pulse applied subsequently is VH2, VH1>VH2 is satisfied.

摘要翻译： 用于驱动可变电阻元件和非易失性存储器件的驱动方法，其实现稳定的存储操作。 在低电阻写入处理中，具有负极性的低电阻写入电压脉冲在包括在可变电阻元件中的可变电阻层上施加一次，而在高电阻写入处理中，具有正极性的高电阻写入电压脉冲是 施加两倍以上的同一可变电阻层。 这里，当高电阻写入电压脉冲之一的电压值为VH1，随后施加的另一个高电阻写入电压脉冲的电压值为VH2时，满足VH1> VH2。

公开(公告)号：US08486788B2

公开(公告)日：2013-07-16

申请号：US13162310

申请日：2011-06-16

申请人： Junko Iwanaga ,  Takeshi Takagi ,  Yoshihiko Kanzawa ,  Haruyuki Sorada ,  Tohru Saitoh ,  Takahiro Kawashima

发明人： Junko Iwanaga ,  Takeshi Takagi ,  Yoshihiko Kanzawa ,  Haruyuki Sorada ,  Tohru Saitoh ,  Takahiro Kawashima

IPC分类号： H01L21/336

CPC分类号： H01L29/785 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/66795

摘要： A semiconductor device includes: a semiconductor substrate in which a trench is formed; a source region and a drain region each of which is buried in the trench and contains an impurity of the same conductive type; a semiconductor FIN buried in the trench and provided between the source and drain regions; a gate insulating film provided on a side surface of the semiconductor FIN as well as the upper surface of the semiconductor FIN; and a gate electrode formed on the gate insulating film.

摘要翻译： 一种半导体器件包括：形成沟槽的半导体衬底; 源极区域和漏极区域，每个源极区域和漏极区域被埋在沟槽中并且包含相同导电类型的杂质; 掩埋在沟槽中并设置在源区和漏区之间的半导体FIN; 设置在半导体FIN的侧表面上的栅极绝缘膜以及半导体FIN的上表面; 以及形成在栅极绝缘膜上的栅电极。

公开(公告)号：US20130112936A1

公开(公告)日：2013-05-09

申请号：US13810708

申请日：2012-01-18

申请人： Zhiqiang WEI ,  Takeshi Takagi ,  Satoru Mitani ,  Yoshio Kawashima ,  Ichirou Takahashi

发明人： Zhiqiang WEI ,  Takeshi Takagi ,  Satoru Mitani ,  Yoshio Kawashima ,  Ichirou Takahashi

IPC分类号： H01L45/00

CPC分类号： H01L45/1253 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/1273 ,  H01L45/146 ,  H01L45/16 ,  H01L45/1625 ,  H01L45/1675

摘要： A variable resistance element including: a first electrode; a second electrode; and a variable resistance layer having a resistance value which reversibly changes according to electrical signals applied, wherein the variable resistance layer includes a first variable resistance layer comprising a first oxygen-deficient transition metal oxide, and a second variable resistance layer comprising a second transition metal oxide having a degree of oxygen deficiency lower than a degree of oxygen deficiency of the first transition metal oxide layer, the second electrode has a single needle-shaped part at the interface with the second variable resistance layer, and the second variable resistance layer is interposed between the first variable resistance layer and the second electrode, is in contact with the first variable resistance layer and the second electrode, and covers the needle-shaped part.

摘要翻译： 一种可变电阻元件，包括：第一电极; 第二电极; 以及可变电阻层，其具有根据施加的电信号可逆地改变的电阻值，其中所述可变电阻层包括包含第一氧缺乏过渡金属氧化物的第一可变电阻层和包含第二过渡金属的第二可变电阻层 具有低于第一过渡金属氧化物层的氧缺乏程度的氧缺乏的氧化物，第二电极在与第二可变电阻层的界面处具有单个针状部分，并且插入第二可变电阻层 在第一可变电阻层和第二电极之间，与第一可变电阻层和第二电极接触并覆盖针状部分。

公开(公告)号：US08432721B2

公开(公告)日：2013-04-30

申请号：US13201890

申请日：2011-02-01

申请人： Mitsuteru Iijima ,  Takeshi Takagi

发明人： Mitsuteru Iijima ,  Takeshi Takagi

IPC分类号： G11C11/00

CPC分类号： G11C13/0069 ,  G11C13/0007 ,  G11C13/0097 ,  G11C2013/0073 ,  G11C2013/0083 ,  G11C2213/32 ,  G11C2213/72 ,  G11C2213/79 ,  H01L45/08 ,  H01L45/146

摘要： Programming a variable resistance element includes: a writing step of applying a writing voltage pulse to transition metal oxide comprising two stacked metal oxide layers to decrease resistance of the metal oxide, each metal oxide layer having different oxygen deficiency; and an erasing step of applying an erasing voltage pulse, of different polarity than the writing pulse, to the metal oxide to increase resistance of the metal oxide. |Vw1|>|Vw2|, Vw1 representing voltage of the writing pulse for first to N-th writing steps, and Vw2 representing voltage of the writing pulse for (N+1)-th and subsequent writing steps, N being at least equal to 1, te1>te2, te1 representing pulse width of the erasing pulse for first to M-th erasing steps, and te2 representing pulse width of the erasing pulse for (M+1)-th and subsequent erasing steps. M>1. The (N+1)-th writing step follows the M-th erasing step.

摘要翻译： 编程可变电阻元件包括：写入步骤，对包含两个堆叠的金属氧化物层的过渡金属氧化物施加写入电压脉冲，以降低金属氧化物的电阻，每个金属氧化物层具有不同的氧缺乏; 以及将与写入脉冲不同的擦除电压脉冲施加到金属氧化物以增加金属氧化物的电阻的擦除步骤。 | Vw1 |> | Vw2 |，表示第一至第N写入步骤的写入脉冲的电压的Vw1，以及表示第（N + 1）个和后续写入步骤的写入脉冲的电压的Vw2，N至少相等 到1，te1> te2，te1表示第一到第M擦除步骤的擦除脉冲的脉冲宽度，te2表示用于（M + 1）个和随后的擦除步骤的擦除脉冲的脉冲宽度。 M> 1。 第（N + 1）个写入步骤在第M擦除步骤之后。

公开(公告)号：US20130010530A1

公开(公告)日：2013-01-10

申请号：US13636258

申请日：2011-03-18

申请人： Koji Katayama ,  Takeshi Takagi ,  Mitsuteru Iijima

发明人： Koji Katayama ,  Takeshi Takagi ,  Mitsuteru Iijima

IPC分类号： G11C11/00

CPC分类号： G11C13/0007 ,  G11C2213/72 ,  H01L27/2409 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/1625

摘要： Provided is a method for driving a non-volatile memory element in which a variable resistance element including a first electrode, a second electrode, and a variable resistance layer capable of reversibly changing between a high resistance state and a low resistance state with application of electrical signals having different polarities is connected in series with a current steering element having bidirectional rectifying characteristics with respect to an applied voltage. After the non-volatile memory element is manufactured, the resistance value of the variable resistance layer is reduced from a resistance value in the initial resistance state higher than that in the high resistance state by applying, to the non-volatile memory element, a voltage pulse having the polarity identical to that of the voltage pulse for changing the variable resistance layer from the low resistance state to the high resistance state in the normal operations.

摘要翻译： 提供一种用于驱动非易失性存储元件的方法，其中包括第一电极，第二电极和可变电阻层的可变电阻元件，所述可变电阻元件能够通过施加电而在高电阻状态和低电阻状态之间可逆地变化 具有不同极性的信号与具有相对于施加电压的双向整流特性的电流导向元件串联连接。 在制造非易失性存储元件之后，通过向非易失性存储元件施加电压，可变电阻层的电阻值比初始电阻状态中的电阻值高于高电阻状态的电阻值 脉冲具有与用于在正常操作中将可变电阻层从低电阻状态改变为高电阻状态的电压脉冲的极性相同的脉冲。

公开(公告)号：US20120327702A1

公开(公告)日：2012-12-27

申请号：US13599286

申请日：2012-08-30

申请人： Takeshi Takagi ,  Zhiqiang Wei ,  Takeki Ninomiya ,  Shunsaku Muraoka ,  Yoshihiko Kanzawa

发明人： Takeshi Takagi ,  Zhiqiang Wei ,  Takeki Ninomiya ,  Shunsaku Muraoka ,  Yoshihiko Kanzawa

IPC分类号： H01L45/00 ,  G11C11/21

CPC分类号： H01L27/101 ,  G11C13/0007 ,  G11C13/0069 ,  G11C2013/0073 ,  G11C2013/0083 ,  G11C2213/31 ,  G11C2213/32 ,  G11C2213/56 ,  H01L27/2409 ,  H01L27/2436 ,  H01L27/2463 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/1625 ,  H01L45/1675

摘要： A nonvolatile memory element includes: a first electrode layer; a second electrode layer; and a variable resistance layer which is placed between the electrode layers, and whose resistance state reversibly changes between a high resistance state and a low resistance state based on a polarity of a voltage applied between the electrode layers. The variable resistance layer is formed by stacking a first oxide layer including an oxide of a first transition metal and a second oxide layer including an oxide of a second transition metal which is different from the first transition metal. At least one of the following conditions is satisfied: (1) a dielectric constant of the second oxide layer is larger than a dielectric constant of the first oxide layer; and (2) a band gap of the second oxide layer is smaller than a band gap of the first oxide layer.

摘要翻译： 非易失性存储元件包括：第一电极层; 第二电极层; 以及可变电阻层，其设置在电极层之间，并且其电阻状态基于施加在电极层之间的电压的极性而在高电阻状态和低电阻状态之间可逆地变化。 可变电阻层通过堆叠包括第一过渡金属的氧化物的第一氧化物层和包含与第一过渡金属不同的第二过渡金属的氧化物的第二氧化物层而形成。 满足以下条件中的至少一个：（1）第二氧化物层的介电常数大于第一氧化物层的介电常数; 和（2）第二氧化物层的带隙小于第一氧化物层的带隙。

公开(公告)号：US20120320661A1

公开(公告)日：2012-12-20

申请号：US13596154

申请日：2012-08-28

申请人： Shunsaku MURAOKA ,  Takeshi Takagi ,  Satoru Mitani ,  Koji Katayama

发明人： Shunsaku MURAOKA ,  Takeshi Takagi ,  Satoru Mitani ,  Koji Katayama

IPC分类号： G11C11/00

CPC分类号： G11C13/0007 ,  G11C13/0069 ,  G11C2013/0083 ,  G11C2213/72 ,  G11C2213/79 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/1625

摘要： A method includes applying a first polarity writing voltage pulse to a metal oxide layer to change its resistance state from high to low into a write state, applying a second polarity erasing voltage pulse different from the first polarity to the metal oxide layer to change its resistance state from low to high into an erase state, and applying an initial voltage pulse having the second polarity to the metal oxide layer before first application of the writing voltage pulse, to change an initial resistance value of the metal oxide layer. R0>RH>RL and |V0|>|Ve|≧|Vw| are satisfied where R0, RL, and RH are the resistance values of the initial, write, and erase states, respectively, of the metal oxide layer, and V0, Vw, and Ve are voltage values of the initial, writing, and erasing voltage pulses, respectively.

摘要翻译： 一种方法包括：将第一极性写入电压脉冲施加到金属氧化物层，以将其电阻状态从高变为低电平变为写入状态，将不同于第一极性的第二极性擦除电压脉冲施加到金属氧化物层以改变其电阻 状态从低到高进入擦除状态，以及在首次施加写入电压脉冲之前将具有第二极性的初始电压脉冲施加到金属氧化物层，以改变金属氧化物层的初始电阻值。 R0> RH> RL和| V0 |> | Ve |≥| Vw | 满足R0，RL和RH分别是金属氧化物层的初始，写入和擦除状态的电阻值，V0，Vw和Ve是初始，写入和擦除电压的电压值 脉冲。

公开(公告)号：US08264865B2

公开(公告)日：2012-09-11

申请号：US12677404

申请日：2009-07-01

申请人： Satoru Mitani ,  Yoshihiko Kanzawa ,  Koji Katayama ,  Takeshi Takagi

发明人： Satoru Mitani ,  Yoshihiko Kanzawa ,  Koji Katayama ,  Takeshi Takagi

IPC分类号： G11C11/00

CPC分类号： G11C13/0069 ,  G11C13/0007 ,  G11C2213/32 ,  G11C2213/34 ,  G11C2213/71 ,  G11C2213/79 ,  H01L27/101 ,  H01L27/2409 ,  H01L27/2436 ,  H01L27/2481 ,  H01L45/08 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/1625

摘要： A nonvolatile memory element of the present invention comprises a first electrode (103), a second electrode (108); a resistance variable layer (107) which is interposed between the first electrode (103) and the second electrode (107) and is configured to switch a resistance value reversibly in response to an electric signal applied between the electrodes (103) and (108), and the resistance variable layer (107) has at least a multi-layer structure in which a first hafnium-containing layer having a composition expressed as HfOx (0.9≦x≦1.6), and a second hafnium-containing layer having a composition expressed as HfOy (1.8

摘要翻译： 本发明的非易失性存储元件包括第一电极（103），第二电极（108） 介于第一电极（103）和第二电极（107）之间的电阻变化层（107），其被配置为响应于施加在电极（103）和（108）之间的电信号可逆地切换电阻值， ，并且电阻变化层（107）具有至少多层结构，其中具有表示为HfO x（0.9＆nlE; x＆nlE; 1.6）的组成的第一含铪层和具有组成的第二含铪层 表示为HfOy（1.8

公开(公告)号：US08258493B2

公开(公告)日：2012-09-04

申请号：US12515379

申请日：2007-11-13

申请人： Takumi Mikawa ,  Takeshi Takagi

发明人： Takumi Mikawa ,  Takeshi Takagi

IPC分类号： H01L29/00

CPC分类号： H01L27/101 ,  G11C13/0007 ,  G11C2213/32 ,  G11C2213/72 ,  G11C2213/73 ,  H01L27/0688 ,  H01L27/112 ,  H01L27/115 ,  H01L27/2409 ,  H01L27/2418 ,  H01L27/2463 ,  H01L27/2481 ,  H01L45/04 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/1683

摘要： A nonvolatile semiconductor memory apparatus (10) of the present invention comprises a substrate (10), lower-layer electrode wires (15) provided on the substrate (11), an interlayer insulating layer (16) which is disposed on the substrate (11) including the lower-layer electrode wires (15) and is provided with contact holes at locations respectively opposite to the lower-layer electrode wires (15), resistance variable layers (18) which are respectively connected to the lower-layer electrode wires (15); and non-ohmic devices (20) which are respectively provided on the resistance variable layers (18) such that the non-ohmic devices are respectively connected to the resistance variable layers (18). The non-ohmic devices (20) each has a laminated-layer structure including plural semiconductor layers, a laminated-layer structure including a metal electrode layer and an insulator layer, or a laminated-layer structure including a metal electrode layer and a semiconductor layer. One layer of the laminated-layer structure is embedded to fill each of the contact holes and the semiconductor layer or the insulator layer which is the other layer of the laminated-layer structure has a larger area than an opening of each of the contact holes and is provided on the interlayer insulating layer (16).

摘要翻译： 本发明的非易失性半导体存储装置（10）具备基板（10），设置在基板（11）上的下层电极布线（15），设置在基板（11）上的层间绝缘层（16） ），并且在分别与下层电极线（15）相对的位置设置接触孔，电阻变化层（18）分别与下层电极线（15）连接 15）; 和非欧姆器件（20），其分别设置在电阻变化层（18）上，使得非欧姆器件分别连接到电阻变化层（18）。 非欧姆装置（20）各自具有包括多个半导体层的层叠层结构，包括金属电极层和绝缘体层的层叠层结构，或者包括金属电极层和半导体层的层叠层结构 。 嵌入层叠层结构的一层以填充每个接触孔，作为层叠层结构的另一层的半导体层或绝缘体层的面积比每个接触孔的开口大， 设置在层间绝缘层（16）上。

公开(公告)号：US08094482B2

公开(公告)日：2012-01-10

申请号：US12529466

申请日：2008-10-28

申请人： Zhiqiang Wei ,  Takeshi Takagi ,  Ken Kawai ,  Kazuhiko Shimakawa

发明人： Zhiqiang Wei ,  Takeshi Takagi ,  Ken Kawai ,  Kazuhiko Shimakawa

IPC分类号： G11C11/00

CPC分类号： H01L27/101 ,  G11C11/5685 ,  G11C13/0007 ,  G11C13/004 ,  G11C13/0069 ,  G11C2013/0054 ,  G11C2013/0073 ,  G11C2013/009 ,  G11C2211/5646 ,  G11C2213/31 ,  G11C2213/32 ,  G11C2213/34 ,  G11C2213/79

摘要： A nonvolatile memory apparatus and a nonvolatile data storage medium of the present invention, including nonvolatile memory elements each of which changes its resistance in response to electric pulses applied, comprises a first write circuit for performing first write in which a first electric pulse is applied to the nonvolatile memory element to switch a resistance value of the nonvolatile memory element from a first resistance value to a second resistance value and a second electric pulse which is opposite in polarity to the first electric pulse is applied to the nonvolatile memory element to switch the resistance value of the nonvolatile memory element from the second resistance value to the first resistance value.

摘要翻译： 本发明的非易失性存储装置和非易失性数据存储介质，包括各自根据施加的电脉冲改变其电阻的非易失性存储元件，包括用于执行第一写入的第一写入电路，其中施加第一电脉冲到 将非易失性存储元件的电阻值从第一电阻值切换到与第一电脉冲极性相反的第二电阻值和第二电脉冲的非易失性存储元件施加到非易失性存储元件，以将电阻 非易失性存储元件的值从第二电阻值到第一电阻值。